| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 12/22/2010 | EP2262921A1 Quick-change precursor manifold for large-area cvd and pecvd |
| 12/22/2010 | EP2262920A1 Method for growing monocrystalline diamonds |
| 12/22/2010 | EP1507888B1 Plasma-enhanced chemical vapour deposition method for depositing silicon nitride or silicon oxynitrid in an mim-capacitor |
| 12/22/2010 | CN201678731U System of flat PECVD silicon nitride film |
| 12/22/2010 | CN1961405B Method of operating a system for chemical oxide removal |
| 12/22/2010 | CN1953953B Metal complex comprising beta-diketonato as ligand |
| 12/22/2010 | CN1938833B Techniques promoting adhesion of porous low k film to underlying barrier layer and interconnection structure |
| 12/22/2010 | CN1928152B Vapor phase growth device |
| 12/22/2010 | CN1911937B Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane |
| 12/22/2010 | CN1898409B Method and apparatus for forming a high quality low temperature silicon nitride layer |
| 12/22/2010 | CN1833051B Method and device for coating or modifying surfaces |
| 12/22/2010 | CN1655336B Substrate support bushing |
| 12/22/2010 | CN101925695A Iii-group nitride single-crystal ingot, iii-group nitride single-crystal substrate, method for manufacturing iii-group nitride single-crystal ingot, and method for manufacturing iii-group nitride single-crystal substrate |
| 12/22/2010 | CN101925690A Insulating film material, film forming method using insulating film material, and insulating film |
| 12/22/2010 | CN101925689A Vacuum coating apparatus and method |
| 12/22/2010 | CN101925550A Method for increasing durability of glass and glass product |
| 12/22/2010 | CN101925455A Object having ductile and corrosion resistant surface layer |
| 12/22/2010 | CN101924023A Vapor phase epitaxy apparatus of group III nitride semiconductor |
| 12/22/2010 | CN101924022A Method for growing GaN and InGaN by adopting InxGa1-xN buffer layer |
| 12/22/2010 | CN101924015A Gas input device and semiconductor processing device |
| 12/22/2010 | CN101924003A Electrode structure and plasma device |
| 12/22/2010 | CN101921999A Multiple-reaction cavity metallorganic chemical vapor deposition equipment |
| 12/22/2010 | CN101921998A Plasma enhanced chemical vapor deposition (PECVD) device and method capable of enhancing uniformity of thin film solar cell |
| 12/22/2010 | CN101921997A 扩散器重力支撑件 Gravity diffuser support |
| 12/22/2010 | CN101921996A Novel spray header device of MOCVD equipment |
| 12/22/2010 | CN101921995A Reaction chamber and chemical vapor deposition equipment |
| 12/22/2010 | CN101921994A Device and method for depositing ultrathin alumina film by atomic layer |
| 12/22/2010 | CN101921993A Polymer film nano doping device and method |
| 12/22/2010 | CN101568993B Film forming apparatus and method of forming film |
| 12/22/2010 | CN101403109B Radio frequency electrode discharging apparatus |
| 12/22/2010 | CN101310043B Ald reactor |
| 12/22/2010 | CN101223000B Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system |
| 12/22/2010 | CN101186488B Method for manufacturing alumina made ceramic structure member |
| 12/22/2010 | CN101093786B UV curing system |
| 12/22/2010 | CN101084327B Film-forming method and recording medium |
| 12/22/2010 | CN101061253B Substrate processing apparatus using a batch processing chamber |
| 12/21/2010 | US7854974 Tube formed of bonded silicon staves |
| 12/21/2010 | US7854966 Coating process for fatigue critical components |
| 12/21/2010 | US7854962 Vapor deposition of a metal oxide /nitride, dielectric thin films on semiconductor wafers by supplying the gas produced by evaporation or sublimation of the metal material; providing a heater, a carrier gas, temperature controller and baffle to maintain uniform gas diffusion and coating |
| 12/21/2010 | US7854820 Upper electrode backing member with particle reducing features |
| 12/21/2010 | US7854805 Plasma processing plant |
| 12/21/2010 | US7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system |
| 12/21/2010 | CA2486841C Method for repairing coated components using nial bond coats |
| 12/19/2010 | CA2763982A1 Metal-coated polymer article of high durability and vacuum and/or pressure integrity |
| 12/16/2010 | WO2010144377A1 Vapor deposition reactor and method for forming thin film |
| 12/16/2010 | WO2010144302A2 Roll-to-roll chemical vapor deposition system |
| 12/16/2010 | WO2010143765A1 Surface treatment method for treating surface of substrate to be highly hydrophobic |
| 12/16/2010 | WO2010143571A1 Method for forming ge-sb-te film, and storage medium |
| 12/16/2010 | WO2010143570A1 Method for forming ge-sb-te film, and storage medium |
