C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2011
04/06/2011	CN101496148B Interrupted deposition process for selective deposition of si-containing films
04/06/2011	CN101471275B Device for holding substance to be processed
04/06/2011	CN101440483B Charging room for chemical vapor deposition device
04/06/2011	CN101312927B Laminated hard alloy piece
04/05/2011	US7919345 Method of fabricating micromechanical components with free-standing microstructures or membranes
04/05/2011	US7919143 Carrier for receiving an object and method for the production of a carrier
04/05/2011	US7919142 Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same
04/05/2011	US7919141 Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articles
04/05/2011	US7918940 Apparatus for processing substrate
04/05/2011	US7918939 Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same
04/05/2011	US7918938 High temperature ALD inlet manifold
04/05/2011	US7918293 Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
03/2011
03/31/2011	WO2011037798A1 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
03/31/2011	WO2011037251A1 Method for production of laminate
03/31/2011	WO2011037190A1 Deposited film formation device and deposited film formation method
03/31/2011	WO2011037090A1 Method for forming metal oxide film, method for forming manganese oxide film, and computer-readable storage medium
03/31/2011	WO2011037020A1 Method and apparatus for cooling subject to be processed, and computer-readable storage medium
03/31/2011	WO2011036514A1 Method for the production of an anticorrosive layer on a substrate
03/31/2011	WO2011011129A3 Coated tooling
03/31/2011	WO2010132585A3 Vessel processing
03/31/2011	WO2010132579A3 Vessel processing
03/31/2011	WO2010132172A3 Method for tuning a deposition rate during an atomic layer deposition process
03/31/2011	WO2010129431A3 Thermocouple and temperature measuring system
03/31/2011	US20110076511 Multi-layer high moisture barrier polylactic acid film
03/31/2011	US20110076509 Method for the Synthesis of Metallic Nanotubes and Nanotubes Synthesized by the Method
03/31/2011	US20110076482 Metallized Barrier Material
03/31/2011	US20110076476 Method of Producing a Hydrogenated Amorphous Carbon Coating
03/31/2011	US20110076456 Lens arrays and methods of making the same
03/31/2011	US20110076422 Curved microwave plasma line source for coating of three-dimensional substrates
03/31/2011	US20110076421 Vapor deposition reactor for forming thin film on curved surface
03/31/2011	US20110076403 Vaporization apparatus with precise powder metering
03/31/2011	US20110076402 System for controlling the sublimation of reactants
03/31/2011	US20110076401 Method of Making Showerhead for Semiconductor Processing Apparatus
03/31/2011	US20110076400 Nanocrystalline diamond-structured carbon coating of silicon carbide
03/31/2011	US20110076399 Deposition source
03/31/2011	US20110076398 Evaporation source and vapor deposition apparatus using the same
03/31/2011	US20110075293 Coatings For Tape Guides
03/31/2011	US20110073256 Semiconductor manufacturing apparatus
03/31/2011	US20110073184 Method for manufacturing monocrystalline thin film and monocrystalline thin film device manufactured thereby
03/31/2011	US20110073042 Substrate Centering Device and Organic Material Deposition System
03/31/2011	US20110073040 Substrate treatment apparatus
03/31/2011	US20110073038 Gas distribution plate and apparatus using the same
03/31/2011	US20110073037 Epitaxial growth susceptor
03/30/2011	EP2302667A1 Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device
03/30/2011	EP2302094A1 Low temperature deposition of phase change memory materials
03/30/2011	EP2301309A2 Clamped showerhead electrode assembly
03/30/2011	EP2301308A2 Clamped monolithic showerhead electrode
03/30/2011	EP2301090A1 Method to control deposition of organic molecules and organic electronic device
03/30/2011	EP2301067A1 Showerhead electrode assemblies for plasma processing apparatuses
03/30/2011	EP2300633A1 Process and installation for despositing films simultaneously onto both sides of a substrate.
