Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2010
09/16/2010US20100233633 Engineering boron-rich films for lithographic mask applications
09/16/2010US20100233511 Bodies coated with a hard material and method for the production thereof
09/16/2010US20100233473 Visible-light-responsive photoactive coating, coated article, and method of making same
09/16/2010US20100233437 Lithographic machine platform and applications thereof
09/16/2010US20100233385 Apparatus and method of forming thin layers on substrate surfaces
09/16/2010US20100233366 Apparatus and method of producing vapor-grown carbon structure
09/16/2010US20100233353 Evaporator, coating installation, and method for use thereof
09/16/2010US20100232892 Coated cutting tool for medium-rough to rough turning of stainless steels and superalloys
09/16/2010US20100230834 Bubbling supply system for stable precursor supply
09/16/2010US20100230387 Shower Plate, Method for Manufacturing the Shower Plate, Plasma Processing Apparatus using the Shower Plate, Plasma Processing Method and Electronic Device Manufacturing Method
09/16/2010US20100230050 Plasma generating apparatus
09/16/2010US20100229797 Film deposition apparatus
09/16/2010US20100229796 Manufacturing apparatus of polycrystalline silicon
09/16/2010US20100229795 Substrate processing apparatus
09/16/2010US20100229794 Vapor phase epitaxy apparatus of group iii nitride semiconductor
09/16/2010US20100229793 Showerhead for vapor deposition
09/16/2010DE112008001548T5 Plasmabearbeitungsvorrichtung und Plasmabearbeitungsverfahren Plasma processing apparatus and plasma processing method
09/16/2010DE102009020436A1 Verfahren und Vorrichtung zur Plasmabehandlung eines flachen Substrats Method and apparatus for plasma treatment of a flat substrate
09/15/2010EP2228465A1 Methods for making dielectric films comprising silicon
09/15/2010EP2227576A1 Apparatus for delivering precursor gases to an epitaxial growth substrate
09/15/2010EP1633523B1 Coated cutting tool with brazed-in superhard blank
09/15/2010CN201581128U Tooling for supporting silicon chip
09/15/2010CN201581127U Horizontal direction revolution and autorotation mechanism for vacuum coating
09/15/2010CN1796005B Plastic container having a carbon-treated internal surface
09/15/2010CN101836303A Hover cushion transport for webs in a web coating process
09/15/2010CN101836284A Plasma processing apparatus and gas exhaust method
09/15/2010CN101831694A Method for depositing group III/V compounds
09/15/2010CN101831651A Hard alloy cutter and film plating method of same
09/15/2010CN101831633A Method for preparing composite film of graphene and amorphous carbon
09/15/2010CN101831632A Film deposition apparatus
09/15/2010CN101831631A Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
09/15/2010CN101831630A Method for preparing doped zinc oxide by adopting metallic source chemical vapor deposition technology
09/15/2010CN101831629A Showerhead design with precursor source
09/15/2010CN101831628A Method for growing high-quality In ingredient enriched InGaN thin film material
09/15/2010CN101831627A Method for improving wear-resisting property of ultra-high molecular polyethylene
09/15/2010CN101831626A Chemical vapor diamond deposition device
09/15/2010CN101831625A Process for forming diamond-like carbon film on surface of infrared optical element
09/15/2010CN101831624A Hot wire tensioning mechanism
09/15/2010CN101831623A Chemical vapor densification furnace hearth
09/15/2010CN101831622A Grapheme foam and preparation method thereof
09/15/2010CN101831621A Chemical vapor densification furnace body
09/15/2010CN101830429A Method for assembling monometal nano particles on carbon nano tubes
09/15/2010CN101830089A Wear-resistant membrane structure, die and manufacturing method thereof
09/15/2010CN101413114B Substrate bearing device and processing apparatus for plasma
09/15/2010CN101320680B Anti-arc protection device and its assembling method
09/15/2010CN101308794B Atomic layer deposition of tungsten material
09/15/2010CN101307436B Supporting device for base plate
09/15/2010CN101248211B Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve
09/14/2010USRE41694 Method for roll-to-roll deposition of optically transparent and high conductivity metallic thin films
09/14/2010US7794841 Articles of manufacture containing increased stability low concentration gases and methods of making and using the same
09/14/2010US7794797 Celivering gaseous hydrocarbon and oxygen to a catalyst distributed on the surface of the substrate, using a catalytic chemical vapor deposition process, selectively heating the catalyst by causing an exothermic oxidation reaction on the surface of the catalyst forming carbon nanotubes
09/14/2010US7794792 Multuilayer structure; fiber substrate, polymer layer and antibacterial layer containing nano-photocatalyst and nanosilver particles that kills germs
09/14/2010US7794789 Multi-station deposition apparatus and method
09/14/2010US7794788 Method for pre-conditioning a precursor vaporization system for a vapor deposition process
09/14/2010US7794787 forming a first mixture that comprises HfCl4 dispersed in a supercritical fluid(CO2) and flowed into a reaction chamber to form a first component ( hafnium) on a substrate, flowing an oxygen-containing precursors ( H2O and O3 )into the chamber, reacting with hafnium to form HfO2; atomic layer deposition
09/14/2010US7794786 Composite material and process for preparing a composite material
09/14/2010US7794563 Etching depth measuring device, etching apparatus, and etching depth measuring method
09/14/2010US7794546 Sealing device and method for a processing system
09/14/2010US7794545 Mask, film forming method, light-emitting device, and electronic apparatus
09/14/2010US7794544 Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
09/14/2010US7793612 Ring plasma jet method and apparatus for making an optical fiber preform
09/10/2010WO2010101859A1 Atomic layer deposition processes
09/10/2010WO2010101715A1 Gas injectors for cvd systems with the same
09/10/2010WO2010101191A1 Placing table structure, film forming apparatus, and raw material recovery method
09/10/2010WO2010100971A1 Base material having thin film
09/10/2010WO2010100950A1 Method for manufacturing semiconductor thin film using substrate irradiated with focused beam, apparatus for manufacturing semiconductor thin film, method for selectively growing semiconductor thin film, and semiconductor element
09/10/2010WO2010100806A1 Method of modifying surface of amorphous carbon film
09/10/2010WO2010100792A1 Fluid controller
09/10/2010WO2010100702A1 Film forming method and film forming apparatus
09/10/2010WO2010100699A1 Crystal growth process for nitride semiconductor, and method for manufacturing semiconductor device
09/10/2010WO2010100689A1 Method for manufacturing gallium nitride compound semiconductor, and semiconductor light emitting element
09/10/2010WO2010100261A1 Self-supporting cvd diamond film and method for producing a self-supporting cvd diamond film
09/10/2010WO2010100235A1 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
09/10/2010WO2010100116A1 Method for depositing a coating
09/10/2010WO2010080508A3 Highly sinterable lanthanum strontium titanate interconnects through doping
09/10/2010WO2010076973A3 Polysilicon deposition apparatus
09/10/2010WO2010065695A3 Chemical vapor deposition flow inlet elements and methods
09/10/2010CA2754093A1 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
09/09/2010US20100227478 Substrate processing apparatus and method of manufacturing semiconductor
09/09/2010US20100227458 Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same
09/09/2010US20100227430 Process for depositing boron compounds by cvd or pvd
09/09/2010US20100227281 Methods Of Forming Patterns
09/09/2010US20100227178 Barrier laminate, gas barrier film, and device using the same
09/09/2010US20100227160 Al203 CERAMIC TOOLS WITH DIFFUSION BONDING ENHANCED LAYER
09/09/2010US20100227158 Surface modified electrical insulation system with improved tracking and erosion resistance
09/09/2010US20100227141 Protective coating for industrial parts
09/09/2010US20100227094 Oxygen barrier molded container and method for production thereof
09/09/2010US20100227062 METHOD FOR FORMING Ti-BASED FILM AND STORAGE MEDIUM
09/09/2010US20100227061 LOW TEMPERATURE ALD Si02
09/09/2010US20100227060 Atomic layer deposition apparatus and method of fabricating atomic layer using the same
09/09/2010US20100227059 Film deposition apparatus, film deposition method, and computer readable storage medium
09/09/2010US20100227058 Method for fabricating carbon nanotube array
09/09/2010US20100227057 Cvd apparatus which has rotation type heated and the control method
09/09/2010US20100227052 Methods for processing substrates having an antimicrobial coating
09/09/2010US20100227046 Film deposition apparatus, film deposition method, and computer readable storage medium
09/09/2010US20100226850 Method for producing titanium oxide
09/09/2010US20100226847 Method for direct, chirality-selective synthesis of semiconducting or metallic single-walled carbon nanotubes
09/09/2010US20100224592 Charged particle beam processing
09/09/2010US20100224486 Dynamic Film Thickness Control System/Method and its Utilization
09/09/2010US20100224481 Gas flow set-up for multiple, interacting reactive sputter sources