Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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01/20/2011 | US20110014394 film depositing apparatus and method |
01/20/2011 | US20110014384 Bladder-based apparatus and method for dispensing coatings |
01/20/2011 | US20110014368 Carbon nanotube growth at reduced temperature via catalytic oxidation |
01/20/2011 | US20110014354 Adhesive compositions and methods for use in failure analysis |
01/20/2011 | US20110013891 Vaporizor body |
01/20/2011 | US20110012378 Metallic resin cover and method of producing the same, and door handle for vehicle |
01/20/2011 | US20110011341 Shower plate and plasma processing device using the same |
01/20/2011 | US20110011339 Coating apparatus |
01/20/2011 | US20110011338 Flow control features of cvd chambers |
01/20/2011 | CA2768171A1 A method of inhibiting formation of deposits in a manufacturing system |
01/19/2011 | EP2276328A1 Microwave plasma processing device |
01/19/2011 | EP2276061A1 PROCESS FOR PRODUCING SI(1-V-W-X)CWALXNV BASE MATERIAL, PROCESS FOR PRODUCING EPITAXIAL WAFER, SI(1-V-W-X)CWALXNV BASE MATERIAL, AND EPITAXIAL WAFER& xA; |
01/19/2011 | EP2274458A2 Hybrid layers for use in coatings on electronic devices or other articles |
01/19/2011 | EP2274457A1 Apparatus and methods for deposition reactors |
01/19/2011 | EP1604388B1 Processing system and method for chemically treating a substrate |
01/19/2011 | EP1442154B1 Method for producing a continuous coating at the surface of a component |
01/19/2011 | EP1390558B1 Penning discharge plasma source |
01/19/2011 | CN1879189B Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
01/19/2011 | CN1871696B Method for forming insulating film, system for forming insulating film, and method for manufacturing semiconductor device |
01/19/2011 | CN1821053B Method for preparing four needle shape zinc oxide nano stick by low temperature catalyst-free gas phase deposition |
01/19/2011 | CN101952971A Method for manufacturing a solar cell with a surface-passivating dielectric double layer, and corresponding solar cell |
01/19/2011 | CN101952935A Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory |
01/19/2011 | CN101952480A Bodies coated with a hard material and method for the production thereof |
01/19/2011 | CN101952226A Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom |
01/19/2011 | CN101949009A Temperature control method of plasma chemical vapor deposition base |
01/19/2011 | CN101949008A Carrier plate, method for performing deposition processing by using carrier plate, and plasma deposition processing equipment |
01/19/2011 | CN101949007A Gas distributor for uniform gas emission |
01/19/2011 | CN101598834B Single mode fiber and preparation method thereof |
01/19/2011 | CN101560645B Large vacuum coating equipment |
01/19/2011 | CN101414162B Fluid flow distribution and supply unit and flow distribution control program |
01/19/2011 | CN101329998B Semiconductor treating device |
01/19/2011 | CN101316951B Diamond electrode, method for producing same, and electrolytic bath |
01/19/2011 | CN101165208B Rotating pressure distributor and carousel-type machine for treating hollow bodies which is equipped therewith |
01/19/2011 | CN101036420B Microwave plasma processing apparatus |
01/18/2011 | US7872291 Enhanced atomic layer deposition |
01/18/2011 | US7872209 Thermal flux processing by scanning a focused line beam |
01/18/2011 | US7871940 Apparatus and process for producing thin films and devices |
01/18/2011 | US7871677 photo-excitation with ultraviolet radiation from low pressure mercury lamp; cost efficiency |
01/18/2011 | US7871676 Activation energy from impinging high energy ion flux; kinetic energy rather than thermal energy drives the reaction of gases; plasma power modulation or wafer bias; low temperature; higher density, superior purity and adhesion |
01/18/2011 | US7871668 Convective flow chemical vapor deposition growth of nanostructures |
01/18/2011 | US7871667 Method of operating vacuum deposition apparatus and vacuum deposition apparatus |
01/18/2011 | US7871536 stabilized cyclic alkene composition comprising cyclic alkenes and antioxidant compound to reduce or eliminate residue formation upon evaporation of such compositions; used to form dielectric films |
01/18/2011 | US7871490 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution |
01/18/2011 | US7871470 Substrate support lift mechanism |
01/18/2011 | CA2519115C Aluminum material coated with carbon and manufacturing method thereof |
01/13/2011 | WO2011006064A1 Metal-containing precursors for deposition of metal-containing films |
01/13/2011 | WO2011006035A2 Bis-ketoiminate copper precursors for deposition of copper-containing films |
01/13/2011 | WO2011005439A1 Method and apparatus for producing hyperthermal beams |
01/13/2011 | WO2011004726A1 Method for manufacturing nitride semiconductor substrate |
