Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2010
12/30/2010US20100330299 Plasma deposition of a thin film
12/30/2010US20100330295 Method for providing ductile environmental coating having fatigue and corrosion resistance
12/30/2010US20100330278 Method for treating high hydrophobic surface of substrate
12/30/2010US20100330265 Thin film deposition apparatus
12/30/2010US20100327228 Group iii nitride semiconductor epitaxial substrate and method for manufacturing the same
12/30/2010US20100327085 Gas injection system for plasma processing
12/30/2010US20100326358 Batch type atomic layer deposition apparatus
12/30/2010US20100326357 Nozzle and furnace having the same
12/30/2010US20100326356 Plasma booster for plasma treatment installation
12/30/2010US20100326135 Diamond material
12/30/2010DE102010018415A1 Single wafer air-to-air microwave plasma treatment plant, where the wafer is transported in and out of an endless metal band in vacuum plant by a steady process, which is carried out by plasma heads standing in rows
12/30/2010DE102010016926A1 Electrostatic lacquering of electrically non-conductive parts e.g. plastic-, glass- or ceramic parts by surface conductivity-producing layers, comprises dryly coating non-conductive parts with metal conducting and semi-conducting layers
12/30/2010DE102009033417A1 Verfahren und System zur Herstellung eines beschichteten Gegenstands mit Tempern A method and system for making a coated article with annealing
12/30/2010DE102009030303A1 Method for the production of a coating having antireflexion layer on a movable substrate by a plasma-enhanced chemical vapor deposition, comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit
12/30/2010DE102005001168B4 Verfahren und System zum Erzeugen einer Mehrzahl von Dünnfilmvorrichtungen Method and system for generating a plurality of thin-film devices
12/29/2010WO2010151657A1 Methods of applying protective films
12/29/2010WO2010151430A1 Chemical vapor deposition using n,o polydentate ligand complexes of metals
12/29/2010WO2010151336A1 Plasma treatment method
12/29/2010WO2010151057A2 Plasma deposition of a thin film
12/29/2010WO2010150723A1 Variable resistance element and method for manufacturing same
12/29/2010WO2010148661A1 Single-mode optical fiber and manufacture method thereof
12/29/2010WO2010087973A3 Method of depositing an electrically conductive titanium oxide coating on a substrate
12/29/2010EP2267190A1 Large area, uniformly low dislocation density gan substrate and process for making the same
12/29/2010EP2267183A1 Atomic layer film-forming device
12/29/2010EP2267182A2 Coated cutting tool
12/29/2010EP2266729A2 Production of chain agglomerations of nano-scale metal particles
12/29/2010EP2266709A2 Coated medical devices
12/29/2010EP2266369A1 Manufacturing apparatus for depositing a material and an electrode for use therein
12/29/2010EP2266368A1 Manufacturing apparatus for depositing a material on an electrode for use therein
12/29/2010EP2265883A1 Manufacturing apparatus for depositing a material and an electrode for use therein
12/29/2010EP2265745A1 Exhaust gas treatment device for a cvd device, cvd device and exhaust gas treatment method
12/29/2010EP2265742A2 Corrosion resistant object with alloying zone
12/29/2010EP1951931B1 Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactor
12/29/2010EP1489645B1 Cvd apparatus and method of cleaning the cvd apparatus
12/29/2010EP1192050B1 Substrate treatment method
12/29/2010EP1163544B1 method of making ultraviolet filters with enhanced weatherability
12/29/2010CN201689695U Window for X-ray microscopic transmission imaging
12/29/2010CN1938791B Transparent conductive film, process for producing the same, transparent conductive base material and luminescent device
12/29/2010CN1934913B Plasma generating equipment
12/29/2010CN1675058B Laminating product including adhesion layer and laminate product including protective film
12/29/2010CN101933140A Nanostructures and methods of making the same
12/29/2010CN101933122A Load-lock apparatus and substrate cooling method
12/29/2010CN101932753A Film deposition apparatus and film deposition method
12/29/2010CN101932751A Deposition apparatus and deposition method
12/29/2010CN101932750A Vacuum processing apparatus and operating method for vacuum processing apparatus
12/29/2010CN101931022A Preparation method of crystalline silicon solar battery
12/29/2010CN101930902A Heating cavity and semiconductor processing equipment
12/29/2010CN101930891A Reaction chamber and lining device
12/29/2010CN101928936A Apparatus for substrate alignment, apparatus for substrate processing having the same, and substrate alignment method
12/29/2010CN101928935A Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor
12/29/2010CN101928934A Method for improving uniformity of high-temperature oxide of wafer
