| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/28/2010 | US7803419 Apparatus and method for rapid cooling of large area substrates in vacuum |
| 09/28/2010 | US7803255 arc discharge plasma source and generator for generate a magnetic field in a vapor deposition zone between an evaporator and a movable substrate, are aligned perpendicular to a movement direction of the substrate and parallel to a transport plane of the substrate; uniformity; simple and cost-effective |
| 09/28/2010 | US7803229 Apparatus and method for compensating uniformity of film thickness |
| 09/28/2010 | US7802539 Semiconductor processing equipment having improved particle performance |
| 09/28/2010 | US7802538 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors |
| 09/28/2010 | CA2591651C Shadow sculpted thin films |
| 09/23/2010 | WO2010106859A1 Raw material for chemical vapor deposition, and process for forming silicon-containing thin film using same |
| 09/23/2010 | WO2010106811A1 Surface-coated cutting tool |
| 09/23/2010 | WO2010105947A1 Mocvd reactor having a ceiling panel coupled locally differently to a heat dissipation member |
| 09/23/2010 | WO2010105829A1 Apparatus and method for deposition of functional coatings |
| 09/23/2010 | WO2010105585A1 Substrate processing system and substrate processing method |
| 09/23/2010 | WO2010086600A3 Providing gas for use in forming a carbon nanomaterial |
| 09/23/2010 | WO2008127920A3 Silicon nitride passivation for a solar cell |
| 09/23/2010 | US20100240216 Film formation method and apparatus utilizing plasma cvd |
| 09/23/2010 | US20100240214 Method of forming multi metal layers thin film on wafer |
| 09/23/2010 | US20100240199 Scalable Light-Induced Metallic to Semiconducting Conversion of Carbon Nanotubes and Applications to Field-Effect Transistor Devices |
| 09/23/2010 | US20100239850 Method for making composite material |
| 09/23/2010 | US20100239821 Surface enhanced infrared absorption sensor and method for producing the same |
| 09/23/2010 | US20100239782 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus |
| 09/23/2010 | US20100239781 Method for in-chamber preprocessing in plasma nitridation processing, plasma processing method, and plasma processing apparatus |
| 09/23/2010 | US20100239758 Surface pre-treatment for enhancement of nucleation of high dielectric constant materials |
| 09/23/2010 | US20100239757 High frequency plasma cvd apparatus, high frequency plasma cvd method and semiconductor thin film manufacturing method |
| 09/23/2010 | US20100239756 Plasma processing apparatus and gas exhaust method |
| 09/23/2010 | US20100239747 Shadow mask and evaporation system incorporating the same |
| 09/23/2010 | US20100239746 Manufacturing Apparatus |
| 09/23/2010 | US20100239742 Durable transparent intelligent coatings for polymeric transparencies |
| 09/23/2010 | US20100239482 Method of producing gas barrier layer, gas barrier film for solar batteries and gas barrier film for displays |
| 09/23/2010 | US20100239464 Substrate manufacturing method for sensor applications using optical characteristics and the substrate therefrom |
| 09/23/2010 | US20100236684 Plasma deposition to increase adhesion |
| 09/23/2010 | US20100236483 Chemical vapor deposition reactor having multiple inlets |
| 09/23/2010 | US20100236482 Plasma film forming apparatus |
| 09/23/2010 | US20100236481 Preparation of Membranes Using Solvent-Less Vapor Deposition Followed by In-Situ Polymerization |
| 09/23/2010 | US20100236480 Raw material gas supply system and film forming apparatus |
| 09/23/2010 | US20100236479 Plasma deposition apparatus |
| 09/23/2010 | US20100236478 Vacuum processing system |
| 09/23/2010 | DE102009013855A1 Verfahren zur Beschichtung eines Gleitelements und Gleitelement, insbesondere Kolbenring A method for coating a sliding member and sliding member, in particular piston ring |
| 09/23/2010 | DE102009011960A1 Verfahren zur Überwachung von Plasma-Entladungen A method for monitoring plasma discharges |
| 09/23/2010 | DE102006004192B4 Wärmeaustauschrohr und Verfahren zu dessen Herstellung Heat exchange tube and method for its production |
| 09/22/2010 | EP2230327A1 Diamond coating for cutting tool |
| 09/22/2010 | EP2229466A1 Plasma activated chemical vapour deposition method and apparatus therefor |
| 09/22/2010 | EP2229465A1 Method and apparatus for generating plasma |
| 09/22/2010 | EP2229276A1 Object having a ductile and corrosion resistant surface layer |
| 09/22/2010 | CN201587981U Plasma enhanced chemical vapor deposition equipment |
| 09/22/2010 | CN201587977U Film coating fixture for film coating machine |
| 09/22/2010 | CN1966761B Method for adding rare earth into rare earth modified coating in ion plating |
| 09/22/2010 | CN1934288B Plasma CVD equipment |
| 09/22/2010 | CN1906764B Gradient deposition of low-k cvd materials |
| 09/22/2010 | CN1804114B Thin film forming device and cleaning method thereof |
| 09/22/2010 | CN101842882A Liquid raw material vaporizer and film forming apparatus using the same |
| 09/22/2010 | CN101842880A Gas feeding device, treating device, treating method, and storage medium |
| 09/22/2010 | CN101842514A Method and apparatus for sealing an opening of a processing chamber |
| 09/22/2010 | CN101842193A Surface treatment method, showerhead, treatment container, and treatment apparatus using same |
| 09/22/2010 | CN101842168A AEROSOL JET tm printing system for photovoltaic applications |
| 09/22/2010 | CN101842166A Apparatus for anisotropic focusing |
| 09/22/2010 | CN101842165A Mechanically integrated and closely coupled print head and mist source |
| 09/22/2010 | CN101840761A Nano gamma-Fe2O3/SiO2 magnetic composite material with ultra-low friction and preparation method thereof |
| 09/22/2010 | CN101838808A Method for preparing graphite carbon-coated metal nanoparticles in air atmosphere |
| 09/22/2010 | CN101838801A Device and method for detecting drive screw of heater |
| 09/22/2010 | CN101838800A Device and method for processing surface of material by atmospheric-pressure micro-discharge plasma |
| 09/22/2010 | CN101838789A Method of reducing stress in coatings produced by physical vapour deposition |
| 09/22/2010 | CN101837486A Head-adjustable hard alloy ball-end milling cutter with TiN composite coating |
| 09/22/2010 | CN101459054B Plasma processing apparatus |
| 09/22/2010 | CN101241844B In-situ dry clean chamber for front end of line fabrication |
| 09/22/2010 | CN101223297B Apparatus for the PECVD deposition of an inner barrier layer on a container, comprising an optical plasma analysis device |
| 09/22/2010 | CN101178609B Method and device for adjusting the electrical power supply of a magnetron, and installation for treatment of thermoplastic containers applying same |
| 09/22/2010 | CN101170050B Cleaning method for reaction cavity room, forming method of protection film |
| 09/22/2010 | CN101162688B Plasma processing device and running processing method and method for manufacturing electric device |
| 09/22/2010 | CN101089223B Apparatus for effecting plasma chemical vapor deposition (pcvd)and method for preparing optical fiber |
| 09/21/2010 | US7800153 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries |
| 09/21/2010 | US7799705 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups |
| 09/21/2010 | US7799663 Fabrication of semiconductor metamaterials |
| 09/21/2010 | US7799377 Organic/inorganic thin film deposition method |
| 09/21/2010 | US7799376 plasma enhanced chemical vapor deposition using an SiH4-based precursor gas in the presence of phosphine as a dopant and argon as a carrier gas to deposite silicon film with a tensile stress; manufacture of microelectromechanical System |
| 09/21/2010 | US7799375 filling a substantial number of pores within porous silicon carbide preform with carbon precursor to produce filled silicon carbide preform, heating filled silicon carbide preform at carbonization temperature from 800-1800 degrees C. to produce carbonaceous porous structure within sic pores |
| 09/21/2010 | US7799374 providing substrate with metallic layer, defining holes in layer, oxidizing to form metallic oxide layer, removing portions of layer in holes to expose corresponding portions of metal layer, forming metal-salt catalyst layer on exposed portions of metal layer in holes, growing carbon nanotubes in holes |
| 09/21/2010 | US7799300 removing unreacted reactants present in gases removed from vapor phase reactors such as from atomic layer deposition by directing the excess reactant to contact a sacrificial material downstream of the substrate; diminishes the amount of waste and wear on equipment; semiconductor thin films |
| 09/21/2010 | US7799291 Apparatus for synthesis of ZnO nano-structured materials |
| 09/21/2010 | US7799163 Substrate-supported aligned carbon nanotube films |
| 09/21/2010 | US7799150 Container for increasing the shelf life of reactive nitrous oxide or nitric oxide gas with an internal metal surface that has been passivated by an oxidized silicon compound that has been exposed to a high concentration of the reactive gas before being filled with a much lower concentration of the gas |
| 09/21/2010 | US7799135 Reactor surface passivation through chemical deactivation |
| 09/21/2010 | US7799134 Shower plate having projections and plasma CVD apparatus using same |
| 09/21/2010 | US7798097 Plasma booster for plasma treatment installation |
| 09/21/2010 | US7798096 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool |
| 09/16/2010 | WO2010104152A1 Method of depositing amorphous hydrocarbon nitride (a-cn:hx) film, organic el device, and process for producing same |
| 09/16/2010 | WO2010104150A1 Vaporizer |
| 09/16/2010 | WO2010104122A1 Plasma processing apparatus |
| 09/16/2010 | WO2010104120A1 Plasma processing apparatus |
| 09/16/2010 | WO2010103953A1 Substrate processing apparatus, trap device, method for controlling substrate processing apparatus, and method for controlling trap device |
| 09/16/2010 | WO2010103930A1 Method for forming cvd-ru film and method for manufacturing semiconductor devices |
| 09/16/2010 | WO2010103893A1 Process for removing residual water molecules in process for producing metallic thin film, and purge solvent |
| 09/16/2010 | WO2010103881A1 Method for forming cu film and storage medium |
| 09/16/2010 | WO2010103880A1 METHOD FOR FORMING Cu FILM, AND STORAGE MEDIUM |
| 09/16/2010 | WO2010103879A1 METHOD FOR FORMING Cu FILM, AND STORAGE MEDIUM |
| 09/16/2010 | WO2010103846A1 Apparatus for processing exhaust gas and method for processing exhaust gas |
| 09/16/2010 | WO2010103751A1 Atomic layer deposition apparatus and thin film forming method |
| 09/16/2010 | WO2010103737A1 Epitaxial wafer for light emitting diode |
| 09/16/2010 | WO2010103732A1 Atomic layer deposition apparatus |
| 09/16/2010 | WO2010103487A1 Bubbling supply system for stable precursor supply |
| 09/16/2010 | US20100233879 Method for uniform nanoscale film deposition |
| 09/16/2010 | US20100233876 Film forming apparatus, film forming method, computer program and storage medium |