Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2010
06/23/2010CN101748385A Substrate processing device for chemical vapor deposition (CVD)
06/23/2010CN101748384A Gas distribution sprinkling module
06/23/2010CN101748383A Silicon compounds for producing SiO2-containing insulating layers on chips
06/23/2010CN101748382A Method of growing GaN-based luminescent crystalline membrane for molecular beam epitaxy
06/23/2010CN101748381A Method for preparing high-performance doped diamond-like film
06/23/2010CN101748380A Method for preparing carbon nano tube films, carbon nano tube films and carbon nano tube elements
06/23/2010CN101748379A Automatic horizontal silicon substrate film producing device
06/23/2010CN101748378A Film-forming carrier board and production method of solar batteries
06/23/2010CN101748377A Reaction chamber of metal organism chemical deposition equipment
06/23/2010CN101748376A Cuprous compounds and preparation methods of copper thin film by chemical vapor deposition using same
06/23/2010CN101431017B Method for improving GaN thick film integrality on sapphire substrate
06/23/2010CN101359579B Vacuum chamber
06/23/2010CN101319324B Diamond-like film preparation method
06/23/2010CN101308771B Gas flow diffuser
06/23/2010CN101280424B Method for determining optimum high frequency voltage bias value
06/23/2010CN101225513B Manufacturing method of plasmatron for coating technique of solar cell slice
06/23/2010CN101218370B Hard-coated body and method for production thereof
06/23/2010CN101210315B Heat retainer for chemical vapor deposition device
06/23/2010CN101207062B Method for manufacturing substrate carrying table
06/23/2010CN101195909B Direct current plasma chemical vapor deposition equipment
06/23/2010CN101153385B Plasma body reinforced chemical vapor deposition method
06/23/2010CN101122013B Purge gas unit and purge gas supply integrated unit
06/23/2010CN101061257B Method for vaporization of liquid raw material which enables low-temperature vaporization of liquid raw material, and vaporizer using the method
06/23/2010CN101006195B Method for producing silicon nitride films
06/22/2010US7741585 Integrated thermal unit having a shuttle with two-axis movement
06/22/2010US7741173 Method for forming a metal oxide film
06/22/2010US7740917 Method for forming thin film and base and having thin film formed by such method
06/22/2010US7740916 Method for the protection of extreme ultraviolet lithography optics
06/22/2010US7740909 chemical vapor deposition (CVD); titanium carbonitrides; for spray coating cutting tools
06/22/2010US7740902 vapor deposition; heat treatment; corrosion resistance; fuel cells
06/22/2010US7740815 treating gas stream containing silicon-containing gas by conveying gas stream to pump, supplying to pump an oxidant for oxidizing silicon-containing gas within pump and a liquid, and exhausting from pump the liquid containing a by-product of oxidation of the silicon-containing gas
06/22/2010US7740768 Simultaneous front side ash and backside clean
06/22/2010US7740739 Plasma processing apparatus and method
06/22/2010US7740738 Inductively coupled antenna and plasma processing apparatus using the same
06/22/2010US7740736 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber
06/22/2010US7740706 Gas baffle and distributor for semiconductor processing chamber
06/22/2010US7740705 Exhaust apparatus configured to reduce particle contamination in a deposition system
06/22/2010US7740704 High rate atomic layer deposition apparatus and method of using
06/22/2010US7740703 Semiconductor film formation device
06/22/2010CA2369833C Method of depositing a thick dielectric film
06/19/2010CA2688861A1 Static chemical vapor deposition of .gamma.-ni+.gamma.'-ni3a1 coatings
06/17/2010WO2010068849A1 High temperature and high voltage electrode assembly design
06/17/2010WO2010068168A1 Method of making cutting tool inserts with high demands on dimensional accuracy
06/17/2010WO2010067856A1 Film-forming method, film-forming apparatus, and storage medium
06/17/2010WO2010067778A1 Tantalum nitride film formation method and film formation device therefore
06/17/2010WO2010067591A1 Rack and pinion system, vacuum processing device, drive control method for rack and pinion system, drive control program, and recording medium
06/17/2010WO2010067590A1 Microwave plasma treatment device
06/17/2010WO2010067424A1 Catalyst chemical vapor deposition apparatus
06/17/2010WO2010066990A2 Method for the synthesis of carbon nanotubes on long particulate micrometric materials
06/17/2010WO2010066479A1 Method for supplying power to a cvd process in the deposition of silicon
06/17/2010WO2007141059A3 Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnum precursors and their use for semiconductor manufacturing
06/17/2010US20100151694 Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures
