| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 11/24/2010 | CN201648518U Plate PECVD silicon nitride covering film system |
| 11/24/2010 | CN1891859B Method for forming silicon oxynitride film |
| 11/24/2010 | CN1798865B Method for forming thin film and article with thin film |
| 11/24/2010 | CN101897016A Semiconductor device manufacturing method, semiconductor device, electronic device, semiconductor manufacturing apparatus and storage medium |
| 11/24/2010 | CN101897005A High frequency plasma CVD apparatus, high frequency plasma CVD method and semiconductor thin film manufacturing method |
| 11/24/2010 | CN101896639A An HVPE reactor arrangement |
| 11/24/2010 | CN101896638A Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing |
| 11/24/2010 | CN101896637A Showerhead electrode assemblies and plasma processing chambers incorporating the same |
| 11/24/2010 | CN101896301A Coated article with nanolayered coating scheme |
| 11/24/2010 | CN101894853A Phase change random access memory and manufacturing method |
| 11/24/2010 | CN101894803A Method for protecting high-temperature silica quality on top of ONO layer of SONOS flash memory |
| 11/24/2010 | CN101894802A Flash memory and manufacturing method thereof |
| 11/24/2010 | CN101894737A Control method of cavity environment |
| 11/24/2010 | CN101893879A Method and system for carrier plate transmission control of plasma chemical vapor deposition equipment |
| 11/24/2010 | CN101892467A Integrating multi-reaction chamber flow process epitaxial growth method and system |
| 11/24/2010 | CN101892466A Offline large-area coating film production line |
| 11/24/2010 | CN101892465A Quickly-changed silicon chip film-coated single-faced hanging hook assembly and mounting method thereof |
| 11/24/2010 | CN101892464A Preparation and application of ZnO thin film with flexible substrate suede structure |
| 11/24/2010 | CN101355010B Air-intake installation and reaction chamber |
| 11/24/2010 | CN101288157B Substrate processing apparatus and substrate processing method |
| 11/24/2010 | CN101271859B Plasma processing apparatus and structure therein |
| 11/24/2010 | CN101213497B Reinforced micromechanical part |
| 11/23/2010 | US7838457 vapor deposition while vibrating the conductive powder to form a uniformly coatings with a catalytic substance; electrode for hydrogen decomposition as a constituent of a fuel cell |
| 11/23/2010 | US7838086 gas flows through gap adjacent to confinement ring to provide physical confinement of plasma |
| 11/23/2010 | US7838085 generating plasma that includes ions of coating material to be deposited on surfaces of workpiece, securing using support, increasing ionization of said plasma within workpiece by applying hollow cathode techniques, including biasing and tuning pressure to induce oscillation of electrons |
| 11/23/2010 | US7838084 Chemisorbtion to form a monolayer on substrate within the deposition chamber from gaseous precursor; contacting with remote plasma oxygen or ozone and with remote plasma nitrogen; oxidation; forming porous silica, alumina, tin oxide, indium oxide and/or indium tin oxide from precursors |
| 11/23/2010 | US7838073 Tantalum amide complexes for depositing tantalum-containing films, and method of making same |
| 11/23/2010 | US7838072 adaptive real time thermal processing system including multivariable controller; includes creating dynamic model and incorporating virtual sensors therein; chemisorption |
| 11/23/2010 | US7837843 Fixture for use in a coating operation |
| 11/23/2010 | US7837828 Substrate supporting structure for semiconductor processing, and plasma processing device |
| 11/23/2010 | US7837826 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof |
| 11/23/2010 | US7837806 Making a storage stable acid gas standard for use in detectors and calibration of measurements of this regulated pollutant; reacting a silane compound with an oxygen compound on a metal container to form passivation coating |
| 11/23/2010 | US7837799 Arrangement for transporting a flat substrate in a vacuum chamber |
| 11/23/2010 | US7837798 Semiconductor processing apparatus with a heat resistant hermetically sealed substrate support |
| 11/23/2010 | US7837797 Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition |
| 11/23/2010 | US7837796 Process chamber, inline coating installation and method for treating a substrate |
| 11/23/2010 | US7837795 Low temperature load and bake |
| 11/23/2010 | US7837528 Evaporation mask, method of fabricating organic electroluminescent device using the same, and organic electroluminescent device |
| 11/23/2010 | US7837383 Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing |
| 11/23/2010 | CA2469330C Method and installation for treating flue gas containing hydrocarbons |
| 11/18/2010 | WO2010132611A2 Textured metal nanopetals |
| 11/18/2010 | WO2010132591A2 Pecvd coating using an organosilicon precursor |
| 11/18/2010 | WO2010132585A2 Vessel processing |
