Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2010
12/15/2010CN101914759A Hvpe showerhead design
12/15/2010CN101912763A Method of treating a gas stream
12/15/2010CN101529564B Vaporizer and film forming apparatus
12/15/2010CN101448977B Apparatus and process for plasma-enhanced atomic layer deposition
12/15/2010CN101418439B Laser processing device and laser processing method
12/15/2010CN101280422B Device for lot manufactureof diamond coating drawing die
12/15/2010CN101222041B Nano combination electrode material Li3N/Si used for lithium ion battery and its preparation method
12/15/2010CN101191201B Reaction cavity for metal organic substance chemical gaseous phase deposition device
12/15/2010CN101187013B Plasma processing chamber with ground member integrity indicator and method for using the same
12/15/2010CN101187011B Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
12/15/2010CN101109074B Method to reduce gas-phase reactions in a pecvd process with silicon and organic precursors to deposit defect-free initial layers
12/15/2010CN101091006B Seal structure of vacuum apparatus
12/15/2010CN101091003B Method for forming tantalum nitride film
12/14/2010US7851728 Heater unit
12/14/2010US7851402 An inner organic binding group attached to at least one metal moiety of a metal oxide crystallite particle; andan outer organic binding group attached to at least one inner organic binding group; catalysts and precursors for forming metal oxide films and coatings
12/14/2010US7851385 Forming a gate stack on a semiconductor substrate, forming a conformal silicon oxide layer on the semiconductor substrate using a low temperature cyclic method involving exposing the semiconductor substrate to a silicon containing precursor to form a seed layer ; forming a spacer layer; memory cells
12/14/2010US7851075 Work piece with a hard film of ALCR-containing material, and process for its production
12/14/2010US7851019 Method for controlling the sublimation of reactants
12/14/2010US7851016 Article having nano-scaled structures and a process for making such article
12/14/2010US7850819 Plasma reactor with high productivity
12/14/2010US7850790 Passivating internal metal surfaces of pipes, piping manifold, tubes to increase shelf-life of gas compositions, especially low concentration gas products; passivation coatings made from reacting a silane compound with oxygen to improve storage stability
12/14/2010US7850780 System for thin film deposition utilizing compensating forces
12/14/2010US7850779 Apparatus and process for plasma-enhanced atomic layer deposition
12/14/2010US7850778 Apparatus and method for growing fullerene nanotube forests, and forming nanotube films, threads and composite structures therefrom
12/14/2010US7850174 Plasma processing apparatus and focus ring
12/14/2010US7849815 Plasma processing apparatus
12/14/2010US7849814 Plasma generating device
12/14/2010CA2551389C Asymmetric graded composites for improved drill bits
12/09/2010WO2010141668A2 Methods of forming strontium titanate films
12/09/2010WO2010141130A1 Low temperature cnt growth using gas-preheat method
12/09/2010WO2010140889A1 Method for passivating at least a part of a substrate surface
12/09/2010WO2010140564A1 Nitride semiconductor crystal and method for manufacturing same
12/09/2010WO2010140529A1 Starting material for use in forming silicone oxide film and method for forming silicone oxide film using same
12/09/2010WO2010139855A1 Protective coating, method for protecting a substrate and use for the same
12/09/2010WO2010139547A1 Coating installation and coating method
12/09/2010WO2010139543A1 Coating installation and method
12/09/2010WO2010139542A1 Coating installation and coating method
12/09/2010WO2010139541A1 Coating installation and coating method
12/09/2010WO2010139053A1 Metal-clad polymer article
12/09/2010WO2010139052A1 Metal-coated polymer article of high durability and vacuum and/or pressure integrity
12/09/2010US20100311249 Multi-gas flow diffuser
12/09/2010US20100311237 Formation of a tantalum-nitride layer
12/09/2010US20100310863 Transparent electroconductive film and method for producing the same
12/09/2010US20100310860 Synthetic method for anti-oxidation ceramic coatings on graphite substrates
12/09/2010US20100310791 Plasma processing method and plasma processing system
12/09/2010US20100310789 Method for Preparation of Hybrid Comprising Magnetite Nanoparticles and Carbon Nitride Nanotubes
