Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2010
07/21/2010CN201530862U Gas transportation sedimentation growing system for cadmium-telluride thin film solar cell
07/21/2010CN1837404B Film-forming apparatus and film-forming method
07/21/2010CN1748043B Method of forming a ta2o5 comprising layer
07/21/2010CN101785089A Vaporizer, material gas supply system including vaporizer and film forming apparatus using such system
07/21/2010CN101784695A Method for preparation of a nanocomposite material by vapour phase chemical deposition
07/21/2010CN101783289A Preparation method of inverse epitaxial wafer
07/21/2010CN101783286A Method for manufacturing capacitor of metal-insulator-metal structure
07/21/2010CN101783280A Cleaning method of semiconductor board
07/21/2010CN101781755A Method for preparing aluminum-based alloy with Al-Si-O-N wearproof anticorrosive layer
07/21/2010CN101781754A Modularization solar selective coat continuous coating device
07/21/2010CN101781336A Organometallic compounds, processes and methods of use
07/21/2010CN101285175B Process for preparing graphenes by chemical vapour deposition method
07/21/2010CN101265573B Thin film deposition method
07/21/2010CN101226922B SICOH dielectric and its forming method
07/21/2010CN101221896B Substrate support bushing
07/21/2010CN101053070B Low-k dielectric layer formed from aluminosilicate precursors
07/20/2010US7759508 Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
07/20/2010US7759187 Metal plating using seed film
07/20/2010US7758963 Corrosion resistant coating based on silicon, carbon, hydrogen and nitrogen
07/20/2010US7758921 A hydrocarbon and an organometallic compound containing an catalytically active transition metal and a nitrogen compound and an inert gas and a reducing gas is vaporized; heating to grow longitudinally aligned carbon nanotubes with a catalytically active transition metal incorporated in the nanotubes
07/20/2010US7758920 Thin dielectrical films containing silicon on a wafer target substrate by chemical vapor deposition; selectively supplying a purge gas, a first process gas of a silane, and a second process gas selected from a nitriding gas, an oxynitriding gas, and an oxidizing gas alternately
07/20/2010US7758914 Repairing the chromium/aluminum (C1A) protective coating on a worn zone of a turboprop blade by removing the coating and painting the exposed superalloy substrate with a paint containing a platinoid metal and chromium; vapor aluminizing the prelayer; cost efficiency; fuel efficiency; aircraft
07/20/2010US7758912 Anti-stiction coating
07/20/2010US7758718 Reduced electric field arrangement for managing plasma confinement
07/20/2010US7758699 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
07/20/2010US7758698 Dual top gas feed through distributor for high density plasma chamber
07/20/2010US7758697 Silicon-containing layer deposition with silicon compounds
07/20/2010US7757633 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
07/20/2010CA2483232C Method of selective region vapor phase aluminizing
07/20/2010CA2426814C Vacuum metalization process for chroming substrates
07/15/2010WO2010080946A2 Non-stick articles
07/15/2010WO2010080508A2 Highly sinterable lanthanum strontium titanate interconnects through doping
07/15/2010WO2010079766A1 Plasma processing apparatus
07/15/2010WO2010079753A1 Plasma processing apparatus
07/15/2010WO2010079738A1 Plasma processing apparatus and plasma cvd film-forming method
07/15/2010WO2010079599A1 Fluid carrying apparatus
07/15/2010WO2010078754A1 Continuous film vacuum deposition method and apparatus
07/15/2010WO2010055423A3 Tellurium precursors for film deposition
07/15/2010US20100178825 Cnt-infused carbon fiber materials and process therefor
07/15/2010US20100178775 Shower plate sintered integrally with gas release hole member and method for manufacturing the same
07/15/2010US20100178730 Direct-current plasma CVD apparatus and method for producing diamond using the same
07/15/2010US20100178568 Process for producing carbon nanostructure on a flexible substrate, and energy storage devices comprising flexible carbon nanostructure electrodes
07/15/2010US20100178493 Formation of Thin Uniform Coatings on Blade Edges Using Isostatic Press
07/15/2010US20100178490 Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
07/15/2010US20100178481 Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
07/15/2010US20100178468 Ultra-thin microporous/hybrid materials
07/15/2010US20100178437 Apparatus for Generating Gas Having Extremely Low Oxygen Concentration, Processing System and Thin Film Depositing Method Therewith, and Inert Gas Generated as Such
07/15/2010US20100178436 Methods and apparatus for forming diamond-like coatings
07/15/2010US20100178435 Methods and systems for manufacturing polycrystalline silicon and silicon-germanium solar cells
07/15/2010US20100178424 Method of manufacturing organic thin film
07/15/2010US20100178423 Method for controlling flow and concentration of liquid precursor
07/15/2010US20100177462 Platinum-Based Electrocatalysts Synthesized by Depositing Contiguous Adlayers on Carbon Nanostructures
07/15/2010US20100175989 Deposition apparatus, deposition system and deposition method
