Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2011
01/20/2011US20110014394 film depositing apparatus and method
01/20/2011US20110014384 Bladder-based apparatus and method for dispensing coatings
01/20/2011US20110014368 Carbon nanotube growth at reduced temperature via catalytic oxidation
01/20/2011US20110014354 Adhesive compositions and methods for use in failure analysis
01/20/2011US20110013891 Vaporizor body
01/20/2011US20110012378 Metallic resin cover and method of producing the same, and door handle for vehicle
01/20/2011US20110011341 Shower plate and plasma processing device using the same
01/20/2011US20110011339 Coating apparatus
01/20/2011US20110011338 Flow control features of cvd chambers
01/20/2011CA2768171A1 A method of inhibiting formation of deposits in a manufacturing system
01/19/2011EP2276328A1 Microwave plasma processing device
01/19/2011EP2276061A1 PROCESS FOR PRODUCING SI(1-V-W-X)CWALXNV BASE MATERIAL, PROCESS FOR PRODUCING EPITAXIAL WAFER, SI(1-V-W-X)CWALXNV BASE MATERIAL, AND EPITAXIAL WAFER& xA;
01/19/2011EP2274458A2 Hybrid layers for use in coatings on electronic devices or other articles
01/19/2011EP2274457A1 Apparatus and methods for deposition reactors
01/19/2011EP1604388B1 Processing system and method for chemically treating a substrate
01/19/2011EP1442154B1 Method for producing a continuous coating at the surface of a component
01/19/2011EP1390558B1 Penning discharge plasma source
01/19/2011CN1879189B Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
01/19/2011CN1871696B Method for forming insulating film, system for forming insulating film, and method for manufacturing semiconductor device
01/19/2011CN1821053B Method for preparing four needle shape zinc oxide nano stick by low temperature catalyst-free gas phase deposition
01/19/2011CN101952971A Method for manufacturing a solar cell with a surface-passivating dielectric double layer, and corresponding solar cell
01/19/2011CN101952935A Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory
01/19/2011CN101952480A Bodies coated with a hard material and method for the production thereof
01/19/2011CN101952226A Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom
01/19/2011CN101949009A Temperature control method of plasma chemical vapor deposition base
01/19/2011CN101949008A Carrier plate, method for performing deposition processing by using carrier plate, and plasma deposition processing equipment
01/19/2011CN101949007A Gas distributor for uniform gas emission
01/19/2011CN101598834B Single mode fiber and preparation method thereof
01/19/2011CN101560645B Large vacuum coating equipment
01/19/2011CN101414162B Fluid flow distribution and supply unit and flow distribution control program
01/19/2011CN101329998B Semiconductor treating device
01/19/2011CN101316951B Diamond electrode, method for producing same, and electrolytic bath
01/19/2011CN101165208B Rotating pressure distributor and carousel-type machine for treating hollow bodies which is equipped therewith
01/19/2011CN101036420B Microwave plasma processing apparatus
01/18/2011US7872291 Enhanced atomic layer deposition
01/18/2011US7872209 Thermal flux processing by scanning a focused line beam
01/18/2011US7871940 Apparatus and process for producing thin films and devices
01/18/2011US7871677 photo-excitation with ultraviolet radiation from low pressure mercury lamp; cost efficiency
01/18/2011US7871676 Activation energy from impinging high energy ion flux; kinetic energy rather than thermal energy drives the reaction of gases; plasma power modulation or wafer bias; low temperature; higher density, superior purity and adhesion
01/18/2011US7871668 Convective flow chemical vapor deposition growth of nanostructures
01/18/2011US7871667 Method of operating vacuum deposition apparatus and vacuum deposition apparatus
01/18/2011US7871536 stabilized cyclic alkene composition comprising cyclic alkenes and antioxidant compound to reduce or eliminate residue formation upon evaporation of such compositions; used to form dielectric films
01/18/2011US7871490 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
01/18/2011US7871470 Substrate support lift mechanism
01/18/2011CA2519115C Aluminum material coated with carbon and manufacturing method thereof
01/13/2011WO2011006064A1 Metal-containing precursors for deposition of metal-containing films
01/13/2011WO2011006035A2 Bis-ketoiminate copper precursors for deposition of copper-containing films
01/13/2011WO2011005439A1 Method and apparatus for producing hyperthermal beams
01/13/2011WO2011004726A1 Method for manufacturing nitride semiconductor substrate
01/13/2011WO2011004717A1 Contact-hole forming method
