Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2010
09/09/2010US20100224325 Plasma processing apparatus and electrode for same
09/09/2010US20100224324 Plasma generating apparatus, plasma generating method and remote plasma processing apparatus
09/09/2010US20100224323 Plasma processing apparatus and electrode for same
09/09/2010US20100224129 System and method for surface treatment and barrier coating of fibers for in situ cnt growth
09/09/2010US20100224128 Semiconductor manufacturing apparatus
09/09/2010US20100224127 Dynamic Film Thickness Control System/Method and its Utilization
09/09/2010DE102009015545A1 Beschichtungsanlage mit Aktivierungselement sowie Verfahren zu dessen Herstellung Coating installation with activation element and process for its preparation
09/09/2010DE102009000821A1 Verfahren zum Aufbringen einer Beschichtung auf Werkstücke und/oder Werkstoffe aufweisend mindestens ein leicht oxidierbares Nichteisenmetall A method for applying a coating to workpieces and / or materials comprising at least one easily oxidizable non-ferrous metal
09/08/2010EP2226502A1 Method and arrangement to install a wind-turbine
09/08/2010EP2225407A1 Formation of a lithium comprising structure on a substrate by ald
09/08/2010CN1982242B Optical material and optical device
09/08/2010CN1981069B Composition containing siloxane compound and phenol compound
09/08/2010CN1829571B Metalorganic chemical vapor deposition(MOCVD) process and apparatus to produce multi-layer high-temperature superconducting(HTS) coated tape
09/08/2010CN1795289B Chemical vapor deposition film formed by plasma cvd process and method for forming same
09/08/2010CN1759466B Substrate support lift mechanism
09/08/2010CN1698188B Method for depositing a low dielectric constant film
09/08/2010CN101827956A Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors
09/08/2010CN101827955A Workpiece carrier device
09/08/2010CN101827953A Voltage variable type thinfilm deposition method and apparatus thereof
09/08/2010CN101827782A Connecting and bonding adjacent layers with nanostructures
09/08/2010CN101827766A Substrate processing apparatus
09/08/2010CN101826475A Apparatus and mask of inspecting mask, and apparatus and method of generating virtual chart
09/08/2010CN101826447A Film deposition apparatus and film deposition method
09/08/2010CN101826446A Film deposition apparatus and film deposition method
09/08/2010CN101825741A Coaxial dual-waveguide structured optical fiber with annular waveguide layer and preparation method thereof
09/08/2010CN101824647A Automatic process control method of PECVD film deposition
09/08/2010CN101824618A Superhard DLC (Diamond-like Carbon) base nano composite coating PCB (Printed Circuit Board) microdriller and manufacturing method thereof
09/08/2010CN101824607A Gas inlet device for CVD reactor
09/08/2010CN101824606A Vertical shower type MOCVD reactor
09/08/2010CN101824605A Pretreatment process for processing titanium nitride film deposited on surface of numerical control punch die
09/08/2010CN101824591A Deposition mas
09/08/2010CN101556971B Back reflector for silicon-based thin film solar cell and preparation method thereof
09/08/2010CN101510504B Transversal epitaxial growth method for nano area of semiconductor film
09/08/2010CN101403104B Apparatus for injection of gas and method for generating in situ doping polysilicon by using the apparatus
09/08/2010CN101368265B Gas path system of apparatus for preparing gallium nitride thin film
09/08/2010CN101339967B Two-chamber alternative amorphous silicon photovoltaic film chemical vapour deposition equipment
09/08/2010CN101314845B Independent MO source pipe line of semiconductor material growth apparatus and application thereof
09/08/2010CN101012551B Chip bench of plasma reinforced thin film deposition device
09/07/2010US7791272 a moisture impervious protective layer of silicon nitride in contact with an upper electrode (e.g. indium tin oxide) and a circular polarizer in contact with the protective layer by using an adhesive ( acrylic adhesive) so that any irregularities in the protective layer are filled with the adhesive
09/07/2010US7791005 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
09/07/2010US7790632 Methods of forming a phosphorus doped silicon dioxide-comprising layer
09/07/2010US7790556 Integration of high k gate dielectric
09/07/2010US7790230 Metal chloride seeded growth of electronic and optical materials
09/07/2010US7790229 High resolution substrate holder leveling device and method
09/07/2010US7790228 such as nanotubes, nanocoils; spraying powders of catalyst to raw material gas, subjecting to beam irradiation, infrared beam irradiation, electron beam radiation, or ion beam irradiation
09/07/2010US7790004 holder includes a reusable base formed, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, encourages adherence of coating material and has a low vapor pressure at coating temp.
