Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2011
02/16/2011EP2284290A1 Water-reactive al composite material, water-reactive al film, method for production of the al film, and structural member for film-forming chamber
02/16/2011EP2283168A1 Method for producing nanoscalar electrically conductive multilayer systems
02/16/2011CN201746583U Penning discharge ion source flexible material vacuum coating electrode
02/16/2011CN101978477A Method for film formation, apparatus for film formation, and computer-readable recording medium
02/16/2011CN101978472A Nanofilm protective and release matrices
02/16/2011CN101978095A Coaxial microwave assisted deposition and etch systems
02/16/2011CN101974739A Plasma-enhanced chemical vapor deposition device
02/16/2011CN101974738A Plasma enhanced chemical vapor deposition device
02/16/2011CN101974737A Graphite boat anti-seize transmission device
02/16/2011CN101974736A Chemical vapor deposition device and spray head assembly thereof
02/16/2011CN101974735A Inductively coupled plasma processing apparatus
02/16/2011CN101974734A Method for preparing substrate material with multilayer composite protective film
02/16/2011CN101506952B Oxide film forming method and apparatus therefor
02/16/2011CN101120122B Gas distribution showerhead featuring exhaust apertures
02/15/2011US7890220 Low overhead closed loop control system
02/15/2011US7888619 Machine for the treatment of bottles that are equipped with an interchangeable connection cartridge
02/15/2011US7887884 Method for atomic layer deposition of materials using an atmospheric pressure for semiconductor devices
02/15/2011US7887883 Composition and method for low temperature deposition of silicon-containing films
02/15/2011US7887875 Method to reduce photoresist poisoning
02/15/2011US7887874 Fully automated paste dispense system for dispensing small dots and lines
02/15/2011US7887873 Gasification monitor, method for detecting mist, film forming method and film forming apparatus
02/15/2011US7887692 Palladium plating solution
02/15/2011US7887670 Gas introducing mechanism and processing apparatus for processing object to be processed
02/15/2011US7887637 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning
02/15/2011US7887635 Printing head for nano patterning
02/15/2011US7887632 Process for producing monocrystal thin film and monocrystal thin film device
02/15/2011US7887628 Chemical vapor deposited diamond having a thickness of >2 mm of high purity/quality; single impurity of not greater than 1 ppm and a total impurity content of not greater than 5 ppm; high value electron mobility, wide band gap device; anvils
02/15/2011US7887385 Organic EL light emitting element, manufacturing method thereof, and display device
02/15/2011US7886808 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus
02/15/2011US7886690 Plasma source
02/15/2011US7886689 Plasma processing apparatus
02/15/2011US7886688 Plasma processing apparatus
02/15/2011US7886687 Plasma processing apparatus
02/15/2011US7886686 Installation for the vacuum treatment in particular of substrates
02/15/2011CA2588035C Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion cvd
02/15/2011CA2393531C Chemical vapor deposition method and coatings produced therefrom
02/10/2011WO2011017338A2 Method for making graphene
02/10/2011WO2011017068A1 High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films
02/10/2011WO2011016512A1 Process for production of semiconductor device, and apparatus for production of semiconductor device
02/10/2011WO2011016471A1 Apparatus for producing a thin-film lamination
02/10/2011WO2011016304A1 Epitaxial substrate for semiconductor element, method for manufacturing epitaxial substrate for semiconductor element, and semiconductor element
02/10/2011WO2011016219A1 Epitaxial substrate for electronic devices and manufacturing method for said epitaxial substrate
02/10/2011WO2011016121A1 Film-forming apparatus
02/10/2011WO2010123666A3 Method and apparatus for growing a thin film onto a substrate
02/10/2011US20110034993 Coated medical implants
02/10/2011US20110033728 Method and System for Repairing Cracks in Structures
02/10/2011US20110033688 Large area deposition of graphene via hetero-epitaxial growth, and products including the same
02/10/2011US20110033661 Controllable nanostructuring on micro-structured surfaces
02/10/2011US20110033639 Apparatus and process for carbon nanotube growth
02/10/2011US20110033638 Method and apparatus for deposition on large area substrates having reduced gas usage
02/10/2011US20110033623 Method of preventing carbon friction material anti oxidation system migration by utilizing carbon vapor deposition
02/10/2011US20110033622 Nonwoven preforms made with increased areal weight fabric segments for aircraft friction materials
02/10/2011US20110033621 Thin film deposition apparatus including deposition blade
