Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2010
04/14/2010EP2175045A1 CVD coating process, coating device and component for a fluid guiding process
04/14/2010EP2174942A1 Niobium and vanadium organometallic precursors for thin film deposition
04/14/2010EP2173923A1 Method of manufacturing a dye sensitized solar cell by atmospheric pressure atomic layer deposition (ald)
04/14/2010EP2173922A1 Ruthenium precursor with two differing ligands for use in semiconductor applications
04/14/2010EP2173920A2 Multilayer barrier stacks and methods for making them
04/14/2010CN201437552U Gas inlet system
04/14/2010CN201437551U Continuous winding coating equipment
04/14/2010CN1969058B 碳膜 Carbon
04/14/2010CN1670920B Vacuum processing apparatus
04/14/2010CN101694853A ZnO/SiC/Si heterojunction solar battery and preparation method thereof
04/14/2010CN101693991A Plasma-enhanced chemical vapor deposition PECVD equipment
04/14/2010CN101693990A Single-source chemical vapor deposition (CVD) preparation method of a-side ZnO film
04/14/2010CN101109075B Plasma resonant cavity waveguide assembly with heat insulating function
04/13/2010US7698116 Manifolds for delivering fluids having a desired mass flow profile and methods for designing the same
04/13/2010US7695983 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
04/13/2010US7695774 Forming a titanium oxide thin film on a substrate, radiating excimer beam to the titanium oxide thin film while heating the substrate in a vacuum or a gas atmosphere in the presence of silicon
04/13/2010US7695765 Methods for producing low-stress carbon-doped oxide films with improved integration properties
04/13/2010US7695764 Depositing a nucleation layerfor bonding alumina by treating the substrate with pulses of titanium chloride,aluminum chloride and hydrogen, purging, pulsing with nitrogen/oxygen mixture, controlled texture obtained within wide temperature range from 750-1000 degrees C.; wear resistance; toughness
04/13/2010US7695763 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate
04/13/2010US7695760 Deposition method for oxide thin film or stacked metal thin films using supercritical fluid or subcritical fluid, and deposition apparatus therefor
04/13/2010US7695754 Accurately filling the areas of a display's substrate with polymer using an inkjet print head movable relative to the table; provided with sensor and acontrol for processing signals produced by the sensor to control displacement and and the liquid delivery timing based on the signals
04/13/2010US7695700 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
04/13/2010US7695596 Forming uniform patterns by multi-step supporting the substrate in a vacuum deposition process so as to improve the close adhesion of a mask to the substrate
04/13/2010US7695590 Chemical vapor deposition plasma reactor having plural ion shower grids
04/13/2010US7695563 Pulsed deposition process for tungsten nucleation
04/13/2010US7695231 Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate using the same
04/13/2010US7694651 High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said method
04/13/2010CA2490034C Method and apparatus for a blow-molded collapsible container for dispensing liquids
04/13/2010CA2484915C Gas preheater
04/13/2010CA2452656C A method of depositing an inorganic film on an organic polymer
04/13/2010CA2350455C Method of producing negative electrode for lithium secondary cell
04/08/2010WO2010039252A1 Method and apparatus for chemical vapor deposition
04/08/2010WO2010038888A1 Silicon oxynitride film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038887A1 Silicon dioxide film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038886A1 Method for depositing silicon nitride film, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038885A1 Silicon nitride film and process for production thereof, computer-readable storage medium, and plasma cvd device
04/08/2010WO2010038734A1 Film forming apparatus
04/08/2010WO2010038674A1 Method for detecting abnormal placement state of substrate, substrate processing method, computer-readable storage medium and substrate processing apparatus
04/08/2010WO2010038515A1 Vaporizer and deposition system using the same
04/08/2010WO2010038077A1 Method of coating pipettes
04/08/2010WO2010037906A1 Fibrous product having a barrier layer and method of producing the same
04/08/2010US20100087069 Method of manufacturing semiconductor device and substrate processing apparatus
04/08/2010US20100087030 Method, apparatus and system of manufacturing solar cell
04/08/2010US20100086756 Decorative Part and Process for Producing the Same
04/08/2010US20100086734 Nanostructured titania
04/08/2010US20100086703 Vapor Phase Epitaxy System
04/08/2010US20100086682 combining a hydrocarbon solvent with an organometallic precursor, then injecting the mixture into a chemical reactor tube for thermally decomposition and deposition of metal atoms that serve as the catalyst initiating and sustaining the growth of single and multi-walled carbon nanotubes
