Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2010
07/08/2010US20100173495 Substrate processing apparatus using a batch processing chamber
07/08/2010US20100173487 Semiconductor apparatus and method of manufacturing the semiconductor apparatus
07/08/2010US20100173432 Gap maintenance for opening to process chamber
07/08/2010US20100173228 Nanotube and Carbon Layer Nanostructured Composites
07/08/2010US20100173162 Method for stable hydrophilicity enhancement of a substrate by atmostpheric pressure plasma deposition
07/08/2010US20100173153 Beam-like material comprising carbon nanotube and manufacturing method thereof
07/08/2010US20100173100 Method for the synthesis of product molecules
07/08/2010US20100173075 High Coordination Sphere Group 2 Metal B-Diketiminate Precursors
07/08/2010US20100173074 Method and apparatus for modulation of precursor exposure during a pulsed deposition process
07/08/2010US20100173073 Vaporizing apparatus and film forming apparatus provided with vaporizing apparatus
07/08/2010US20100173072 Method and device for controlling oxidizing-reducing of the surface of a steel strip running continuously through a radiant tubes furnace for its galvanizing
07/08/2010US20100173067 Film forming apparatus and film forming method
07/08/2010US20100172101 Thermal interface material and method for manufacturing the same
07/08/2010US20100171272 Piston ring
07/08/2010US20100171089 Dielectric layers and memory cells including metal-doped alumina
07/08/2010US20100170787 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170781 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170444 Organic material vapor generator, film forming source, and film forming apparatus
07/08/2010US20100170443 Film manufacturing device
07/08/2010US20100170442 Remote plasma apparatus for processing substrate with two types of gases
07/08/2010US20100170440 Surface treatment apparatus
07/08/2010US20100170439 Vapor deposition apparatus
07/08/2010US20100170438 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor
07/08/2010US20100170437 Dynamic Film Thickness Control System/Method and its Utilization
07/08/2010US20100170436 Substrate treatment equipment and manufacturing method of substrate
07/08/2010US20100170435 Device for the temperature control of the surface temperatures of substrates in a cvd reactor
07/08/2010DE102008064183A1 In-Line-Vakuumbeschichtungsanlage In-line vacuum coating system
07/07/2010EP2204471A2 Method for coating substrates loaded with temperature and/or hot media and hot media and/or temperature loaded substrate
07/07/2010EP2204470A1 A method of making a coated cutting tool and a coated cutting tool
07/07/2010CN201520801U Leakproof component of film plating equipment
07/07/2010CN1777977B Film forming method
07/07/2010CN101772833A Gas supply device
07/07/2010CN101772591A Method of manufacturing a dye sensitized solar cell by atmospheric pressure atomic layer deposition (ald)
07/07/2010CN101772590A Raw gas supply system, and filming apparatus
07/07/2010CN101772589A Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
07/07/2010CN101772588A Atmospheric pressure plasma enhanced chemical vapor deposition process
07/07/2010CN101771122A AlGaInP system LED with electron hole dual limitation and preparation method thereof
07/07/2010CN101770973A Plasma process equipment and static chuck device
07/07/2010CN101770971A Wafer bearing device
07/07/2010CN101770933A Plasma process equipment and gas distribution device thereof
07/07/2010CN101770932A Plasma process equipment
07/07/2010CN101770923A Method for loading plasma enhanced chemical vapor deposition equipment and glass panel
07/07/2010CN101770922A Capacitance coupling type radiofrequency plasma source
07/07/2010CN101768747A Method for carrying out surface activating treatment on surface of titanium alloy
07/07/2010CN101768741A High-performance multi-layered membrane structure-borne noise surface wave device and preparation method thereof
07/07/2010CN101768734A Deposition apparatus and substrate manufacturing method
07/07/2010CN101768733A Gas distribution device and plasma processing device
07/07/2010CN101768732A Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method
07/07/2010CN101768731A Atomic layer deposition apparatus
07/07/2010CN101768730A Film preparation device
07/06/2010US7749871 Method for depositing nanolaminate thin films on sensitive surfaces
07/06/2010US7749815 Methods for depositing tungsten after surface treatment
07/06/2010US7749621 photoabsorption band in the visible region of the electromagnetic spectrum on a glass ribbon; oxides contains essentially titanium and other vanadium, manganese, magnesium, scandium, yttrium, niobium, molybdenum, ruthenium, lead, nickel, rhenium and mixtures thereof
07/06/2010US7749574 high speed atomic layer deposition of silica, by exposing substrates to silicon precursors, oxidizers and catalysts, at low temperatures
