| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/16/2010 | CN1754978B Methods and apparatus for reducing arcing during plasma processing |
| 06/16/2010 | CN1721570B Method for aluminide coating a hollow article |
| 06/16/2010 | CN1648282B Plasma enhanced semicondutor deposition apparatus |
| 06/16/2010 | CN101743338A Vacuum treatment unit and vacuum treatment process |
| 06/16/2010 | CN101740448A Plasma processing equipment and substrate support plate thereof |
| 06/16/2010 | CN101736348A Method for carrying out surface activation treatment on marine climate-resisting engineering parts |
| 06/16/2010 | CN101736326A Capacitively coupled plasma processing reactor |
| 06/16/2010 | CN101736325A Microwave plasma preparation method of superhard titanium aluminum nitride thin film |
| 06/16/2010 | CN101736324A Microwave plasma preparation method of superhard titanium nitride thin film |
| 06/16/2010 | CN101736323A Device for preparing boron-doped diamond composite coating on surface of cutter |
| 06/16/2010 | CN101736322A Chemical vapor deposition reactor |
| 06/16/2010 | CN101736321A Method for preparing microcrystalline silicon-germanium film by adopting helium-hydrogen gas mixing and diluting method |
| 06/16/2010 | CN101736320A Film deposition apparatus and cleaning method for the same |
| 06/16/2010 | CN101736319A Gas injector and film deposition apparatus |
| 06/16/2010 | CN101736318A Film deposition apparatus |
| 06/16/2010 | CN101736317A Atomic layer deposition equipment |
| 06/16/2010 | CN101736316A High efficiency uv cleaning of a process chamber |
| 06/16/2010 | CN101736315A Off-line detection device for radio frequency generator |
| 06/16/2010 | CN101736314A Formation method of silicon oxide film and metal-insulator-metal capacitor |
| 06/16/2010 | CN101736313A Method for preparing diamond-like film on germanium substrate |
| 06/16/2010 | CN101736312A Method for coating surface of radiation module and coated radiation module |
| 06/16/2010 | CN101736311A Heating device for metallorganic chemical deposition equipment |
| 06/16/2010 | CN101736310A Gas delivery system applied to tungsten chemical vapor deposition technology |
| 06/16/2010 | CN101736307A Plasma vapor deposition method |
| 06/16/2010 | CN101735082A Group 2 metal precursors for deposition of group 2 metal oxide films |
| 06/16/2010 | CN101403106B Technique for producing high-insulativity SiO2 film |
| 06/16/2010 | CN101363118B Method for growing silicon carbide film on silicon substrate |
| 06/16/2010 | CN101288158B Heat treatment apparatus |
| 06/16/2010 | CN101163817B Vapor deposition film by plasma CVD method |
| 06/16/2010 | CN101145508B Plasma processing device and method |
| 06/16/2010 | CN101091001B Method for forming tantalum nitride film |
| 06/16/2010 | CN101088759B Coat cutting tool blade |
| 06/16/2010 | CN101065514B Method and system for measuring a flow rate in a solid precursor delivery system |
| 06/16/2010 | CN101038859B Plasma processing apparatus and electrode used therein |
| 06/15/2010 | US7737291 Composition containing siloxane compound and phenol compound |
| 06/15/2010 | US7737290 depositing copper metal films on a heated substrates by the reaction of alternating doses of copper(I) N,N'-diisopropylacetamidinate vapor and hydrogen gas; uniform thickness and excellent step coverage in narrow holes; interconnects in microelectronics, magnetic recording media |
| 06/15/2010 | US7737080 antisoiling layer comprises titanium dioxide-based layer |
| 06/15/2010 | US7737035 Dual seal deposition process chamber and process |
| 06/15/2010 | US7737034 Substrate treating apparatus and method for manufacturing semiconductor device |
| 06/15/2010 | US7737005 Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program |
| 06/15/2010 | US7736733 for rough cutting of train wheels; superior thermal crack resistance, for longer tool life and high-efficiency cutting under high load conditions; includes alpha aluminum oxide film to provide superior strength and superior welding resistance |
| 06/15/2010 | US7736698 Method of depositing zinc oxide coatings on a substrate |
| 06/15/2010 | US7736697 forming tantalum nitride layer or tantalum silicide layer; purity; low temperature process for forming a high quality, uniform tantalum-containing films; useful in integrated circuits as barrier films |
| 06/15/2010 | US7736554 Forming a porous substrate from a fiber reinforcement made of refractory fibers; densifying by a first phase of carbon and by a second of silicon carbide; impregnating the porous substrate with molten silicon to fill in the pores of the substrate; noncracking;construction materials; air/spacecraft |
| 06/15/2010 | US7736462 Installation for processing a substrate |
| 06/15/2010 | US7736446 Method for manufacturing a lanthanum oxide compound |
| 06/15/2010 | US7736440 Method and apparatus for preventing adherence of solid products in gas exhaust pipe and exhaust gas abatement device with same apparatus |
| 06/15/2010 | US7736438 Method and apparatus for depositing a coating on a tape carrier |
| 06/15/2010 | US7736437 Baffled liner cover |
| 06/10/2010 | WO2010065966A2 High rate deposition of thin films with improved barrier layer properties |
