| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/12/2010 | DE102008056125A1 Testglaswechselsystem zur selektiven Beschichtung und optischen Messung von Schichteigenschaften in einer Vakuumbeschichtungsanlage Test lens changing system for selectively coating and optical measurement of coating properties in a vacuum coating system |
| 05/12/2010 | CN201459238U Air circuit connecting device for vapor deposition furnace |
| 05/12/2010 | CN201459237U Atomic layer deposition reactor made of composite material |
| 05/12/2010 | CN1989046B Container-treatment machine comprising controlled gripping means for seizing containers by the neck |
| 05/12/2010 | CN1891861B Process kit design for reducing particle generation |
| 05/12/2010 | CN1872662B Nano line cluster of titanium silicide prepared by chemical vapor deposition under normal pressure, and preparation method |
| 05/12/2010 | CN1867694B Substrate heater assembly |
| 05/12/2010 | CN1861840B Catalyst enhanced chemical vapor deposition apparatus |
| 05/12/2010 | CN1854335B Coated cutting tool insert |
| 05/12/2010 | CN1826428B Method of forming thin film |
| 05/12/2010 | CN1777694B Film formation method and apparatus utilizing plasma CVD |
| 05/12/2010 | CN1721108B Cutting tool blade used for turning steel and manufacturing method thereof |
| 05/12/2010 | CN1675406B Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| 05/12/2010 | CN1607266B Apparatus for treating workpieces |
| 05/12/2010 | CN1577898B Manufacturing method of silicon thin film solar cell |
| 05/12/2010 | CN1504268B Composite material with ornamental appearance and functional layer and its preparation method |
| 05/12/2010 | CN101707225A Method for improving characteristics of antireflecting film of monocrystalline silicon solar battery |
| 05/12/2010 | CN101705478A Method for improving strength of free-standing diamond film |
| 05/12/2010 | CN101705477A System and method for detecting and repairing crystallization rate of film product on line |
| 05/12/2010 | CN101705476A Method for rapidly preparing high density isotropic carbon by CVD hot plate method |
| 05/12/2010 | CN101705475A Method for depositing photoluminescent amorphous hydrogenated silicon carbide film on silicon chip substrate |
| 05/12/2010 | CN101704110A Method for preparing flaky metal carbonyl powder |
| 05/12/2010 | CN101200802B Engine inner surface ceramic treatment method |
| 05/12/2010 | CN101126154B Gas reaction system with quartz nozzle protection components and |
| 05/12/2010 | CN101089221B Manufacturing method of diamond coating film and its application |
| 05/12/2010 | CN101088151B System for and method of forming via holes by multiple deposition events in a continuous inline shadow mask deposition process |
| 05/12/2010 | CN101065513B Gas distribution system for improving transient vapor phase deposition |
| 05/12/2010 | CN101061258B Barrier film forming internal electrode and film forming device |
| 05/11/2010 | US7714155 having a specific amino alcohol as a ligand containing hafnium metal; as a precursor in thin film formation involving vaporization, such as chemical vapor deposition and atomic layer deposition |
| 05/11/2010 | US7713757 Method for measuring dopant concentration during plasma ion implantation |
| 05/11/2010 | US7713592 Hybrid process; vapor deposition; atomic layer deposition; purging; cyclic process; thin films; controlling substrate temperature |
| 05/11/2010 | US7713589 Method for making carbon nanotube array |
| 05/11/2010 | US7713587 Coated substrate that exhibits low visible light transmittance and low visible light reflectance from at least one side of the substrate; privacy glass; formed by depositing an infrared reflecting layer, a primer layer, a dielectric layer, an absorbing layer on substrate |
| 05/11/2010 | US7713584 Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III) |
| 05/11/2010 | US7713583 Method for forming isotope-doped light element nanotube |
| 05/11/2010 | US7713582 film is allowed to grow on a substrate by subjecting to alternative surface reaction of vapor phase reacting materials, the faster the adsorption of the raw material gases to the substrate surface is, the shorter the time required for forming a film becomes, and the productivity is enhanced |
| 05/11/2010 | US7713431 Plasma processing method |
| 05/11/2010 | US7713378 Ozone processing device |
| 05/11/2010 | US7713355 Silicon shelf towers |
| 05/11/2010 | US7713354 Film forming method, film forming system and recording medium |
| 05/11/2010 | US7713346 Vapor deposition using amine containing organosilicon compound; integrated circuits; disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups |
| 05/11/2010 | US7712436 Plasma processing apparatus with filter circuit |
| 05/11/2010 | US7712435 Plasma processing apparatus with insulated gas inlet pore |
| 05/11/2010 | US7712434 Apparatus including showerhead electrode and heater for plasma processing |
