Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2011
03/08/2011US7901783 Low κ dielectric inorganic/organic hybrid films and method of making
03/08/2011US7901737 Process for producing magnetic recording medium
03/08/2011US7901736 Multilayer material and method of preparing same
03/08/2011US7901539 Apparatus and methods for transporting and processing substrates
03/08/2011US7901510 Bolt and plasma processing apparatus provided with same
03/08/2011US7901509 Heating apparatus with enhanced thermal uniformity and method for making thereof
03/08/2011US7901490 Reducing introduction of foreign material to wafers
03/08/2011US7900652 Gas supply system for a pumping arrangement
03/08/2011US7900580 Substrate processing apparatus and reaction container
03/08/2011US7900579 Heat treatment method wherein the substrate holder is composed of two holder constituting bodies that move relative to each other
03/03/2011WO2011026127A2 A local plasma confinement and pressure control arrangement and methods thereof
03/03/2011WO2011026126A2 A multi-peripheral ring arrangement for performing plasma confinement
03/03/2011WO2011026078A2 Apparatus for gaseous vapor deposition
03/03/2011WO2011026066A2 Film cassette for gaseous vapor deposition
03/03/2011WO2011025000A1 Oriented carbon nanotube manufacturing method
03/03/2011WO2011024995A1 Apparatus for forming deposited film and method for forming deposited film
03/03/2011WO2011024854A1 Silicon carbide epitaxial wafer and manufacturing method therefor
03/03/2011WO2011024749A1 Vacuum treatment device and vacuum treatment factory
03/03/2011WO2011023512A1 Cvd method and cvd reactor
03/03/2011WO2011023493A1 Cvd reactor and method for depositing a coating
03/03/2011WO2011023078A1 Deep silicon etching device and gas intake system for deep silicon etching device
03/03/2011WO2010144302A3 Roll-to-roll chemical vapor deposition system
03/03/2011WO2010141668A3 Methods of forming strontium titanate films
03/03/2011WO2010126274A3 Cigt thin film and method for fabricating same
03/03/2011US20110054633 Nanofilm Protective and Release Matrices
03/03/2011US20110053382 Substrate processing apparatus and semiconductor devices manufacturing method
03/03/2011US20110053357 Plasma cvd apparatus, method for forming microcrystalline semiconductor film and method for manufacturing semiconductor device
03/03/2011US20110052931 Coated Cutting Tools Having a Platinum Group Metal Concentration Gradient and Related Processes
03/03/2011US20110052924 Thin film forming method and thin film stack
03/03/2011US20110052909 Device for thermohydraulic applications with improved water softening properties, lower release of heavy metals, and relative method of manufacturing
03/03/2011US20110052834 Method and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology
03/03/2011US20110052833 Gas distribution showerhead and method of cleaning
03/03/2011US20110052832 Film forming method and film forming apparatus
03/03/2011US20110052810 Film forming method and storage medium
03/03/2011US20110052809 Method for application of an adhesion promoter composition to a substrate
03/03/2011US20110052808 Method of depositing a multilayer coating with a variety of oxide adhesion layers and organic layers
03/03/2011US20110052795 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
03/03/2011US20110052794 Vapor-phase growth apparatus and thin-film vapor-phase growth method
03/03/2011US20110052792 Method for printing electronic device using matching logic and method for manufacturing rfid tag using the same
03/03/2011US20110052791 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same
03/03/2011US20110052790 Kits for and methods of repair, maintenance and substantial color match of cementitious materials
03/03/2011US20110052482 Method and apparatus to help promote contact of gas with vaporized material
03/03/2011US20110052406 Airfoil and process for depositing an erosion-resistant coating on the airfoil
03/03/2011US20110049716 Structures of and methods and tools for forming in-situ metallic/dielectric caps for interconnects
03/03/2011US20110049512 Method for developing thin film from oxide or silicate of hafnium nitride, coordination compound used in said method, and method for producing integrated electronic circuit
03/03/2011US20110049491 Method for manufacturing a multi-layer stack structure with improved wvtr barrier property
03/03/2011US20110049102 Plasma treatment apparatus and method for plasma-assisted treatment of substrates
03/03/2011US20110048643 Plasma processing apparatus and focus ring
03/03/2011US20110048328 Apparatus for gaseous vapor deposition
03/03/2011US20110048327 Film cassette for gaseous vapor deposition
03/03/2011US20110048325 Gas Distribution Apparatus and Substrate Processing Apparatus Having the Same
