Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2010
05/04/2010US7709384 Tantalum amide complexes for depositing tantalum-containing films, and method of making same
05/04/2010US7709377 Thin film including multi components and method of forming the same
05/04/2010US7709063 Remote plasma apparatus for processing substrate with two types of gases
05/04/2010US7709062 Scanning ion beams; filling aperture; process control
05/04/2010US7708911 Titanium oxide based hybrid material, respective preparation process and uses
05/04/2010US7708860 Plasma processing apparatus
05/04/2010US7708859 Gas distribution system having fast gas switching capabilities
05/04/2010US7708835 Film precursor tray for use in a film precursor evaporation system and method of using
05/04/2010US7708834 Bolt and plasma processing apparatus provided with same
05/04/2010US7707965 Processing apparatus and lid opening/closing mechanism
04/2010
04/29/2010WO2010048607A2 Enhanced optical properties of chemical vapor deposited single crystal diamond by low-pressure/high-temperature annealing
04/29/2010WO2010047869A1 Cvd precursors
04/29/2010WO2010047155A1 Heat treatment apparatus
04/29/2010WO2010046373A2 Atomic layer deposition powder coating
04/29/2010WO2010046252A1 Gas supply system, pumping system, coating system, gas supply method, and pumping method
04/29/2010WO2010045904A2 Metal/cnt and/or fullerene composite coating on strip materials
04/29/2010US20100105817 Silanes with Embedded Hydrophilicity, Dispersible Particles Derived Therefrom and Related Methods
04/29/2010US20100105216 Plasma oxidizing method, storage medium, and plasma processing apparatus
04/29/2010US20100105213 Forming method of amorphous carbon film, amorphous carbon film, multilayer resist film, manufacturing method of semiconductor device, and computer-readable storage medium
04/29/2010US20100105195 Method and apparatus for forming a film by deposition from a plasma
04/29/2010US20100104860 Cemented Tungsten Carbide-Based Material and Method for Making the Same
04/29/2010US20100104852 Fabrication of High-Throughput Nano-Imprint Lithography Templates
04/29/2010US20100104838 Optical Article and Method for Manufacturing the Same
04/29/2010US20100104786 Device housing and method for manufacturing the same
04/29/2010US20100104772 Electrode and power coupling scheme for uniform process in a large-area pecvd chamber
04/29/2010US20100104771 Electrode and power coupling scheme for uniform process in a large-area pecvd chamber
04/29/2010US20100104755 Deposition method of ternary films
04/29/2010US20100104754 Multiple gas feed apparatus and method
04/29/2010US20100104753 Low pressure vapor phase deposition of organic thin films
04/29/2010US20100104752 Method for coating a substrate and metal alloy vacuum deposition facility
04/29/2010US20100104751 Evaporating apparatus, evaporating method and manufacturing method of evaporating apparatus
04/29/2010US20100104737 Method for inscribing or marking surfaces
04/29/2010US20100104736 Method and apparatus for automated application of hardfacing material to drill bits
04/29/2010US20100103518 Grid polarizer
04/29/2010US20100102450 Zinc oxide based composites and methods for their fabrication
04/29/2010US20100102417 Vapor deposition method for ternary compounds
04/29/2010US20100101696 Tire, metal cord and process for manufacturing a metal cord
04/29/2010US20100101497 Substrate treatment apparatus
04/29/2010US20100101496 Wafer carrier and epitaxy machine using the same
04/29/2010US20100101495 Restricted Radiated Heating Assembly for High Temperature Processing
04/29/2010US20100101494 Electrode and chemical vapor deposition apparatus employing the electrode
04/29/2010DE112008001482T5 Vorrichtung und Verfahren zur Verbesserung der Behandlungsgleichmäßigkeit in einem Plasmaprozess Apparatus and method for improving the uniformity of treatment in a plasma process
04/29/2010DE102008053394A1 Vorrichtung zum partiellen Abdecken einer Bauteilzone Apparatus for partial covering a component zone
04/29/2010DE102008053030A1 Metall/CNT-und/oder Fulleren-Komposit-Beschichtung auf Bandwerkstoffen Metal / CNT and / or fullerene composite coating on tape materials
04/29/2010CA2731922A1 Metal/cnt and/or fullerene composite coating on strip materials
04/28/2010EP2179842A1 Biodegradable resin container having deposited film, and method for formation of deposited film
04/28/2010EP2178895A1 Methods of forming thin metal-containing films by cvd or ald using iron, ruthenium or osmium cyclopentadiene carbon monoxide complexes
04/28/2010EP2178894A1 Organometallic precursors for use in chemical phase deposition processes
04/28/2010EP1664379B1 Metallization of substrate (s) by a liquid/vapor deposition process
04/28/2010CN201442977U Clamping mechanical device for back plate placed in PECVD cavity
