| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/24/2011 | WO2011021578A1 Method for producing epitaxial silicon wafer |
| 02/24/2011 | WO2011021538A1 Substrate treating apparatus, arithmetic control mechanism, air-release valve, and pressure control method |
| 02/24/2011 | WO2011021349A1 Method for manufacturing silicon epitaxial wafer |
| 02/24/2011 | WO2011020924A1 Planar heating unit for a substrate treatment device and substrate treatment device |
| 02/24/2011 | WO2011020739A1 Aluminium oxide coated body and method for the production thereof |
| 02/24/2011 | WO2010132424A3 Corrosion protection and lubrication of mems devices |
| 02/24/2011 | WO2010129718A3 Method and reactor for growing gallium nitride crystals using ammonia and hydrogen chloride |
| 02/24/2011 | WO2010007356A3 Ald gas delivery device |
| 02/24/2011 | WO2007117742A3 Batch processing system and method for performing chemical oxide removal |
| 02/24/2011 | US20110046768 Determining Characteristics of Electric Cables Using Terahertz Radiation |
| 02/24/2011 | US20110046026 Nanographene layers and particles and lubricants incorporating the same |
| 02/24/2011 | US20110045675 Substrate processing apparatus and producing method of semiconductor device |
| 02/24/2011 | US20110045617 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
| 02/24/2011 | US20110045349 3d approach on battery and supercapacitor fabrication by initiation chemical vapor deposition techniques |
| 02/24/2011 | US20110045208 Diamond-like carbon film forming apparatus and method of forming diamond-like carbon film |
| 02/24/2011 | US20110045207 Method for producing carbon nanowalls |
| 02/24/2011 | US20110045206 In-situ deposition of battery active lithium materials by plasma spraying |
| 02/24/2011 | US20110045205 Device and Process for Very High-Frequency Plasma-Assisted CVD under Atmospheric Pressure, and Applications Thereof |
| 02/24/2011 | US20110045183 Methods of forming a layer, methods of forming a gate structure and methods of forming a capacitor |
| 02/24/2011 | US20110045182 Substrate processing apparatus, trap device, control method for substrate processing apparatus, and control method for trap device |
| 02/24/2011 | US20110045181 Applying vapour phase aluminide coating on airfoil internal cavities using improved method |
| 02/24/2011 | US20110045167 Ejection amount correction method and coating apparatus |
| 02/24/2011 | US20110045166 Hydrophobicizing apparatus, hydrophobicizing method and storage medium |
| 02/24/2011 | US20110044779 Work piece with a hard film of alcr-containing material, and process for its production |
| 02/24/2011 | US20110042659 Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
| 02/24/2011 | US20110042578 Ion beam monitoring arrangement |
| 02/24/2011 | US20110042208 Film forming source, vapor deposition apparatus, and apparatus for manufacturing an organic el element |
| 02/24/2011 | US20110041769 Apparatus for chemical vapor deposition and apparatus for processing substrate |
| 02/24/2011 | US20110041768 Heat equalizer and organic film forming apparatus |
| 02/24/2011 | US20110041767 Metal capturing apparatus and atomic layer deposition apparatus having the same |
| 02/24/2011 | US20110041766 Plasma source |
| 02/24/2011 | US20110041765 Film deposition device |
| 02/24/2011 | US20110041764 Batch processing platform for ald and cvd |
| 02/24/2011 | DE102010027852A1 Maskenrahmenanordnung zur Dünnfilmabscheidung und zugehörige Verfahren Mask frame assembly for thin film deposition and associated methods |
| 02/24/2011 | DE102010026987A1 Herstellvorrichtung und -verfahren für Halbleiterbauelement Fabrication and method for semiconductor device |
| 02/23/2011 | EP2287394A1 Method for working polymeric and inorganic materials with plasma |
| 02/23/2011 | EP2287368A2 Apparatus and method for producing (Ai, Ga, In)N material using an in-situ laser for parting this material |
| 02/23/2011 | EP2287355A1 Fine grained cemented carbide with refined structure |
| 02/23/2011 | EP2287354A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSTION CHAMBER |
| 02/23/2011 | EP2286006A1 Methods and apparatus for deposition reactors |
| 02/23/2011 | EP2286002A1 Method for making oriented tantalum pentoxide films |
| 02/23/2011 | EP2286001A1 Method of coating inner and outer surfaces of pipes for thermal solar and other applications |
| 02/23/2011 | EP1859077B1 A system and a method for the production of micro-electro-mechanical systems |
| 02/23/2011 | EP1612853B1 Cooling device for vacuum treatment device |
| 02/23/2011 | CN101981677A Epitaxial substrate for smeiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element |
| 02/23/2011 | CN101981669A Shower plate and plasma processing device using the same |
| 02/23/2011 | CN101981668A Control method and processor of exhaust gas flow rate of processing chamber |
| 02/23/2011 | CN101981660A Organometallic-compound feeder |
| 02/23/2011 | CN101981658A Epitaxial substrate for semiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element |
| 02/23/2011 | CN101981226A Deposition of ternary oxide films containing ruthenium and alkali earth metals |