02/10/2011US20110033620 Compound lift pin tip with temperature compensated attachment feature
02/10/2011US20110033619 Thin film deposition apparatus including deposition blade
02/10/2011US20110033618 Gas supply system and method for providing a gaseos deposition medium
02/10/2011US20110033612 Disc vapor lubrication
02/10/2011US20110033610 Modular and readily configurable reactor enclosures and associated function modules
02/10/2011US20110033365 Process and apparatus for producing carbonaceous film
02/10/2011US20110033284 Structurally diverse thermal barrier coatings
02/10/2011US20110030899 Plasma processing apparatus using transmission electrode
02/10/2011US20110030898 Plasma Processing Apparatus and the Upper Electrode Unit
02/10/2011US20110030617 Plasma system
02/10/2011US20110030615 Method and apparatus for dry cleaning a cooled showerhead
02/10/2011US20110030611 METHOD FOR PREPARING POLYCRYSTALS AND SINGLE CRYSTALS OF ZINC OXIDE (ZnO) ON A SEED BY CHEMICALLY ACTIVATED SUBLIMATION AT HIGH TEMPERATURE AND DEVICE FOR CARRYING OUT SAID METHOD
02/10/2011DE10320133B4 Verfahren zur Herstellung von einkristallinen oder quasi-einkristallinen Diamantschichten und auf einem Körper angeordnete einkristalline oder quasi-einkristalline Diamantschicht A process for the production of single crystalline or quasi-single-crystalline diamond layers and arranged on a body monocrystalline or quasi-monocrystalline diamond layer
02/10/2011DE102009035952A1 Flansch für ein CVD-Reaktorgehäuse, Verwendung einer Kamera bei einem CVD-Verfahren sowie CVD-Verfahren zur Erzeugung von Siliziumstangen Flange for a CVD reactor housing, a camera is used in a CVD process and the CVD process for the production of silicon rods
02/09/2011EP2282619A1 Plasma processing apparatus
02/09/2011EP2282198A1 Method for applying a layer to a substrate
02/09/2011EP2281922A2 Method and apparatus of using solution based precursors for atomic layer deposition
02/09/2011EP2281921A1 Apparatus and method for atomic layer deposition.
02/09/2011EP2281920A1 Porous low dielectric constant compositions and methods for making and using same
02/09/2011EP2281915A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSITION CHAMBER
02/09/2011EP2281914A1 PROCESS FOR PRODUCTION OF WATER-REACTIVE Al FILM AND CONSTITUENT MEMBERS FOR FILM DEPOSITION CHAMBERS
02/09/2011EP2281300A2 Methods and apparatus for a chemical vapor deposition reactor
02/09/2011EP2281073A1 High-k dielectric films and methods of producing using titanium-based -diketonate precursors
02/09/2011EP2193220B1 Method of patterning a mesoporous nano particulate layer
02/09/2011EP1448486B1 Burner for a vapour deposition process
02/09/2011CN1962934B Method of fabricating a silicon nitride stack
02/09/2011CN101971322A Method of aftertreatment of amorphous hydrocarbon film and method for manufacturing electronic device by using the aftertreatment method
02/09/2011CN101971303A Method for sr-ti-o-based film formation and storage medium
02/09/2011CN101971292A Cathode electrode for plasma cvd and plasma cvd apparatus
02/09/2011CN101971288A Plasma system
02/09/2011CN101970717A Body coated with hard material
02/09/2011CN101970716A Body coated with hard material
02/09/2011CN101970715A Method and system for depositing a metal or metalloid on carbon nanotubes
02/09/2011CN101970714A Multi-pass vacuum coating systems
02/09/2011CN101969020A Deposition apparatus and method of manufacturing a semiconductor device
02/09/2011CN101967638A Preparation method of diamond film inner wall of fracture well head
02/09/2011CN101967627A Charging chamber for chemical vapor phase deposition device
02/09/2011CN101967626A Method for preparing high-hardness diamond film on surface of medical CoCrMo alloy
02/09/2011CN101629281B Metallorganics chemical gas phase deposition liquid inlet device
02/09/2011CN101388330B Semiconductor manufacture device and method by heating substrate
02/09/2011CN101374666B Liquid discharging head base, liquid discharging head using such base and method for manufacturing such base and head
02/09/2011CN101162686B Heat treatment apparatus
02/09/2011CN100999388B Preparation method of polycrystalline silicon film by surface modifying solution for inducing crystallization
02/08/2011US7883997 Solid-phase sheet growing substrate and method of manufacturing solid-phase sheet
02/08/2011US7883789 Solar cells; film has discontinuous ridges of a first metal oxide and a continuous layer of a second metal oxide that has a continuous series of micron-size protrusions formed over and between the ridges; low resistance, a high transparency, good light scattering of solar spectrum; mass reproduction
02/08/2011US7883775 Diamond film coated tool and process for producing the same
02/08/2011US7883750 Thin films and a method for producing the same