Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2010
08/11/2010CN101333650B Method for uniformly and controllably coating conducting carbon layer at surface of LiFePO4 granule surface
08/11/2010CN101311302B Chemical vapour deposition equipment and furnace tube
08/11/2010CN101276777B Substrate mounting stage and substrate processing apparatus
08/11/2010CN101220469B Method and apparatus for plasma enhanced chemical vapor deposition
08/11/2010CN101207056B Method for measuring loading effect and percentage of coverage for thin membrane stairway
08/11/2010CN101033544B Continuous synthesis method for rare earth ion nitriding-rare earth ion plating composite coating
08/10/2010US7772748 Composite for forming ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head
08/10/2010US7772599 Gallium nitride-based semiconductor stacked structure, production method thereof, and compound semiconductor and light-emitting device each using the stacked structure
08/10/2010US7772314 Mask material for masking holes in a component, comprising a resin containing particles or fibres of metal or oxide material, wherein the plastic is a UV polymerizing plastic such as polyurethane, a polyurethane oligomer, 2-Hydroxyl Methacrylate, Isobornyl Acrylate, Maleic acid, methyl methacrylate
08/10/2010US7772130 Insulation film forming method, insulation film forming system, and semiconductor device manufacturing method
08/10/2010US7772121 Method of forming a trench structure
08/10/2010US7771836 forming Ti coating film on surface of base material by evaporating titanium in dry plating apparatus in atmosphere of inert gas other than nitrogen, introducing nitrogen in such a manner that nitrogen amount is increased with time while titanium is evaporated in a constant amount; cost efficiency
08/10/2010US7771823 nano-crystalline diamond matrix that is substantially free of graphite inclusions; chemical vapor deposition operates at DC bias voltage that precludes formation of plasma ion capable of causing region of nano-crystalline diamond matrix within forming film to allotrope when plasma ion collides with film
08/10/2010US7771822 Consisting of a copper alloy; for use as a plug-in or clip connection
08/10/2010US7771798 plasma jet source produces a plasma, which emerges from plasma jet source in form of plasma jet and acts on substrate; precursor materials, which are modified or fused in the plasma jet and subsequently deposited on the substrate, are introduced into plasma
08/10/2010US7771796 introducing in plasma processing chamber first gas having function of stabilizing plasma and second gas generating active hydrogen, both being introduced for predetermined period of time with no generation of plasma, generating plasma, and carrying out curing on low dielectric constant SiOCH film
08/10/2010US7771790 Making closed fluidic structure in a substrate using vapor deposition techniques;
08/10/2010US7771789 using magnetic force to prevent or suppress the substrate and the mask from being bent or curved; making circuit wires of liquid crystal monitors, a large-sized full color organic electroluminescent (EL) panel
08/10/2010US7771701 chemical vapor deposition
08/10/2010US7771607 Plasma processing apparatus and plasma processing method
08/10/2010US7771564 Plasma processing apparatus
08/10/2010US7771562 Etch system with integrated inductive coupling
08/10/2010US7771561 Apparatus and method for surface treatment to substrate
08/10/2010US7771539 Holder for fabricating organic light emitting display
08/10/2010US7771538 Substrate supporting means having wire and apparatus using the same
08/10/2010US7771537 Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition
08/10/2010US7771536 Substrate processing apparatus
08/10/2010US7771535 Semiconductor manufacturing apparatus
08/10/2010US7771534 Method of growing oxide thin films
08/10/2010US7771533 Atomic-layer-chemical-vapor-deposition of films that contain silicon dioxide
08/10/2010CA2536503C Heat treatable coated article with diamond-like carbon (dlc) coating
08/05/2010WO2010087973A2 Method of depositing an electrically conductive titanium oxide coating
08/05/2010WO2010087518A1 Epitaxial silicon carbide single crystal substrate and mehtod for producing same
08/05/2010WO2010087428A1 Cvd apparatus
08/05/2010WO2010087392A1 Substrate comprising alloy film of metal element having barrier function and metal element having catalytic power
08/05/2010WO2010087385A1 Film deposition device and gas ejection member
08/05/2010WO2010087362A1 Film formation method, and plasma film formation apparatus
08/05/2010WO2010087217A1 Cyclooctatetraenetricarbonylruthenium complex, process for producing same, and process for producing film using the complex as raw material
08/05/2010WO2010087102A1 Method for producing diamond-like carbon membrane
08/05/2010WO2010086950A1 Microwave plasma processing apparatus, dielectric board provided with slot board for microwave plasma processing apparatus, and method for manufacturing dielectric board
08/05/2010WO2010086805A1 Device for supplying the liquid material inside a filling container and method of controlling the liquid level inside the filling container for said liquid material supply device
08/05/2010WO2010086600A2 Providing gas for use in forming a carbon nanomaterial
08/05/2010WO2010056954A3 Sealing apparatus for a process chamber
08/05/2010WO2009134081A9 Method for depositing ultra fine crystal particle polysilicon thin film
08/05/2010US20100197069 Process for producing layered member and layered member
08/05/2010US20100196713 Fine particles and method for producing the same
08/05/2010US20100196627 Plasma processing method and computer storage medium
08/05/2010US20100196626 Ground return for plasma processes
08/05/2010US20100196625 Showerhead, substrate processing apparatus including the showerhead, and plasma supplying method using the showerhead
08/05/2010US20100196600 Apparatus and method for producing aligned carbon-nanotube aggregates
08/05/2010US20100196599 Staggered dual process chambers using one single facet on a transfer module
08/05/2010US20100196296 Multi-layer metallic effect pigments, process for their preparation and use
08/05/2010US20100195946 Coated bearing
08/05/2010US20100193915 Plasma processing apparatus and plasma processing method, and semiconductor device
08/05/2010US20100193747 Process of preparing carbon nanotube film, the carbon nanotube film prepared thereby and carbon nanotube elements comprising the same
08/05/2010US20100193471 Method and system for controlling radical distribution
08/05/2010US20100193461 Plasma-deposited barrier coating including at least three layers, method for obtaining one such coating and container coated with same
08/05/2010US20100193350 Method for making carbon nanotube-base device
08/05/2010US20100193132 Multi-workpiece processing chamber and workpiece processing system including the same
08/05/2010US20100193129 Apparatus for generating dielectric barrier discharge gas
08/05/2010US20100193128 Surface treatment apparatus
08/05/2010US20100192858 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
08/05/2010US20100192857 Vacuum processing apparatus
08/05/2010US20100192856 Mask assembly and deposition and apparatus for a flat panel display using the same
08/05/2010US20100192388 Metallized cutlery and tableware and method therefor
08/05/2010DE102008044025A1 Vorrichtung und Verfahren zum Beschichten eines Substrats mittels CVD Apparatus and method for coating a substrate by means of CVD
08/04/2010EP2213764A2 Sensor system for semiconductor manufacturing apparatus
08/04/2010EP2213595A1 Substrate processing apparatus
08/04/2010EP2212446A1 Oxide compounds as a coating composition
08/04/2010EP2212445A1 Process for depositing boron compounds by cvd or pvd
08/04/2010EP1570107B1 Susceptor system
08/04/2010EP1423259B1 parting method for forming free-standing (al,ga,in)n article
08/04/2010CN201538815U Plasma chemical vapor deposition production line mechanical transmission device
08/04/2010CN101796618A Method and apparatus for diagnosing status of parts in real time in plasma processing equipment
08/04/2010CN101796615A Top panel and plasma processing apparatus using the same
08/04/2010CN101796216A Production equipment and method of thin-film laminate
08/04/2010CN101796215A Clean rate improvement by pressure controlled remote plasma source
08/04/2010CN101795528A inductively coupled plasma processing apparatus
08/04/2010CN101792901A Method for preparing cubic indium oxide single-crystal film on yttrium-doped zirconia substrate
08/04/2010CN101792900A Binary and ternary metal chalcogenide materials and method of making and using the same
08/04/2010CN101792899A Fuel cell component having a durable conductive and hydrophilic coating
08/04/2010CN101791883A Surface erosion-resistant composite coating of carbon/carbon composite, preparation method and application thereof
08/04/2010CN101358337B Growth method of nonpolar GaN film
08/04/2010CN101213640B Apparatus for controlling substrate processing apparatus and method for controlling substrate processing apparatus
08/04/2010CN101094934B AL2O3 multilayer plate
08/04/2010CN101016624B Plasma chemical gas phase deposition apparatus and plasma surface treatment method
08/03/2010US7769279 Heat treatment apparatus
08/03/2010US7767840 Organometallic compounds
08/03/2010US7767584 In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
08/03/2010US7767320 Hard-material-coated bodies and method for their production
08/03/2010US7767275 Method for synthesizing self-aligned carbon nanomaterials on large area
08/03/2010US7767269 Plasma enhanced chemical vapor deposition in which the deposited phase A material is followed by a phase B material for exposure of the support and phase A material to a pulse of limited duration of an ionic bombardment with high energy density of selected energy density level
08/03/2010US7767262 Nitrogen profile engineering in nitrided high dielectric constant films
08/03/2010US7767184 film comprising a nano-crystalline diamond matrix, wherein the film has less than 3 weight percent of graphite; prepared by plasma assisted chemical vapor deposition of films and coatings; low cost
08/03/2010US7767055 Capacitive coupling plasma processing apparatus
08/03/2010US7767024 Method for front end of line fabrication
08/03/2010US7767023 Device for containing catastrophic failure of a turbomolecular pump
08/03/2010CA2457791C Coatings with low permeation of gases and vapors
07/2010
07/29/2010WO2010085496A1 Methods and systems for control of a surface modification process
07/29/2010WO2010084650A1 Substrate support stage of plasma processing apparatus
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