Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2010
10/12/2010US7811634 Controlled sulfur species deposition process
10/12/2010US7811633 forming an InSe thin film from a single precursor containing In and Se on ZnO or CdS substrate using Me2In ( mu SeMe)]2 as a single precursor containing indium (In) and selenium (Se) on a substrate by MOCVD (Me used herein refers to methyl, and mu represents double bridge bond), forming Cu2Se thin film
10/12/2010US7811632 growing a carbon nanotube includes the step of impinging a beam of carbon-containing molecules onto a substrate to grow carbon nanotube on the catalyst surface
10/12/2010US7811542 A three-dimensional network of intertwined, interconnected carbon nanotubes; macroscopic particle morphology with crosssection of < 1000 microns; multiwalls; oxidation resistance; heat resistance; easy dispersion in polymer matrices; high conductivity at low loads; electrical emitters
10/12/2010US7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system
10/12/2010US7811411 Thermal management of inductively coupled plasma reactors
10/12/2010US7811410 Matching circuit for a complex radio frequency (RF) waveform
10/12/2010US7811409 Bare aluminum baffles for resist stripping chambers
10/12/2010US7811384 Method and apparatus for treating substrates in a rotary installation
10/12/2010US7811374 Colored coating and formulation
10/12/2010US7810527 Container-treatment machine comprising controlled gripping means for seizing containers by the neck
10/12/2010US7810449 Plasma processing system with locally-efficient inductive plasma coupling
10/12/2010US7810448 Apparatus and method for the treating of workpieces
10/07/2010WO2010114386A1 Thin films containing molybdenum oxide
10/07/2010WO2010113946A1 Treatment device
10/07/2010WO2010113928A1 Method for forming silicon nitride film, method for manufacturing semiconductor memory device, and plasma cvd apparatus
10/07/2010WO2010113709A1 Plasma processing apparatus and method for manufacturing solar cell using same
10/07/2010WO2010113693A1 Gas barrier film, electronic device including same, gas barrier bag, and method for manufacturing gas barrier film
10/07/2010WO2010113423A1 Method for growing crystals of nitride semiconductor, and process for manufacture of semiconductor device
10/07/2010WO2010112339A1 Bodies coated by sic and method for creating sic-coated bodies
10/07/2010WO2009030438A3 Coated engine component for a gas turbine
10/07/2010US20100255684 Method for oxide film formation and apparatus for the method
10/07/2010US20100255683 Plasma processing apparatus
10/07/2010US20100255665 Plasma processing apparatus
10/07/2010US20100255662 Method for producing polycrystalline silicon germanium suitable for micromachining
10/07/2010US20100255658 Substrate reactor with adjustable injectors for mixing gases within reaction chamber
10/07/2010US20100255625 Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
10/07/2010US20100255387 Photo-activation of solid oxide fuel cells and gas separation devices
10/07/2010US20100255346 Coatings to inhibit formation of deposits from elevated temperature contact with hydrocarbons
10/07/2010US20100255345 Coated pcbn cutting insert, coated pcbn cutting tool using such coated pcbn cutting insert, and method for making the same
10/07/2010US20100255342 Metal Plating Using Seed Film
10/07/2010US20100255337 Multilayer Coatings
10/07/2010US20100255303 Multifunctional composites based on coated nanostructures
10/07/2010US20100255252 Nanostructure composite and method of producing the same
10/07/2010US20100255217 Method for forming a capacitor dielectric and method for manufacturing capacitor using the capacitor dielectric
10/07/2010US20100255216 Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
10/07/2010US20100255199 Alumina coating, coated product and method of making the same
10/07/2010US20100255198 Solid precursor-based delivery of fluid utilizing controlled solids morphology
10/07/2010US20100255197 Three-Dimensional Carbon Fibers and Method and Apparatus for their Production
10/07/2010US20100255196 Treatment system for flat substrates
10/07/2010US20100255194 Gradient fabrication to direct transport on a surface
10/07/2010US20100255181 Vapour delivery system
10/07/2010US20100255180 System and method for glazing
10/07/2010US20100255179 Systems and methods for printing electronic device assembly
10/07/2010US20100254886 Carbon Nanotube Particulates, Compositions and Use Thereof
10/07/2010US20100254885 Carbon Nanotubes Grown on Bulk Materials and Methods for Fabrication
10/07/2010US20100254063 Step down dechucking
10/07/2010US20100252532 Substrate replacing method and substrate processing apparatus
10/07/2010US20100252531 Enhanced Etch and Deposition Profile Control Using Plasma Sheath Engineering
10/07/2010US20100252199 Multifrequency capacitively coupled plasma etch chamber
10/07/2010US20100252197 Showerhead electrode with centering feature
10/07/2010US20100252067 Cleaning device and cleaning process for a plasma reactor
10/07/2010US20100252047 Remote fluorination of fibrous filter webs
10/07/2010DE102008063737A9 Verfahren zur Abscheidung von mikrokristallinem Silizium auf einem Substrat A method of depositing microcrystalline silicon on a substrate