01/13/2011WO2011004712A1 Vapor phase growth device and vapor phase growth method
01/13/2011WO2011004682A1 Barrier film, organic photoelectric conversion element, and method for manufacturing barrier film
01/13/2011WO2011004621A1 Vacuum processing apparatus
01/13/2011WO2011004609A1 Co2 recycling method and co2 reduction method and device
01/13/2011WO2011004602A1 Epitaxial wafer and method of producing same
01/13/2011WO2010118109A3 Strontium ruthenium oxide interface
01/13/2011US20110009954 Method for manufacturing of drug-releasing stent coated with titanium-oxide thin film
01/13/2011US20110008576 Method, Material and Apparatus for Enhancing Dynamic Stiffness
01/13/2011US20110008550 Atomic layer growing apparatus and thin film forming method
01/13/2011US20110008541 Method and apparatus for organic vapor printing
01/13/2011US20110008540 Canister for deposition apparatus, and deposition apparatus and method using the same
01/13/2011US20110008539 Vapor generator and vapor deposition apparatus
01/13/2011US20110008525 Condensation and curing of materials within a coating system
01/13/2011US20110006213 Radiation image detection apparatus and manufacturing method of the same
01/13/2011US20110006039 Plasma generating electrode assembly
01/13/2011US20110005686 Loading table structure and processing device
01/13/2011US20110005685 Plasma reactor with uniform process rate distribution by improved rf ground return path
01/13/2011US20110005683 Plasma generating apparatus
01/13/2011US20110005681 Plasma Generating Units for Processing a Substrate
01/13/2011US20110005680 Tunable gas flow equalizer
01/13/2011US20110005461 Methods and systems for plasma deposition and treatment
01/13/2011DE112008003378T5 Schichtbildende Behandlungsschablone, Plasma-CVD-Vorrichtung, Metallplatte und Osmiumschicht-Bildungsverfahren Film-forming treatment jig, plasma CVD apparatus, metal plate and osmium-forming method
01/13/2011DE102008030900B4 Verdampfbare Silbercarboxylat-Amin-Komplexe als Silberprecursor sowie Verdampfungsverfahren für dieselben Evaporable silver carboxylate-amine complexes as well as Silberprecursor evaporation method for the same
01/12/2011EP2273536A1 Group iii nitride semiconductor device and method for manufacturing the same, group iii nitride semiconductor light-emitting device and method for manufacturing the same, and lamp
01/12/2011EP2272998A1 Thermal barrier coating method and article
01/12/2011EP2272996A1 Fabrication of porogen residue free and mechanically robust low-k materials
01/12/2011EP2271790A2 Device and process for chemical vapor phase treatment
01/12/2011EP2271789A1 Deposition of ternary oxide films containing ruthenium and alkali earth metals
01/12/2011EP2271788A2 Systems and methods for distributing gas in a chemical vapor deposition reactor
01/12/2011EP2126161B1 Device and method for selectively depositing crystalline layers using mocvd or hvpe
01/12/2011EP1833759B1 High purity granular silicon and method of manufacturing the same
01/12/2011CN201708179U Susceptor of semiconductor solar coating process chamber
01/12/2011CN201704403U PECVD equipment
01/12/2011CN201704402U Processing chamber used for semiconductor solar film coating
01/12/2011CN1932081B Method for restoring portion of turbine component
01/12/2011CN101946311A Thin film and method for manufacturing semiconductor device using the thin film
01/12/2011CN101946020A Method of metal coating and coating produced thereby
01/12/2011CN101945832A A glass product and a method for manufacturing a glass product
01/12/2011CN101945711A Vapour delivery system
01/12/2011CN101944560A Manufacturing method of semiconductor photonic device substrate
01/12/2011CN101944474A Chamber cover opening/closing system and substrate processing equipment using same
01/12/2011CN101942696A Si-base reversed extension 3C-SiC monocrystal film and preparation method thereof
01/12/2011CN101942649A Method for constructing high-density nano-silicon structure at low temperature
01/12/2011CN101942648A Gas used in plasma CVD process
01/12/2011CN101942646A Film making equipment
01/12/2011CN101942645A Film plating machine
01/12/2011CN101942640A Canister for deposition apparatus, deposition apparatus using the same and method of depositing
01/12/2011CN101519773B U-shaped pipe connecting method for gas path of CVD material growing device
01/12/2011CN101487121B Diamond / W-C gradient structure composite coating and preparing method thereof
01/12/2011CN101477846B Transparent base with transparent conductive film , Method for producing a transparent base with transparent conductive film, Photoelectric element including same