Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2010
04/22/2010US20100096083 Shower head structure and treating device
04/22/2010US20100095892 Evaporator device, method of mounting an evaporator device, method of operating an evaporator device, and coating device
04/22/2010US20100095891 Method and apparatus for cleaning a cvd chamber
04/22/2010US20100095890 Gas supply system, pumping system, coating system, gas supply method, and pumping method
04/22/2010US20100095889 Plasma doping apparatus
04/22/2010US20100095888 Plasma generating apparatus and plasma film forming apparatus
04/22/2010US20100095865 Precursor compositions for ald/cvd of group ii ruthenate thin films
04/22/2010DE102008050941A1 CVD-Beschichtungsverfahren, Beschichtungsvorrichtung und Bauteil einer Fluidführung CVD coating process, the coating apparatus and a fluid guide component
04/21/2010EP2176445A1 Method and device for the infiltration of a structure of a porous material by chemical vapour deposition
04/21/2010EP2176444A1 Clean rate improvement by pressure controlled remote plasma source
04/21/2010EP2176443A2 Diamond film deposition
04/21/2010EP1203394B1 METHOD FOR PREPARING A CsX PHOTOSTIMULABLE PHOSPHOR AND PHOSPHORS THEREFROM
04/21/2010CN201439541U PECVD trolley by adopting plasma chemistry vapor deposition (PCVD) method
04/21/2010CN201439540U Knife shank inserting device for diamond coating layer of precision knife and processing device
04/21/2010CN201439539U Reaction cavity vacuum valve and protection device thereof
04/21/2010CN1990910B Film forming apparatus and its operating method
04/21/2010CN1839217B Methods of depositing materials over substrates, and methods of forming layers over substrates
04/21/2010CN1484712B Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
04/21/2010CN101697363A Method for improving properties of window layer material for single-chamber sedimentary silicon-based solar cells
04/21/2010CN101696495A Method for adjusting temperature of growth chamber
04/21/2010CN101696494A Reactant deposition method
04/21/2010CN101696493A Reactor for chemical vapor deposition process
04/21/2010CN101696492A Device and method for preparing aluminum-doped zinc oxide transparent conductive film
04/21/2010CN101696491A In-situ method for preparing graphene/carbon nanotube composite film
04/21/2010CN101337654B Micron grade blocky silicone base composite body assembled by silicon oxide or willemite nano-wires and method for preparing same
04/21/2010CN101283455B Silicon-based thin film photoelectric converter, and method and apparatus for manufacturing same
04/21/2010CN101280423B Manufacturing method of small aperture diamond coating drawing die
04/21/2010CN101265574B Thin film deposition apparatus and thin film deposition method
04/21/2010CN101179000B Plasma source and uses thereof
04/21/2010CN101126148B Nano thin film with separation and protection function and manufacturing method thereof
04/21/2010CN101119012B Method for fabrication of semiconductor device
04/20/2010USRE41248 For turning of steel/low alloyed steels, carbon steels and tough hardened steels at high cutting speeds; cobalt binder phase improves cutting performance when alloyed with tungsten; resistance to plastic deformation
04/20/2010US7700486 Oxide-like seasoning for dielectric low k films
04/20/2010US7700195 Cutting tool and process for the formation thereof
04/20/2010US7700186 Cemented carbide body
04/20/2010US7700167 Coating on a stator vane comprising a polymer matrix fiber composite having a melting point, glass transition temperature, or maximum exposure temperature that is < 150 degrees C.; polymer matrix fiber composite of metal nitrides, carbides, carboxynitrides has a melting point of > 150 degrees C.