| 11/18/2010 | WO2010132581A2 Vessel coating and inspection |
| 11/18/2010 | WO2010132579A2 Vessel processing |
| 11/18/2010 | WO2010132424A2 Corrosion protection and lubrication of mems devices |
| 11/18/2010 | WO2010132172A2 Method for tuning a deposition rate during an atomic layer deposition process |
| 11/18/2010 | WO2010131366A1 Surface wave plasma cvd apparatus and film forming method |
| 11/18/2010 | WO2010131365A1 Surface wave plasma cvd apparatus and film forming method |
| 11/18/2010 | WO2010105585A8 Substrate processing system and substrate processing method |
| 11/18/2010 | WO2010090504A3 Apparatus for vacuum coating |
| 11/18/2010 | WO2009042051A3 Process for depositing organic materials |
| 11/18/2010 | US20100292757 Method and device for plasma-supported surface treatment |
| 11/18/2010 | US20100292030 Transport system for golf balls through plasma field |
| 11/18/2010 | US20100291408 Nanostructures including a metal |
| 11/18/2010 | US20100291328 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture |
| 11/18/2010 | US20100291319 Plasma processing apparatus and plasma processing method |
| 11/18/2010 | US20100291308 Web Substrate Deposition System |
| 11/18/2010 | US20100291299 Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition |
| 11/18/2010 | US20100291298 Methods of Preparing Metal Carbides |
| 11/18/2010 | US20100291297 Method for forming catalyst layer for carbon nanostructure growth, liquid for catalyst layer formation, and process for... |
| 11/18/2010 | US20100291169 Polyelectrolyte Complex for Imparting Antimicrobial Properties to a Substrate |
| 11/18/2010 | US20100290945 Solution based zirconium precursors for atomic layer deposition |
| 11/18/2010 | US20100290323 Near-field light generating device including near-field light generating element with edge part opposed to waveguide |
| 11/18/2010 | US20100290021 Optical element for reflection of uv radiation, method for manufacturing the same and projection exposure apparatus comprising the same |
| 11/18/2010 | US20100289384 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element |
| 11/18/2010 | US20100288730 Vacuum Processing Apparatus And Vacuum Processing Method Using The Same |
| 11/18/2010 | US20100288728 Apparatus and method for processing substrate |
| 11/18/2010 | US20100288439 Top plate and plasma process apparatus employing the same |
| 11/18/2010 | US20100288316 Household Device Having an Improved Shaft |
| 11/18/2010 | US20100288197 Anodized showerhead |
| 11/18/2010 | US20100288195 Plasma processing method and apparatus |
| 11/18/2010 | CA2761872A1 Pecvd coating using an organosilicon precursor |
| 11/17/2010 | EP2251899A1 Dielectric barrier deposition using nitrogen containing precursor |
| 11/17/2010 | EP2251898A1 Atomic layer deposition apparatus and atomic layer deposition method |
| 11/17/2010 | EP2251455A2 PECVD coating using an organosilicon precursor |
| 11/17/2010 | EP2251454A2 Vessel coating and inspection |
| 11/17/2010 | EP2251453A2 Vessel holder |
| 11/17/2010 | EP2251452A2 Vessel processing |
| 11/17/2010 | EP2251451A1 Raw material supplying device |
| 11/17/2010 | EP2251450A1 Method for applying a multi-layer coating structure onto a substrate and substrate with a multi-layer coating structure |
| 11/17/2010 | EP2251122A1 Surface coated member and cutting tool |
| 11/17/2010 | EP2250299A1 Body coated with hard material |
| 11/17/2010 | EP2250298A1 Method and system for depositing a metal or metalloid on carbon nanotubes |
| 11/17/2010 | EP2179073B1 Al-Ti-Ru-N-C HARD MATERIAL COATING |
| 11/17/2010 | EP1466031B1 Method and installation for the densification of substrates by means of chemical vapour infiltration |
| 11/17/2010 | EP1434896B1 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 11/17/2010 | EP1405333B1 Wafer boat and method of making a slip free wafer boat |
| 11/17/2010 | EP1371087B1 A device for epitaxially growing objects by cvd |
| 11/17/2010 | EP1021590B1 A method of depositing an electrocatalyst and electrodes formed by such method |
| 11/17/2010 | EP0914496B1 Microwave applicator for an electron cyclotron resonance plasma source |
| 11/17/2010 | CN201634762U Gas flow controller of deposition system |
| 11/17/2010 | CN201634761U Sprayer for organic metallic chemical vapor deposition equipment |
| 11/17/2010 | CN201634760U MOCVD (Metal Organic Chemical Vapor Deposition) reactor separated from heater and provided with rotary substrate |
| 11/17/2010 | CN101889104A Coated article |
| 11/17/2010 | CN101888736A Gas distributor and apparatus using the same |
| 11/17/2010 | CN101887852A Method for filling deep trench |
| 11/17/2010 | CN101887134A Infrared window protective film material, use thereof and preparation method thereof |
| 11/17/2010 | CN101886255A Dielectric barrier deposition using nitrogen containing precursor |
| 11/17/2010 | CN101886254A Method of improving initiation layer for low-k dielectric film by digital liquid flow meter |