Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2010
08/25/2010CN101348936B Orientational alignment carbon nano-tube and carbon coating cobalt nano-particle complex and preparation thereof
08/25/2010CN101343733B Method for MOVCD growth nitride epitaxial layer
08/25/2010CN101091004B Method for forming tantalum nitride film
08/25/2010CN101091002B Method for forming tantalum nitride film
08/25/2010CN101063196B Method and apparatus for using solution based precursors for atomic layer deposition
08/24/2010US7781326 Formation of a tantalum-nitride layer
08/24/2010US7781314 Nitride semiconductor device manufacturing method
08/24/2010US7781031 Barrier layer, composite article comprising the same, electroactive device, and method
08/24/2010US7781018 contacting the oxidizable component (Fe, Al or alloy) in particle form with a gas containing a vapour of the activating component (AlCl3, FeCl3 etc.) and depositing activating component from the gas onto the oxidizable component in either a liquid or solid form; utility in packaging
08/24/2010US7781017 catalytic vapor deposition of ethylene in presence of a sputtered iron, cobalt, nickel, and alloys thereof; plural molecular orientations
08/24/2010US7781016 Method for measuring precursor amounts in bubbler sources
08/24/2010US7781015 depositing metal coatings for producing a plain bearing; lamination by vapor deposition; alloying; resist to corrosion due to friction
08/24/2010US7780821 Multi-chamber processing with simultaneous workpiece transport and gas delivery
08/24/2010US7780814 Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
08/24/2010US7780791 Apparatus for an optimized plasma chamber top piece
08/24/2010US7780790 Vacuum processing apparatus
08/24/2010US7780789 Vortex chamber lids for atomic layer deposition
08/24/2010US7780788 Gas delivery apparatus for atomic layer deposition
08/24/2010US7780787 Apparatus and method for depositing a material on a substrate
08/24/2010US7780786 Internal member of a plasma processing vessel
08/24/2010US7780785 Gas delivery apparatus for atomic layer deposition
08/24/2010US7780777 An aqueous dispersion of aggregated titanium dioxide powder, an amino alcohol, a dibasic carboxylic acid and/or hydroxycarboxylic acids; coating of glass, ceramics, metal surfaces
08/24/2010US7779785 Production method for semiconductor device and substrate processing apparatus
08/24/2010US7779784 Apparatus and method for plasma assisted deposition
08/24/2010US7779783 Plasma processing device
08/24/2010CA2282664C Arrangement and method for improving vacuum in a very high vacuum system
08/19/2010WO2010093614A1 A portable dry nanocoating machine
08/19/2010WO2010093041A1 Process for producing multilayered gas-barrier film
08/19/2010WO2010092878A1 Cvd device
08/19/2010WO2010092471A2 Method and device for coating planar substrates with chalcogens
08/19/2010WO2010092384A1 Two layer barrier on polymeric substrate
08/19/2010WO2010092383A1 Two layer barrier on polymeric substrate
08/19/2010WO2010092235A1 Gas deposition reactor
08/19/2010WO2010091879A1 Method for applying a coating to workpieces and/or materials comprising at least one readily oxidizable nonferrous metal
08/19/2010WO2010091473A1 A chemical vapour deposition system and process
08/19/2010WO2010091470A1 Plasma deposition
08/19/2010WO2010076974A3 Polysilicon deposition apparatus
08/19/2010US20100210118 Semiconductor device manufacturing method and substrate processing apparatus
08/19/2010US20100209720 Coatings
08/19/2010US20100209702 Composite layer and fabrication method thereof
08/19/2010US20100209700 Method of producing compound nanorods and thin films
08/19/2010US20100209696 Anchored Nanostructure Materials and Method of Fabrication
08/19/2010US20100209628 Growth of coatings of nanoparticles by photoinduced chemical vapor deposition
08/19/2010US20100209626 Methods for heating with lamps
08/19/2010US20100209625 Voltage variable type thinfilm deposition method and apparatus thereof
08/19/2010US20100209624 Film-forming apparatus and film-forming method
08/19/2010US20100209623 Apparatus for growing large area vanadium dioxide thin film and method of growing large area oxide thin film in the apparatus
08/19/2010US20100209622 Thin Film of Aluminum Nitride and Process for Producing the Thin Film of Aluminum Nitride
08/19/2010US20100209620 Method for vapor deposition
08/19/2010US20100209610 Group iv complexes as cvd and ald precursors for forming metal-containing thin films
