Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2011
03/17/2011US20110064890 Film deposition method
03/17/2011US20110064885 Apparatus and method for film deposition
03/17/2011US20110064879 Organometallic compounds
03/17/2011US20110064878 Apparatus and method for film deposition
03/17/2011US20110064877 Gas supply device, vacuum processing apparatus and method of producing electronic device
03/17/2011US20110064645 Carbon nanotube and method for producing the same
03/17/2011US20110064530 Coated ceramic cutting insert and method for making the same
03/17/2011US20110063601 Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame
03/17/2011US20110062460 Organic el light emitting element, manufacturing method thereof, and display device
03/17/2011US20110062113 Substrate processing apparatus and method
03/17/2011US20110061595 High temperature gas heating device for a vapor deposition system
03/16/2011EP2294608A2 Modular and readily configurable reactor enclosures and associated function modules
03/16/2011EP2294247A1 Apparatus and method for high-throughput atomic layer deposition
03/16/2011EP2294246A1 Method for depositing a thin-film polymer in a low-pressure gas phase
03/16/2011EP2294245A1 Arrangement in connection with ald reactor
03/16/2011EP2294244A1 Thermal gradient enhanced chemical vapour deposition (tge-cvd)
03/16/2011EP2294243A1 Deposition method
03/16/2011EP2294242A1 Combustion deposition burner and/or related methods
03/16/2011EP2294239A1 Coating method and device using a plasma-enhanced chemical reaction
03/16/2011EP2294026A1 Composite coatings comprising hollow and/or shell-like metal oxide particles deposited via combustion deposition
03/16/2011EP2293861A2 Machine for processing vessels made of thermoplastic material
03/16/2011EP2089560B1 Sliding mating part in lubricated regime, coated by a thin film
03/16/2011EP1809792B1 Common rack for electroplating and pvd coating operations
03/16/2011EP1711643B1 Method for the production of an ultra barrier layer system
03/16/2011EP1300380B1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating.
03/16/2011CN201762441U Plasma enhanced chemical vapor deposition furnace
03/16/2011CN201762440U Epicyclic loading vehicle of graphite frame
03/16/2011CN101985747A Substrate processing apparatus
03/16/2011CN101985746A Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
03/16/2011CN101985745A Chemical vapor deposition (CVD) apparatus and substrate processing apparatus
03/16/2011CN101985744A Method for preparing monocrystalline cubic carbon nitride thin film
03/16/2011CN101985743A Method for preparing silicon carbide film by adopting plasma enhanced chemical vapor deposition (PECVD)
03/16/2011CN101985742A Gas ejection unit for chemical vapor deposition device
03/16/2011CN101657888B Method of cleaning powdery source supply system, substrate treating system and method of substrate treatment
03/16/2011CN101591774B Chemical vapor deposition apparatus
03/16/2011CN101591771B Device for positioning and supporting base of vacuum equipment
03/16/2011CN101321427B DC magnetic filtering cathode vacuum arc plasma source
03/16/2011CN101319313B Power transport mechanism and plasma auxiliary chemical vapor deposition apparatus using the same
03/15/2011US7906668 Imide complex, method for producing the same, metal-containing thin film and method for producing the same
03/15/2011US7906411 Deposition technique for producing high quality compound semiconductor materials
03/15/2011US7906409 Device manufacturing method
03/15/2011US7906175 Methods for forming a ruthenium-based film on a substrate
03/15/2011US7906174 PECVD methods for producing ultra low-k dielectric films using UV treatment
03/15/2011US7906032 Method for conditioning a process chamber
03/15/2011US7905982 Antenna for plasma processor apparatus
03/15/2011US7905961 Linear type deposition source
03/15/2011US7905960 Apparatus for manufacturing substrate
03/15/2011US7905959 Lid assembly for a processing system to facilitate sequential deposition techniques
03/15/2011CA2316652C Moisture insensitive electroluminescent phosphor
03/10/2011WO2011029096A2 Plasma enhanced chemical vapor deposition apparatus
03/10/2011WO2011028119A1 Coating method and coating apparatus
03/10/2011WO2011027835A1 METHOD FOR FORMING Co FILM
03/10/2011WO2011027834A1 METHOD FOR FORMING Co FILM AND METHOD FOR FORMING Cu WIRING FILM
03/10/2011WO2011027565A1 Gas supply system
03/10/2011WO2011027481A1 Semiconductor device and method for manufacturing same