06/17/2010US20100151682 Method of manufacturing semiconductor device and substrate processing apparatus
06/17/2010US20100151666 Novel Methods for Making and Using Halosilylgermanes
06/17/2010US20100151654 Nitride film forming method, semiconductor device fabrication method, capacitor fabrication method and nitride film forming apparatus
06/17/2010US20100151261 Methods and apparatus for the vaporization and delivery of solution precursors for atomic layer deposition
06/17/2010US20100151249 Methods for preoducing coated phosphors and host material particles using atomic layer deposition methods
06/17/2010US20100151230 Process for controlling fatigue debit of a coated article
06/17/2010US20100151193 Film of SP3-bonded boron nitride having a self-organized surface texture capable of promoting field electron emission
06/17/2010US20100151152 Non-Stoichiometric SiOxNy Optical Filter Fabrication
06/17/2010US20100151150 Plasma processing apparatus and manufacturing method of deposition-inhibitory member
06/17/2010US20100151149 Thin film deposition via a spatially-coordinated and time-synchronized process
06/17/2010US20100151147 Metal pattern formation method and metal pattern formaton system
06/17/2010US20100151131 Film deposition apparatus, film deposition method, and computer-readable storage medium
06/17/2010US20100151130 Combustion chemical vapor deposition on temperature-sensitive substrates
06/17/2010US20100151127 Apparatus and method for preventing process system contamination
06/17/2010US20100151117 HOT-DIP Sn-Zn COATED STEEL SHEET HAVING EXCELLENT CORROSION RESISTANCE
06/17/2010US20100151116 Method for producing laminate
06/17/2010US20100151115 Method and system for producing a gas-sensitive substrate
06/17/2010US20100150204 Process for manufacturing platinum resistance thermometer
06/17/2010US20100149680 Method of manufacturing magnetic recording medium, magnetic recording medium, and magnetic recording reproducing apparatus
06/17/2010US20100149540 Novel Chips for Surface Plasmon (SPR) Detection
06/17/2010US20100147794 Substrate plasma treatment using magnetic mask device
06/17/2010US20100147464 Plasma treatment apparatus
06/17/2010US20100147396 Multiple-Substrate Transfer Apparatus and Multiple-Substrate Processing Apparatus
06/17/2010US20100147220 Evaporation container and vapor deposition apparatus
06/17/2010US20100147219 High temperature and high voltage electrode assembly design
06/17/2010US20100147218 Systems and methods for forming metal oxide layers
06/17/2010US20100147216 Dynamic Film Thickness Control System/Method and its Utilization
06/17/2010US20100147214 Dynamic Film Thickness Control System/Method and its Utilization
06/17/2010DE102004043384B4 Verfahren zur Herstellung eines beschichteten Hohlkörper-Substrates aus zumindest Polyethylenterephthalat A process for preparing a coated hollow body substrate of polyethylene terephthalate at least
06/16/2010EP2197050A1 Process for producing a GaN-based element
06/16/2010EP2197049A1 Process for producing a GaN-based element
06/16/2010EP2196566A1 EPITAXIAL SiC SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING EPITAXIAL SiC SINGLE CRYSTAL SUBSTRATE
06/16/2010EP2196565A1 Sic epitaxial substrate and process for producing the same
06/16/2010EP2196564A1 Isotope diamond laminate
06/16/2010EP2196558A1 Thin layer formation equipment and process for formation of thin layers
06/16/2010EP2196557A1 Precursors for depositing group 4 metal-containing films
06/16/2010EP2195828A2 Exhaust unit, exhaust method using the exhaust unit, and substrate processing apparatus including the exhaust unit
06/16/2010EP2195827A1 Showerhead, substrate processing apparatus including the showerhead, and plasma supplying method using the showerhead
06/16/2010EP2195472A1 Device for very high frequency plasma assisted cvd under atmospheric pressure, and applications thereof
06/16/2010EP2195262A1 Large container for handling and transporting high-purity and ultra high purity chemicals
06/16/2010CN201506833U Tunnel multiposition type near room sublimation apparatus
06/16/2010CN1997766B Al2O3 ceramic tools with diffusion bonding enhanced layer
06/16/2010CN1938444B Ultra-hydrophilic and micro-organism resistant thin film coated metal product and method for manufacturing the same
06/16/2010CN1882714B Cleaning process and apparatus for silicate materials
06/16/2010CN1867695B Method of improving post-develop photoresist profile on a deposited dielectric film
06/16/2010CN1804116B Highly-oriented diamond film, method for manufacturing the same, and applicaiton thereof
06/16/2010CN1795290B Method and apparatus for generating a precursor for a semiconductor processing system
06/16/2010CN1774525B Gas delivery apparatus for atomic layer deposition
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