Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2010
09/01/2010CN1540033B Chemical vapor deposition installation with integrated diffuser frame
09/01/2010CN1531012B Plasma treating method and treater
09/01/2010CN101822122A Apparatus for irradiation unit
09/01/2010CN101821427A Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head
09/01/2010CN101821426A RF return plates for backing plate support
09/01/2010CN101821040A Edge replacement-type cutting chip
09/01/2010CN101818336A Processing apparatus and heater unit
09/01/2010CN101818335A Method and apparatus for using solution based precursors for atomic layer deposition
09/01/2010CN101818334A ALD apparatus and method
09/01/2010CN101818333A Vapor phase epitaxy apparatus of group III nitride semiconductor
09/01/2010CN101818332A Super-hard self-lubricating diamond/diamond-like composite laminated coating material and preparation method thereof
09/01/2010CN101481793B Large area microwave plasma CVD device
09/01/2010CN101479054B Automatic purging device for purging the pipeline of a photoresist coating and developing apparatus
09/01/2010CN101320675B Plasma processing device, electrode temperature adjusting device and method
09/01/2010CN101189360B Method for forming vapor deposition film by using surface wave plasma, and apparatus therefor
09/01/2010CN101107693B Magnetron control method, microwave generation device, processing device
09/01/2010CN101010447B Substrate processing apparatus and semiconductor device manufacturing method
08/2010
08/31/2010US7786320 semiconductors; low dielectric thin films; chemical vapor deposition
08/31/2010US7785672 Plasma enhanced chemical vapor deposition; better control over surface standing wave effects and film thickness uniformity for silicon-containing films such as silicon nitride and silicon oxide
08/31/2010US7785671 metal substrate, metal bonding layer, ceramics thermal barrier; columnar structure of stabilized zirconia, or ZrO2-HfO2 solid solution; simultaneously melting two ZrO2 deposition and Lanthanum oxide deposition materials by electron beam physical vapor deposition; low thermal conductivity; durability
08/31/2010US7785665 having lenticular grain morphology or polyhedra-lenticular grain morphology at surface, chemical vapor deposition
08/31/2010US7785664 depositing titanium/titanium nitride thin films onto substrate in chamber for depositing semiconductor thin film, process gap between shower head or gas injection unit and substrate is controlled; dry cleaning
08/31/2010US7785663 Successive vapour deposition system, vapour deposition system, and vapour deposition process
08/31/2010US7785658 Method for forming metal wiring structure
08/31/2010US7785655 Liquid crystal dispensing system and method of dispensing liquid crystal material using same
08/31/2010US7785558 Method of manufacturing carbon nanostructure
08/31/2010US7785456 Magnetic latch for a vapour deposition system
08/31/2010US7785441 Plasma generator, plasma control method, and method of producing substrate
08/31/2010US7785419 Epitaxial apparatus
08/31/2010US7785418 Adjusting mechanism and adjusting method thereof
08/31/2010US7785417 Gas injection system for plasma processing
08/31/2010US7785415 Localized synthesis and self-assembly of nanostructures
08/31/2010US7785414 Process for manufacturing wafer of silicon carbide single crystal
08/31/2010US7784426 Plasma reactor for the treatment of large size substrates
08/31/2010US7784306 Material deposition
08/26/2010WO2010096383A1 Apparatus and methods for safely providing hazardous reactants
08/26/2010WO2010096212A2 Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon
08/26/2010WO2010095550A1 Method for forming epitaxial wafer and method for manufacturing semiconductor element
08/26/2010WO2010095498A1 Method for forming cu film and storage medium
08/26/2010WO2010095497A1 Method for forming cu film and storage medium
08/26/2010WO2010095299A1 Substrate support table of plasma processing device
08/26/2010WO2010095011A1 Process to deposit diamond like carbon as protective coating on inner surface of a shaped object.
