Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2010
06/09/2010CN101730375A Inductively coupled plasma processing device and plasma processing method
06/09/2010CN101728250A Method for growing p-type AlGaN
06/09/2010CN101728206A Vacuum processing chamber for very large area substrates
06/09/2010CN101724828A Material gas concentration control system
06/09/2010CN101724827A Method for reducing ethylene cracking furnace tube coking and improving ethylene selectivity
06/09/2010CN101724826A Surface treatment method for C-C heating element
06/09/2010CN101322226B Substrate treating apparatus and treating gas emitting mechanism
06/09/2010CN101315502B Method for improving medium layer defect between micro-reflection mirrors and producing silicon based LCD
06/09/2010CN101297066B Copper based composite base material for electronic part, electronic part and process for producing copper based composite base material for electronic part
06/09/2010CN101220466B Method for manufacturing gallium nitride nano-wire with tungsten auxiliary heat anneal
06/09/2010CN101104926B Method for preparing boron phosphite hard coating
06/09/2010CN101027424B System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
06/08/2010US7734135 Method and device for manufacturing optical preforms, as well as the optical fibres obtained therewith
06/08/2010US7732331 Copper interconnect structure having stuffed diffusion barrier
06/08/2010US7732325 Plasma-enhanced cyclic layer deposition process for barrier layers
06/08/2010US7732308 Process for depositing layers containing silicon and germanium
06/08/2010US7732307 Method of forming amorphous TiN by thermal chemical vapor deposition (CVD)
06/08/2010US7732236 III nitride semiconductor crystal and manufacturing method thereof, III nitride semiconductor device manufacturing method thereof, and light emitting device
06/08/2010US7732014 Soaking the base material in a salt bath of sodium oxide and sodium cyanate or potassium cyanate; dispersing metallic titanium formed by electrolysis of a titanium compound in the bath; heating the bath to 430-670 degrees and soaking the material for 10-24 hours;strong adhesion; low temperature
06/08/2010US7732013 Method of forming a zinc oxide coated article
06/08/2010US7732012 Deposition of high-purity polycrystalline silicon at a high temperature onto a white-heated seed rod in a closed reaction furnace by pyrolysis or hydrogen reduction of a starting silane gas
06/08/2010US7732011 Method to produce tone-controlled colors in colorless crystals
06/08/2010US7732010 Method for supporting a glass substrate to improve uniform deposition thickness
06/08/2010US7732009 Method of cleaning reaction chamber, method of forming protection film and protection wafer
06/08/2010US7731798 Heated chuck for laser thermal processing
06/08/2010US7731797 Substrate treating apparatus and semiconductor device manufacturing method
06/08/2010US7731786 Photosensitive dispersion with adjustable viscosity for the deposition of metal on an insulating substrate and use thereof
06/08/2010US7731162 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
06/03/2010WO2010061955A1 Container containing cobalt carbonyl complex and cobalt carbonyl complex composition
06/03/2010WO2010061740A1 Wafer heating apparatus, electrostatic chuck, and method for manufacturing wafer heating apparatus
06/03/2010WO2010061139A2 Method for manufacturing a complexly shaped composite material part
06/03/2010WO2010060673A1 Thick epitaxial silicon by grain reorientation annealing and applications thereof
06/03/2010WO2010008477A3 Chuck and bridge connection points for tube filaments in a chemical vapor deposition reactor
06/03/2010WO2009105376A3 Multiple ampoule delivery systems
06/03/2010US20100136797 Plasma oxidation processing method, plasma processing apparatus and storage medium
06/03/2010US20100136795 Film deposition apparatus, film deposition method, semiconductor device fabrication apparatus, susceptor for use in the same, and computer readable storage medium
06/03/2010US20100136313 Process for forming high resistivity thin metallic film
06/03/2010US20100136261 Modulation of rf returning straps for uniformity control
06/03/2010US20100136260 Film formation method in vertical batch cvd apparatus
06/03/2010US20100136253 Film or coating deposition and powder formation
06/03/2010US20100136233 Oblique vacuum deposition for roll-roll coating of wire grid polarizer lines oriented in a down-web direction
06/03/2010US20100136232 curing of polymer composites
06/03/2010US20100136216 Gas distribution blocker apparatus
06/03/2010US20100136215 Method for forming ferrite film onto surface of structural member composing plant, ferrite film formation apparatus and quartz crystal electrode apparatus
06/03/2010US20100136212 Method for fabricating material
06/03/2010US20100135466 Braze assembly with beryllium diffusion barrier and method of making same
06/03/2010US20100134798 Substance concentration sensor and production method therefor
06/03/2010US20100133689 Copper (i) compounds useful as deposition precursors of copper thin films
06/03/2010US20100132762 Environmental barrier coating for organic semiconductor devices and methods thereof