| 05/11/2010 | CA2522841C Porous materials functionalized by vacuum deposition |
| 05/06/2010 | WO2010051341A1 Coatings for suppressing metallic whiskers |
| 05/06/2010 | WO2010050877A1 A coated tool and a method of making thereof |
| 05/06/2010 | WO2010050363A1 Plasma cvd apparatus, method for producing semiconductor film, method for manufacturing thin film solar cell, and method for cleaning plasma cvd apparatus |
| 05/06/2010 | WO2010050169A1 Plasma processing device |
| 05/06/2010 | WO2010049186A1 Precursor disposal |
| 05/06/2010 | WO2010049024A1 Precursor recycling |
| 05/06/2010 | WO2010024902A3 Wear resistant coatings for tool dies |
| 05/06/2010 | WO2009132207A3 Synthesis and use of precursors for ald of tellurium and selenium thin films |
| 05/06/2010 | US20100112814 Pre-certified process chamber and method |
| 05/06/2010 | US20100112744 Silicon Production with a Fluidized Bed Reactor Utilizing Tetrachlorosilane to Reduce Wall Deposition |
| 05/06/2010 | US20100112349 Nanomaterial With Core-Shell Structure |
| 05/06/2010 | US20100112334 Silicon carbide-based porous body and method of fabricating the same |
| 05/06/2010 | US20100112252 Plastic formed articles having a vapor deposited film and method of producing the same |
| 05/06/2010 | US20100112235 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips |
| 05/06/2010 | US20100112217 Method and device for the production of moulded pieces from a layer of polyurethane |
| 05/06/2010 | US20100112216 Chemical vapor deposition with elevated temperature gas injection |
| 05/06/2010 | US20100112215 Chemical precursor ampoule for vapor deposition processes |
| 05/06/2010 | US20100112214 Synthesis of Higher Diamondoids |
| 05/06/2010 | US20100112213 Susceptor device, manufacturing apparatus of epitaxial wafer, and manufacturing method of epitaxial wafer |
| 05/06/2010 | US20100112212 Adjustable gas distribution apparatus |
| 05/06/2010 | US20100112211 Zirconium, hafnium, titanium, and silicon precursors for ald/cvd |
| 05/06/2010 | US20100112191 Systems and associated methods for depositing materials |
| 05/06/2010 | US20100110860 Data storage media containing magnesium metal layer |
| 05/06/2010 | US20100108951 Material for transparent conductive film |
| 05/06/2010 | US20100108494 Microporous article having metallic nanoparticle coating |
| 05/06/2010 | US20100108262 Apparatus for in-situ substrate processing |
| 05/06/2010 | US20100108254 Tailorable titanium-tungsten alloy material thermally matched to semiconductor substrates and devices |
| 05/06/2010 | US20100107981 Apparatus for fabricating display device |
| 05/06/2010 | US20100107978 Deposition from liquid sources |
| 05/06/2010 | US20100107977 Film forming apparatus |
| 05/06/2010 | US20100107672 Dual substrate loadlock process equipment |
| 05/06/2010 | DE102008043361A1 Anschlussdraht und Verfahren zur Herstellung eines solchen Lead wire and method for producing such |
| 05/05/2010 | EP2182088A1 Atomic layer deposition using metal amidinates |
| 05/05/2010 | EP2181200A2 Method of patterning vapour deposition by printing |
| 05/05/2010 | EP1422316B1 Method for cleaning reaction container |
| 05/05/2010 | CN1942604B Inlet system for an MOCVD reactor |
| 05/05/2010 | CN1934679B Method and apparatus for forming silicon dots |
| 05/05/2010 | CN1794421B Semiconductor processing apparatus and method |
| 05/05/2010 | CN1780935B Method for forming thin film and base having thin film formed by such method |
| 05/05/2010 | CN1776008B Vacuum chamber and dividing method thereof |
| 05/05/2010 | CN1758826B Diffuser gravity support and method for depositting a film on a substrate |
| 05/05/2010 | CN1742113B Vacuum processing apparatus |
| 05/05/2010 | CN1670244B Gas preparing system and gas preparing method |
| 05/05/2010 | CN1661647B Apparatus for manufacturing flat-panel display |
| 05/05/2010 | CN1639638B Mask repair with electron beam-induced chemical etching |
| 05/05/2010 | CN1630030B Plasma processing device and semiconductor manufacturing device |
| 05/05/2010 | CN1604270B Particle removal apparatus and method and plasma processing apparatus |
| 05/05/2010 | CN1541196B Visible-light-responsive photoactive coating, coated article, and method of making same |
| 05/05/2010 | CN101702885A Surface modified aerosol particles, a method and apparatus for production thereof and powders and dispersions containing said particles |
| 05/05/2010 | CN101701333A Rectangular chemical vapour deposition reactor |
| 05/05/2010 | CN101116170B Encapsulated wafer processing device and process for making thereof |
| 05/05/2010 | CN101076493B High purity granular silicon and method of manufacturing the same |
| 05/04/2010 | US7709540 Method for preparing organic ligand-capped titanium dioxide nanocrystals |
| 05/04/2010 | US7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned |
| 05/04/2010 | US7709385 Method for depositing tungsten-containing layers by vapor deposition techniques |