07/06/2010US7749564 monitoring an intensity of H2 alpha emission of a plasma produced during the coating-deposition process, adjusting at least one process variable of the deposition process to facilitate production of the diamond-like carbon (DLC )coating; transition metal carbide coating using acetylene as carbon source
07/06/2010US7749563 Depositing a low k silicon carbide barrier layer from a phenylsilane and depositing a capping silicon carbide layer having no phenyl group from an oxygen-free alkylsilane
07/06/2010US7749559 removing or reducing an oxide film on a surface of a silicon substrate; and forming a texture on the surface of the silicon substrate having the oxide film removed or reduced using a free abrasive-containing slurry and a tape; magnetic anisotropy can be attained and high recording density can be achieved
07/06/2010US7749553 for depositing a coating material, such as a drug or therapeutic agent, onto a medical device and, more particularly, for verifying material drop size and volume of any material being deposited using imaging system having an exposure time, and plurality of sequential strobe light firings
07/06/2010US7749477 Carbon nanotube arrays
07/06/2010US7749364 Coater having interrupted conveyor system
07/06/2010US7749353 High aspect ratio etch using modulation of RF powers of various frequencies
07/06/2010US7749326 Chemical vapor deposition apparatus
07/06/2010US7748344 Segmented resonant antenna for radio frequency inductively coupled plasmas
07/06/2010US7748138 Particle removal method for a substrate transfer mechanism and apparatus
07/06/2010CA2563044C Apparatus for directing plasma flow to coat internal passageways
07/06/2010CA2479702C System and method for making thin-film structures using a stepped profile mask
07/01/2010WO2010074281A1 Composite carbon and manufacturing method therefor
07/01/2010WO2010074037A1 Ruthenium compound, process for producing same, process for producing ruthenium-containing thin film using same, and ruthenium-containing thin film
07/01/2010WO2010073578A1 Plasma generating apparatus and plasma processing apparatus
07/01/2010WO2010073532A1 Plasma processing device
07/01/2010WO2010072686A1 In-line vacuum coating system
07/01/2010WO2010072380A1 Mocvd reactor having cylindrical gas inlet element
07/01/2010WO2010053687A3 Thermal spray coatings for semiconductor applications
07/01/2010WO2010045904A3 Metal/cnt and/or fullerene composite coating on strip materials
07/01/2010WO2010036569A3 Novel hardmetal for use in oil and gas drilling applications
07/01/2010US20100167555 Method in depositing metal oxide materials
07/01/2010US20100167551 Dual path gas distribution device
07/01/2010US20100167507 Plasma doping apparatus and plasma doping method
07/01/2010US20100167090 Method of forming a protective film, a protective film obtained by the method, and a magnetic recording medium including the protective film
07/01/2010US20100167037 Nickel oxide film for bolometer and method for manufacturing thereof, and infrared detector using the same
07/01/2010US20100166981 Surface charge enhanced atomic layer deposition of pure metallic films
07/01/2010US20100166980 Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method
07/01/2010US20100166979 Deposition Apparatus and Substrate Manufacturing Method
07/01/2010US20100166958 Fabrication method and fabrication apparatus for fabricating metal oxide thin film
07/01/2010US20100166957 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
07/01/2010US20100166956 Vapor deposition apparatus
07/01/2010US20100166955 System and method for thin film deposition
07/01/2010US20100166945 Methods of calculating thicknesses of layers and methods of forming layers using the same
07/01/2010US20100166943 Technique for measuring process induced magnetic anisotropy in a magnetoresistive sensor
07/01/2010US20100166942 Method for Searching Parameter Codes of a Biosensor and Method for Producing a Biosensor Chip Matching a Biosensor
07/01/2010US20100166815 Method for Preparation of a Nanocomposite Material by Vapour Phase Chemical Deposition
07/01/2010US20100166512 Cutting Tool, Manufacturing Method Thereof and Cutting Method
07/01/2010US20100163751 Scintillator panel
07/01/2010US20100163186 Plasma Processing Apparatus
07/01/2010US20100162958 Substrate processing apparatus and reaction tube for processing substrate
07/01/2010US20100162957 Device for coating a plurality of closest packed substrates arranged on a susceptor
07/01/2010US20100162956 Substrate Processing Apparatus and Substrate Mount Table Used in the Apparatus
07/01/2010US20100162955 Systems and methods for substrate processing
07/01/2010US20100162954 Integrated facility and process chamber for substrate processing
07/01/2010DE102008064134A1 Verfahren und Vorrichtung zur Beschichtung von Gegenständen mittels eines Niederdruckplasmas Method and apparatus for coating objects by means of a low-pressure plasma