09/07/2010US7789993 Internal balanced coil for inductively coupled high density plasma processing chamber
09/07/2010US7789992 Neutral beam etching device for separating and accelerating plasma
09/07/2010US7789963 Chuck pedestal shield
09/07/2010US7789962 Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same
09/07/2010US7789961 Delivery device comprising gas diffuser for thin film deposition
09/07/2010US7789614 Aligner
09/02/2010WO2010099392A1 Apparatus for manufacture of solar cells
09/02/2010WO2010099344A1 High throughput multi-wafer epitaxial reactor
09/02/2010WO2010099218A1 Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof
09/02/2010WO2010098875A2 Ald systems and methods
09/02/2010WO2010098422A1 Method for producing two-dimensionally patterned carbon nanotube and two-dimensionally patterned carbon nanotube
09/02/2010WO2010098308A1 Organic compound steam generator and apparatus for producing organic thin film
09/02/2010WO2010097148A1 Slide ring seal and method for producing such a slide ring seal
09/02/2010WO2010080946A3 Non-stick articles
09/02/2010WO2010055423A8 Tellurium precursors for film deposition
09/02/2010US20100221914 Composition and method for low temperature deposition of silicon-containing films
09/02/2010US20100221583 Hdd pattern implant system
09/02/2010US20100221495 Method of Manufacturing a Transparent Member and Plastic Member
09/02/2010US20100221454 Methods for Preparation of High-Purity Polysilicon Rods Using a Metallic Core Means
09/02/2010US20100221453 Bias enhanced nucleation of diamond films in a chemical vapor deposition process
09/02/2010US20100221452 Surface coating method for hydrophobic and superhydrophobic treatment in atmospheric pressure plasma
09/02/2010US20100221451 Method for treating plasma and/or covering plasma of workpieces under continuous atmospheric pressure, in particular material plates or strips
09/02/2010US20100221450 Method for Producing a Carbon-Containing Material by Carbon Electron-Beam Vaporisation in a Vacuum and a Subsequent Condensation Thereof on a Substrate and a Device for Carrying Out Said Method
09/02/2010US20100221428 Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition
09/02/2010US20100221427 Methods and apparatus for controlled chemical vapor deposition
09/02/2010US20100221426 Web Substrate Deposition System
09/02/2010US20100221425 Textured Coating on a Component Surface
09/02/2010US20100221424 Low temperature cnt growth using gas-preheat method
09/02/2010US20100220305 Optical element and exposure apparatus
09/02/2010US20100219548 Fine-structure transfer apparatus and method
09/02/2010US20100219488 Silicon structure, method for manufacturing the same, and sensor chip
09/02/2010US20100219380 Polycrystalline silicon and method for the production thereof
09/02/2010US20100219160 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
09/02/2010US20100219157 Film forming apparatus and film forming method
09/02/2010US20100218896 Atmospheric pressure plasma reactor
09/02/2010US20100218724 Substrate processing apparatus
09/02/2010US20100218723 Molecular Beam Cell Having Purge Function
09/02/2010US20100218722 High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method
09/02/2010US20100218721 Hollow-cathode discharge apparatus for plasma-based processing
09/02/2010DE102009010556A1 Verfahren zur Herstellung von epitaxierten Siliciumscheiben Process for producing epitaxially coated silicon wafers
09/01/2010EP2224475A1 Processing method and semiconductor device manufacturing method
09/01/2010EP2224468A1 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method
09/01/2010EP2222901A1 Epitaxial barrel susceptor having improved thickness uniformity
09/01/2010EP2222890A1 Coating method
09/01/2010EP2222889A1 Atomic layer deposition process
09/01/2010EP1915419B1 Glazing system for vehicle tops and windows
09/01/2010CN201567372U Air inlet control device in plasma chemical vapor deposition equipment
09/01/2010CN201567371U Device for preparing boron-doped isotropic pyrolytic carbon material
09/01/2010CN201567370U Chemical vapor deposition machine station and shading frame thereof
09/01/2010CN1986877B Organometallic composition
09/01/2010CN1926668B Formation of a silicon oxynitride layer on a high-K dielectric material
09/01/2010CN1890398B A layered structure
09/01/2010CN1882398B Exhaust gas treatment
09/01/2010CN1570203B Oxide coated cutting tool