07/15/2010US20100175831 Inductively coupled plasma processing apparatus
07/15/2010US20100175621 Microwave Plasma Processing Apparatus
07/15/2010US20100175620 Chemical vapor deposition apparatus
07/14/2010EP2205774A2 Bodies coated with a hard material and method for the production thereof
07/14/2010EP2205383A1 A new product and method for its manufacture within material processing
07/14/2010EP2205303A2 Medicinal inhalation devices and components thereof
07/14/2010EP1462230B1 Die for molding honeycomb structure and manufacturing method thereof
07/14/2010CN201525885U Device of chemical vapor deposition diamond or other materials
07/14/2010CN201525884U Plate type gas distributing device
07/14/2010CN101778967A Group iii nitride semiconductor epitaxial substrate
07/14/2010CN101778963A System and process for the continous vacuum coating of a material in web form
07/14/2010CN101778719A Biodegradable resin container having deposited film, and method for formation of deposited film
07/14/2010CN101776667A Preparation method of diamond film chromatographic column
07/14/2010CN101775592A Direct-current plasma CVD apparatus and method for producing diamond using the same
07/14/2010CN101775591A Method for depositing film
07/14/2010CN101775590A Graphite base with protective coating layer and preparation method thereof
07/14/2010CN101775354A Microbe inoculator with boron nitride film coating and preparation method thereof
07/14/2010CN101775041A 2-acyl 1,3-indane dione silver compound with stable organic phosphine, preparation method and application thereof
07/14/2010CN101052615B Metal compound, thin film-forming material, and method for producing thin film
07/14/2010CN101018885B Semiconductor processing components and semiconductor processing utilizing same
07/13/2010US7755160 Plasma excited chemical vapor deposition method silicon/oxygen/nitrogen-containing-material and layered assembly
07/13/2010US7754995 Plasma processing apparatus and plasma processing method
07/13/2010US7754994 Cleaning device using atmospheric gas discharge plasma
07/13/2010US7754621 yttrium source material and zirconium source material are alternately used as metal source materials so as to form a yttrium-stabilized zirconium oxide (YSZ) thin film on a substrate by atomic layer deposition
07/13/2010US7754352 Sputtering an oxide of Indium, Zinc, Gallium, Cadmium, and tin using vapor deposition; liquid crystal displays, touch panel devices, personal digital assistants, electronic controllers
07/13/2010US7754302 DLC film coated plastic container, and device and method for manufacturing the plastic container
07/13/2010US7754294 Plasma enhanced chemical vapor deposition; better control over surface standing wave effects and film thickness uniformity for silicon-containing films such as silicon nitride and silicon oxide
07/13/2010US7754290 discharging a chemical species from at least one nozzle; oxidation, silylation; for cost reduction and safety
07/13/2010US7754286 Depositing any one of polysilicon, epitaxial silicon or amorphous silicon; silicon dioxide film is formed by a wet and thermal oxidation treatment; repeated process until it has a thickness for an optical waveguide
07/13/2010US7754283 making a nanotube growing mat in a predetermined pattern of nanosized catalytic metal particles whose pattern produces nanotubes in a highly ordered forms; substrate comprising carbon and silicon in alternating layers; chemical vapor deposition
07/13/2010US7754282 form a layer with improved thickness uniformity; plasma enhanced chemical vapor deposition in semiconductor manufacturing
07/13/2010US7754281 heating to gas phase polymerization in one reactor to form polyimide; free of hazardous waste; free of support structure; flexibility in material selection
07/13/2010US7754274 Forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; anddrilling through-holes in the substrate
07/13/2010US7754182 Carbon nanotube array and method for forming same
07/13/2010US7754016 Multiple axis tumbler coating apparatus
07/13/2010US7754015 Vacuum vapor-deposition apparatus and method of producing vapor-deposited film
07/13/2010US7754014 Gas-purged vacuum valve
07/13/2010US7754013 Apparatus and method for atomic layer deposition on substrates
07/13/2010CA2487199C Method for repairing components using environmental bond coatings and resultant repaired components
07/08/2010WO2010076974A2 Polysilicon deposition apparatus
07/08/2010WO2010076973A2 Polysilicon deposition apparatus
07/08/2010WO2010076423A1 Method for making diamond composite materials
07/08/2010WO2010055441A3 Improved substrate temperature control by using liquid controlled multizone substrate support
07/08/2010WO2010048607A3 Enhanced optical properties of chemical vapor deposited single crystal diamond by low-pressure/high-temperature annealing
07/08/2010WO2009086257A8 Susceptor with support bosses
07/08/2010WO2009062882A3 Method for manufacturing a solar cell with a surface-passivating dielectric double layer, and corresponding solar cell
07/08/2010US20100174103 Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same
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