Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2010
05/20/2010US20100124825 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
05/20/2010US20100124822 Apparatuses for adjusting electrode gap in capacitively-coupled rf plasma reactor
05/20/2010US20100124655 Method for fabricating carbon nanotube, wafer for growing carbon nanotube, and carbon nanotube device
05/20/2010US20100124643 Undercoating layers providing improved photoactive topcoat functionality
05/20/2010US20100124642 Undercoating layers providing improved conductive topcoat functionality
05/20/2010US20100124622 Method for making nanowire structure
05/20/2010US20100124621 Method of Forming Insulation Film by Modified PEALD
05/20/2010US20100124613 Heater integrated thermocouple
05/20/2010US20100124610 Substrate position detection apparatus, substrate position detection method, film deposition apparatus, film deposition method, and a computer readable storage medium
05/20/2010US20100124609 Methods Of Forming Metal-Containing Structures, And Methods Of Forming Germanium-Containing Structures
05/20/2010US20100124600 Method and apparatus for detecting and passivating defects in thin film solar cells
05/20/2010US20100124529 Method of manufacturing carbon cylindrical structures and biopolymer detection device
05/20/2010US20100123368 Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer
05/20/2010US20100122798 Heat transport device, electronic apparatus, and heat transport device manufacturing method
05/20/2010US20100122710 Film deposition apparatus, cleaning method for the same, and computer storage medium storing program
05/20/2010US20100122659 Metering and vaporizing particulate material
05/20/2010US20100122657 Electrode, Chemical Vapor Deposition Apparatus Including the Electrode and Method of Making
05/20/2010DE102008056968A1 Verfahren zum Abscheiden einer Nanokomposit-Schicht auf einem Substrat mittels chemischer Dampfabscheidung A method for depositing a nano-layer on a substrate by chemical vapor deposition
05/20/2010CA2743474A1 Hydrophobic surface coating systems and methods for metals
05/19/2010EP2187446A2 Microcrystalline silicon alloys for thin film and wafer based solar applications
05/19/2010EP2186923A1 Gas supply system, pumping system, coating system, gas supply method, and pumping method
05/19/2010EP2186922A1 Method for separating a nanocomposite layer on a substrate using chemical vapor deposition
05/19/2010EP2186921A1 Filament arrangement for hot wire chemical vapour deposition
05/19/2010EP2186920A1 Arrangement and method for regulating a gas stream or the like
05/19/2010EP2186130A1 Tungsten digitlines and methods of forming and operating the same
05/19/2010EP2186115A2 Combinatorial process system
05/19/2010EP2185044A2 Part for a hydraulic circuit of a machine for preparing drinks that comprises a coating
05/19/2010EP1439240B1 Method for hot-press forming a plated steel product
05/19/2010EP1108267B1 Methods of forming roughened layers of platinum and methods of forming capacitors containing said roughened layers of platinum
05/19/2010CN201473588U Hook of silicon wafer carrier for PECVD
05/19/2010CN201473587U Silicon wafer carrier refitting device for PECVD
05/19/2010CN1932075B Substrate processing device, chemical oxide removing processing module and substrate lifting device
05/19/2010CN101711288A Method for the application of a high-strength coating to workpieces and/or materials
05/19/2010CN101709457A Device of chemical vapor deposition diamond or other substances
05/19/2010CN101333653B Plasma chemical vapor deposition process for preventing generation of bag type defects
05/19/2010CN101333652B Method for preparing SixOyFz coatings on organic precoated metal plate
05/19/2010CN101208783B Method to increase silicon nitride film tensile stress using post PECVD deposition and UV processing
05/19/2010CN101206999B Inner lining and reaction chamber containing the same
05/19/2010CN101171365B Multiple inlet atomic layer deposition reactor
05/19/2010CN101130859B Resistor external-heating type thermal gradient vapor phase carbon depositing device for airplane carbon brake disc densification technique
05/19/2010CN101091005B Method for forming tantalum nitride film
05/19/2010CN101091000B Method for forming tantalum nitride film
05/19/2010CN101012549B Chip carrier in silicon chip production
05/19/2010CN101008081B Graphite boat for silicon wafer production
05/19/2010CN101003033B Gas separation type showerhead
05/18/2010US7719648 Manufacturing apparatus for liquid crystal device, manufacturing method for liquid crystal device, liquid crystal device and electronic device
05/18/2010US7718930 Loading table and heat treating apparatus having the loading table