01/13/2011 | WO2011004717A1 Contact-hole forming method |
01/13/2011 | WO2011004712A1 Vapor phase growth device and vapor phase growth method |
01/13/2011 | WO2011004682A1 Barrier film, organic photoelectric conversion element, and method for manufacturing barrier film |
01/13/2011 | WO2011004621A1 Vacuum processing apparatus |
01/13/2011 | WO2011004609A1 Co2 recycling method and co2 reduction method and device |
01/13/2011 | WO2011004602A1 Epitaxial wafer and method of producing same |
01/13/2011 | WO2010118109A3 Strontium ruthenium oxide interface |
01/13/2011 | US20110009954 Method for manufacturing of drug-releasing stent coated with titanium-oxide thin film |
01/13/2011 | US20110008576 Method, Material and Apparatus for Enhancing Dynamic Stiffness |
01/13/2011 | US20110008550 Atomic layer growing apparatus and thin film forming method |
01/13/2011 | US20110008541 Method and apparatus for organic vapor printing |
01/13/2011 | US20110008540 Canister for deposition apparatus, and deposition apparatus and method using the same |
01/13/2011 | US20110008539 Vapor generator and vapor deposition apparatus |
01/13/2011 | US20110008525 Condensation and curing of materials within a coating system |
01/13/2011 | US20110006213 Radiation image detection apparatus and manufacturing method of the same |
01/13/2011 | US20110006039 Plasma generating electrode assembly |
01/13/2011 | US20110005686 Loading table structure and processing device |
01/13/2011 | US20110005685 Plasma reactor with uniform process rate distribution by improved rf ground return path |
01/13/2011 | US20110005683 Plasma generating apparatus |
01/13/2011 | US20110005681 Plasma Generating Units for Processing a Substrate |
01/13/2011 | US20110005680 Tunable gas flow equalizer |
01/13/2011 | US20110005461 Methods and systems for plasma deposition and treatment |
01/13/2011 | DE112008003378T5 Schichtbildende Behandlungsschablone, Plasma-CVD-Vorrichtung, Metallplatte und Osmiumschicht-Bildungsverfahren Film-forming treatment jig, plasma CVD apparatus, metal plate and osmium-forming method |
01/13/2011 | DE102008030900B4 Verdampfbare Silbercarboxylat-Amin-Komplexe als Silberprecursor sowie Verdampfungsverfahren für dieselben Evaporable silver carboxylate-amine complexes as well as Silberprecursor evaporation method for the same |
01/12/2011 | EP2273536A1 Group iii nitride semiconductor device and method for manufacturing the same, group iii nitride semiconductor light-emitting device and method for manufacturing the same, and lamp |
01/12/2011 | EP2272998A1 Thermal barrier coating method and article |
01/12/2011 | EP2272996A1 Fabrication of porogen residue free and mechanically robust low-k materials |
01/12/2011 | EP2271790A2 Device and process for chemical vapor phase treatment |
01/12/2011 | EP2271789A1 Deposition of ternary oxide films containing ruthenium and alkali earth metals |
01/12/2011 | EP2271788A2 Systems and methods for distributing gas in a chemical vapor deposition reactor |
01/12/2011 | EP2126161B1 Device and method for selectively depositing crystalline layers using mocvd or hvpe |
01/12/2011 | EP1833759B1 High purity granular silicon and method of manufacturing the same |
01/12/2011 | CN201708179U Susceptor of semiconductor solar coating process chamber |
01/12/2011 | CN201704403U PECVD equipment |
01/12/2011 | CN201704402U Processing chamber used for semiconductor solar film coating |
01/12/2011 | CN1932081B Method for restoring portion of turbine component |
01/12/2011 | CN101946311A Thin film and method for manufacturing semiconductor device using the thin film |
01/12/2011 | CN101946020A Method of metal coating and coating produced thereby |
01/12/2011 | CN101945832A A glass product and a method for manufacturing a glass product |
01/12/2011 | CN101945711A Vapour delivery system |
01/12/2011 | CN101944560A Manufacturing method of semiconductor photonic device substrate |
01/12/2011 | CN101944474A Chamber cover opening/closing system and substrate processing equipment using same |
01/12/2011 | CN101942696A Si-base reversed extension 3C-SiC monocrystal film and preparation method thereof |
01/12/2011 | CN101942649A Method for constructing high-density nano-silicon structure at low temperature |
01/12/2011 | CN101942648A Gas used in plasma CVD process |
01/12/2011 | CN101942646A Film making equipment |
01/12/2011 | CN101942645A Film plating machine |
01/12/2011 | CN101942640A Canister for deposition apparatus, deposition apparatus using the same and method of depositing |
01/12/2011 | CN101519773B U-shaped pipe connecting method for gas path of CVD material growing device |
01/12/2011 | CN101487121B Diamond / W-C gradient structure composite coating and preparing method thereof |
01/12/2011 | CN101477846B Transparent base with transparent conductive film , Method for producing a transparent base with transparent conductive film, Photoelectric element including same |