04/20/2010US7700166 Process for evaporating high-melting materials
04/20/2010US7700164 Making a hard carbon protective film of a magnetic recording medium for example; generating a plasma between first and second electrodes by applying an electromagnetic energy which is combined with plural frequencies to the first electrode, and activating a material gas by the plasma
04/20/2010US7700157 Depositing a block copolymer on a substrate to form an ordered meso- scale structured array of the polymer materials, forming catalytic metal dots based on meso-scale structure, and growing nano-scale objects on dots to form an ordered array
04/20/2010US7700156 Method and apparatus for forming silicon oxide film
04/20/2010US7700155 Method and apparatus for modulation of precursor exposure during a pulsed deposition process
04/20/2010US7700154 Selective aluminide coating process
04/20/2010US7699957 Plasma processing apparatus
04/20/2010US7699934 Epitaxial wafer production apparatus and susceptor structure
04/20/2010US7699933 Method and device for the plasma treatment of workpieces
04/20/2010US7699932 Reactors, systems and methods for depositing thin films onto microfeature workpieces
04/20/2010US7699023 Gas delivery apparatus for atomic layer deposition
04/20/2010US7699022 Device for the zonal surface treatment of an article by dielectric barrier discharge
04/15/2010WO2010042454A1 Epitaxial reactor for silicon deposition
04/15/2010WO2010041679A1 High-frequency plasma cvd device, high-frequency plasma cvd method, and semiconductor thin film manufacturing method
04/15/2010WO2010041485A1 Method for fabricating p-type gallium nitride-based semiconductor, method for fabricating nitride-based semiconductor element, and method for fabricating epitaxial wafer
04/15/2010WO2010041363A1 Semiconductor device and method for manufacturing semiconductor device
04/15/2010WO2010041213A1 Vapor phase deposition system
04/15/2010WO2010040908A1 Device for the synthesis of nanoparticles by fluidized-bed chemical vapour deposition
04/15/2010WO2010040741A1 Niobium and vanadium organometallic precursors for thin film deposition
04/15/2010US20100093185 Method for forming silicon oxide film, plasma processing apparatus and storage medium
04/15/2010US20100093170 Method for forming tungsten materials during vapor deposition processes
04/15/2010US20100092803 Method for manufacturing a magneto-resistance effect element and magnetic recording and reproducing apparatus
04/15/2010US20100092781 Roll-To-Roll Plasma Enhanced Chemical Vapor Deposition Method of Barrier Layers Comprising Silicon And Carbon
04/15/2010US20100092780 Optical Film, Processing Method of Optical Film and Processing Device of Optical Film
04/15/2010US20100092698 Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition
04/15/2010US20100092697 Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition
04/15/2010US20100092694 Method for coating objects
04/15/2010US20100092692 Method and device for coating substrates
04/15/2010US20100092686 Method for the production of a coating material
04/15/2010US20100092679 Material layer forming apparatus using supercritical fluid, material layer forming system comprising the same and method of forming material layer
04/15/2010US20100092668 Concentric Showerhead For Vapor Deposition
04/15/2010US20100092667 Atomic layer deposition using metal amidinates
04/15/2010US20100092666 Film deposition apparatus and film deposition method
04/15/2010US20100092665 Evaporating apparatus, apparatus for controlling evaporating apparatus, method for controlling evaporating apparatus and method for using evaporating apparatus
04/15/2010US20100092658 Coating of masked substrates
04/15/2010US20100091428 Insulator, capacitor with the same and fabrication method thereof, and method for fabricating semionductor device
04/15/2010US20100091412 Method for manufacturing a magneto-resistance effect element and magnetic recording and reproducing apparatus
04/15/2010US20100090315 Film forming method, film forming apparatus, storage medium and semiconductor device
04/15/2010US20100090154 Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus
04/15/2010US20100089871 Plasma processing apparatus, plasma processing method and storage medium
04/15/2010US20100089870 Plasma processing apparatus and plasma processing method
04/15/2010US20100089869 Nanomanufacturing devices and methods
04/15/2010US20100089866 Method for producing tapered metallic nanowire tips on atomic force microscope cantilevers
04/15/2010US20100089761 Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
04/15/2010US20100089615 Transparent electroconductive film and process for producing the same
04/15/2010US20100089534 Planar Controlled Zone Microwave Plasma System
04/15/2010US20100089531 Vacuum processing apparatus
04/15/2010US20100089323 Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating method
04/15/2010US20100089322 Plasma coating system for accommodating substrates of different shapes
04/15/2010US20100089321 Generation and distribution of a fluorine gas
04/15/2010US20100089320 Plasma processing member, deposition apparatus including the same, and depositing method using the same
04/15/2010US20100089319 Rf return path for large plasma processing chamber
04/15/2010US20100089318 Remote Plasma Apparatus for Manufacturing Solar Cells
04/15/2010US20100089316 Plasma treatment apparatus and plasma treatment method
04/15/2010US20100089314 Substrate support system for reduced autodoping and backside deposition
04/15/2010US20100089238 Method for Dissolving, Recovering and Treating a Gas, Installation for the Stocking of a Gas and Its Method of Manufacture
04/15/2010US20100089123 Hydrogen sensor and method for manufacturing the same
04/15/2010DE112008001372T5 Verfahren und Vorrichtung zum Bilden eines Metalloxid-Dünnfilms Method and apparatus for forming a metal oxide thin film
04/15/2010DE112007003490T5 Vorrichtung und Verfahren zum Bewegen eines Substrats Apparatus and method for moving a substrate
04/15/2010DE102008052098A1 Verfahren zur Herstellung photokatalytisch aktiver Titandioxidschichten Process for the preparation of photocatalytically active titanium dioxide layers
04/15/2010DE102008050433A1 Semi-finished product for producing heat exchanger, comprises a substrate made of aluminum alloy with coating applied on the substrate, where a material-consistent connection of the substrate is producible by partial melting of the coating
04/14/2010EP2175482A1 Vacuum processing device and vacuum processing method
04/14/2010EP2175047A1 Apparatus for plasma treating substrates and method
04/14/2010EP2175046A2 Fluorine process for cleaning semiconductor process chamber
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