| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 07/01/2010 | DE102008055147A1 Verfahren zur Beschichtung von temperatur- und/oder heißmedienbeaufschlagten Bauteilen sowie heißmedien- und/oder temperaturbeaufschlagtes Bauteil A process for coating of temperature- and / or components and heißmedienbeaufschlagten heißmedien- and / or component temperaturbeaufschlagtes |
| 06/30/2010 | EP2202786A1 Plasma film forming apparatus |
| 06/30/2010 | EP2201149A1 Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors |
| 06/30/2010 | EP2200756A2 Aerosol jet® printing system for photovoltaic applications |
| 06/30/2010 | EP1483782B1 Production method of sic monitor wafer |
| 06/30/2010 | EP1017873B1 Single body injector and deposition chamber |
| 06/30/2010 | CN201517132U PECVD trolly recognizing system |
| 06/30/2010 | CN201517131U Apparatus for preparing diamond-like film |
| 06/30/2010 | CN201515940U Iron-based anti-rust non-sticking cooking utensil |
| 06/30/2010 | CN101765902A Apparatus for generating dielectric barrier discharge gas |
| 06/30/2010 | CN101765680A Treating-gas supply system and treating apparatus |
| 06/30/2010 | CN101765679A Conformal doping using high neutral plasma implant |
| 06/30/2010 | CN101764049A Substrate processing apparatus |
| 06/30/2010 | CN101764044A Method for pretreating technical cavity of plasma device |
| 06/30/2010 | CN101764042A Air sucking device and semiconductor processing device |
| 06/30/2010 | CN101762834A Anti-reflection plate and manufacturing method for anti-reflection structure thereof |
| 06/30/2010 | CN101760728A Chemical vapor deposition system |
| 06/30/2010 | CN101760727A Material gas concentration control system |
| 06/30/2010 | CN101760726A Preparation method of B and N codope ZnO film |
| 06/30/2010 | CN101760725A Preparation method of zinc sulphide head cap with high optical quality |
| 06/30/2010 | CN101760724A Method for preparing graphene membrane electrode with overlarge area and high quality |
| 06/30/2010 | CN101298673B Preparation of insulated heat conducting metal substrate |
| 06/30/2010 | CN101235487B Material gas supply device |
| 06/29/2010 | US7745762 Optimizing the thermal budget during a pulsed heating process |
| 06/29/2010 | US7745329 Tungsten nitride atomic layer deposition processes |
| 06/29/2010 | US7745328 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) |
| 06/29/2010 | US7744965 reacting oxygen radicals and zinc atoms on surface of substrate placed in film-forming chamber evacuated to a vacuum, wherein the density of crystal defects that are defects of the atomic arrangement of the zinc oxide thin film is controlled by temperature of the substrate; electrode films |
| 06/29/2010 | US7744958 providing substrate with shadow mask layer formed thereon, layer configured for defining unmasked surface area on substrate, rotating substrate around axis, forming catalyst layer with thickness equal to optimum thickness at which carbon nanotubes grow fastest, vapor depositing carbon from source gas |
| 06/29/2010 | US7744957 Method and apparatus for depositing material |
| 06/29/2010 | US7744956 forming an array of carbon nanotubes on a substrate and exerting a pressure on the array by a molding device having a pattern to imprint the array of carbon nanotubes; molding device is a metal wire mesh |
| 06/29/2010 | US7744949 upward emission type EL element can be fabricated without exposing the element to the outside air, so a highly reliable device is obtained; OLEDs; no viewing-angle-related problem unlike liquid crystal display devices; using a CCD (charge coupled device) in a film forming chamber to form pixel electrode |
| 06/29/2010 | US7744721 Plasma processing apparatus |
| 06/29/2010 | US7744720 Suppressor of hollow cathode discharge in a shower head fluid distribution system |
| 06/29/2010 | US7744698 Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVD |
| 06/29/2010 | US7743731 Reduced contaminant gas injection system and method of using |
| 06/29/2010 | US7743730 Apparatus for an optimized plasma chamber grounded electrode assembly |
| 06/29/2010 | CA2482398C Method of forming aluminide diffusion coatings |
| 06/24/2010 | WO2010071672A1 Vapour deposited planar pv cell |
| 06/24/2010 | WO2010071585A1 Improved coated cutting insert for rough turning |
| 06/24/2010 | WO2010071572A1 A method of making a coated cutting tool and a coated cutting tool |
| 06/24/2010 | WO2010070863A1 Epitaxial substrate for electronic devices and manufacturing method therefor |
| 06/24/2010 | WO2010069594A1 Process and apparatus for coating articles by means of a low-pressure plasma |
| 06/24/2010 | WO2010043716A3 Method for the controlled growth of a graphene film |
| 06/24/2010 | WO2010027841A3 High speed deposition of materials having low defect density |
| 06/24/2010 | WO2010011390A3 Hybrid layers for use in coatings on electronic devices or other articles |
| 06/24/2010 | WO2009066464A9 Nitride semiconductor and nitride semiconductor crystal growth method |
| 06/24/2010 | US20100159627 Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics |
| 06/24/2010 | US20100159224 Moisture resistant polyimide compositions |
| 06/24/2010 | US20100159156 Thin film forming apparatus and thin film forming method |
| 06/24/2010 | US20100159151 Methods for making environmental barrier coatings and ceramic components having cmas mitigation capability |
| 06/24/2010 | US20100159136 STATIC CHEMICAL VAPOR DEPOSITION OF y-Ni + y'-Ni3AI COATINGS |
| 06/24/2010 | US20100159135 Process for in situ generation of hydrogen sulfide or hydrogen selenide gas using a solid precursor |
| 06/24/2010 | US20100159134 Resin composition for direct vapor deposition, molded articles made by using the same, and surface-metallized lamp housing |
| 06/24/2010 | US20100159133 Gas Dispersion Shield Method |
| 06/24/2010 | US20100159132 Linear Deposition Source |
| 06/24/2010 | US20100159125 Method and apparatus for depositing mixed layers |
| 06/24/2010 | US20100159123 Evaporation source with exchangeable nozzles |
| 06/24/2010 | US20100159122 Deposition film forming apparatus, deposition film forming method and electrophotographic photosensitive member manufacturing method |
| 06/24/2010 | US20100155223 Electromagnet array in a sputter reactor |
| 06/24/2010 | US20100155222 Application of dense plasmas generated at atmospheric pressure for treating gas effluents |
| 06/24/2010 | US20100154712 Source gas generating device and film forming apparatus |
| 06/24/2010 | US20100154711 Substrate processing apparatus |
| 06/24/2010 | US20100154709 Combined wafer area pressure control and plasma confinement assembly |
| 06/24/2010 | US20100154708 High-temperature evaporator cell for evaporating high-melting materials |
| 06/24/2010 | US20100154707 Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method |
| 06/24/2010 | US20100154425 Strain tolerant thermal barrier coating system |
| 06/24/2010 | DE102008063737A1 Verfahren zur Abscheidung von mikrokristallinem Silizium auf einem Substrat A method of depositing microcrystalline silicon on a substrate |
| 06/24/2010 | DE102008055582A1 MOCVD-Reaktor mit zylindrischem Gaseinlassorgan MOCVD reactor with cylindrical gas inlet element |
| 06/23/2010 | EP2199434A1 Method for forming microscopic structures on a substrate |
| 06/23/2010 | EP2199433A1 Method for forming microscopic structures on a substrate |
| 06/23/2010 | EP2199428A2 Method for removal of carbon from an organosilicate material |
| 06/23/2010 | EP2199427A2 Method for producing laminate |
| 06/23/2010 | EP2199263A1 Method and device for manufacturing an optical preform |
| 06/23/2010 | EP2198899A2 Device and method for producing same |
| 06/23/2010 | EP2198668A1 Apparatus for an irradiation unit |
| 06/23/2010 | EP2198447A2 Device for the plasma treatment of workpieces |
| 06/23/2010 | EP1497849B1 Method of manufacturing a silicon electrode for plasma reaction chambers |
| 06/23/2010 | CN201512580U Novel container for encapsulating solid high-pure metal organic compounds |
| 06/23/2010 | CN1939715B Alumina layer with enhanced texture |
| 06/23/2010 | CN1699650B Steel traveler and its manufacturing method |
| 06/23/2010 | CN1638052B Method of manufacturing thin film |
| 06/23/2010 | CN101755325A Film forming apparatus, film forming method, storage medium and gas supplying apparatus |
| 06/23/2010 | CN101755074A Method and apparatus for depositing nitride film |
| 06/23/2010 | CN101755073A Reactor for depositing thin film on wafer |
| 06/23/2010 | CN101755072A Solar cells and methods and apparatuses for forming the same |
| 06/23/2010 | CN101752457A Method and equipment for manufacturing solar battery |
| 06/23/2010 | CN101752435A Silicon-based thin film solar cell with microcrystalline silicon-germanium thin film as intrinsic layer and preparation method thereof |
| 06/23/2010 | CN101752244A Process for producing materials for electronic device |
| 06/23/2010 | CN101752242A Method for manufacturing insulation layer and method for manufacturing semiconductor device using the same |
| 06/23/2010 | CN101752214A Semiconductor processing cavity part and production method thereof, as well as semiconductor processing equipment |
| 06/23/2010 | CN101752028A Transparent conducting film and preparation method thereof |
| 06/23/2010 | CN101748405A Transparent conducting film and preparation method thereof, solar battery and flat panel display device |
| 06/23/2010 | CN101748393A Heating control method of production line equipment and device |
| 06/23/2010 | CN101748392A Fully-automatic large-scale flat-plate type PECVD crystal silicon photovoltaic anti-reflection film preparation device |
| 06/23/2010 | CN101748391A Film deposition apparatus and film deposition method |
| 06/23/2010 | CN101748390A Heating device and semiconductor processing device |
| 06/23/2010 | CN101748389A Film deposition apparatus, film deposition method, semiconductor device fabrication apparatus and susceptor for use in the same |
| 06/23/2010 | CN101748388A Film deposition apparatus |
| 06/23/2010 | CN101748387A Film deposition apparatus |
| 06/23/2010 | CN101748386A Plasma processing equipment |