10/06/2010EP2237357A1 Ionic electrolyte membrane structure, method for its production and solid oxide fuel cell making use of ionic electrolyte membrane structure
10/06/2010EP2237310A1 High frequency plasma cvd apparatus, high frequency plasma cvd method and semiconductor thin film manufacturing method
10/06/2010EP2236646A1 Method for fabricating semiconductor device
10/06/2010EP2236640A2 Multi-component coating deposition
10/06/2010EP2236548A2 Aliphatic polyester film and gas barrier film
10/06/2010EP2235748A2 High temperature vacuum chuck assembly
10/06/2010EP2235238A1 Method for producing group iii nitride-based compound semiconductor, wafer including group iii nitride-based compound semiconductor, and group iii nitride-based compound semiconductor device
10/06/2010EP2235232A2 Enhancing catalytic activity of nanoporous materials
10/06/2010EP2234941A1 Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom
10/06/2010EP2234759A1 Method for manufacturing an extremely hydrophobic surface
10/06/2010EP1411144B1 Method for forming ultra-high strength elastic diamond like carbon structure
10/06/2010EP1402316B1 Mask repair with electron beam-induced chemical etching
10/06/2010CN201598330U 一种等离子体化学气相沉积设备的运载小车 A plasma chemical vapor deposition apparatus carrying the trolley
10/06/2010CN1800446B Delivery device
10/06/2010CN1737193B Method of depositing noble metal electrode using oxidation-reduction reaction
10/06/2010CN1515018B Plasma processor
10/06/2010CN101855947A Plasma treatment device
10/06/2010CN101855719A Load lock apparatus and substrate cooling method
10/06/2010CN101855707A Plasma processing apparatus
10/06/2010CN101855698A Device for the plasma treatment of workpieces
10/06/2010CN101855385A Process for depositing boron compounds by CVD or PVD
10/06/2010CN101851749A Method for preparing vanadium nitride coating by using low-temperature flowing layer and device thereof
10/06/2010CN101851748A Full-automatic large panel PECVD silicon nitride tectorial membrane preparation system
10/06/2010CN101850944A Method for sedimentating silicon nitride thin film by using 13.56 MHz radio frequency power source
10/06/2010CN101562220B Process for manufacturing amorphous silicon thin film solar cell
10/06/2010CN101467233B Thin-film deposition apparatus using discharge electrode and solar cell fabrication method
10/06/2010CN101376966B Novel electrode box
10/06/2010CN101260519B Suction device for plasma coating chamber
10/06/2010CN101207174B 氮化物半导体衬底及其制造方法 The nitride semiconductor substrate and manufacturing method thereof
10/06/2010CN101207003B Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining
10/05/2010USRE41799 Chemical-vapor deposition of tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; coating glass at 450-650 degrees C. at high rates controlled emissivity, refractive index; wear resistance
10/05/2010US7808091 Wafer structure with discrete gettering material
10/05/2010US7807585 Method of fabricating a semiconductor device
10/05/2010US7807553 Substrate heating apparatus and semiconductor fabrication method
10/05/2010US7807494 Method for producing a chalcogenide-semiconductor layer of the ABC2 type with optical process monitoring
10/05/2010US7807234 Applying plasma processing to a semiconductor silicon substrate by microwaving in the presence of a mixture of inert gas and oxygen and nitrogen free radicals; oxynitriding to produce an insulation film where nitrogen has a higher concentration near the surface than at the interface with silicon
10/05/2010US7807233 Method of forming a TEOS cap layer at low temperature and reduced deposition rate
10/05/2010US7807225 High-density, plasma-enhanced chemical vapor deposition of thin f% of electrical thin films for integrated circuits, for example, liquid crystal displays; controlling optical properties by adjustment source amounts of starting materials and inductively coupled power source; low temperature; in-situ
10/05/2010US7807223 chemical intermediates has mix of open and cyclic ligands or direct bonds for chemical vapor deposition, atomic layer deposition; forming capacitor electrode barrier against oxygen diffusion; improve reactivity of process at low temperature, high quality
10/05/2010US7807222 Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
10/05/2010US7807220 Coating an abrasive of diamond or boron nitride with boron powder combined with boric acid and heating to 800-1200 degrees C. in an inert gas; matrix bonding; oxidation resistance; protective coatings; cutting, grinding or polishing tools; preferably, boron-coated abrasive particles
10/05/2010US7807213 Method and system for characterizing porous materials
10/05/2010US7807019 Radial antenna and plasma processing apparatus comprising the same
10/05/2010US7807006 blow molding or compression molding, enclosing an opening by means of a sulphonated plastic part, welded to the wall of the tank; impervious plastic accessories meets the fuel emission standards
10/05/2010US7806985 Vacuum device where power supply mechanism is mounted and power supply method
10/05/2010US7806984 Semiconductor or liquid crystal producing device
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