Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2010
10/21/2010US20100263594 Substrate processing apparatus
10/21/2010US20100263593 Substrate processing apparatus and reaction container
10/21/2010US20100263592 Plasma processing chamber with a grounded electrode assembly
10/21/2010US20100263588 Methods and apparatus for epitaxial growth of semiconductor materials
10/21/2010DE19708808B4 Verfahren und Vorrichtung zum Aufbringen von transparenten Schutzschichten auf Gegenstände Method and apparatus for applying transparent protective coatings on objects
10/21/2010CA2757425A1 Menthol-derivative compounds and use thereof as oral and systemic active agents
10/21/2010CA2747776A1 Substrate, substrate with thin film, semiconductor device, and method of manufacturing semiconductor device
10/20/2010EP2242111A1 Process for producing solar battery element and solar battery element
10/20/2010EP2242092A1 Plasma processing method and plasma processing system
10/20/2010EP2241651A1 Plasma processing apparatus
10/20/2010EP2240623A1 Low thermal conductivity, cmas-resistant thermal barrier coatings
10/20/2010CN1841654B Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same
10/20/2010CN101868848A Method for fabricating p-type gallium nitride-based semiconductor, method for fabricating nitride-based semiconductor element, and method for fabricating epitaxial wafer
10/20/2010CN101866834A Method for preparing SiGe material of high-Ge component by low temperature reduced pressure chemical vapor deposition and selective epitaxy
10/20/2010CN101866833A Silicon epitaxy method for filling groove
10/20/2010CN101864568A Method for preparing high-orientation PZT piezoelectric thin film
10/20/2010CN101864562A Method for preparing oxide surface on metal medical appliance by Atomic Layer Deposition (ALD) technology
10/20/2010CN101864561A Technology for shaping antireflection coating on inner wall of cover glass tube
10/20/2010CN101864560A High power microwave plasma diamond film deposition device
10/20/2010CN101864554A Hard alloy blade for improving cutting edge structure
10/20/2010CN101864553A Integrated manufacturing method of microminiature parts based on surface coating
10/20/2010CN101864552A Mask frame assembly for thin film deposition and associated methods
10/20/2010CN101863667A Ceramics and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
10/20/2010CN101487114B Low temperature polysilicon thin-film device and method of manufacturing the same
10/20/2010CN101409234B Semiconductor structure and manufacture method thereof
10/20/2010CN101120116B Method for the densification of thin porous substrates by means of vapour phase chemical infiltration and device for loading such substrates
10/20/2010CN101098981B Winding plasma cvd apparatus
10/19/2010US7816549 Metal-containing compound, its production method, metal-containing thin film, and its formation method
10/19/2010US7816280 Semiconductor device, semiconductor wafer, and methods of producing the same device and wafer
10/19/2010US7816272 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device
10/19/2010US7815970 Controlled polarity group III-nitride films and methods of preparing such films
10/19/2010US7815969 Preparing matrix with geometrical shape, synthesizing diamond film on matrix by CVD to form diamond/matrix composite, composite being partially uncoated with diamond film to have an opening site, etching matrix of partially covered composite through opening site to obtain hollow diamond shell; biochips
10/19/2010US7815922 Articles having bioactive surfaces and solvent-free methods of preparation thereof
10/19/2010US7815767 Plasma processing apparatus
10/19/2010US7815740 Substrate mounting table, substrate processing apparatus and substrate processing method
10/19/2010US7815739 Vertical batch processing apparatus
10/19/2010US7815738 Deposition tool cleaning process having a moving plasma zone
10/19/2010US7815737 Source for thermal physical vapor deposition of organic electroluminescent layers
10/19/2010US7815735 Body having a smooth diamond layer, device and method therefor
10/19/2010US7814796 Partial pressure measuring method and partial pressure measuring apparatus
10/19/2010CA2433907C A method of making a continuous coating on the surface of a part
10/14/2010WO2010118109A2 Strontium ruthenium oxide interface
10/14/2010WO2010118051A2 Semiconductor processing reactor and components thereof
10/14/2010WO2010117638A1 Recovery of monobutyltin trichloride
10/14/2010WO2010117046A1 Gas-barrier multilayer film
10/14/2010WO2010116889A1 Method for forming manganese oxide film, method for manufacturing semiconductor device, and semiconductor device
10/14/2010WO2010116034A1 Structure comprising at least one reflecting thin film on a surface of a macroscopic object, method for fabricating a structure, and uses for the same
10/14/2010WO2010115902A1 Photovoltaic cell deposition with minimized gas usage
10/14/2010WO2010115734A1 Process for the manufacture of etched items