| 06/10/2010 | WO2010065806A1 Delivered energy compensation during plasma processing |
| 06/10/2010 | WO2010065695A2 Chemical vapor deposition flow inlet elements and methods |
| 06/10/2010 | WO2010065410A1 Dielectric barrier deposition using oxygen containing precursor |
| 06/10/2010 | WO2010064566A1 Method of growing gallium nitride crystals and process for producing gallium nitride crystals |
| 06/10/2010 | WO2010064524A1 Hafnium amide complex manufacturing method and hafnium-containing oxide film |
| 06/10/2010 | WO2010064470A1 Film-forming apparatus and film-forming method |
| 06/10/2010 | WO2010064298A1 Member for plasma treatment apparatus and process for producing the member |
| 06/10/2010 | WO2010063907A2 Methods for preparing and depositing nanometer- or angstrom-scale particles on media |
| 06/10/2010 | WO2010063759A1 Method for producing fittings, lateral grids and shelves for high temperature applications and metal component |
| 06/10/2010 | WO2010063440A1 Process for providing super-hydrophilic properties to a substrate |
| 06/10/2010 | US20100144122 Hybrid chemical vapor deposition process combining hot-wire cvd and plasma-enhanced cvd |
| 06/10/2010 | US20100144077 Substrate processing apparatus and method and a manufacturing method of a thin film semiconductor device |
| 06/10/2010 | US20100143710 High rate deposition of thin films with improved barrier layer properties |
| 06/10/2010 | US20100143608 Method and device for preparing a multilayer coating on a substrate |
| 06/10/2010 | US20100143607 Precursors for Depositing Group 4 Metal-Containing Films |
| 06/10/2010 | US20100143601 Three dimensional micro-fabricated burners |
| 06/10/2010 | US20100143588 Chemical vapor deposition flow inlet elements and methods |
| 06/10/2010 | US20100143587 Vapor deposition apparatus and vapor deposition method |
| 06/10/2010 | US20100143579 Method and apparatus for manufacturing epitaxial silicon wafer |
| 06/10/2010 | US20100143431 Bioactive, ruthenium-containing coating and device |
| 06/10/2010 | US20100143207 Semi-conductive coatings for a polyolefin reaction system |
| 06/10/2010 | US20100143108 Device for the Protection of Components Having A Flammable Titanium Alloy From Titanium Fire, and Method for the Production Thereof |
| 06/10/2010 | US20100140588 Catalyst support substrate, method for growing carbon nanotubes using the same, and transistor using carbon nanotubes |
| 06/10/2010 | US20100140077 Excited gas injection for ion implant control |
| 06/10/2010 | US20100139863 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 06/10/2010 | US20100139762 Compound-type thin film, method of forming the same, and electronic device using the same |
| 06/10/2010 | US20100139565 Particle-measuring system and particle-measuring method |
| 06/10/2010 | US20100139564 Evaporation source |
| 06/10/2010 | US20100139563 Fabrication of large grain polycrystalline silicon film by nano aluminum-induced crystallization of amorphous silicon |
| 06/10/2010 | US20100139562 Substrate treatment apparatus |
| 06/10/2010 | DE202010002486U1 Spann- und Kontaktierungsvorrichtung für Silizium-Dünnstäbe Clamping and contacting of thin silicon rods |
| 06/10/2010 | DE112008001821T5 Bewegliche Injektoren in Drehscheiben-Gasreaktoren Moving injectors in hubs gas reactors |
| 06/10/2010 | DE102008060924A1 Method for depositing a layer on a substrate, comprises producing flame from a process gas, supplying two fluid or gaseous precursor materials to the process gas and/or the flame and then subjected to reaction |
| 06/10/2010 | DE102008060923A1 Verfahren zur Beschichtung eines Substrats A process for coating a substrate |
| 06/10/2010 | DE102008059909A1 Verfahren zur Herstellung von Beschlägen, Seitengittern und Gargutträgern für Hochtemperaturanwendungen und metallisches Bauteil Process for the preparation of fittings, side rails and food supports for high temperature applications and metallic component |
| 06/10/2010 | DE102006045617B4 Verfahren zur Herstellung einer anorganisch-anorganischen Gradientenverbundschicht A method for producing a gradient composite inorganic-inorganic |
| 06/09/2010 | EP2194162A2 Use of a coating |
| 06/09/2010 | EP2194161A1 Vaporization apparatus, film forming apparatus, film forming method, computer program and storage medium |
| 06/09/2010 | EP2194160A1 Flexible holder system for components and corresponding method |
| 06/09/2010 | EP2194060A1 Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films |
| 06/09/2010 | EP2193222A1 Process for making thin film transistors by atomic layer deposition |
| 06/09/2010 | EP2193221A1 Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head |
| 06/09/2010 | EP2193220A1 Method of patterning a mesoporous nano particulate layer |
| 06/09/2010 | EP2193219A2 Process for forming thin film encapsulation layers |
| 06/09/2010 | EP2193218A2 Organosiloxane materials for selective area deposition of inorganic materials |
| 06/09/2010 | CN201501927U Vertical chemical vapor deposition device |
| 06/09/2010 | CN201501147U Novel-material intaglio roller |
| 06/09/2010 | CN1954095B Treating device and heater unit |
| 06/09/2010 | CN1942610B Ultrahard diamonds and method of making thereof |
| 06/09/2010 | CN1938447B Film-forming apparatus and film-forming method |