03/30/2011	EP2010694B1 Apparatus and method for controlling the surface temperature of a substrate in a process chamber
03/30/2011	CN201780981U Movable fixture for solar battery
03/30/2011	CN201778112U Conveying flange of process gas
03/30/2011	CN201778111U Reactor for chemical vapor deposition
03/30/2011	CN201778110U Plasma enhanced chemical vapor deposition (PECVD) automatic loading and unloading boat device
03/30/2011	CN1938224B Method for treating surface of base, surface-treated base, material and instrument for medical use
03/30/2011	CN1712560B Vertical CVD apparatus and CVD method using the same
03/30/2011	CN101999174A Apparatus for manufacturing thin film solar cell
03/30/2011	CN101999173A Apparatus for manufacturing thin film solar cell
03/30/2011	CN101999172A Apparatus for manufacturing thin film solar cell
03/30/2011	CN101999159A Thin film solar cell manufacturing equipment
03/30/2011	CN101997057A Method and equipment for manufacturing solar cell
03/30/2011	CN101996878A Method for depositing low-dielectric constant insulating material layer
03/30/2011	CN101996869A Preparation method and preparation device for poly-silicon thin film
03/30/2011	CN101996843A Plasma processing device and focusing ring
03/30/2011	CN101994102A Film deposition device
03/30/2011	CN101994101A Film deposition apparatus and film deposition method
03/30/2011	CN101994100A Installation method of chemical vapor deposition equipment and chemical vapor deposition equipment
03/30/2011	CN101994099A Method for forming fluorine-doped silicon oxide thin film
03/30/2011	CN101994098A Method for preparing carbon-alumina solar energy heat absorbing coating by MOCVD
03/30/2011	CN101994097A Film coating device
03/30/2011	CN101994096A Vacuum film coater
03/30/2011	CN101994095A Coated umbrella stand
03/30/2011	CN101992466A Robot hand for grabbing wafer
03/30/2011	CN101563762B Showerhead electrode assembly with gas flow modification for extended electrode life
03/30/2011	CN101542695B Method for forming srTiO3 film
03/30/2011	CN101506950B Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
03/30/2011	CN101476116B Device and method for deposition
03/30/2011	CN101457359B Method for preparing Ti-Si-N nanocrystalline-amorphous composite superhard coating
03/30/2011	CN101403079B Method of manufacturing carbon/carbon-copper composite material
03/30/2011	CN101348249B Method for preparing carbon nano-tube array on particle interior surface
03/30/2011	CN101258784B Plasma processing device
03/30/2011	CN101246963B Carbon nano tube electrode formed by directly growing carbon nano tube and supporting platinum-based nano catalyst
03/30/2011	CN101092689B Low-impurity organosilicon product as precursor for cvd
03/30/2011	CN101083223B Ring assembly for substrate processing chamber
03/29/2011	US7915698 Nitride semiconductor substrate having a base substrate with parallel trenches
03/29/2011	US7915165 Substrate treating apparatus and method for manufacturing semiconductor device
03/29/2011	US7914913 Chemical vapor deposed nitride or carbonitride from at least nitrogen and aluminum chloride; adherence; chemical and wear resistance; machining modem metal materials
03/29/2011	US7914849 Alumina layer with controlled texture
03/29/2011	US7914848 Tape-manufacturing system having extended operational capabilities
03/29/2011	US7914644 Method for mounting protective film onto glass
03/29/2011	US7914621 Vapor deposition source and vapor deposition apparatus having the same
03/29/2011	US7914620 Supporting device for heating crucible and deposition apparatus having the same
03/29/2011	US7913752 Cooling device for vacuum treatment device
03/29/2011	US7913645 Methods and apparatus for incorporating nitrogen in oxide films
03/29/2011	CA2425409C Process of formation of a ceramic coating on a substrate by electron-beam physical vapor deposition
03/24/2011	WO2011034751A2 Hot wire chemical vapor deposition (cvd) inline coating tool
03/24/2011	WO2011034429A1 Thin film deposition apparatus and method for the same
03/24/2011	WO2011034057A1 Plasma processing apparatus and gas supply mechanism for plasma processing apparatus
03/24/2011	WO2011033987A1 Film-forming method, semiconductor element manufacturing method, insulating film and semiconductor element

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