Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2011
02/01/2011US7878145 Monitoring plasma ion implantation systems for fault detection and process control
01/2011
01/27/2011WO2011011299A1 Compositions and methods of use for forming titanium- containing thin films
01/27/2011WO2011011129A2 Coated tooling
01/27/2011WO2011010727A1 Thermal cvd device, sio2 film or siof film and method for forming said films
01/27/2011WO2011010726A1 Plasma cvd device, sio2 film or siof film and method for forming said films
01/27/2011WO2011010661A1 Treatment device and method for operating same
01/27/2011WO2011010660A1 Device and method for forming film
01/27/2011WO2011010650A1 Film forming method
01/27/2011WO2011010186A1 High dielectric constant films deposited at high temperature by atomic layer deposition
01/27/2011WO2011009681A1 Plasma enhanced deposition method, semiconductor device, and deposition device
01/27/2011US20110021035 Deposition apparatus and method of manufacturing semiconductor device using the same
01/27/2011US20110021024 Surface treatment in semiconductor manufacturing
01/27/2011US20110021008 Directional Solid Phase Crystallization of Thin Amorphous Silicon for Solar Cell Applications
01/27/2011US20110020547 High dielectric constant films deposited at high temperature by atomic layer deposition
01/27/2011US20110020546 Low Temperature ALD of Noble Metals
01/27/2011US20110020545 Lateral-flow deposition apparatus and method of depositing film by using the apparatus
01/27/2011US20110020544 Exhaust system structure of film formation apparatus, film formation apparatus, and exhaust gas processing method
01/27/2011US20110020539 Palladium thiolate bonding of carbon nanotubes
01/27/2011US20110020532 Papermaking coating station with pressure-sensitive film roll
01/27/2011US20110020211 High Throughput Carbon Nanotube Growth System, and Carbon Nanotubes and Carbon Nanofibers Formed Thereby
01/27/2011US20110017913 Radiation image conversion panel and production method thereof
01/27/2011US20110017706 Plasma processing method and plasma processing apparatus
01/27/2011US20110017140 Method of treating a gas stream
01/27/2011US20110017139 System for Depositing a Film by Modulated Ion-Induced Atomic Layer Deposition (MII-ALD)
01/27/2011US20110017135 Tomic layer film forming apparatus
01/27/2011US20110017127 Apparatus and method for producing epitaxial layers
01/27/2011US20110017126 Coloured diamond
01/26/2011EP2278612A2 Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device
01/26/2011EP2278047A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film
01/26/2011EP2278046A1 Precursors for cvd silicon carbo-nitride films
01/26/2011EP2277194A1 Layered structures comprising silicon carbide layers, a process for their manufacture and their use
01/26/2011EP2276872A1 Device for thermohydraulic applications with improved water softening properties, lower release of heavy metals, and relative method of manufacturing
01/26/2011EP2276871A1 Method and arrangement for producing an n-semiconductive indium sulfide thin layer
01/26/2011EP2276709A2 Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition
01/26/2011EP2276546A1 Process for the phase transformation of substances
01/26/2011EP1807634B1 Counter track joint having a track inflection point
01/26/2011EP1346082B1 Coated cemented carbide cutting tool insert
01/26/2011EP1130948B1 Inner-electrode plasma processing apparatus and method of plasma processing
01/26/2011CN201722426U Automatic substrate loading and unloading mechanism of horizontal vacuum coating machine
01/26/2011CN101960044A Solid precursor sublimator
01/26/2011CN101960040A Corrosion resistant object with alloying zone
01/26/2011CN101959897A Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process
01/26/2011CN101959795A Thin film of metal silicon compound and process for producing the thin film of metal silicon compound
01/26/2011CN101959794A Method for recycling silane (SiH4)
01/26/2011CN101959631A Surface coated member and cutting tool
01/26/2011CN101958365A Method for realizing slowly-varying lamination antireflection coating of solar cell
01/26/2011CN101958284A Method for improving current carrier migration rate of MOS transistor
01/26/2011CN101958249A Method for improving current carrier migration rate of MOS transistor
01/26/2011CN101958235A Method for manufacturing metal-insulator-metal capacitor
01/26/2011CN101956183A Chemical vapor deposition furnace