06/03/2010US20100132615 Film deposition apparatus
06/03/2010US20100132614 Film deposition apparatus
06/03/2010US20100132613 Fabrication of low dielectric constant insulating film
06/03/2010CA2744895A1 Method for manufacturing a complexly shaped composite material part
06/02/2010EP2192208A1 Deposition apparatus
06/02/2010EP2192207A1 Amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films
06/02/2010EP2192091A1 Process for providing super-hydrophilic properties to a substrate
06/02/2010EP2191037A1 Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head
06/02/2010EP2191036A2 Delivery device for deposition
06/02/2010EP2191035A1 Deposition system for thin film formation
06/02/2010EP2191034A1 Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors
06/02/2010EP2191033A2 System and process for the continous vacuum coating of a material in web form
06/02/2010CN201495314U Gas distribution device for thin film deposition device
06/02/2010CN201495286U Switching device of silicon wafer carrier used for PECVD
06/02/2010CN201495285U Conversion device of silicon wafer carrier used for PECV
06/02/2010CN201495284U Support hook for coating of silicon wafer
06/02/2010CN201495282U Belt-material coating machine
06/02/2010CN1930079B Elongated nano-structures and related devices
06/02/2010CN1771343B Composition for making metal matrix composites
06/02/2010CN101720363A showerhead electrode assemblies for plasma processing apparatuses
06/02/2010CN101719480A Static cartridge and plasma device
06/02/2010CN101718652A Method for producing ultrahard pressure head
06/02/2010CN101717924A Method for reducing particle number in STI technology
06/02/2010CN101717923A Nonpolar GaN membrane and preparation method thereof
06/02/2010CN101716481A Hypergravity fluidization vapor deposition reaction device
06/02/2010CN101366103B Process for producing siliceous film and substrate with siliceous film produced thereby
06/02/2010CN101356631B Film position adjusting method and substrate processing system
06/02/2010CN101346802B Method of film deposition and apparatus for treating substrate
06/02/2010CN101339895B Gas distribution device and plasma processing apparatus applying the same
06/02/2010CN101331596B Gas introduction device, method of manufacturing the same, and processing device
06/02/2010CN101320679B Plasma processing system
06/02/2010CN101315880B Gas distribution device and plasma processing apparatus adopting the same
06/02/2010CN101306379B Preparation method and use of silicon carbide nano-wire catalyst for making hydrogen
06/02/2010CN101250692B Atmosphere opening method for treatment container
06/02/2010CN101246836B Substrate carrying platform and process method for its surface
06/02/2010CN101215692B Multiple reaction cavity atom layer deposition device and method
06/02/2010CN101161857B Aluminum alloy surface treatment method
06/02/2010CN101118865B Substrate support with a protective layer for plasma resistance
06/01/2010US7728172 Chalcogenide containing tellurium, doped with nitorgen and silicon; plasma enhanced chemical vapor deposition or atomic layer deposition of an organometallic tellurium compound containing nitrogen and silicon
06/01/2010US7727791 Semiconductor layer, process for forming the same, and semiconductor light emitting device
06/01/2010US7727592 high performance cutting tool insert for high cutting speeds; wear resistance and edge toughness; suitable for turning of stainless steels; cemented carbide substrate of cobalt, tungsten, titanium, tantalum and niobium, and a post-treated coating
06/01/2010US7727591 Controlling or modeling a chemical vapor infiltration process for densifying porous substrates with carbon
06/01/2010US7727590 substrate support member, filament assembly support member, and precursor gas inlet all located in a vacuum chamber and a device for providing a clean portion of a filament inside the chamber without breaking vacuum; time required for changing catalyst filaments between successive runs may be reduced
06/01/2010US7727589 Method of producing esthetically pleasing ornaments from bone components
06/01/2010US7727588 Apparatus for the efficient coating of substrates
06/01/2010US7727484 Fluid bed apparatus module and method of changing a first module for a second module in a fluid bed apparatus
06/01/2010US7727483 preventing chlorosilanes supplied to the reaction vessel from penetrating a pipe wall of the reaction vessel; leakproof; manufacturing silicon that is used as a raw material of a semiconductor and a solar battery for power generation
06/01/2010US7727354 Structure for preventing gap formation and plasma processing equipment having the same
06/01/2010US7727335 Device and method for the evaporative deposition of a coating material
06/01/2010US7727318 protective coatings on a gas turbine component, comprising an alloy of nickel, chromium, aluminum, and yttrium; also including ruthenium, rhenium, hafnium, zirconium, titanium, and silicon and/or germanium; prevent aluminum diffusion, spalling and delamination, oxidation resistance
06/01/2010US7726953 Pump ring
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