03/10/2011WO2011027321A1 Dihalide germanium(ii) precursors for germanium-containing film depositions
03/10/2011WO2011027035A1 Process and apparatus for controlling coating deposition
03/10/2011WO2011026565A1 Method for applying layers
03/10/2011US20110060165 Metal aminotroponiminates, bis-oxazolinates and guanidinates
03/10/2011US20110059307 Method to prepare superhydrophobic surfaces on solid bodies by rapid expansion solutions
03/10/2011US20110059240 Process for the manufacturing of dense silicon carbide
03/10/2011US20110059231 Methods and devices for processing a precursor layer in a group via environment
03/10/2011US20110059230 Method for metalizing solar cells, hot-melt aerosol ink, and aerosol jet printing system
03/10/2011US20110059003 Methods of growing a silicon carbide epitaxial layer on a substrate to increase and control carrier lifetime
03/10/2011US20110058952 High-temperature anti-corrosive layer and method for the production thereof
03/10/2011US20110056912 Plasma processing apparatus and plasma processing method
03/10/2011US20110056729 Insulated conductive element having a substantially continuous barrier layer formed through continuous vapor deposition
03/10/2011US20110056625 Electron beam etching device and method
03/10/2011US20110056436 A device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device
03/10/2011US20110056435 Plasma cvd apparatus, method for manufacturing microcrystalline semiconductor layer, and method for manufacturing thin film transistor
03/10/2011US20110056434 Heat treatment apparatus
03/10/2011US20110056433 Device for forming diamond film
03/10/2011US20110056273 condensation apparatus
03/10/2011DE4412541B4 Gaseinlassanlage und -verfahren Gas inlet system and method
03/10/2011DE102010029496A1 Method for energy supply of a load in a deposition process, comprises providing first and second electrical variables by a first and second controllable electric ignition means, where the electrical variables differ itself in its amounts
03/10/2011DE102009043960A1 CVD-Reaktor CVD reactor
03/10/2011DE102009038603A1 Producing fiber composite body, useful e.g. in aeronautical equipment, comprises providing fiber filaments bundle, introducing solid, powdery substance, producing fiber preform, infiltrating it, and carrying out chemical vapor infiltration
03/10/2011DE102005020666B4 Schichtbildungsquelle, vakuumunterstützte Vorrichtung zur Schichtbildung, Verfahren zur Herstellung eines organischen elektrolumineszierenden Bauelements Film forming source, vacuum-assisted apparatus for film formation, method of manufacturing an organic electroluminescent device
03/10/2011CA2773520A1 Coating method and coating apparatus
03/09/2011EP2293343A1 Apparatus for manufacturing thin film solar cell
03/09/2011EP2293342A1 Apparatus for manufacturing thin film solar cell
03/09/2011EP2293322A1 Method for forming a metal nitride layer
03/09/2011EP2292339A1 Coating method and coating apparatus
03/09/2011EP2291548A1 Methods of forming ruthenium-containing films by atomic layer deposition
03/09/2011EP1651802B1 Support system for treatment apparatuses
03/09/2011CN201758113U Film deposition device
03/09/2011CN201756586U Solar battery deposition box
03/09/2011CN201756585U Solar battery deposition fixture
03/09/2011CN201756584U Discharge electrode member for deposition of solar battery
03/09/2011CN201756583U Large size diamond like carbon (DLC) film depositing apparatus at low temperatures
03/09/2011CN101587156B Plasma monitoring method and apparatus
03/09/2011CN101171350B High performance alloys with improved metal dusting corrosion resistance
03/09/2011CN101158032B Film forming device and method thereof
03/08/2011US7902549 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same
03/08/2011US7902104 Divided solid composition composed of grains provided with continuous metal deposition, method for the production and use thereof in the form of a catalyst
03/08/2011US7902099 Dielectric layers and memory cells including metal-doped alumina
03/08/2011US7902049 Method for depositing high-quality microcrystalline semiconductor materials
03/08/2011US7901869 Double patterning with a double layer cap on carbonaceous hardmask
03/08/2011US7901788 Forming an aluminum intermetallic coatings by concurrently gas flowing at least two different halide precursor in an inert carrier gas, dehydrochlorination, vapor deposition, alloying
03/08/2011US7901786 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product