Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2010
08/18/2010CN101809191A Process of making an optical film by atomic layer deposition (ALD) at atmospheric pressure
08/18/2010CN101809190A Process for making thin film transistors by atomic layer deposition
08/18/2010CN101809189A Vapour delivery system
08/18/2010CN101809188A Process for forming thin film encapsulation layers
08/18/2010CN101809187A Organosiloxane materials for selective area deposition of inorganic materials
08/18/2010CN101808937A recycle and reuse of silane
08/18/2010CN101807585A TFT-LCD (Thin Film Transistor Liquid Crystal Display) array substrate and manufacture method thereof
08/18/2010CN101807515A Multi-zone resitive heater
08/18/2010CN101805895A Helicon wave plasma enhanced chemical vapor deposition unit
08/18/2010CN101805894A Preparation method for hydrogenated crystalline state nanometer carborundum films under low temperature
08/18/2010CN101514445B Device for preparing double-sided diamond coating based on heat wire method
08/18/2010CN101371341B Plasma processing apparatus
08/18/2010CN101173348B Method for deposition compact SiO2 with low damnification PECVD
08/17/2010USRE41503 Method of producing plasma display panel with protective layer of an alkaline earth oxide
08/17/2010US7777160 Electrode tuning method and apparatus for a layered heater structure
08/17/2010US7777152 High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck
08/17/2010US7777059 Complexes having ligands of phosphines, phosphites, isonitriles,alkenes,alkynes; chemical vapor deposition to depoit pure copperfor conductive wiring; microelectronics; cost efficiency; efficiency; stability; handling; storage stability; uniform films;spin coating
08/17/2010US7776777 Catalyst support using cellulose fibers, preparation method thereof, supported catalyst comprising nano-metal catalyst supported on carbon nanotubes directly grown on surface of the catalyst support, and method of preparing the supported catalyst
08/17/2010US7776742 Film-forming method
08/17/2010US7776445 Graphene-diamond hybrid material and method for preparing same using chemical vapor deposition
08/17/2010US7776425 Nanoparticle coated nanostructured surfaces for detection, catalysis and device applications
08/17/2010US7776408 Method and apparatus for producing single crystalline diamonds
08/17/2010US7776406 Optical materials and optical devices
08/17/2010US7776396 Controlled vapor deposition of multilayered coatings adhered by an oxide layer
08/17/2010US7776395 Method of depositing catalyst assisted silicates of high-k materials
08/17/2010US7776394 exposing surface to agent selected from imines, piperidines, pyrazoles and triazoles to form deposit, exposing deposit to composition consisting of metal precursor, reacting complex with reducing agent to form film; oxide-free
08/17/2010US7776393 wear and heat resistance; vapor deposition, lamination; for application to cutting tools
08/17/2010US7776383 Ceramic nanomaterial; electrodes overcoated with multilayer ceramic film; sintering
08/17/2010US7776192 Elongate vacuum system for coating one or both sides of a flat substrate
08/17/2010US7776178 Suspension for showerhead in process chamber
08/17/2010US7776156 Side RF coil and side heater for plasma processing apparatus
08/12/2010WO2010091397A2 Protective carbon coatings
08/12/2010WO2010091352A2 Mesoporous carbon material for energy storage
08/12/2010WO2010090519A2 Origami sensor
08/12/2010WO2010090112A1 Carburetor, carburetor for mocvd using same, center rod for use in the carburetor or carburetor for mocvd, method for dispersing carrier gas, and method for vaporizing carrier gas
08/12/2010WO2010090038A1 Insulating film material, and film formation method utilizing the material, and insulating film
08/12/2010WO2010089978A1 Shower-type vapor deposition device and vapor deposition method therefor
08/12/2010WO2010089461A1 Ald reactor, method for loading ald reactor, and production line
08/12/2010WO2010089460A1 Gate arrangement, production line and method
08/12/2010WO2010089459A1 Reaction chamber
08/12/2010WO2010089333A1 Plastic substrate comprising a flexible, transparent protective coating and method for producing such a plastic substrate
08/12/2010US20100204443 Vapor deposition of biomolecules
08/12/2010US20100203287 Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings
08/12/2010US20100203263 Deposition of Chalcogenide Materials via Vaporization Process
08/12/2010US20100203260 Method for efficient coating of substrates including plasma cleaning and dehydration
08/12/2010US20100203253 Plasma system and method of producing a functional coating
08/12/2010US20100203246 Deposition method and deposition apparatus for nitride film
08/12/2010US20100203245 Fabrication method of a photonic crystal structure
08/12/2010US20100203244 High accuracy vapor generation and delivery for thin film deposition
08/12/2010US20100203243 Method for forming a polysilicon film
08/12/2010US20100203242 self-cleaning susceptor for solar cell processing
08/12/2010US20100203230 Hot Melt Adhesive System And Method Using Machine Readable Information
08/12/2010US20100202880 Coating for gas bearing
08/12/2010US20100201055 Substrate treating apparatus and method for manufacturing semiconductor device