12/09/2010US20100310788 Method and system for continuous or semi-continuous laser deposition
12/09/2010US20100310785 Vacuum processing apparatus and operating method for vacuum processing apparatus
12/09/2010US20100310772 Gas supply device
12/09/2010US20100310771 Vapor deposition reactor and method for forming thin film
12/09/2010US20100310770 Process for synthesizing a thin film or composition layer via non-contact pressure containment
12/09/2010US20100310769 Continuous Feed Chemical Vapor Deposition System
12/09/2010US20100310768 Thin film deposition apparatus
12/09/2010US20100310767 Vapor deposition apparatus and vapor deposition method
12/09/2010US20100310766 Roll-to-Roll Chemical Vapor Deposition System
12/09/2010US20100310759 Method and apparatus for cleaning organic deposition materials
12/09/2010US20100307705 Security element
12/09/2010US20100307687 Internal member of a plasma processing vessel
12/09/2010US20100307686 Substrate processing apparatus
12/09/2010US20100307592 Three-dimensional indium-tin-oxide electrode, method of fabricating the same, device of fabricating the same, and method of fabricating solar cell comprising the same
12/09/2010US20100307553 Engineering light manipulation in structured films or coatings
12/09/2010US20100307417 Manufacturing device for silicon carbide single crystal
12/09/2010US20100307416 Chemical Vapor Deposition Apparatus
12/09/2010US20100307415 Semiconductor processing reactor and components thereof
12/09/2010DE112008003535T5 Suszeptor für das epitaxiale Wachstum Susceptor for epitaxial growth
12/09/2010DE102009023472A1 Beschichtungsanlage und Beschichtungsverfahren Coating machine and coating processes
12/09/2010DE102009023471A1 Beschichtungsanlage und -verfahren Coating system and method
12/09/2010DE102009023467A1 Beschichtungsanlage und -verfahren Coating system and method
12/09/2010DE10056241B4 Niederdruckdampfturbine Low pressure steam turbine
12/09/2010CA2763983A1 Metal-clad polymer article
12/09/2010CA2752525A1 Low temperature cnt growth using gas-preheat method
12/08/2010EP2259295A1 Epitaxial substrate for smeiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
12/08/2010EP2259287A1 Epitaxial substrate for semiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
12/08/2010EP2258888A1 Cvi apparatus and method
12/08/2010EP2257973A1 Silver reflectors for semiconductor processing chambers
12/08/2010EP2257971A1 Nanofilm protective and release matrices
12/08/2010EP2257853A2 Method for processing an object with miniaturized structures
12/08/2010EP2257658A1 Method of making nucleation layer for diamond growth
12/08/2010EP2257655A2 Substrates for silicon solar cells and methods of producing the same
12/08/2010EP2257654A2 Piston ring
12/08/2010EP2257561A1 Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ald) process
12/08/2010EP1949406B1 Plasma etching method and etching chamber
12/08/2010EP1487619B1 Self-sharpening cutting tool with hard coating
12/08/2010EP1261864B1 Fluid handling devices with diamond-like films
12/08/2010CN201665709U PECVD special film coating silicon chip carrier
12/08/2010CN201665708U Quick-change silicon wafer coating film single-side hanger component
12/08/2010CN1921069B Laser processing apparatus utilizing laser beam to irradiate semiconductor layer
12/08/2010CN1920092B Method of depositing Ge-Sb-Te thin film
12/08/2010CN1675403B Titania coatings by CVD at atmospheric pressure
12/08/2010CN1582071B Depositing device and its making device
12/08/2010CN101911275A Vacuum processing device, vacuum processing method, and computer-readable storage medium
12/08/2010CN101911266A Semiconductor device manufacturing method, semiconductor manufacturing apparatus and storage medium
12/08/2010CN101911252A Placing table apparatus, processing apparatus and temperature control method
12/08/2010CN101910477A Method for growing group III nitride crystal
12/08/2010CN101910475A Epitaxial barrel susceptor having improved thickness uniformity
12/08/2010CN101910467A Metal catalyzed selective deposition of materials including germanium and antimony
12/08/2010CN101910460A Plasma processing apparatus
12/08/2010CN101910459A Film forming method and film forming apparatus
12/08/2010CN101910458A Method of depositing metallic film and memory medium
12/08/2010CN101910457A Material for formation of nickel-containing film, and method for production thereof
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