| 02/23/2011 | CN101981225A Low wet etch rate silicon nitride film |
| 02/23/2011 | CN101980935A Method and device for fixing and transporting impact-sensitive sheets in sputter feed systems |
| 02/23/2011 | CN101979707A Carbon chemical adsorption method for preparing graphene film by using atomic layer deposition |
| 02/23/2011 | CN101091420B Surface wave excitation plasma generator and surface wave excitation plasma processing system |
| 02/23/2011 | CN101052745B Apparatuses and methods for atomic layer deposition of hafnium-containing high-K dielectric materials |
| 02/22/2011 | US7894919 Fully automated paste dispense system for dispensing small dots and lines |
| 02/22/2011 | US7893433 Thin films and methods of making them |
| 02/22/2011 | US7892917 Method for forming bismuth titanium silicon oxide thin film |
| 02/22/2011 | US7892611 Plasma generating electrode assembly |
| 02/22/2011 | US7892604 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating |
| 02/22/2011 | US7892602 Cyclical deposition of refractory metal silicon nitride |
| 02/22/2011 | US7892404 Method for oxidizing substance and oxidation apparatus therefor |
| 02/22/2011 | US7892361 In-chamber member, a cleaning method therefor and a plasma processing apparatus |
| 02/22/2011 | US7892358 System for introducing a precursor gas to a vapor deposition system |
| 02/22/2011 | US7892357 Gas distribution plate assembly for plasma reactors |
| 02/22/2011 | US7892356 Diamond composite substrate and process for producing the same |
| 02/22/2011 | US7892343 Method for manufacturing slurry and mold for precision casting |
| 02/17/2011 | WO2011020042A2 Hafnium- and zirconium-containing precursors and methods of using the same |
| 02/17/2011 | WO2011020028A2 Silane blend for thin film vapor deposition |
| 02/17/2011 | WO2011019950A1 Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species |
| 02/17/2011 | WO2011019920A1 High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith |
| 02/17/2011 | WO2011019215A2 Apparatus for forming layer |
| 02/17/2011 | WO2011018917A1 Diamond-coated tool |
| 02/17/2011 | WO2011018912A1 Plasma cvd apparatus, plasma electrode, and method for manufacturing semiconductor film |
| 02/17/2011 | WO2011018831A1 Apparatus and method for removing contact hole surface protective film of semiconductor silicon wafer and burying film into contact hole of semiconductor silicon wafer |
| 02/17/2011 | WO2011018252A1 Sliding element, in particular a piston ring, having a coating |
| 02/17/2011 | US20110039690 Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
| 02/17/2011 | US20110039420 Film forming apparatus and film forming method |
| 02/17/2011 | US20110039418 Method for insulating film formation, storage medium from which information is readable with computer, and treatment system |
| 02/17/2011 | US20110039399 Manufacturing apparatus and method for semiconductor device |
| 02/17/2011 | US20110039367 Masked ion implant with fast-slow scan |
| 02/17/2011 | US20110039036 Remote non-thermal atmospheric plasma treatment of temperature sensitive particulate materials and apparatus therefore |
| 02/17/2011 | US20110039026 Film deposition apparatus, film deposition method, and computer readable storage medium |
| 02/17/2011 | US20110039025 Method of patterning vapour deposition by printing |
| 02/17/2011 | US20110038785 Method for manufacturing carbon nanotube |
| 02/17/2011 | US20110038130 Plasma enhanced polymer ultra-thin multi-layer packaging |
| 02/17/2011 | US20110036874 Solid yttrium oxide-containing substrate which has been cleaned to remove impurities |
| 02/17/2011 | US20110036499 Substrate treatment apparatus |
| 02/17/2011 | US20110036294 Manufacturing Apparatus For Depositing A Material And An Electrode For Use Therein |
| 02/17/2011 | US20110036293 Vapor deposition device |
| 02/17/2011 | US20110036292 Manufacturing Apparatus For Depositing A Material And An Electrode For Use Therein |
| 02/17/2011 | US20110036291 Arrangement in connection with ald reactor |
| 02/17/2011 | DE202010015818U1 Vorrichtung zum Behandeln eines Substrats mittels eines Plasmas An apparatus for treating a substrate by means of a plasma |
| 02/17/2011 | DE102009049570B3 Anordnung zur Gasseparation und deren Verwendung Arrangement for gas separation and their use |
| 02/17/2011 | CA2747216A1 Diamond coated tool |
| 02/16/2011 | EP2284875A2 Film forming method, fabrication method of semiconductor device, semiconductor device, and substrate processing system |
| 02/16/2011 | EP2284869A1 Thin film formation device and semiconductor film manufacturing method |
| 02/16/2011 | EP2284297A1 Method for achieving improved epitaxy quality (surface texture and defect density) on free-standing (aluminium, indium, gallium) nitride ((AI, In,Ga)N) substrates for opto-electronic and electronic devices |
| 02/16/2011 | EP2284294A2 Aluminia coating, coated product and method of making the same |
| 02/16/2011 | EP2284291A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, METHOD FOR PRODUCTION OF THE AL FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER |