Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2010
11/10/2010CN101048029B Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
11/09/2010US7831135 Method and system for controlling bake plate temperature in a semiconductor processing chamber
11/09/2010US7829913 Porous substrate and its manufacturing method, and gan semiconductor multilayer substrate and its manufacturing method
11/09/2010US7829353 Pulsed mass flow delivery system and method
11/09/2010US7829183 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
11/09/2010US7829158 forming a tantalum containing multilayer film, using a radio frequency power to perform plasma enhanced atomic layer deposition; semiconductor integrated circuit; forming tantalum, tantalum nitride, tantalum carbonitride
11/09/2010US7829157 Methods of making multilayered, hydrogen-containing thermite structures
11/09/2010US7829150 Growth of inorganic thin films using self-assembled monolayers as nucleation sites
11/09/2010US7829145 delivering a processing gas into a chemical vapor deposition chamber through a first gas pathway that includes flow through a first apertures in a blocker plate, reacting the gases to deposit a layer on a substrate, now a etching gas ( F2, CHCL3) is delivered through second aperture to etch the deposit
11/09/2010US7829144 Method of forming a metal film for electrode
11/09/2010US7829143 exposing the solvent soluble organic film ( polyethylene terephthalate insulating film or polythiophenes, polyarylenevinylenes electroconductive films) to a vapor of a solvent (chloroform) for a period of time sufficient to render at least an outermost portion of the organic film insoluble in the solvent
11/09/2010US7828928 Vacuum processing apparatus
11/09/2010US7828927 Plasma processing device
11/09/2010US7828900 Vacuum film-forming apparatus
11/09/2010US7828899 In-line, pass-by system and method for disc vapor lubrication
11/09/2010US7828898 CVD apparatus of improved in-plane uniformity
11/09/2010US7828274 Method and apparatus to help promote contact of gas with vaporized material
11/09/2010US7827932 Vaporizer and processor
11/09/2010US7827931 Plasma processor electrode and plasma processor
11/04/2010WO2010126274A2 Cigt thin film and method for fabricating same
11/04/2010WO2010126080A1 Method for forming semiconductor film and method for manufacturing photoelectric conversion device
11/04/2010WO2010125995A1 Plasma processing method and plasma processing apparatus
11/04/2010WO2010125926A1 Antifouling laminate
11/04/2010WO2010125918A1 Semiconductor heat treatment member comprising sic film
11/04/2010WO2010125850A1 Method for fabricating wafer products and method for fabricating gallium nitride semiconductor photonic elements
11/04/2010WO2010125821A1 Method of deposition of chemical compound semiconductor and device
11/04/2010WO2010124979A1 Optoelectronic component and method for the production thereof
11/04/2010WO2010081959A3 Organometallic complexes for chemical vapour deposition of platinum
11/04/2010US20100279569 Cnt-infused glass fiber materials and process therefor
11/04/2010US20100279513 Systems and Methods for Nanowire Growth and Manufacturing
11/04/2010US20100279093 Coated article
11/04/2010US20100279092 Multiple-layer film and method for manufacturnig the same
11/04/2010US20100279011 Novel bismuth precursors for cvd/ald of thin films
11/04/2010US20100279010 Method and system for close proximity catalysis for carbon nanotube synthesis
11/04/2010US20100279009 Process for the continuous production of aligned carbon nanotubes
11/04/2010US20100279008 Film deposition apparatus and film deposition method
11/04/2010US20100278999 Plasma process apparatus and plasma process method
11/04/2010US20100278717 Method and apparatus for manufacturing carbon nanotube
11/04/2010US20100276607 Method of depositing protective structures
11/04/2010US20100276084 Plasma processing equipment and gas distribution apparatus thereof
11/04/2010US20100276047 Wear resistant coating for interface of wheel rim and tire
11/04/2010US20100276002 Process and apparatus for producing polysilicon sheets
11/04/2010US20100275848 Heat treatment apparatus
11/04/2010US20100275847 Dlc film coated plastic container, and device and method for manufacturing the plastic container
11/04/2010US20100275846 Plasma processing method, plasma processing apparatus, and computer recording medium
11/04/2010US20100275845 Ultraviolet-resistant materials and devices and systems including same
11/04/2010US20100275844 Deposition apparatus
11/04/2010US20100275843 hvpe reactor arrangement
11/04/2010US20100275842 Evaporating apparatus
11/04/2010DE112008002629T5 Hartmetallwerkzeug für die Mikrobearbeitung Carbide tool for micromachining
11/04/2010DE102009019422A1 Generating plasma by magnetron, comprises supplying electrical energy in pulse form to magnetron, changing strength of electric field maintaining magnetron discharge, and changing strength of magnetic field penetrating through magnetron