03/03/2011US20110048313 Indicating thermal dosage exposure of electric lamps
03/03/2011DE102009043848A1 CVD-Verfahren und CVD-Reaktor CVD and CVD-reactor
03/03/2011DE102009043840A1 CVD-Reaktor mit streifenförmig verlaufenden Gaseintrittszonen sowie Verfahren zum Abscheiden einer Schicht auf einem Substrat in einem derartigen CVD-Reaktor CVD reactor with a strip shape extending gas inlet zones and to processes for depositing a layer on a substrate in such a CVD reactor
03/03/2011DE102009028579A1 Beschichtete Körper aus Metall, Hartmetall, Cermet oder Keramik sowie Verfahren zur Beschichtung derartiger Körper Coated body made of metal, hard metal, cermet or ceramic and method for coating such body
03/03/2011DE102009028577A1 Beschichtete Körper aus Metall, Hartmetall, Cermet, Keramik oder Halbleiterwerkstoff sowie Verfahren zur Beschichtung derartiger Körper Coated body made of metal, hard metal, cermet, ceramic or semiconductor material, and methods for coating such body
03/03/2011DE102007020800B4 Modifizierte Multikanalstrukturen und deren Verwendung Modified multi-channel structures and their use
03/02/2011EP2290701A1 Apparatus for manufacturing thin film solar cell
03/02/2011EP2290700A1 Apparatus for manufacturing thin film solar cell
03/02/2011EP2290136A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices
03/02/2011EP2290135A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices
03/02/2011EP2290127A1 Film deposition device
03/02/2011EP2290126A2 Atomic layer deposition systems and methods including metal beta-diketiminate compounds
03/02/2011EP2290124A1 Vacuum processing apparatus and method for operating vacuum processing apparatus
03/02/2011EP2290123A1 Processes for producing thin metal nitride layers, inter alia making use of a selective decomposition of alcoholates, processes for hardening a surface, for obtaining thin oxygen compound layers, articles comprising said layers and uses thereof, and a process for obtaining metal hydrides and aldehydes/ketones
03/02/2011EP2288739A1 Transparent barrier layer system
03/02/2011EP2288646A1 Method for depositing a scratch protection coating on a plastic substrate
03/02/2011EP2041332B1 Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
03/02/2011EP2009140B1 Method for microcrystalline silicon film formation
03/02/2011EP1636399B1 Coating for a mechanical part, comprising at least one hydrogenated amorphous carbon, and method of depositing one such coating
03/02/2011EP1564820B1 Boron phosphide semiconductor light-emitting device, method for manufacturing same, and light-emitting diode
03/02/2011EP1412551B1 Method of making a passivated surface
03/02/2011EP1018160B1 Method of fabricating a hydrogenated oxidized silicon carbon film
03/02/2011CN101983256A Piston ring
03/02/2011CN101982563A Plasma treatment device
03/02/2011CN101982562A Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturing
03/02/2011CN101289736B Partial pressure measuring method and partial pressure measuring apparatus
03/02/2011CN101029384B A method for thin film vapor deposition of dialkyl amido dihydro aluminium compound
03/01/2011USRE42175 Electrostatic chucking stage and substrate processing apparatus
03/01/2011US7899308 Evaporation device with receptacle for receiving material to be evaporated
03/01/2011US7897957 Non-volatile resistance switching memory
03/01/2011US7897938 Scintillator panel
03/01/2011US7897411 Non-volatile resistance switching memory
03/01/2011US7897259 Compounds and compositions for coating glass with silicon oxide
03/01/2011US7897215 Sequential UV induced chemical vapor deposition
03/01/2011US7897210 Device and method for organic vapor jet deposition
03/01/2011US7897209 Apparatus and method for producing aligned carbon-nanotube aggregates
03/01/2011US7897208 Low temperature ALD SiO2
03/01/2011US7897205 Film forming method and film forming apparatus
03/01/2011US7897025 Method and apparatus for forming thin film
03/01/2011US7897009 Plasma processing apparatus
03/01/2011US7896968 Winding type plasma CVD apparatus
03/01/2011US7896967 Gas supply system, substrate processing apparatus and gas supply method
03/01/2011US7896649 Heat system, heat method, and program
03/01/2011US7895971 Microwave plasma processing apparatus
03/01/2011US7895970 Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
02/2011
02/24/2011WO2011022637A1 Dual heating for precise wafer temperature control
02/24/2011WO2011021715A1 Substrate, substrate production method, semiconductor element, and semiconductor element production method
02/24/2011WO2011021635A1 Substrate processing system, group management device, and display method for substrate processing system
02/24/2011WO2011021607A1 Plasma processing apparatus and substrate processing method