| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/20/2011 | CN102021528A Film coating device |
| 04/20/2011 | CN102021527A Strip film plating machine |
| 04/20/2011 | CN102020263A Method for synthesizing graphene film material |
| 04/20/2011 | CN102019420A Composite particulate preparing apparatus and method |
| 04/20/2011 | CN102019134A Tail gas treatment device |
| 04/20/2011 | CN101634013B Plural gas distribution system and plural gas distribution sprinkling head device |
| 04/20/2011 | CN101528976B Ethylene-tetrafluoroethylene copolymer molded product and method for producing the same |
| 04/20/2011 | CN101525741B Precipitation equipment for manufacturing thin film type solar battery |
| 04/20/2011 | CN101469409B Composite aluminum oxide /erbium hydrogen resistance coating and preparation thereof |
| 04/20/2011 | CN101469399B Erbium oxide hydrogen resistance coating and preparation thereof |
| 04/20/2011 | CN101419902B Multi-chamber vacuum processing apparatus |
| 04/20/2011 | CN101135047B Gasification device and semiconductor processing system |
| 04/20/2011 | CN101075500B Solid electrolyte and method of producing the same |
| 04/19/2011 | US7928018 Plasma processing method and method for manufacturing an electronic device |
| 04/19/2011 | US7927915 Low resistivity silicon carbide |
| 04/19/2011 | US7927907 Method of making silicon solar cells containing μC silicon layers |
| 04/19/2011 | US7927700 Substrate covered with an intermediate coating and a hard carbon coating |
| 04/19/2011 | US7927663 Method of forming a coating with controlled grain size and morphology for enhanced wear resistance and toughness |
| 04/19/2011 | US7927662 CVD method in vertical CVD apparatus using different reactive gases |
| 04/19/2011 | US7927661 Methods of depositing a metal oxide layer or film using a rare earth metal precursor |
| 04/19/2011 | US7927659 System and method for depositing a material on a substrate |
| 04/19/2011 | US7927658 Producing a metallocene precursor, film, coating, from cyclopntadienefor electronics |
| 04/19/2011 | US7927473 Substrate holder, deposition method using substrate holder, hard disk manufacturing method, deposition apparatus, and program |
| 04/19/2011 | US7927472 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus |
| 04/19/2011 | US7927455 Plasma processing apparatus |
| 04/19/2011 | US7927425 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same |
| 04/19/2011 | US7927424 Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers |
| 04/19/2011 | US7927423 Vapor deposition of anti-stiction layer for micromechanical devices |
| 04/19/2011 | US7926446 Multi-place coating apparatus and process for plasma coating |
| 04/19/2011 | US7926445 Oxidizing method and oxidizing unit for object to be processed |
| 04/14/2011 | WO2011044467A1 Cvd apparatus |
| 04/14/2011 | WO2011044457A1 Manufacturing apparatus for depositing a material and an electrode for use therein |
| 04/14/2011 | WO2011044441A1 Cvd apparatus with electrode |
| 04/14/2011 | WO2011044412A1 Multi-rotation epitaxial growth apparatus and reactors incorporating same |
| 04/14/2011 | WO2011044325A2 Methods of nucleation control in film deposition |
| 04/14/2011 | WO2011043503A1 Diamond-like carbon thin film containing silicon, preparation method thereof, and use thereof |
| 04/14/2011 | WO2011043414A1 Thin film, method for forming same, and semiconductor light-emitting element comprising the thin film |
| 04/14/2011 | WO2011043337A1 Low dielectric constant insulating film and formation method therefor |
| 04/14/2011 | WO2011043297A1 Surface-wave plasma cvd device and film-forming method |
| 04/14/2011 | WO2011043263A1 Film-forming method and plasma processing apparatus |
| 04/14/2011 | WO2011043244A1 Film-forming device, film-forming head, and film-forming method |
| 04/14/2011 | WO2011043139A1 Raw material for chemical vapor deposition and method for forming silicon-containing thin film using the raw material |
| 04/14/2011 | WO2011043047A1 Plasma cvd device |
| 04/14/2011 | WO2011042949A1 Surface wave plasma cvd device and film-forming method |
| 04/14/2011 | WO2011042328A1 Method of coating a substrate |
| 04/14/2011 | WO2011041804A1 Cutting tool for processing metal materials |
| 04/14/2011 | WO2010091352A3 Mesoporous carbon material for energy storage |
| 04/14/2011 | US20110086513 Upper electrode backing member with particle reducing features |
| 04/14/2011 | US20110086496 Metal organic chemical vapor deposition apparatus and method |
| 04/14/2011 | US20110086485 Method for manufacturing a mos semiconductor memory device, and plasma cvd device |
