Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2011
02/08/2011US7883746 Insulating film formation method which exhibits improved thickness uniformity and improved composition uniformity
02/08/2011US7883745 introducing a solvent into the vaporizer; vaporizing the introduced solvent to produce vapor phase and liquid phase, refluxing introduced solvent between liquid and vapor phases in the vaporizer for a period of time; removing contaminants, condensing vaporized solvent contacting the vaporizer; cleaning
02/08/2011US7883744 Use of a titanium-copper-nickel-based alloy
02/08/2011US7883743 Sacrificial coating for fluoride ion cleaning
02/08/2011US7883639 stabilized cyclic alkene composition comprising cyclic alkenes and antioxidant compound to reduce or eliminate residue formation upon evaporation of such compositions; used to form dielectric films
02/08/2011US7883601 Apparatus and method for controlling relative particle speeds in a plasma
02/08/2011US7883600 RF supply system and plasma processing apparatus
02/08/2011US7883583 Vaporization apparatus with precise powder metering
02/08/2011US7883581 Substrate processing apparatus and method of manufacturing semiconductor device
02/08/2011US7883580 System and method for nanotube growth via Ion implantation using a catalytic transmembrane
02/08/2011US7883579 Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus
02/08/2011US7882800 Ring mechanism, and plasma processing device using the ring mechanism
02/03/2011WO2011014762A1 Apparatus for atomic layer deposition
02/03/2011WO2011014110A1 Coated cutting tool insert for turning of steels
02/03/2011WO2011014070A1 Apparatus and method for atomic layer deposition
02/03/2011WO2011013812A1 Semiconductor device production apparatus and semiconductor device production method
02/03/2011WO2011013811A1 Semiconductor device production apparatus and semiconductor device production method
02/03/2011WO2011013810A1 Semiconductor device production method and semiconductor device production apparatus
02/03/2011WO2011013775A1 Transparent conductive substrate for solar cells, and solar cell
02/03/2011WO2011013746A1 Film-forming apparatus
02/03/2011WO2011013719A1 Transparent conductive substrate for solar cell, and solar cell
02/03/2011WO2011013702A1 Plasma processing device and plasma processing method
02/03/2011WO2011013697A1 Film-forming apparatus
02/03/2011WO2011013633A1 Planar antenna member and plasma processing device equipped with same
02/03/2011WO2011013461A1 Plasma processing apparatus
02/03/2011WO2011013460A1 Plasma processing apparatus
02/03/2011WO2011013459A1 Plasma processing apparatus
02/03/2011WO2011013458A1 Plasma processing apparatus, method for using plasma processing apparatus, and method for cleaning plasma processing apparatus
02/03/2011WO2011012636A1 Process for the preparation of a coated substrate, coated substrate, and use thereof
02/03/2011WO2011012185A1 Cleaning of a process chamber
02/03/2011WO2010144730A3 Method for manufacturing multi-component oxide heterostructures
02/03/2011WO2010132611A3 Textured metal nanopetals
02/03/2011WO2010046373A3 Atomic layer deposition powder coating
02/03/2011WO2009118457A8 A coating and a method for producing a coating
02/03/2011US20110027979 Dielectric film, method of manufacutring semiconductor device using dielectric film, and semiconductor manufacturing apparatus
02/03/2011US20110027608 Object having a ductile and corrosion resistant surface layer
02/03/2011US20110027506 Functional composite material
02/03/2011US20110027482 Layered composite including cubic boron nitride
02/03/2011US20110027481 Device and method for organic vapor jet deposition
02/03/2011US20110027480 Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
02/03/2011US20110027465 Method for forming dielectric film and method for forming capacitor in semiconductor device using the same
02/03/2011US20110027457 Vapour delivery system
02/03/2011US20110026891 Single mode optical fibers and modular method of making same
02/03/2011US20110026187 Conductive Seal Ring Electrostatic Chuck
02/03/2011US20110024048 Plasma processing apparatus
02/03/2011US20110024047 Substrate support having fluid channel
02/03/2011US20110024022 Metrological scale
02/03/2011US20110023783 Multiple nozzle evaporator for vacuum thermal evaporation
02/03/2011US20110023782 Gas injection unit for chemical vapor desposition apparatus
02/03/2011US20110023781 Device for the plasma treatment of workpieces
02/03/2011US20110023541 Process For Manufacturing Cross-Corrugated Packings