08/19/2010US20100209609 Vapor emission device, organic thin film vapor deposition apparatus, and method for depositing organic thin film
08/19/2010US20100209608 Film formation method, die, and method of manufacturing the same
08/19/2010US20100209605 Anchored Nanostructure Materials and Ball Milling Method Of Fabrication
08/19/2010US20100209598 IN SITU GENERATION OF RuO4 FOR ALD OF Ru AND Ru RELATED MATERIALS
08/19/2010US20100209596 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
08/19/2010US20100209595 Methods of Forming Strontium Ruthenate Thin Films and Methods of Manufacturing Capacitors Including the Same
08/19/2010US20100209336 Ultrathin magnesium nanoblades
08/19/2010US20100209259 Evacuation apparatus
08/19/2010US20100209082 Heating lamp system
08/19/2010US20100207515 Method for controlling film forming apparatus, film forming method, film forming apparatus, organic el electronic device, and storage medium having program for controlling film forming apparatus stored therein
08/19/2010US20100207492 Ceramic and method of manufacturing the same, Dielectric capacitor, semiconductor device, and element
08/19/2010US20100207138 III Nitride Semiconductor Crystal, III Nitride Semiconductor Device, and Light Emitting Device
08/19/2010US20100207053 Catalyst composition for the synthesis of thin multi-walled carbon nanotube and its manufacturing method
08/19/2010US20100206941 Coated diamond
08/19/2010US20100206847 Toroidal plasma chamber for high gas flow rate process
08/19/2010US20100206846 Substrate processing apparatus and substrate processing method
08/19/2010US20100206845 Plasma processing apparatus and method for operating the same
08/19/2010US20100206716 Method for Forming Tantalum Nitride Film
08/19/2010US20100206483 RF Bus and RF Return Bus for Plasma Chamber Electrode
08/19/2010US20100206482 Plasma processing apparatus and temperature measuring method and apparatus used therein
08/19/2010US20100206235 Wafer carrier track
08/19/2010US20100206234 Simplified powder feeding and vaporization apparatus
08/19/2010US20100206233 Device and Method for Vaporizing Temperature Sensitive Materials
08/19/2010US20100206232 Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits
08/19/2010US20100206230 Methods of low temperature oxidation
08/19/2010US20100206229 Vapor deposition reactor system
08/19/2010US20100206228 Chemical Mechanical Vapor Deposition Device for Production of Bone Substitute Material
08/19/2010US20100206163 Wear resistance reinforcing method and sliding structure
08/19/2010DE102009032151A1 Coating articles with oxygen barriers in a reaction chamber of a chemical vapor deposition device under normal pressure, comprises initially admixing undried air to gas stream of silicon and monocarbonic acid with a given steam pressure
08/18/2010EP2219236A1 Process for producing a GaN-based element
08/18/2010EP2219230A2 Method for fabricating solar cell using inductively coupled plasma chemical vapor deposition
08/18/2010EP2217865A1 High temperature solar selective coatings
08/18/2010EP2217741A1 A device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device
08/18/2010EP2217740A1 Process for selective area deposition of inorganic materials
08/18/2010EP2217739A1 Method for preparing a deposition from a vapour
08/18/2010EP2217738A1 Frame-based vacuum chamber for coating systems
08/18/2010CN201553779U Tail gas treatment device of PECVD equipment
08/18/2010CN201553777U Diversion-type thermal evaporation and deposition device
08/18/2010CN201553775U Film wrinkle removing device of vacuum aluminum-plating machine
08/18/2010CN1937279B Method for preparing organic electroluminescent device electronic injection layer
08/18/2010CN101809769A Compound semiconductor epitaxial wafer and process for producing the same
08/18/2010CN101809730A Processing method and semiconductor device manufacturing method
08/18/2010CN101809719A Methods and arrangements for plasma processing system with tunable capacitance
08/18/2010CN101809712A Gas feeding device for semiconductor manufacturing facilities
08/18/2010CN101809197A Film forming apparatus
08/18/2010CN101809196A Deposition system for thin film formation
08/18/2010CN101809195A Process for selective area deposition of inorganic materials
08/18/2010CN101809194A Method of patterning a mesoporous nano particulate layer
08/18/2010CN101809193A Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head
08/18/2010CN101809192A Delivery device for deposition
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