Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2010
12/01/2010EP1198414B1 Substrate-supported aligned carbon nanotube films
12/01/2010CN1955338B Vaporizer and semiconductor processing system
12/01/2010CN1737192B Magnetic latch for a vapour deposition system
12/01/2010CN101903980A Stage structure and heat treatment apparatus
12/01/2010CN101903564A Coating method
12/01/2010CN101903563A Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materials
12/01/2010CN101903562A Apparatus and method for manufacturing photoelectric converting element, and photoelectric converting element
12/01/2010CN101903561A Liquid material vaporization apparatus
12/01/2010CN101903560A Method for sputter targets for electrolyte films
12/01/2010CN101901761A MOCVD growth method of non-polar m-surface GaN based on gamma-surface LiAlO2 substrate
12/01/2010CN101901760A MOCVD growing method of polar c-plane GaN based on c-plane SiC substrate
12/01/2010CN101901759A MOCVD (Metal-organic Chemical Vapor Deposition) growth method of nonpolar a-side GaN film on r-side based Al2O3 substrate
12/01/2010CN101901758A MOCVD growth method of non-polar m-surface GaN film based on m-surface SiC substrate
12/01/2010CN101901757A MOCVD growing method based on nonpolar a-surface GaN on a-surface 6H-SiC substrate
12/01/2010CN101901756A MOCVD growing method of polar c surface GaN film based on c surface Al2O3 substrate
12/01/2010CN101901743A Cleaning process and apparatus for silicate materials
12/01/2010CN101900108A Sliding member for compressor
12/01/2010CN101899653A Flange for transmitting process gas
12/01/2010CN101899652A Gas supply system and method
12/01/2010CN101899651A Amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films
12/01/2010CN101899650A Substrate heating furnace of MOCVD
12/01/2010CN101899649A Method for forming tungsten film
12/01/2010CN101899068A Volatile group 2 metal precursors
12/01/2010CN101556904B Gas distributor and semiconductor processing equipment applying same
12/01/2010CN101345204B Retaining device and temperature control method for processed body
12/01/2010CN101328581B Plasma processing apparatus and substrate carrier plate thereof
12/01/2010CN101307437B Radio frequency electrode and film preparing device
12/01/2010CN101298676B Manufacturing method of insulation heat-conducting metal substrate
12/01/2010CN101294277B Thin film deposition method
12/01/2010CN101257117B Double polar plates for fuel battery and method for making surface azote chromium thin film
12/01/2010CN101255551B Vaporizer and semiconductor processing apparatus
12/01/2010CN101226877B Substrate processing device and method
12/01/2010CN101225514B Coating system, coating method and coating products
12/01/2010CN101223299B Tectorial membrane forming device for forming tectorial membrane on internal surface of container, production method for internal surface tectorial membrane container
12/01/2010CN101191203B Plasma reactor substrate mounting surface texturing
12/01/2010CN101107379B Gas treatment method
12/01/2010CN101065516B Multi-tray film precursor evaporation system and thin film deposition system incorporating same
12/01/2010CN101052743B Divided solid composition made from particles with continuous metal deposition, and its manufacturing method and its application as catalyst mode
11/2010
11/30/2010USRE41972 Aluminum oxide coated tool
11/30/2010US7842905 Method and device for the thermal treatment of substrates
11/30/2010US7842622 Method of forming highly conformal amorphous carbon layer
11/30/2010US7842356 Substrate processing methods
11/30/2010US7842355 using the pulsed direct current power signal during a first phase and second phase of the drive signal with different pulse amplitude to generate two different density of plasma, vapor depositing, lamination; film forming on semiconductor industry wafers
11/30/2010US7842343 inner surface of capillary with very small flow path is hydrophilically treated without increasing cost; primary substitution group from modifying gas (F2 and O2) bonds to keto group of polymethyl methacrylate groove and second modifying hydrolysis step substitutes that group with hydroxy; microdevice
11/30/2010US7842342 forming a magnesium oxide film on plasma display panel; control the partial pressure of water in the film-forming chamber, by controlling a ratio of a partial pressure of hydrogen to a partial pressure of oxygen in the film-forming chamber; without being influenced by outside humidity
11/30/2010US7842341 by evaporation; forming an OLED display device; improves device performance through decrease in contamination and increase the purity
11/30/2010US7842338 Proteolytic deposition of titanium/zirconium oxides; semiconductors; transparencies; photocatalysts
11/30/2010US7842160 Semiconductor producing device and semiconductor device producing method
11/30/2010US7842159 Inductively coupled plasma processing apparatus for very large area using dual frequency
11/30/2010US7842135 Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire
11/30/2010CA2573559C Nanostructured coatings and related methods
11/25/2010WO2010135250A2 Methods for determining the quantity of precursor in an ampoule
11/25/2010WO2010134976A1 Pt-al-hf/zr coating and method
11/25/2010WO2010134892A1 A coating apparatus
11/25/2010WO2010134471A1 Vapor phase growth apparatus
11/25/2010WO2010134354A1 Method for forming carbon film, method for manufacturing magnetic recording medium, and apparatus for forming carbon film
11/25/2010WO2010134126A1 Plasma apparatus
11/25/2010WO2010133607A2 Method for coating micromechanical parts with high tribological performances for application in mechanical systems
11/25/2010WO2010133386A1 Holding cone for silicon growth rods
11/25/2010US20100298738 Vessel, coating, inspection and processing apparatus
11/25/2010US20100297846 Method of manufacturing a semiconductor device and substrate processing apparatus
11/25/2010US20100297832 Semiconductor device manufacturing method, substrate processing apparatus, substrate manufacturing method
11/25/2010US20100297472 Oxidation-corrosion resistant coating
11/25/2010US20100297471 Pt-Al-Hf/Zr coating and method
11/25/2010US20100297447 Core-shell structured metal oxide particles and method for producing the same
11/25/2010US20100297391 Diamond capsules and methods of manufacture
11/25/2010US20100297361 Plasma deposition source and method for depositing thin films
11/25/2010US20100297350 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
11/25/2010US20100297349 Thin film deposition apparatus
11/25/2010US20100297348 Thin film deposition apparatus
11/25/2010US20100297347 Substrate support having side gas outlets and methods
11/25/2010US20100297346 Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium
11/25/2010US20100297335 Method for applying adhesive to a web substrate
11/25/2010US20100296943 Thermal barrier coated materilas, method of preparation thereof, and method of coating using them
11/25/2010US20100296621 Method of manufacturing nuclear fuel elements and a container for implementing such a method
11/25/2010US20100294710 Method for producing a component, in particular a micromechanical and/or microfluidic and/or microelectronic component, and component
11/25/2010US20100294648 Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System
11/25/2010US20100294433 Plasma processing apparatus
11/25/2010US20100294431 Equipment for producing semiconductors, corresponding pumping device and substrate holder
11/25/2010US20100294200 Vapor chamber and method for manufacturing the same
11/25/2010US20100294199 Cvd apparatus for improved film thickness non-uniformity and particle performance
11/25/2010US20100294024 Encapsulated device with integrated gas permeation sensor
11/25/2010DE102009023125A1 Manufacturing serially switched thin-film solar cells, comprises arranging a semi-finished product with a rigid carrier substrate onto a reception, and introducing the semi-finished product in a deposition chamber with a deposition device
11/25/2010DE102005030584B4 Verfahren zur Herstellung von Nickelsilizid durch Abscheiden von Nickel aus einem gasförmigen Vorstufenmaterial A process for producing nickel silicide by depositing nickel from a gaseous precursor material
11/25/2010CA2748304A1 Pt-al-hf/zr coating and method
11/24/2010EP2253745A2 Coloured Diamond
11/24/2010EP2253735A2 Vessel processing
11/24/2010EP2253734A2 CVD method and apparatus
11/24/2010EP2253733A1 High colour diamond
11/24/2010EP2253589A1 Thin film of metal silicon compound and process for producing the thin film of metal silicon compound
11/24/2010EP2253464A2 Graded platinum diffusion aluminide coating
11/24/2010EP2253008A1 Plasma system
11/24/2010EP2252721A1 Body coated with hard material
11/24/2010EP2252550A2 Method for recycling silane (sih<sb>4</sb>)
11/24/2010EP2252409A2 Vapour delivery system
11/24/2010EP2252389A1 A biocompatible filter member for body fluid dialysis and fabrication and use thereof
11/24/2010EP1631536B1 Method for preparation of alpha, beta-unsaturated cyclic ketones by dehydrogenation of secondary allylic cyclic alcohols
11/24/2010EP1466041B1 Coloured diamond
11/24/2010EP1361606B1 Method of producing electronic device material
11/24/2010EP1340247B1 Method of forming dielectric films
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