02/03/2011DE102010028734A1 Gas separation arrangement comprises vacuum coating system designed as longitudinally extended flow through system
02/03/2011DE102009026249A1 Plasma unterstütztes Abscheideverfahren, Halbleitervorrichtung und Abscheidevorrichtung Plasma assisted deposition, semiconductor device and separator
02/03/2011DE10123554B4 Verfahren zur Erhöhung der Druckspannung oder zur Erniedrigung der Zugeigenspannung einer CVD-, PCVD- oder PVD-Schicht und Schneideinsatz zum Zerspanen A process for increasing the compressive stress or tensile stress to lower the a CVD, PCVD, or PVD-layer and cutting insert for chip removal
02/03/2011CA2767472A1 Process for the preparation of a coated substrate, coated substrate, and use thereof
02/02/2011EP2280091A1 METHOD FOR PRODUCTION OF WATER-REACTIVE Al FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
02/02/2011EP2279801A1 Coating methods using plasma jet, substrates coated thereby and plasma coating apparatus
02/02/2011EP2279518A2 Combinatorial plasma enhanced deposition techniques
02/02/2011EP2279285A2 Synthesis and use of precursors for ald of tellurium and selenium thin films
02/02/2011EP2279284A1 Metalorganic chemical vapor deposition of zinc oxide
02/02/2011EP1521297B1 Plasma processing equipment
02/02/2011CN201732776U Chemical vapor deposition process chamber wafer transfer device
02/02/2011CN201729880U Pin for fore-vacuum chamber tray
02/02/2011CN201729879U Support device
02/02/2011CN201729878U Exhaust line
02/02/2011CN201729877U Fastening assembly for chemical vapor deposition reaction chamber
02/02/2011CN101964378A Method for realizing graded laminated passivation film on back surface of solar cell
02/02/2011CN101964368A Laminated solar battery and manufacturing method thereof
02/02/2011CN101962769A Method for preparing hydrophobic film on surface of material
02/02/2011CN101962759A PECVD system with internal heater
02/02/2011CN101962758A Method for forming Hf-based gate medium film on germanium substrate by atomic layer deposition at low temperature
02/02/2011CN101962757A Method and device for forming film on substrate
02/02/2011CN101962756A Batch cvd method and apparatus for semiconductor process
02/02/2011CN101962754A Film coating device
02/02/2011CN101962753A Film coating device
02/02/2011CN101718652B Method for producing ultrahard pressure head
02/02/2011CN101519774B Plasma processing apparatus
02/02/2011CN101416284B Processing apparatus and processing method
02/01/2011US7881573 Optical imaging probe connector
02/01/2011US7880392 Plasma producing method and apparatus as well as plasma processing apparatus
02/01/2011US7880122 Wafer having thermal circuit and power supplier therefor
02/01/2011US7879412 Diamond thin film coating method and diamond-coated cemented carbide member
02/01/2011US7879401 Organic vapor jet deposition using an exhaust
02/01/2011US7879400 Substrate processing apparatus, method of manufacturing a semiconductor device, and method of forming a thin film on metal surface
02/01/2011US7879399 CV method using metal carbonyl gas
02/01/2011US7879398 Chemical vapor deposition growth perpendicular to substrate then second group grown on sidewalls of first group; simple; high resolution, low voltage, uniform emission
02/01/2011US7879397 Method for processing polysilazane film
02/01/2011US7879396 High aspect ratio performance coatings for biological microfluidics
02/01/2011US7879203 Hollow cathode of coating material; subject cathode, anode and substrate to a vacuum; cool the hollow cathode; connect a power source to cathode; apply a current to form an arc to remove coating material from the outer circumference; form a cloud of coating in the vacuum, deposit on substrate
02/01/2011US7879201 Method and apparatus for surface processing of a substrate
02/01/2011US7879187 Plasma etching apparatus
02/01/2011US7879186 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor
02/01/2011US7879185 Dual frequency RF match
02/01/2011US7879183 Apparatus and method for front side protection during backside cleaning
02/01/2011US7879182 Shower plate, plasma processing apparatus, and product manufacturing method
02/01/2011US7879181 Apparatus for manufacturing flat-panel display
02/01/2011US7879179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
02/01/2011US7879151 Mask etch processing apparatus
02/01/2011US7879150 Silicon carbide manufacturing device and method of manufacturing silicon carbide
02/01/2011US7879149 Vacuum processing apparatus