08/26/2010WO2010094802A1 Preparation unit for lithogrpahy machine
08/26/2010WO2010094376A2 A method and arrangement for vapour phase coating of an internal surface of at least one hollow article
08/26/2010WO2010053878A3 Laminar flow in a precursor source canister
08/26/2010WO2010052672A3 Allyl-containing precursors for the deposition of metal-containing films
08/26/2010US20100216304 Method for forming ti film and tin film, contact structure, computer readable storage medium and computer program
08/26/2010US20100216023 Process for producing carbon nanostructure on a flexible substrate, and energy storage devices comprising flexible carbon nanostructure electrodes
08/26/2010US20100215967 Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon
08/26/2010US20100215929 Organic light emitting diode display
08/26/2010US20100215915 Method for manufacture and coating of nanostructured components
08/26/2010US20100215897 Metal ferrite spinel energy storage devices and methods for making and using same
08/26/2010US20100215891 Recording medium and manufacturing method of recording medium
08/26/2010US20100215872 High Throughput Multi-Wafer Epitaxial Reactor
08/26/2010US20100215871 Method for forming thin film using radicals generated by plasma
08/26/2010US20100215854 Hvpe showerhead design
08/26/2010US20100215853 Method for controlling process gas concentration
08/26/2010US20100215848 Vacuum treatment of strip-shaped substrates
08/26/2010US20100215842 eta 2-N,N'-dimethylethylenediamino-tris-dimethylaminotantalum; tantalum silicon nitride films on substrate via chemical vapor deposition, atomic layer deposition; for diffusion barrier layers on microelectronic devices (integrated circuits) featuring copper metallization and/or ferroelectric thin films
08/26/2010US20100215643 Anti-infective functionalized surfaces and methods of making same
08/26/2010US20100215541 Device and method for producing high power microwave plasma
08/26/2010US20100215513 Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate using the same
08/26/2010US20100214369 Piezoelectric film, method for forming piezoelectric film, piezoelectric device and liquid discharge device
08/26/2010US20100213167 Method of patterning vapour deposition by printing
08/26/2010US20100212593 Substrate processing apparatus
08/26/2010US20100212592 Vacuum processing apparatus
08/26/2010US20100212591 Reactor lid assembly for vapor deposition
08/26/2010US20100212284 Ion thruster grids and methods for making
08/26/2010US20100212283 vapor deposition of zirconium nitride protective coating applied over a propellant-contacting surface of an aerospace vehicle propellant system ( H2O2 propellant); corrosiion resistance; nondegradation
08/25/2010EP2221855A1 Nitride semiconductor and nitride semiconductor crystal growth method
08/25/2010EP2221854A1 Iii nitride structure and method for manufacturing iii nitride structure
08/25/2010EP2221515A1 Slip ring seal and method for manufacturing the same
08/25/2010EP2220267A1 Substrate having a coating comprising copper and method for the production thereof by means of atomic layer deposition
08/25/2010EP2220266A1 Solution based lanthanum precursors for atomic layer deposition
08/25/2010CN201562657U Thin film deposition device
08/25/2010CN201562656U Film depositing apparatus and film photovoltaic device
08/25/2010CN201560236U Plasma enhanced chemical vapor deposition equipment
08/25/2010CN201560235U Quartz outer tube of Low Pressure Vapor Phase Deposition vertical furnace tube
08/25/2010CN201560234U Chemical vapor deposition equipment integrating atomic layer deposition process
08/25/2010CN1576391B Gas injector for use in semiconductor fabricating apparatus
08/25/2010CN101815807A Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors
08/25/2010CN101815686A Method for the transparent coating of a substrate with plasma at atmospheric pressure
08/25/2010CN101814506A Composite storage medium floating-gate memory structure and manufacture method thereof
08/25/2010CN101814505A Multi-layer floating gate nonvolatile memory structure and production method thereof
08/25/2010CN101814430A Method for preparing composite trapping layer of floating gate type nonvolatile memory
08/25/2010CN101812677A Plasma-reinforced chemical vapor deposition process cavity
08/25/2010CN101812676A Processing chamber used for semiconductor solar film plating
08/25/2010CN101812675A Vacuum processing apparatus
08/25/2010CN101812674A Gas distribution device for metal organic chemical vapor deposition equipment
08/25/2010CN101812673A Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment
08/25/2010CN101812672A A1B12 nano/sub-micron spherical material and preparation method thereof
08/25/2010CN101812671A Gas path device for metal organic chemical vapor deposition equipment
08/25/2010CN101812662A Mask adhesion unit and deposition apparatus using the same
08/25/2010CN101811871A Liner tray for metal organic chemical vapor deposition equipment and manufacturing process thereof
08/25/2010CN101811385A Diamond coating for cutting tool
08/25/2010CN101503796B Apparatus for preparing CVD diamond film for linear sample
08/25/2010CN101494171B Silicon nitride preparation method capable of reducing leakage current
08/25/2010CN101469415B Plasma auxiliary organic thin film deposition apparatus
08/25/2010CN101451238B Pre-deposition method for forming protection film in chamber
08/25/2010CN101413115B Method for plasma assisted film deposition
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