01/26/2011CN101956182A Gas wall structure for chemical vapor deposition equipment
01/26/2011CN101956181A Preparation method of transition metal nickel oxide and cobalt oxide nanowire array
01/26/2011CN101956180A Antireflective film SiNx:H surface in-situ NH3 plasma treatment method
01/26/2011CN101956179A Method for depositing silver-bearing diamond thin film at lower temperature
01/26/2011CN101956178A Boron-doped nanocrystalline diamond film and preparation method thereof
01/26/2011CN101956177A Rotary bin for vacuum continuous coating production line
01/26/2011CN101956173A Bearing assembly and coating device utilizing same
01/26/2011CN101956162A Heating platform
01/26/2011CN101955495A Organometallic precursor compounds
01/26/2011CN101392368B Plasma treatment facility and plasma treatment method for bottle
01/26/2011CN101296554B Plasma processing device and electric pole plate thereof
01/26/2011CN101243535B Optical emission interferometry for PECVD using a gas injection hole
01/26/2011CN101072900B CVD reactor comprising an rf-heated treatment chamber
01/26/2011CN101014547B Process for the deposition of aluminium oxide coatings
01/25/2011US7877161 Method and system for performing a chemical oxide removal process
01/25/2011US7877120 Battery-operated wireless-communication apparatus and method
01/25/2011US7875829 Thermal flux processing by scanning a focused line beam
01/25/2011US7875549 Fluorine doped carbon films produced by modification by radicals
01/25/2011US7875323 liquid crystal display made by forming a conductive layer on a base substrate, then a buffer layer comprising a polymer-like carbon thin film, an alignment layer on the buffer layer; and having a non-contact type vertical alignment layer capable of preventing a deterioration of light transmittance
01/25/2011US7875322 Plasma processing method
01/25/2011US7875312 Process for producing silicon oxide films for organoaminosilane precursors
01/25/2011US7875309 Using liquid jets; determination velocity; forming pattern; wear resistant
01/25/2011US7875119 Apparatus and method for coating an article
01/25/2011US7874432 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus
01/25/2011CA2500898C Method for forming thin film and apparatus therefor
01/25/2011CA2382070C Method of containing a phase change material in a porous carbon material and articles produced thereby
01/20/2011WO2011008849A1 A method of inhibiting formation of deposits in a manufacturing system
01/20/2011WO2011008778A2 Metal and metal oxide structures and preparation thereof
01/20/2011WO2011008617A1 Atomic layer deposition coatings on razor
01/20/2011WO2011007762A1 Process for production of laminate having aluminum nitride monocrystal layer, laminate produced by the process, process for production of aluminum nitride monocrystal substrate using the laminate, and aluminum nitride monocrystal substrate
01/20/2011WO2011007754A1 Vapor phase growth device
01/20/2011WO2011007745A1 Microwave plasma processing device and microwave plasma processing method
01/20/2011WO2011007709A1 Film-forming method
01/20/2011WO2011007653A1 Method for producing diamond-like carbon film body.
01/20/2011WO2011007580A1 Substrate processing method
01/20/2011WO2011007323A1 Deposition of group iv metal-containing films at high temperature
01/20/2011WO2011007124A2 Sample holder
01/20/2011WO2011007064A1 Method for texturing dlc coatings, and thus-textured dlc coatings
01/20/2011WO2010133607A3 Method for coating micromechanical parts with high tribological performances for application in mechanical systems
01/20/2011WO2010090504A4 Apparatus for vacuum coating
01/20/2011US20110014789 Manufacturing apparatus and method for semiconductor device
01/20/2011US20110014785 Method for manufacturing semiconductor device, and semiconductor manufacturing apparatus used in said method
01/20/2011US20110014446 Method for forming carbon nanotube film, film-forming apparatus, and carbon nanotube film
01/20/2011US20110014432 Hydrophilic sheet and method of imparting ultrahigh hydrophilicity to surface of base material
01/20/2011US20110014424 Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration
01/20/2011US20110014400 Method and system for making thin metal films
01/20/2011US20110014398 Film deposition apparatus and film deposition method
01/20/2011US20110014397 Apparatus and method for processing substrate
01/20/2011US20110014396 Recirculating linear rolling bushing
01/20/2011US20110014395 Method for depositing a fluorinated layer from a precursor monomer