04/08/2010US20100086681 Control device of evaporating apparatus and control method of evaporating apparatus
04/08/2010US20100086680 Mixture and technique for coating an internal surface of an article
04/08/2010US20100086670 Substrate processing method, substrate processing apparatus, and storage medium
04/08/2010US20100085801 Methods of Forming Thin Films for Molecular Based Devices
04/08/2010US20100084634 Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
04/08/2010US20100083982 Particle removal apparatus and method and plasma processing apparatus
04/08/2010US20100083902 Plasma generating device
04/08/2010US20100083901 Arrangement for Producing Coatings on Substrates in Vacuo
04/08/2010US20100083900 Atomic layer deposition apparatus
04/08/2010US20100083898 Substrate processing apparatus
04/08/2010DE112008000803T5 Abscheidungsquelleneinheit, Abscheidungsvorrichtung und Temperatursteuereinrichtung einer Abscheidungsquelleneinheit Deposition source unit deposition apparatus and temperature control device of a deposition source unit
04/08/2010DE102008050196A1 Vorrichtung und Verfahren zum Abscheiden einer Gradientenschicht Apparatus and method for depositing a graded
04/08/2010DE102006058814B4 Bearbeitungsvorrichtungen Processing devices
04/08/2010DE102005017632B4 Verfahren zur Modifikation der Oberfläche einer Probe mittels eines gepulsten Ionenstrahls oder mittels eines ionenstrahlgenerierten Teilchenstrahls mit homogen oder gaußförmig verteilter Stromdichte A method of modifying the surface of a sample by means of a pulsed ion beam or ion beam generated by a particle beam with homogeneously distributed, or Gaussian current density
04/08/2010DE10065454B4 Verfahren zur Herstellung eines Aluminiumoxidfilms zur Verwendung in einem Halbleitergerät A process for producing an aluminum oxide film for use in a semiconductor device
04/07/2010EP2172578A1 Method and device for separating a gradient coating
04/07/2010EP2171534A1 Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
04/07/2010EP2171123A1 Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors
04/07/2010EP1774571B1 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
04/07/2010CN1853002B Precursor delivery system
04/07/2010CN101140860B Apparatus for treating plasma
04/06/2010USRE41189 Method of making enhanced CVD diamond
04/06/2010US7692177 Resistance variable memory element and its method of formation
04/06/2010US7691984 Metal complexes of tridentate β-ketoiminates
04/06/2010US7691757 chemical vapor deposition; semiconductors
04/06/2010US7691749 Deposition of tungsten nitride
04/06/2010US7691692 Substrate processing apparatus and a manufacturing method of a thin film semiconductor device
04/06/2010US7691453 plasma-polymerizing vaporized organic silicon compound (polysiloxanes) in reaction chamber; chemical vapor deposition; cost efficiency
04/06/2010US7691443 Non-pressure gradient single cycle CVI/CVD apparatus and method
04/06/2010US7691442 Ruthenium or cobalt as an underlayer for tungsten film deposition
04/06/2010US7691441 of organic nickel compound; ozonization; photoresists
04/06/2010US7691440 Method and installation for the densification of substrates by means of chemical vapor infiltration
04/06/2010US7691432 Dispenser for liquid crystal display panel and method for detecting residual quantity of dispensing material using the same
04/06/2010US7691243 Internal antennae for plasma processing with metal plasma
04/06/2010US7691226 Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program
04/06/2010US7691205 Substrate-supporting device
04/06/2010US7691204 Film formation apparatus and methods including temperature and emissivity/pattern compensation
04/06/2010US7691203 Film forming apparatus
04/06/2010US7691202 Ultraviolet light-emitting device in which p-type semiconductor is used
04/06/2010CA2561667C Method for treating surface of material, surface-treated material, medical material, and medical instrument
04/06/2010CA2466639C Buffing diamond-like carbon (dlc) to improve scratch resistance
04/01/2010WO2010036569A2 Novel hardmetal for use in oil and gas drilling applications
04/01/2010WO2010035773A1 Film formation device and substrate processing apparatus
04/01/2010WO2010035647A1 Film forming method and film forming apparatus
04/01/2010WO2010035516A1 Film forming apparatus
04/01/2010WO2010035448A1 Diamond electrode and method for manufacturing diamond electrode
04/01/2010WO2010035429A1 Surface treatment nozzle device
04/01/2010WO2010035409A1 Process for producing silicon epitaxial wafer
04/01/2010WO2010035313A1 Method for production of metal oxide film, and apparatus for production of metal oxide film
04/01/2010WO2010035312A1 METHOD FOR PRODUCTION OF ZINC OXIDE (ZnO) FILM OR MAGNESIUM ZINC OXIDE (ZnMgO) FILM, AND APPARATUS FOR PRODUCTION OF ZINC OXIDE FILM OR MAGNESIUM ZINC OXIDE FILM
04/01/2010WO2010034733A1 Shadow mask held magnetically on a substrate support
04/01/2010US20100081568 Methods for producing carbon nanotubes with controlled chirality and diameter and products therefrom
04/01/2010US20100081291 Very Low Dielectric Constant Plasma-Enhanced CVD Films