| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/13/2011 | CN102011102A Normal-temperature deposition equipment for high-interfacial strength diamond film materials and method thereof |
| 04/13/2011 | CN102011101A Growing device for diamond film |
| 04/13/2011 | CN102011100A Method for preparing large-area high quality graphene on iron-based substrate |
| 04/13/2011 | CN102011099A Deposition doped polysilicon machine board |
| 04/13/2011 | CN102011098A Liquid composition containing aminoether for deposition of metal-containing films |
| 04/13/2011 | CN102011097A Method for eliminating sediment residues of compounds of elements in groups III and V |
| 04/13/2011 | CN102011089A Method for preparing nanocrystalline resistance conversion material |
| 04/13/2011 | CN101660117B Solar selective absorbing coating and preparation method thereof |
| 04/13/2011 | CN101622692B Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced |
| 04/13/2011 | CN101490809B Film deposition apparatus |
| 04/13/2011 | CN101467264B Film forming condition setting method, photoelectric converter, and manufacturing method, manufacturing apparatus and inspection method for the same |
| 04/13/2011 | CN101397653B Metal film forming method |
| 04/13/2011 | CN101381861B Film formation method |
| 04/13/2011 | CN101194046B Methods for wet cleaning quartz surfaces of components for plasma processing chambers |
| 04/13/2011 | CN101076716B An apparatus for and method of sampling and collecting powders flowing in a gas stream |
| 04/13/2011 | CN101023508B Improved method and apparatus for the etching of microstructures |
| 04/12/2011 | US7923702 System and method for processing an object |
| 04/12/2011 | US7923385 Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups |
| 04/12/2011 | US7923383 Method and apparatus for treating a semi-conductor substrate |
| 04/12/2011 | US7923381 Methods of forming electronic devices containing Zr-Sn-Ti-O films |
| 04/12/2011 | US7923374 Method and apparatus for production of metal film or the like |
| 04/12/2011 | US7923358 Methods for preparation of high-purity polysilicon rods using a metallic core means |
| 04/12/2011 | US7923322 Method of forming a capacitor |
| 04/12/2011 | US7923263 Non-volatile resistance switching memory |
| 04/12/2011 | US7923076 Plasma deposition apparatus and deposition method utilizing same |
| 04/12/2011 | US7923070 Positioning substrate; chemisorption; contacting cycles |
| 04/12/2011 | US7923069 Multi-station deposition apparatus and method |
| 04/12/2011 | US7923058 Method for manufacturing carbon fibers and method for manufacturing electron emitting device using the same, method for manufacturing display, and ink for producing catalyst for use in these methods |
| 04/12/2011 | US7922882 Substrate holding device, substrate processing system and liquid crystal display device |
| 04/12/2011 | US7922880 Method and apparatus for increasing local plasma density in magnetically confined plasma |
| 04/12/2011 | US7922864 Quick-change precursor manifold for large-area CVD and PECVD |
| 04/12/2011 | US7922863 Apparatus for integrated gas and radiation delivery |
| 04/12/2011 | US7922862 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 04/12/2011 | US7922821 Source, an arrangement for installing a source, and a method for installing and removing a source |
| 04/12/2011 | US7922820 Heating crucible and deposition apparatus including the same |
| 04/12/2011 | US7922819 Semiconductor manufacturing device |
| 04/12/2011 | US7922818 Method and system for binding halide-based contaminants |
| 04/12/2011 | US7921805 Deposition from liquid sources |
| 04/12/2011 | US7921804 Plasma generating nozzle having impedance control mechanism |
| 04/12/2011 | US7921802 System and method for suppression of wafer temperature drift in cold-wall CVD systems |
| 04/12/2011 | US7921673 Apparatus and method for measuring the weight of an optical fiber preform during a chemical deposition process for forming the preform |
| 04/07/2011 | WO2011041389A2 Precursor vapor generation and delivery system with filters and filter monitoring system |
| 04/07/2011 | WO2011041255A1 Vapor deposition reactor for forming thin film on curved surface |
| 04/07/2011 | WO2011041030A1 Non-orthogonal coater geometry for improved coatings on a substrate |
| 04/07/2011 | WO2011040611A1 Catalytic cvd device, film forming method and solar cell manufacturing method |
| 04/07/2011 | WO2011040610A1 Catalytic cvd device, method for formation of film, process for production of solar cell, and substrate holder |
| 04/07/2011 | WO2011040537A1 Plasma treatment method and plasma treatment apparatus |
| 04/07/2011 | WO2011040465A1 Plasma processing apparatus and slow-wave plate used therein |
| 04/07/2011 | WO2011040396A1 Method for forming silicon nitride film, and method for producing semiconductor memory device |
| 04/07/2011 | WO2011040394A1 Method for forming crystalline silicon film and plasma cvd device |
| 04/07/2011 | WO2011040385A1 PROCESS FOR PRODUCTION OF Ni FILM |