| 12/16/2010 | WO2010143525A1 Plasma processing apparatus and plasma processing method |
| 12/16/2010 | WO2010143327A1 Plasma cvd device |
| 12/16/2010 | WO2010142972A1 Substrate structure grown by plasma deposition |
| 12/16/2010 | WO2010142602A1 Method for coating micromechanical components of a micromechanical system, in particular a watch and related micromechanical coated component |
| 12/16/2010 | WO2010092471A3 Method and device for coating planar substrates with chalcogens |
| 12/16/2010 | US20100317198 Remote plasma processing of interface surfaces |
| 12/16/2010 | US20100317197 Heat Shield for Heater in Semiconductor Processing Apparatus |
| 12/16/2010 | US20100317188 Fluorine doped carbon films produced by modification by radicals |
| 12/16/2010 | US20100317178 Remote plasma processing of interface surfaces |
| 12/16/2010 | US20100317176 Method and system for the synthesis of semiconductor nanowires |
| 12/16/2010 | US20100316873 One-dimensional metal nanostructures |
| 12/16/2010 | US20100316815 Plasma cvd method |
| 12/16/2010 | US20100316814 Film deposition apparatus and film deposition method |
| 12/16/2010 | US20100316800 Multi-station deposition apparatus and method |
| 12/16/2010 | US20100316799 Film forming method and film forming apparatus |
| 12/16/2010 | US20100316791 Supercritical vapor deposition method and system |
| 12/16/2010 | US20100316788 Deposition rate monitor device, evaporator, coating installation, method for applying vapor to a substrate and method of operating a deposition rate monitor device |
| 12/16/2010 | US20100314804 Method for the production of semiconductor ribbons from a gaseous feedstock |
| 12/16/2010 | US20100314353 Nano-construction of complex 3-D Structures and modification of existing structures |
| 12/16/2010 | US20100314005 Highly corrosion-resistant member and manufacturing process for the same |
| 12/16/2010 | US20100313951 Carbon nanotube-based solar cells |
| 12/16/2010 | US20100313946 Solar cell module, laminate, and method for production of solar cell module |
| 12/16/2010 | US20100313936 Glass substrate coated with layers having an improved mechanical strength |
| 12/16/2010 | US20100313811 Evaporation source and film-forming device |
| 12/16/2010 | US20100313810 Continuous film forming apparatus |
| 12/16/2010 | DE102009025971A1 Verfahren zum Einrichten eines Epitaxie-Reaktors A method for establishing an epitaxial reactor |
| 12/15/2010 | EP2262043A1 Method for manufacturing at least one micro-component with a single mask |
| 12/15/2010 | EP2261401A1 Nitride semiconductor crystal and manufacturing method thereof |
| 12/15/2010 | EP2261394A1 Production equipment and method of thin-film laminate |
| 12/15/2010 | EP2261393A2 Plasma uniformity control by gas diffuser hole design |
| 12/15/2010 | EP2261392A2 Expanding thermal plasma deposition system |
| 12/15/2010 | EP2261391A1 Processing apparatus and processing method |
| 12/15/2010 | EP2261390A2 Mechanical enhancer additives for low dielectric films |
| 12/15/2010 | EP2261389A2 Method of forming high-k dielectric films based on novel zirconium, and hafnium precursors and their use for semiconductor manufacturing |
| 12/15/2010 | EP2261185A2 Solar glass panel with barrier coating and method for producing same |
| 12/15/2010 | EP2260121A1 A coating and a method for producing a coating |
| 12/15/2010 | EP1902154B1 Apparatus for the pecvd deposition of an inner barrier layer on a container, comprising an optical plasma analysis device |
| 12/15/2010 | EP1850993B1 Method for the production of a saw band |
| 12/15/2010 | EP1219141B1 Multi-zone resistance heater |
| 12/15/2010 | CN201670873U Substrate heating furnace for MOCVD |
| 12/15/2010 | CN1840737B Reflective and resistant coatings and methods for applying to composite structures |
| 12/15/2010 | CN101919028A Polysilicon deposition apparatus |
| 12/15/2010 | CN101919027A Combinatorial process system |
| 12/15/2010 | CN101918611A Thermalization of gaseous precursors in CVD reactors |
| 12/15/2010 | CN101918605A Alloy to be surface-coated and sliding members |
| 12/15/2010 | CN101916796A Method for making gradational diffusion photoelectric diode by using MOCVD epitaxial system |
| 12/15/2010 | CN101916740A In-situ dry clean chamber for front end of line fabrication |
| 12/15/2010 | CN101916715A In-situ dry clean chamber for front end of line fabrication |
| 12/15/2010 | CN101914762A Air inlet spray head structure for metal-organic chemical vapor deposition equipment |
| 12/15/2010 | CN101914761A Device for controlling delivery and uniform distribution of reaction gases in MOCVD reaction chamber |
| 12/15/2010 | CN101914760A Producing method of semiconductor device and substrate processing apparatus |