08/12/2010US20100200883 Method for producing organic electroluminescence element and organic electroluminescence element
08/12/2010US20100200757 Synthesis of advanced scintillators via vapor deposition techniques
08/12/2010US20100200587 Biodegradable resin container with a vacuum-evaporated film and method of forming a vacuum-evaporated film
08/12/2010US20100200545 Non-contact substrate processing
08/12/2010US20100199914 Chemical vapor deposition reactor chamber
08/12/2010US20100199913 Film deposition apparatus
08/12/2010DE202010004773U1 Dichtungselement mit Postionierungsmerkmal für eine festgeklemmte monolithische Gasverteilungselektrode Sealing element with Postionierungsmerkmal for a clamped monolithic gas distribution electrode
08/12/2010DE112007003640T5 Vorrichtung zum Erzeugen eines Gases für eine dielektrische Barrierenentladung Means for generating a gas for a dielectric barrier discharge
08/12/2010DE102009008271A1 Method for coating a substrate with a carbon-containing hard material by depositing in the gas phase comprises post-treating the deposited hard material layer for controlled adjustment of friction with a hydrogen and/or oxygen plasma
08/12/2010DE102009007897A1 Vakuumkammer für Beschichtungsanlagen und Verfahren zum Herstellen einer Vakuumkammer für Beschichtungsanlagen Vacuum chamber for coating systems and methods for producing a vacuum chamber for coating systems
08/12/2010DE102009007667A1 Medical treatment equipment, which comes in contact with a human or animal body in use, comprises a base body having a polyparylene surface coating, which consists of silver particles
08/12/2010DE102009000699A1 Kunststoffsubstrat, umfassend eine flexible, transparente Schutzschicht sowie Verfahren zur Herstellung eines solchen Kunststoffsubstrates Plastic substrate comprising a flexible, transparent protective layer as well as methods for producing such a plastic substrate
08/12/2010DE102008044028A1 Vorrichtung und Verfahren zum Beschichten eines Substrats mittels CVD Apparatus and method for coating a substrate by means of CVD
08/11/2010EP2216831A1 Modular PVD system for flex PV
08/11/2010EP2216804A1 Plasma processing apparatus
08/11/2010EP2216791A1 Transparent electroconductive film and process for producing the transparent electroconductive film
08/11/2010EP2215386A1 Slip ring of an axial face seal arrangement
08/11/2010EP2215283A1 Process of making an optical film by atomic layer deposition (ald) at atmospheric pressure
08/11/2010EP2215282A2 Chemical vapor deposition reactor
08/11/2010EP2215281A1 Voltage variable type thinfilm deposition method and apparatus thereof
08/11/2010CN201549466U Thin film deposition device
08/11/2010CN201545910U Plasma chemical gas-phase deposition chamber capable of automatically reducing temperature
08/11/2010CN1997769B Two-layer shadow mask with small dimension apertures and method of making and using same
08/11/2010CN1757098B Tailoring nitrogen profile in silicon oxynitride using rapid thermal annealing with ammonia under ultra-low pressure
08/11/2010CN101802977A System for processing subject to be processed and method for controlling the system
08/11/2010CN101802976A Substrate placing mechanism, substrate processing apparatus, method for suppressing film deposition on substrate placing mechanism, and storage medium
08/11/2010CN101802273A Epitaxial SIC single crystal substrate and method for manufacturing epitaxial SIC single crystal substrate
08/11/2010CN101802272A PECVD process chamber with cooled backing plate
08/11/2010CN101802259A Device for very high frequency plasma assisted CVD under atmospheric pressure, and applications thereof
08/11/2010CN101802258A Vapour delivery system
08/11/2010CN101802257A Substrate placing mechanism and substrate processing apparatus
08/11/2010CN101802256A Exhaust system structure of film forming apparatus, film forming apparatus and method of disposing of exhaust gas
08/11/2010CN101802255A Film forming apparatus and film forming method
08/11/2010CN101802254A chemical vapor deposition reactor
08/11/2010CN101802253A Method for producing diamond-like carbon coatings using diamondoid precursors on internal surfaces
08/11/2010CN101801988A Organometallic precursors for use in chemical phase deposition processes
08/11/2010CN101801987A Methods of forming thin metal-containing films by cvd or ald using iron, ruthenium or osmium cyclopentadiene carbon monoxide complexes
08/11/2010CN101800148A Tile type power electrode of large-area VHF-PECVD reaction chamber capable of obtaining uniform electric field
08/11/2010CN101798682A Method for depositing nano laminated composite thin film by adopting non-self-limiting growth mechanism
08/11/2010CN101798673A Film forming method, panel manufacturing device and annealing device
08/11/2010CN101798670A Mask assembly and deposition apparatus using the same for flat panel display
08/11/2010CN101536154B Barrier film forming method
08/11/2010CN101459042B Exhaust system and wafer heat treatment apparatus
08/11/2010CN101440480B Method for reducing silicon dioxide dielectric film deposition by HDP CVD process
08/11/2010CN101392366B Method for preparing rapid chemical vapor infiltration of carbon/carbon composite material flat plate
08/11/2010CN101359588B Substrate processing apparatus, load-lock chamber unit, and method of carrying out a transfer device