| 04/07/2011 | WO2011040328A1 Antenna for generating surface wave plasma, microwave introducing mechanism, and apparatus for processing surface wave plasma |
| 04/07/2011 | WO2011040301A1 Method for transferring subject to be processed and apparatus for processing subject to be processed |
| 04/07/2011 | WO2011040173A1 Film forming apparatus, film forming method and substrate processing apparatus |
| 04/07/2011 | WO2011040108A1 Iii nitride semiconductor substrate, epitaxial substrate, and semiconductor device |
| 04/07/2011 | WO2011040106A1 Method for preserving a gallium nitride substrate, preserved gallium nitride substrate, semiconductor device, and manufacturing method therefor |
| 04/07/2011 | WO2011040051A1 Iii nitride semiconductor substrate, epitaxial substrate, and semiconductor device |
| 04/07/2011 | WO2011007745A8 Microwave plasma processing device and microwave plasma processing method |
| 04/07/2011 | WO2010144126A3 System and method for vapor phase reflow of a conductive coating |
| 04/07/2011 | US20110081734 Method and arrangement for producing an n-semiconductive indium sulfide thin layer |
| 04/07/2011 | US20110081503 Method of depositing stable and adhesive interface between fluorine-based low-k material and metal barrier layer |
| 04/07/2011 | US20110081487 Methods and devices for processing a precursor layer in a group via environment |
| 04/07/2011 | US20110081486 Non-orthogonal coater geometry for improved coatings on a substrate |
| 04/07/2011 | US20110081485 method for the application of a filter on a web |
| 04/07/2011 | US20110081477 Plasma Activated Chemical Vapour Deposition Method and Apparatus Therefor |
| 04/07/2011 | US20110080640 Wire-grid polarizer and process for producing the same |
| 04/07/2011 | US20110079826 Semiconductor device, method for fabricating the same and apparatus for fabricating the same |
| 04/07/2011 | US20110079582 Plasma generating device and method |
| 04/07/2011 | US20110079355 Control of ion angular distribution function at wafer surface |
| 04/07/2011 | US20110079179 Liquid material vaporizer and film deposition apparatus using the same |
| 04/07/2011 | DE102009048397A1 Atmosphärendruckplasmaverfahren zur Herstellung oberflächenmodifizierter Partikel und von Beschichtungen Atmospheric pressure plasma process for the preparation of surface-modified particles, and of coatings |
| 04/07/2011 | DE102008028410B4 Selektive Parylene-Beschichtung für Herzschrittmacherelektroden Selective parylene coating for pacemaker electrodes |
| 04/06/2011 | EP2306499A2 Non-thermal process for forming porous low dielectric constant films |
| 04/06/2011 | EP2304774A2 Apparatuses for atomic layer deposition |
| 04/06/2011 | EP2304076A1 Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure |
| 04/06/2011 | EP2304075A1 Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces |
| 04/06/2011 | EP2304074A1 Method of reducing memory effects in semiconductor epitaxy |
| 04/06/2011 | EP2304073A1 Plant for forming electronic circuits on substrates |
| 04/06/2011 | EP2304072A1 Solar cells and methods and apparatuses for forming the same |
| 04/06/2011 | EP1643004B1 Treating device using raw material gas and reactive gas |
| 04/06/2011 | EP1486695B1 High friction sliding member |
| 04/06/2011 | CN201785488U Special gas nozzle and tube-type film coating equipment |
| 04/06/2011 | CN201785487U Cover turning mechanism of PECVD(plasma enhanced chemical vapor deposition)device |
| 04/06/2011 | CN201785486U Novel spray header device of MOCVD equipment |
| 04/06/2011 | CN1930321B Alumina coating, coated product and method of making the same |
| 04/06/2011 | CN102007588A Method for reducing temperature of substrate placing table, computer-readable storage medium, and substrate processing system |
| 04/06/2011 | CN102007565A Substrate processing system and substrate processing method |
| 04/06/2011 | CN102007228A Method for developing thin film from oxide or silicate of hafnium nitride, coordination compound used in said method, and method for producing integrated electronic circuit |
| 04/06/2011 | CN102005212A 真空处理设备以及衬底转移方法 The vacuum processing apparatus and a substrate transfer method |
| 04/06/2011 | CN102002687A Gas mixing method realized by back diffusion in a PECVD system with showerhead |
| 04/06/2011 | CN102002686A Chemical vapor deposition equipment and cooling tank thereof |
| 04/06/2011 | CN102002685A Film formation apparatus and film formation method |
| 04/06/2011 | CN102002684A Slide part |
| 04/06/2011 | CN102002683A Method for preparing hydrogen-containing diamond-like carbon film |
| 04/06/2011 | CN102002682A Method for preparing texture on surface of silicon wafer |
| 04/06/2011 | CN102002681A Application method of a model base plate |
| 04/06/2011 | CN102002680A Bearing plate and ejection fixture with bearing plate |
| 04/06/2011 | CN101634015B Converting device of silicon wafer loading devices for PECVD |
| 04/06/2011 | CN101572208B Plasma processing apparatus and method |
| 04/06/2011 | CN101527258B Cover part, process gas diffusing and supplying unit, and substrate processing apparatus |