12/29/2010CN101928933A Method for preparing silicon carbide film
12/29/2010CN101928932A Laser processing device capable of controlling laser beam length and intensity
12/29/2010CN101928931A Film coating device and method
12/29/2010CN101928930A Vacuum coating machine
12/29/2010CN101567407B Graded zinc diffusing method based on MOCVD (Metal-Organic Chemical Vapor Deposition) system for producing chip of indium-gallium-arsenic photoelectric detector
12/29/2010CN101208457B Method for manufacturing flat substrates
12/29/2010CN101074203B Metal complexes of polydentate beta-ketoiminates
12/29/2010CN101001976B Conductive material comprising an me-dlc hard material coating
12/28/2010US7860597 Atomic layer deposition apparatus
12/28/2010US7860379 Temperature measurement and control of wafer support in thermal processing chamber
12/28/2010US7858815 Vapor deposition process; semiconductor; high dielectric constants,used for capacitor dielectrics and gate dielectrics; random access memory devices
12/28/2010US7858536 Semiconductor device and method for manufacturing semiconductor device
12/28/2010US7858171 Has high barrier properties and a good transparency; a laminated material using the film; a packaging container, and an image display medium; water repellent layer made of silicon oxide carbide ( atomic percent of Si:O:C in a range of 100:40 to 120:80 to 160)
12/28/2010US7858152 Chemical vapor deposition of chalcogenide materials via alternating layers
12/28/2010US7858151 Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination
12/28/2010US7858150 forming a layer of diamond-like carbon (DLC) on a soda lime silica glass substrate; and forming a layer of WS2 on the glass substrate over the DLC layer to prevent DLC from burning off upon exposure to air if taken to high temperature; automobile windshield, side window, corrosion/chemical resistance
12/28/2010US7858147 Interconnect structure and method of fabricating the same
12/28/2010US7857947 Unique passivation technique for a CVD blocker plate to prevent particle formation
12/23/2010WO2010147483A1 Method for improved passivation and solar cell with improved passivation
12/23/2010WO2010147141A1 Film deposition method, pretreatment device, and treating system
12/23/2010WO2010147140A1 Barrier layer, film deposition method, and treating system
12/23/2010WO2010147053A1 Vapor deposition device
12/23/2010WO2010147038A1 Dlc film-forming method and dlc film
12/23/2010WO2010146970A1 Gas discharge structure, and device and method for plasma processing
12/23/2010WO2010146969A1 Plasma processing apparatus and plasma processing method
12/23/2010WO2010146961A1 Plasma processing device and cooling device for plasma processing devices
12/23/2010WO2010146234A1 Apparatus
12/23/2010WO2010146153A1 Method of surface treating microfluidic devices
12/23/2010WO2010145969A1 Method for equipping an epitaxy reactor
12/23/2010WO2010145704A1 Protective coating, a coated member having a protective coating as well as method for producing a protective coating
12/23/2010WO2010052191A3 Coated solid pliant materials
12/23/2010US20100323508 Plasma grid implant system for use in solar cell fabrications
12/23/2010US20100323507 Substrate processing apparatus and producing method of device
12/23/2010US20100323501 Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor
12/23/2010US20100323207 Growth of Carbon Nanotubes on Carbon or Metal Substrates
12/23/2010US20100323127 Atmospheric pressure plasma enhanced chemical vapor deposition process
12/23/2010US20100323125 Atomic layer deposition apparatus and atomic layer deposition method
12/23/2010US20100323124 Sealed plasma coatings
12/23/2010US20100323108 Deposition apparatus and deposition method
12/23/2010US20100319855 Substrate supporting unit, substrate processing apparatus, and method of manufacturing substrate supporting unit
12/23/2010US20100319622 Film coating apparatus for chemical vapor deposition and physical vapor deposition
12/23/2010US20100319620 Vapor deposition apparatus
12/23/2010US20100319619 Oxidation method and apparatus for semiconductor process
12/23/2010DE102006025751B4 Verfahren zur Abdichtung einer Vakuumkammer und Schleuseneinrichtung für eine Vakuumkammer A method of sealing a vacuum chamber and lock device for a vacuum chamber
12/23/2010DE102004059200B4 Vorrichtung und Verfahren zum Kühlen von Substraten Apparatus and method for cooling of substrates
12/22/2010EP2264219A1 Material for chemical vapor deposition, silicon-containing insulating film and process for production thereof
12/22/2010EP2264218A1 Precursors for cvd silicon carbo-nitride films
12/22/2010EP2264217A1 Corrosion-resistant coating
12/22/2010EP2263974A1 Equipment and method for producing orientated carbon nano-tube aggregates
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