10/14/2010WO2010065966A3 High rate deposition of thin films with improved barrier layer properties
10/14/2010US20100261354 Gasket with positioning feature for clamped monolithic showerhead electrode
10/14/2010US20100261058 Composite materials containing metallized carbon nanotubes and nanofibers
10/14/2010US20100261017 Method of producing gas barrier laminate and gas barrier laminate obtained
10/14/2010US20100260994 substrate coated with amorphous hydrogenated carbon
10/14/2010US20100260946 Nanostructure arrays and fabrication methods therefor
10/14/2010US20100260944 Method for forming silicon dots
10/14/2010US20100260940 System and method for depositing metallic coatings on substrates using removable masking materials
10/14/2010US20100260936 Substrate processing apparatus, substrate processing method, and computer-readable storage medium
10/14/2010US20100260935 Film deposition apparatus, film deposition method, and computer readable storage medium
10/14/2010US20100260934 Perfluoroparacyclophane and related methods therefor
10/14/2010US20100260933 Apparatus and method for the production of carbon nanotubes on a continuously moving substrate
10/14/2010US20100260931 Method and apparatus for using a vertical furnace to infuse carbon nanotubes to fiber
10/14/2010US20100260589 Substrate supporting means having wire and apparatus using the same
10/14/2010US20100259162 Film forming device control method, film forming method, film forming device, organic el electronic device, and recording medium storing its control program
10/14/2010US20100258530 Substrate processing apparatus and producing method of device
10/14/2010US20100258529 Plasma Processing Apparatus and Plasma Processing Method
10/14/2010US20100258526 Methods of forming an amorphous carbon layer and methods of forming a pattern using the same
10/14/2010US20100258053 Apparatus for delivering precursor gases to an epitaxial growth substrate
10/14/2010US20100258052 Hvpe precursor source hardware
10/14/2010DE202004021765U1 Gegenbahngelenk mit Bahnwendepunkt Counter track joint with web turning point
10/14/2010DE102009015196A1 Clamping and contacting device for mounting and electrically contacting thin silicon rods in silicon deposition reactors, comprises rod holder to receive thin silicon rod in freely standing manner, and contact elements at the rod holder
10/13/2010EP2239477A1 Opposed path joint with path turning point
10/13/2010EP2239353A1 Photovoltaic cell deposition with minimized gas usage
10/13/2010EP2238277A2 Low wet etch rate silicon nitride film
10/13/2010EP2238276A1 Lock device for adding and removing containers to and from a vacuum treatment chamber
10/13/2010EP2238275A2 Multi-pass vacuum coating systems
10/13/2010EP1614770B1 Microwave plasma processing method
10/13/2010EP1129466B1 Device and method for generating a local plasma by micro-structure electrode discharges with microwaves
10/13/2010CN201605320U 用于生产镜片的真空镀膜机循环冷却装置 Vacuum coating machine cycle cooling device for the production of lenses
10/13/2010CN201605315U 真空镀膜硅醚罐的水浴加热装置 Silicon ether canister vacuum coating bath heating device
10/13/2010CN1961093B Method for the production of an ultra barrier layer system
10/13/2010CN1718398B Die for forming honeycomb structure, and method of manufacturing the same
10/13/2010CN101861641A Plasma processing apparatus and method for plasma processing semiconductor substrate
10/13/2010CN101859702A Oxide-nitride-oxide stack containing a plurality of oxynitrides layers
10/13/2010CN101859699A Polycrystalline silicon deposition process
10/13/2010CN101859694A Film forming apparatus and film forming method
10/13/2010CN101857953A Face feed electrode for thin-film solar cell deposition
10/13/2010CN101857952A Reaction chamber heating system of vapor phase deposition device
10/13/2010CN101856895A Diamond film coating steel matrix composite material and preparation method thereof
10/13/2010CN101541111B U-shaped heating element of silicon tetrachloride hydrogenation furnace and manufacturing process thereof
10/13/2010CN101509129B Integral structure body of film forming groove upper cap and show head
10/13/2010CN101300373B Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a PET hollow body
10/13/2010CN101283456B Manufacturing method of group III-V nitride semiconductor and manufacturing method of lighting device
10/13/2010CN101217110B Group III nitride semiconductor substrate and its manufacturing method
10/13/2010CN101140884B Film formation method and apparatus for semiconductor process
10/13/2010CN101115864B Layered thin film structure, layered thin film forming method, film forming system and storage medium
10/13/2010CN101001978B Susceptor
10/12/2010US7812285 Apparatus and method for heating substrate and coating and developing system
10/12/2010US7811944 Semiconductor device and a method of manufacture therefor
10/12/2010US7811669 Gas barrier laminated film and process for producing the same
1 ... 175 176 177 178 179 180 181 182 183 184 185 186 187 188 189 190 191 192 193 194 195 ... 719