| 04/14/2011 | US20110086235 Methods of nucleation control in film deposition |
| 04/14/2011 | US20110086184 Method of depositing metallic film and memory medium |
| 04/14/2011 | US20110086167 Apparatus for atomic layer deposition |
| 04/14/2011 | US20110086166 Universal atomizer |
| 04/14/2011 | US20110086163 Method for producing a crack-free abradable coating with enhanced adhesion |
| 04/14/2011 | US20110083806 Plasma Resistant Processing Apparatus |
| 04/14/2011 | US20110083607 Vapor phase self-assembled monolayer coating apparatus |
| 04/14/2011 | US20110083606 Exhaust gas treatment device for a cvd device, cvd device, and exhaust gas treatment method |
| 04/14/2011 | US20110083602 Multi-Rotation Epitaxial Growth Apparatus and Reactors Incorporating Same |
| 04/14/2011 | DE112009000734T5 Flüssigkeitsbasiertes Plasmaschichtausbildungsgerät, Elektrode für flüssigkeitsbasiertes Plasma, und Schichtausbildungsverfahren unter Verwendung von flüssigkeitsbasiertem Plasma Liquid-based plasma film forming device, an electrode for liquid-based plasma, and film formation method using liquid-based plasma |
| 04/14/2011 | DE102009049283A1 Verfahren zur Beschichtung zumindest eines Teils eines Grundkörpers A method of coating at least a portion of a base body |
| 04/14/2011 | CA2777104A1 Cvd apparatus |
| 04/14/2011 | CA2777101A1 Manufacturing apparatus for depositing a material and an electrode for use therein |
| 04/14/2011 | CA2777097A1 Cvd apparatus with electrode |
| 04/13/2011 | EP2309554A2 Zinc oxide film method and structure for cigs cell |
| 04/13/2011 | EP2309023A1 Deposition film forming apparatus and deposition film forming method |
| 04/13/2011 | EP2309022A1 Gas barrier coating and gas barrier film |
| 04/13/2011 | EP2308093A1 Hybrid dielectric material for thin film transistors |
| 04/13/2011 | EP2307589A2 Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films |
| 04/13/2011 | CN201793737U Film manufacturing device |
| 04/13/2011 | CN201793736U Silicon chip coating support plate |
| 04/13/2011 | CN201793735U Wafer heating device |
| 04/13/2011 | CN201793734U Quartz carrier for deposition |
| 04/13/2011 | CN201793733U Deposition boat |
| 04/13/2011 | CN201793732U Buffer plate for placing graphite frame |
| 04/13/2011 | CN201793731U MOCVD equipment and sealing structure of reaction chamber thereof |
| 04/13/2011 | CN1897784B Reducing electrostatic charge by roughening the susceptor |
| 04/13/2011 | CN1800444B Film formation apparatus and method of using the same |
| 04/13/2011 | CN102017169A Apparatus for manufacturing thin film solar cell |
| 04/13/2011 | CN102017168A Apparatus for manufacturing thin film solar cell |
| 04/13/2011 | CN102017096A Film forming device |
| 04/13/2011 | CN102017084A Heating device, film forming apparatus, film forming method, and device |
| 04/13/2011 | CN102017082A Group III nitride semiconductor device and method for manufacturing the same, group III nitride semiconductor light-emitting device and method for manufacturing the same, and lamp |
| 04/13/2011 | CN102017078A Heat treatment apparatus |
| 04/13/2011 | CN102016120A Device for thermohydraulic applications with improved water softening properties, lower release of heavy metals, and relative method of manufacturing |
| 04/13/2011 | CN102016119A Heat treatment apparatus |
| 04/13/2011 | CN102016118A Apparatus and methods for deposition reactors |
| 04/13/2011 | CN102016117A Method for preparing electrically conducting materials and devices including same |
| 04/13/2011 | CN102016116A Vaporizer and deposition system using the same |
| 04/13/2011 | CN102016115A Method for depositing ultra fine crystal particle polysilicon thin film |
| 04/13/2011 | CN102016114A Metalorganic chemical vapor deposition of zinc oxide |
| 04/13/2011 | CN102016113A Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors |
| 04/13/2011 | CN102016102A Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber |
| 04/13/2011 | CN102016101A Water-reactive Al composite material, water-reactive Al film, process for production of the Al film, and constituent member for film depostion chamber |
| 04/13/2011 | CN102016100A Process for production of water-reactive Al film and constituent members for film deposition chambers |
| 04/13/2011 | CN102016099A Method for production of water-reactive Al film, and structural member for film-forming chamber |
| 04/13/2011 | CN102011106A Method for flattening diamond film by using composite process |
| 04/13/2011 | CN102011105A Process for depositing silica at low pressure |
| 04/13/2011 | CN102011104A Oxidation treatment device |
| 04/13/2011 | CN102011103A Chemisorption method for preparing carbon nitride film |