Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2010
11/02/2010US7824495 System to continuously produce carbon fiber via microwave assisted plasma processing
11/02/2010US7824492 Method of growing oxide thin films
11/02/2010US7823537 Plasma generator
11/02/2010CA2524643C Tool, especially cutting tool and method for the cvd deposition of a two phase layer on a substrate body
11/02/2010CA2452531C Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
10/2010
10/28/2010WO2010123666A2 Method and apparatus for growing a thin film onto a substrate
10/28/2010WO2010122972A1 Liquid raw material vaporizer
10/28/2010WO2010122742A1 Apparatus for forming thin film and method for forming thin film
10/28/2010WO2010122629A1 Method for forming metal oxide film, metal oxide film, and apparatus for forming metal oxide film
10/28/2010US20100274523 Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
10/28/2010US20100274176 Wound care system and bactericidal methods and devices
10/28/2010US20100273320 Device and method for selectively depositing crystalline layers using mocvd or hvpe
10/28/2010US20100272985 Method of forming self-assembly and uniform fullerene array on surface of substrate
10/28/2010US20100272977 Charge exchange device
10/28/2010US20100272922 Process for Improved Chemical Vapor Deposition of Polysilicon
10/28/2010US20100272895 Film deposition apparatus, film deposition method, storage medium, and gas supply apparatus
10/28/2010US20100272894 Method for simultaneously coating a plurality of workpieces
10/28/2010US20100272893 Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber
10/28/2010US20100272892 Film formation reactive apparatus and method for producing film-formed substrate
10/28/2010US20100272891 Apparatus and method for the production of carbon nanotubes on a continuously moving substrate
10/28/2010US20100272527 Method to attach or improve the attachment of articles
10/28/2010US20100270519 Thermochromic coatings ii
10/28/2010US20100269980 Plasma processing apparatus
10/28/2010US20100269755 Vapor deposition source and apparatus for producing organic el element
10/28/2010US20100269754 Polycrystalline silicon reactor
10/28/2010US20100269753 Method and apparatus for treating a gas stream
10/28/2010DE102009035411B3 Plasmastempel und Verfahren zur Plasmabehandlung einer Oberfläche Plasma temple and method for plasma treatment of a surface
10/28/2010DE102009002129A1 Hartstoffbeschichtete Körper und Verfahren zur Herstellung hartstoffbeschichteter Körper Hard-coated body and method for producing hard-material-coated body
10/27/2010EP2243859A1 Thin film forming method and thin film stack
10/27/2010EP2243858A1 Diamond-like carbon film forming apparatus and method for forming diamond-like carbon film
10/27/2010EP2242870A1 New metal precursors containing beta-diketiminato ligands
10/27/2010EP2242868A1 Vaporization apparatus with precise powder metering
10/27/2010EP2242867A2 A method of giving an article a coloured appearance and an article having a coloured appearance
10/27/2010EP2242731A1 A glass product and a method for manufacturing a glass product
10/27/2010EP2242603A2 Coated article with nanolayered coating scheme
10/27/2010EP1549781B1 Composite material
10/27/2010EP1415015B1 Method and device for the coating and blow moulding of a body
10/27/2010CN201614409U 腔门固定结构及具有该结构的密封腔体机构 Chamber door with a fixed structure and organization of the seal cavity structure
10/27/2010CN1985028B Common rack for electroplating and PVD coating operations
10/27/2010CN1961095B Method and apparatus of depositing low temperature inorganic films on large plastic substrates
10/27/2010CN1950542B Yield improvement in silicon-germanium epitaxial growth
10/27/2010CN1878888B Controlled vapor deposition of multilayered coatings adhered by an oxide layer
10/27/2010CN101874293A Method for plasma deposition and plasma CVD system
10/27/2010CN101872739A Groove filling method
10/27/2010CN101872719A Epitaxial growth method for improving In component uniformity of InGaN quantum well
10/27/2010CN101871099A Plasma uniformity control by gas diffuser curvature
10/27/2010CN101871098A Growing method of high-crystal quality high-resistance GaN epitaxial layer
10/27/2010CN101871097A Simple preparation method of compact PbSe polycrystal film
10/27/2010CN101871096A Methods and apparatuses for transferring articles through a load lock chamber under vacuum
10/27/2010CN101871095A Multifunctional film-coating production line for panel display material
10/27/2010CN101870191A Novel material intaglio roller
10/27/2010CN101870003A Hard alloy coated tool for milling steel and stainless steel
10/27/2010CN101869903A Systems and methods for capture substrates