11/04/2010DE102009018874A1 Powdery electrode material consists of nickel, oxygen and/or hydrogen, or tetravalent nickel oxide, alkali metal, transition metals such as cobalt, vanadium, tungsten, iridium, tantalum and/or chromium and impurities
11/04/2010DE102009002718A1 Corrosion-protective coating of metal strip, comprises applying an organic coating containing a metal compound and/or a metallic pigment on the metal surface, and optionally initially cleaning and degreasing the metal surface
11/03/2010EP2246896A1 Diamond uv sensor element and manufacturing method thereof, uv sensor device, diamond single crystal processing method
11/03/2010EP2246462A1 Iii-group nitride single-crystal ingot, iii-group nitride single-crystal substrate, method for manufacturing iii-group nitride single-crystal ingot, and method for manufacturing iii-group nitride single-crystal substrate
11/03/2010EP2246452A1 Alloy to be surface-coated and sliding members
11/03/2010EP2245211A2 Susceptor with support bosses
11/03/2010EP2245210A1 Coating components of an internal combustion engine for reducing friction, wear, and adhesion tendency
11/03/2010EP2245207A1 Reel-to-reel reaction of a precursor film to form solar cell absorber
11/03/2010EP2245096A2 Cmas-resistant thermal barrier coatings
11/03/2010EP1613791B1 Methods and apparatus for controlling formation of deposits
11/03/2010CN201620191U Lower-pressure chemical deposition equipment for depositing high-temperature oxide
11/03/2010CN201620190U Rubber plug half-coating clamping plate
11/03/2010CN201618638U Metal organic source atomizer for preparing semiconductor material
11/03/2010CN1957447B III nitride semiconductor crystal and manufacturing method thereof, III nitride semiconductor device and manufacturing method thereof, and light emitting device
11/03/2010CN1916233B Organic metal compound supplying container
11/03/2010CN1875483B Process for forming a dielectric on a copper-containing metallization and capacitor arrangement
11/03/2010CN1863938B Polysulfide thermal vapour source for thin sulfide film deposition
11/03/2010CN101878323A A device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device
11/03/2010CN101878322A Plasma-deposited barrier coating including at least three layers, method for obtaining one such coating and container coated with same
11/03/2010CN101878320A Frame-based vacuum chamber for coating systems
11/03/2010CN101877304A Plasma process apparatus and plasma process method
11/03/2010CN101876580A Detection device of quartz tube in cell coating equipment and application method thereof
11/03/2010CN101876075A Preparation method and device thereof of surface structuration composite coating
11/03/2010CN101876066A Method and device for configuring number of carrying plates of production line device
11/03/2010CN101876065A Method for modifying inner surface of slender insulating tube by utilizing plasma discharge under normal pressure
11/03/2010CN101876064A Gas transport and deposition growing system of cadmium telluride thin film solar cell
11/03/2010CN101609861B Manufacturing process for laminated-silicon thin film solar cell
11/03/2010CN101405845B Surface processing apparatus
11/03/2010CN101378029B Dual-electrode electrostatic chuck
11/03/2010CN101356620B Apparatus and method for processing substrate
11/03/2010CN101328579B Hvpe showerhead design
11/03/2010CN101294278B Source air supplying device
11/03/2010CN101207006B Vertical type heat processing apparatus and vertical type heating method
11/03/2010CN101163818B Reactor
11/03/2010CN101130861B Tin phosphate barrier film, method and apparatus
11/02/2010US7826724 Electronic substrate non-contact heating system and method
11/02/2010US7825569 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element
11/02/2010US7825042 Very low dielectric constant plasma-enhanced CVD films
11/02/2010US7824976 Semiconductor apparatus and method of manufacturing the semiconductor apparatus
11/02/2010US7824772 Anti-etch layer comprises zirconium oxycarbide
11/02/2010US7824744 Process and apparatus for depositing a ceramic coating
11/02/2010US7824733 Wear-resistant coating and process for producing it
11/02/2010US7824649 Apparatus and method for synthesizing a single-wall carbon nanotube array
11/02/2010US7824648 Line mark(s)transversely extending across the carbon nanotubes (CNT); parallel and nonuniformly-spaced; used to control growth of CNT when making arrays using chemical vapor deposition; distinguishing the growth mode - starting/stopping; measuring growth rates at different temperatures
11/02/2010US7824520 Plasma treatment apparatus
11/02/2010US7824519 Variable volume plasma processing chamber and associated methods
11/02/2010US7824498 Coating for reducing contamination of substrates during processing
11/02/2010US7824497 Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
11/02/2010US7824496 Container, container producing method, substrate processing device, and semiconductor device producing method
1 ... 173 174 175 176 177 178 179 180 181 182 183 184 185 186 187 188 189 190 191 192 193 ... 719