04/28/2010CN1957116B Nanocrystal diamond film, process for producing the same and apparatus using nanocrystal diamond film
04/28/2010CN1853003B Metallization of substrate(s) by a liquid/vapor deposition process
04/28/2010CN1816645B Method for deposition of titanium oxide by a plasma source
04/28/2010CN1732283B Method for preparing coated wire
04/28/2010CN1694849B Burner for chemical vapour deposition of glass
04/28/2010CN1662448B Process for manufacturing a gallium rich gallium nitride film
04/28/2010CN1590583B Trimethyl indium filling container and filling method thereof
04/27/2010US7705382 Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
04/27/2010US7705330 Electron beam irradiation device
04/27/2010US7704593 Cutting tool and method of producing the same
04/27/2010US7704556 Silicon nitride film forming method
04/27/2010US7704555 Flowing nitrogen gas adjacent a substrate to react with a mobile species (lithium fluoride) diffusing into a metal oxide film (electrode layer) to form the electrochromic layer on which an ion transfer layer is formed; depositing a second transparent electrode; releasing vacuum; vacuum/vapor deposit
04/27/2010US7704554 Cooling solid organic material in an evaporization apparatus below the vaporization temperature, heating a second region of the vaporization apparatus above the vaporization temperature of the material so that there is a steep thermal gradient, vaporizing thin cross section of solid organic material
04/27/2010US7704551 Hot melt adhesive system and method using machine readable information
04/27/2010US7704547 Carbon nanotube growth density control
04/27/2010US7704546 Strengthening the ceramic ball of a hip prosthesis by ion beam implantation to induce controlled bilateral compressive stress on the load-bearing surface and not make the ceramic amorphous; coating with a diamond-like-coating of bonding, amorphous, crosslinked carbon network; durability; noncracking
04/27/2010US7704327 High temperature anneal with improved substrate support
04/27/2010US7704326 Deposition mask and manufacturing method thereof
04/27/2010US7703413 Expanded thermal plasma apparatus
04/22/2010WO2010043716A2 Method for the controlled growth of a graphene film
04/22/2010WO2010043615A1 Gravimetric sensor having a sensitive layer containing a diamond nanopowder
04/22/2010WO2010043215A1 Method for producing photocatalytically active titanium dioxide layers
04/22/2010US20100099319 Systems and Methods for Synthesis of Extended Length Nanostructures
04/22/2010US20100099272 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
04/22/2010US20100099271 Method for improving process control and film conformality of pecvd film
04/22/2010US20100099270 Atomic layer deposition apparatus
04/22/2010US20100099267 System and method of vapor deposition
04/22/2010US20100098971 Coating for gas turbine components, and method and device for providing a coating
04/22/2010US20100098964 Method for the production of a coating
04/22/2010US20100098941 Polymer microstructure with tilted micropillar array and method of fabricating the same
04/22/2010US20100098911 Surface Coated Member and Cutting Tool
04/22/2010US20100098904 Single-walled carbon nanotubes and methods of preparation thereof
04/22/2010US20100098884 Boron film interface engineering
04/22/2010US20100098883 Method and apparatus for producing one-dimensional nanostructure
04/22/2010US20100098882 Plasma source for chamber cleaning and process
04/22/2010US20100098881 System and Method for Chemical Vapor Deposition Process Control
04/22/2010US20100098862 Method and apparatus for precision surface modification in nano-imprint lithography
04/22/2010US20100098856 Method for fabricating i -iii-vi2 compound thin film using single metal-organic chemical vapor deposition process
04/22/2010US20100098855 Furnace temperature control method for thermal budget balance
04/22/2010US20100098854 Pressure controlled droplet spraying (pcds) method for forming particles of compound materials from melts
04/22/2010US20100098853 Arrangement for vaporizing materials and method for coating substrates
04/22/2010US20100098852 Arrangement and method for regulating a gas stream or the like
04/22/2010US20100098851 Techniques for atomic layer deposition
04/22/2010US20100098837 Plasma doping method and apparatus
04/22/2010US20100098836 Method and system for monitoring silane deposition
04/22/2010US20100098835 Compensation of Actinic Radiation Intensity Profiles for Three-Dimensional Modelers
04/22/2010US20100098550 Method for coating of a base body and also a workpiece
04/22/2010US20100096393 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
04/22/2010US20100096362 Plasma processing apparatus, power supply apparatus and method for operating plasma processing apparatus
04/22/2010US20100096085 Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements