| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/05/2010 | US7806983 Substrate temperature control in an ALD reactor |
| 10/05/2010 | US7806982 Apparatus for fabricating electroluminescent display device |
| 10/05/2010 | US7806981 Method for the treatment of a web-type material in a plasma-assisted process |
| 10/05/2010 | US7806078 Plasma treatment apparatus |
| 10/05/2010 | US7806077 Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 10/05/2010 | CA2626870C Cooled device for plasma depositing a barrier layer onto a container |
| 10/05/2010 | CA2473450C Multifunctional particulate material, fluid, and composition |
| 09/30/2010 | WO2010111423A1 High temperature susceptor having improved processing uniformity |
| 09/30/2010 | WO2010111313A1 Chemical vapor deposition method |
| 09/30/2010 | WO2010110888A1 Quantum confinement solar cell fabriacated by atomic layer deposition |
| 09/30/2010 | WO2010110551A2 Chemical vapor deposition reactor for preparation of polysilicon |
| 09/30/2010 | WO2010110263A1 Method for forming metal nitride film, and storage medium |
| 09/30/2010 | WO2010110169A1 Mounting table structure and treatment device |
| 09/30/2010 | WO2010110158A1 Plasma processing apparatus and method for manufacturing photovoltaic element using same |
| 09/30/2010 | WO2010110080A1 Microwave plasma processing apparatus |
| 09/30/2010 | WO2010109915A1 Vapor deposition apparatus and vapor deposition method |
| 09/30/2010 | WO2010109750A1 Method for manufacturing sapphire substrate, and semiconductor device |
| 09/30/2010 | WO2010109076A1 Method and apparatus for coating |
| 09/30/2010 | WO2010090519A3 Origami sensor |
| 09/30/2010 | US20100249160 Cancer Treatment Method |
| 09/30/2010 | US20100248496 Rotatable and tunable heaters for semiconductor furnace |
| 09/30/2010 | US20100248490 Method and apparatus for reduction of voltage potential spike during dechucking |
| 09/30/2010 | US20100248458 Coating apparatus and coating method |
| 09/30/2010 | US20100248423 Delivery device comprising gas diffuser for thin film deposition |
| 09/30/2010 | US20100247975 Method for producing double-sided evaporation film, double-sided evaporation film intermediate, double-sided evaporation film and magnetic recording medium support |
| 09/30/2010 | US20100247952 Controlled oxidation of bond coat |
| 09/30/2010 | US20100247928 Coating apparatus and method |
| 09/30/2010 | US20100247806 Method of producing gas barrier layer |
| 09/30/2010 | US20100247805 Method and apparatus for forming silicon oxide film |
| 09/30/2010 | US20100247804 Biasable cooling pedestal |
| 09/30/2010 | US20100247803 Chemical vapor deposition method |
| 09/30/2010 | US20100247767 Gas delivery apparatus and method for atomic layer deposition |
| 09/30/2010 | US20100247766 Nozzle geometry for organic vapor jet printing |
| 09/30/2010 | US20100247765 Metal compound, material for chemical vapor phase growth, and process for forming metal-containing thin film |
| 09/30/2010 | US20100247764 Method For Surface Treatment of Ti-Al Alloy and Ti-Al Alloy Obtained by The Method |
| 09/30/2010 | US20100247763 Reaction chamber with removable liner |
| 09/30/2010 | US20100247747 Film Deposition Apparatus, Method for Depositing Film, and Method for Manufacturing Lighting Device |
| 09/30/2010 | US20100244311 Method and apparatus for manufacturing vitreous silica crucible |
| 09/30/2010 | US20100243999 Organic electronic device, organic electronic device manufacturing method, organic electronic device manufacturing apparatus, substrate processing system, protection film structure and storage medium with control program stored therein |
| 09/30/2010 | US20100243608 Plasma processing apparatus and plasma processing method |
| 09/30/2010 | US20100243437 Research-scale, cadmium telluride (cdte) device development platform |
| 09/30/2010 | US20100243427 Fabrication of low defectivity electrochromic devices |
| 09/30/2010 | US20100243165 Apparatus for surface-treating wafer using high-frequency inductively-coupled plasma |
| 09/30/2010 | US20100243164 Replaceable upper chamber section of plasma processing apparatus |
| 09/30/2010 | US20100243063 Vapour delivery system |
| 09/30/2010 | US20100243056 Layer for thin film photovoltaics and a solar cell made therefrom |
| 09/30/2010 | US20100242843 High temperature additive manufacturing systems for making near net shape airfoils leading edge protection, and tooling systems therewith |
| 09/30/2010 | US20100242842 Evaporation system |
| 09/30/2010 | US20100242835 High volume delivery system for gallium trichloride |
| 09/30/2010 | US20100242265 Thin film battery synthesis by directed vapor deposition |
| 09/30/2010 | DE102010000554A1 MOCVD-Reaktor mit einer örtlich verschieden an ein Wärmeableitorgan angekoppelten Deckenplatte MOCVD reactor with a different locally coupled to a Wärmeableitorgan ceiling plate |
| 09/29/2010 | EP2234149A1 System and process for conveying workpieces into a chamber |
| 09/29/2010 | EP2234143A1 A system and process for processing the substrate in the chamber |
| 09/29/2010 | EP2234142A1 Nitride semiconductor substrate |
| 09/29/2010 | EP2233607A1 Dielectric coated electrode, and plasma discharge apparatus using the electrode |
| 09/29/2010 | EP2233606A2 Plasma discharge apparatus |
| 09/29/2010 | EP2233605A1 Product comprising a metal oxide layer having a carbon content of from 0.1 to 5 % by weight, and optical film |
| 09/29/2010 | EP2233603A1 Method and apparatus |
| 09/29/2010 | EP2233602A2 DLC film and coated member |
| 09/29/2010 | EP2233491A1 Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film |
| 09/29/2010 | EP2232210A2 Euv light source components and methods for producing, using and refurbishing same |
| 09/29/2010 | EP2231898A2 Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materials |
| 09/29/2010 | EP2231897A1 An hvpe reactor arrangement |
| 09/29/2010 | EP2231896A2 Separate injection of reactive species in selective formation of films |
| 09/29/2010 | EP2231537A1 Method for increasing the durability of glass and a glass product |
| 09/29/2010 | EP2231536A1 Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating |
| 09/29/2010 | EP1876270B1 Method for growth of GaN single crystals |
| 09/29/2010 | CN201593063U Battery plate hanger box of plasma chemical vapor deposition device |
| 09/29/2010 | CN1917932B Method and apparatus for treating a fluorocompound-containing gas stream |
| 09/29/2010 | CN1898410B Deposition of titanium nitride film |
| 09/29/2010 | CN101849042A Apparatus for delivering precursor gases to an epitaxial growth substrate |
| 09/29/2010 | CN101849034A Method for fabricating an n-type semiconductor material using silane as a precursor |
| 09/29/2010 | CN101849033A Thin film forming apparatus and forming method for thin film |
| 09/29/2010 | CN101848917A Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film |
| 09/29/2010 | CN101847673A GaN-based LED epitaxial wafer and growing method thereof |
| 09/29/2010 | CN101847593A Transmission mechanism and wet process equipment equipped with same |
| 09/29/2010 | CN101847578A Method for growing semi-polar GaN based on Al2O3 substrate with m sides |
| 09/29/2010 | CN101845621A Large-area flat-plate type plasma reinforced chemical vapor deposition system |
| 09/29/2010 | CN101845620A Multi-cavity chemical vapor deposition p-i-n coating device by pulse heating |
| 09/29/2010 | CN101845619A Method for preparing ZnO nano needle arrays |
| 09/29/2010 | CN101845618A Manufacturing method of silicon nitride film window for imaging of X-ray microlens |
| 09/29/2010 | CN101844874A On-line film coating method of conductive glass and on-line film coating device |
| 09/29/2010 | CN101844873A On-line film coating method of conductive glass and on-line film coating device |
| 09/29/2010 | CN101469414B Reaction chamber structure of plate type plasma reinforced chemical vapor deposition apparatus |
| 09/29/2010 | CN101355008B Method for forming film |
| 09/29/2010 | CN101353785B Preparation of high-density carbon nano-tube array composite material |
| 09/29/2010 | CN101241840B Vacuum processing apparatus and method |
| 09/29/2010 | CN101231952B Method for forming SrTiO3 film |
| 09/29/2010 | CN101209833B Preparation of carbon nano-tube array |
| 09/29/2010 | CN101207061B Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 09/29/2010 | CN101180418B Method and system for improving coupling between a surface wave plasma source and a plasma space |
| 09/29/2010 | CN101133183B Method and system for coating sections of internal surfaces |
| 09/29/2010 | CN101109076B Device for depositing a coating on an internal surface of a container |
| 09/29/2010 | CN101096754B Shadow mask and method of fabricating organic light-emitting device using the same |
| 09/29/2010 | CN101023714B Plasma processing apparatus |
| 09/29/2010 | CN101023713B Plasma processing apparatus |
| 09/29/2010 | CN101010448B Constitutional member for semiconductor processing apparatus and method for producing same |
| 09/28/2010 | US7803433 Amorphous carbon film forming method and device |
| 09/28/2010 | US7803427 temporary protective layer (e.g. diamond-like carbon) is provided over a solar control coating so that the coated article can be protected from scratches during processing; temporary layer subsequently being burned off during heat treatment; making insulating glass (IG) window, windshields |
| 09/28/2010 | US7803426 Appliance having a container including a nanostructured material for hydrogen storage |