10/27/2010CN101179005B Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof
10/26/2010US7820564 Fabric with a moistureproof, dustproof and antibacterial function
10/26/2010US7820460 Patterned assembly for manufacturing a solar cell and a method thereof
10/26/2010US7820245 Method of synthesizing single-wall carbon nanotubes
10/26/2010US7820244 Method of forming a layer and method of removing reaction by-products
10/26/2010US7820231 superior uniformity in electroluminescence( EL) layer film thickness, superior throughput, and improved utilization efficiency of EL materials
10/26/2010US7820230 An amount of leakage of a substrate-cooling gas into a vacuum container is measured by a flow-rate measuring device so that flow rate of a diluting gas that is the same as the substrate-cooling gas is controlled by a controller or a plasma doping time is prolonged, in accordance with amount of leakage
10/26/2010US7820016 attaching a container to a plate through a first container fixing hole by screwing a first screw; less tightly attached through the second container fixing hole to the plate, and allow the sputtering apparatus expands by heat; semiconductor wafers or liquid crystal panels
10/26/2010US7819975 Deposition method and apparatus
10/26/2010US7819082 Plasma processing apparatus
10/26/2010US7819081 Plasma film forming system
10/26/2010CA2551722C High throughput physical vapor deposition system for material combinatorial studies
10/26/2010CA2424269C Supported tungsten carbide material
10/21/2010WO2010120275A2 Menthol-derivative compounds and use thereof as oral and systemic active agents
10/21/2010WO2010119833A1 Method for producing silicon epitaxial wafer
10/21/2010WO2010119827A1 Diazasilacyclopentene derivative, method for producing same, and method for producing silicon-containing thin film
10/21/2010WO2010119792A1 Substrate, substrate provided with thin film, semiconductor device, and method for manufacturing semiconductor device
10/21/2010WO2010119578A1 Method for manufacturing gas barrier thin film-coated plastic container
10/21/2010WO2010119430A1 Reaction chamber of an epitaxial reactor and reactor that uses said chamber
10/21/2010WO2010119263A1 Material having a low dielectric konstant and method of making the same
10/21/2010WO2010118640A1 Method and apparatus for preparing thin films using continuous liquid phase epitaxy
10/21/2010WO2010098875A3 Ald systems and methods
10/21/2010US20100267303 Hydrophobic surface finish and method of application
10/21/2010US20100267245 High efficiency epitaxial chemical vapor deposition (cvd) reactor
10/21/2010US20100267231 Apparatus for uv damage repair of low k films prior to copper barrier deposition
10/21/2010US20100267203 Method for isolating flexible film from support substrate
10/21/2010US20100267195 Methods Of Forming Phase Change Materials And Methods Of Forming Phase Change Memory Circuitry
10/21/2010US20100266868 Nickel thin film, method for formation of the nickel thin film, ferromagnetic nano-junction element, method for producing the ferromagnetic nano-junction element, thin metallic wire, and method for formation of the thin metallic wire
10/21/2010US20100266866 Method of metal coating and coating produced thereby
10/21/2010US20100266781 Structural Components for Oil, Gas, Exploration, Refining and Petrochemical Applications
10/21/2010US20100266765 Method and apparatus for growing a thin film onto a substrate
10/21/2010US20100266762 Processes and an apparatus for manufacturing high purity polysilicon
10/21/2010US20100266761 Method for manufacturing an extremely hydrophobic surface
10/21/2010US20100266751 Process for producing zirconium oxide thin films
10/21/2010US20100266748 Method for preparing a deposition from a vapour
10/21/2010US20100266466 Reactor with silicide-coated metal surfaces
10/21/2010US20100266461 Method For Reducing Pressure Drop Through Filters, And Filter Exhibiting Reduced Pressure Drop
10/21/2010US20100266419 Engine component for a gas turbine
10/21/2010US20100266409 Method for Coating a Blade and Blade of a Gas Turbine
10/21/2010US20100264130 Top plate for cooking appliance and process for producing the same
10/21/2010US20100264118 Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus
10/21/2010US20100264117 Plasma processing system and plasma processing method
10/21/2010US20100264115 Placing bed structure, treating apparatus using the structure, and method for using the apparatus
10/21/2010US20100263908 Method for fabrication of conductive film using conductive frame and conductive film
10/21/2010US20100263797 Plasma processing apparatus
10/21/2010US20100263796 Plasma Processing Apparatus
10/21/2010US20100263795 Device for processing welding wire
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