05/18/2010US7718226 chemical vapor deposition; titanium carbides, nitrides
05/18/2010US7718225 Method to control semiconductor film deposition characteristics
05/18/2010US7718224 A modified chemical-vapor-deposition reaction chamber reduces turbulence of hydrocarbon gas flow during growth phase to promote environment for ultra-long nanotube formation; freely suspended from the substrate to form electrical contacts by bridging the gap between catalyst pads
05/18/2010US7718223 Control of carbon nanotube density and tower height in an array
05/18/2010US7718222 Apparatus and method for high rate uniform coating, including non-line of sight
05/18/2010US7718215 Apparatus for forming alignment layer and auto-calibration method thereof
05/18/2010US7718044 Method for controlling shaft coating taper
05/18/2010US7718030 Method and system for controlling radical distribution
05/18/2010US7718007 Substrate supporting member and substrate processing apparatus
05/18/2010US7718006 Mask holding structure, film forming method, electro-optic device manufacturing method, and electronic apparatus
05/18/2010US7718005 Film forming equipment and film forming method
05/18/2010US7718004 Gas-introducing system and plasma CVD apparatus
05/18/2010US7717061 Gas switching mechanism for plasma processing apparatus
05/18/2010US7717001 Apparatus for and method of sampling and collecting powders flowing in a gas stream
05/14/2010WO2010053878A2 Laminar flow in a precursor source canister
05/14/2010WO2010053094A1 Compound semiconductor manufacturing device, compound semiconductor manufacturing method, and jig for manufacturing compound semiconductor
05/14/2010WO2010052846A1 Take-up vacuum processing device
05/14/2010WO2010052672A2 Allyl-containing precursors for the deposition of metal-containing films
05/14/2010WO2010052191A2 Coated solid pliant materials
05/14/2010WO2010008957A3 Bead pack brazing with energetics
05/13/2010US20100120311 Method for providing textiles with desensitized silver components
05/13/2010US20100120259 Method and apparatus to enhance process gas temperature in a cvd reactor
05/13/2010US20100120238 Semiconductor manufacturing apparatus and method
05/13/2010US20100119866 Low-temperature synthesis of integrated coatings for corrosion resistance
05/13/2010US20100119825 Crystalline nanostructures
05/13/2010US20100119734 Laminar flow in a precursor source canister
05/13/2010US20100119733 Method of immobilizing active material on surface of substrate
05/13/2010US20100119727 Film forming apparatus, film forming method and storage medium
05/13/2010US20100119708 Filling structures of high aspect ratio elements for growth amplification and device fabrication
05/13/2010US20100119698 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
05/13/2010US20100119640 Die for molding honeycomb structure and manufacturing method thereof
05/13/2010US20100118436 Protective coatings for data storage devices
05/13/2010US20100117764 Assisted selective growth of highly dense and vertically aligned carbon nanotubes
05/13/2010US20100117227 Method of preparing detectors for oxide bonding to readout integrated chips
05/13/2010US20100117035 Electroconductive tin oxide having high mobility and low electron concentration
05/13/2010US20100116791 Novel plasma system for improved process capability
05/13/2010US20100116790 Device and method for locally producing microwave plasma
05/13/2010US20100116789 Substrate processing apparatus
05/13/2010US20100116788 Substrate temperature control by using liquid controlled multizone substrate support
05/13/2010US20100116644 Device for carrying out a plasma-assisted process
05/13/2010US20100116436 Ring-shaped member and method for manufacturing same
05/13/2010US20100116210 Gas injector and film deposition apparatus
05/13/2010US20100116209 Film deposition apparatus
05/13/2010US20100116208 Ampoule and delivery system for solid precursors
05/13/2010US20100116207 Reaction chamber
05/13/2010US20100116206 Gas delivery system having reduced pressure variation
05/12/2010EP2184287A1 Group 2 metal precursors for deposition of group 2 metal oxide films
05/12/2010EP2183407A1 Atmospheric pressure plasma enhanced chemical vapor deposition process
05/12/2010EP2183406A1 Method for preparation of a nanocomposite material by vapour phase chemical deposition
05/12/2010EP2183405A1 Method for producing diamond-like carbon coatings using diamondoid precursors on internal surfaces
05/12/2010EP1619266B1 Method and apparatus for chemical plasma processing of plastic containers
05/12/2010EP1608793B1 Titania coatings
05/12/2010DE102009014414A1 VHF-Elektrodenanordnung, Vorrichtung und Verfahren VHF electrode assembly, device and method