| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/26/2011 | US7932678 Magnetic mirror plasma source and method using same |
| 04/26/2011 | US7932188 Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| 04/26/2011 | US7931955 Composite material made from a substrate material and a barrier layer material |
| 04/26/2011 | US7931938 Diamond-like carbon-coated cell culture substrates |
| 04/26/2011 | US7931937 System and method for depositing a material on a substrate |
| 04/26/2011 | US7931933 Method and apparatus for providing a substrate with viscous medium |
| 04/26/2011 | US7931823 Additives to prevent degradation of cyclic alkene derivatives |
| 04/26/2011 | US7931793 Tin or tin alloy electroplating solution |
| 04/26/2011 | US7931787 Energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process and apparatus. The EAD mode of film growth disclosed is generally achieved by |
| 04/26/2011 | US7931776 Plasma processing apparatus |
| 04/26/2011 | US7931750 Sealing lock for a deposition line in vacuum on a flat product |
| 04/26/2011 | US7931749 Shower head and film-forming device using the same |
| 04/26/2011 | US7930992 Plasma processing equipment |
| 04/21/2011 | WO2011047210A2 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system |
| 04/21/2011 | WO2011046191A1 Jig for semiconductor production and method for producing same |
| 04/21/2011 | WO2011045320A1 Heating device for polysilicon reactors |
| 04/21/2011 | WO2011045241A1 Cvd reactor having a substrate holder resting on a gas cushion comprising a plurality of zones |
| 04/21/2011 | WO2011045186A1 Method and device for separating argon from a gaseous mixture |
| 04/21/2011 | WO2011045020A1 Gas evaporator for coating plants |
| 04/21/2011 | WO2011019215A3 Apparatus for forming layer |
| 04/21/2011 | WO2011015177A3 Connector for gas or liquid lines and use thereof |
| 04/21/2011 | WO2010126893A3 Method and apparatus for controlling ion energy distribution |
| 04/21/2011 | WO2010101715A9 Gas injectors for cvd systems with the same |
| 04/21/2011 | WO2010070454A3 Helium recovery from semiconductor cluster tools |
| 04/21/2011 | US20110093056 Use of Plasma in Formation of Biodegradable Stent Coating |
| 04/21/2011 | US20110092079 Method and installation for producing an anti-reflection and/or passivation coating for semiconductor devices |
| 04/21/2011 | US20110092076 Apparatus and method of vapor coating in an electronic device |
| 04/21/2011 | US20110092073 Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device |
| 04/21/2011 | US20110092070 Method for film formation, apparatus for film formation, and computer-readable recording medium |
| 04/21/2011 | US20110092026 Fluorination pre-treatment of heat spreader attachment indium thermal interface material |
| 04/21/2011 | US20110092010 High-throughput printing of nanostructured semiconductor precursor layer |
| 04/21/2011 | US20110091740 Composite material for electrical/electronic part and electrical/electronic part using the same |
| 04/21/2011 | US20110091662 Coating method and device using a plasma-enhanced chemical reaction |
| 04/21/2011 | US20110091651 Additives to Prevent Degradation of Cyclic Alkene Derivatives |
| 04/21/2011 | US20110091650 Method of forming organic polymer thin film and an apparatus for forming the organic polymer thin film |
| 04/21/2011 | US20110091649 Method and apparatus for counting particles in a gas |
| 04/21/2011 | US20110091648 Gas treatment systems |
| 04/21/2011 | US20110091647 Graphene synthesis by chemical vapor deposition |
| 04/21/2011 | US20110091646 Orifice chemical vapor deposition reactor |
| 04/21/2011 | US20110089559 Method and installation for producing a semiconductor device, and semiconductor device |
| 04/21/2011 | US20110089437 Cross flow cvd reactor |
| 04/21/2011 | US20110089142 Method and apparatus for plasma surface treatment of moving substrate |
| 04/21/2011 | US20110089022 Method and apparatus for surface processing of a substrate |
| 04/21/2011 | US20110088849 Plasma processing apparatus |
| 04/21/2011 | US20110088848 Microwave plasma-treating apparatus |
| 04/21/2011 | US20110088847 Showerhead assembly for plasma processing chamber |
| 04/21/2011 | US20110088846 Plasma source |
| 04/21/2011 | US20110088623 Gas treatment systems |
| 04/21/2011 | US20110088622 Thin film deposition apparatus |
| 04/21/2011 | US20110088621 Organic Vapor Jet Deposition Using an Exhaust |
| 04/21/2011 | DE112009001622T5 Lagenbeschichtung und Verfahren zu ihrer Ausbildung Layer coating and process for their education |
| 04/21/2011 | DE102009049811A1 Verfahren zum Herstellen einer Elektrode A method for manufacturing an electrode |
| 04/21/2011 | DE102009040997A1 High pressure vaporizing cell for coating a substrate, comprises an interior area that is suited to reject steam of coating materials and is formed in such a way that steam atoms do not strike down itself in the operation of the cell |
| 04/20/2011 | EP2312650A2 Solar Cell and Method of Fabricating the Same |
| 04/20/2011 | EP2312617A1 Vacuum processing device and gas supply method |
| 04/20/2011 | EP2312613A2 Showerhead assembly for plasma processing chamber |
| 04/20/2011 | EP2312612A2 Plasma reactor for abating hazardous materials and driving method thereof |
| 04/20/2011 | EP2312018A1 Component for rotary machine |
| 04/20/2011 | EP2312015A2 Functional film and method for producing the same |
| 04/20/2011 | EP2312014A1 Assembly for gas separation and its application |
| 04/20/2011 | EP2312013A1 Method for coating at least one part of a carrier |
| 04/20/2011 | EP2311076A2 Rapid thermal processing chamber with shower head |
| 04/20/2011 | EP2311066A1 Device and method for producing dielectric layers in microwave plasma |
| 04/20/2011 | EP2311065A1 Remote plasma cleaning method and apparatus for applying said method |
| 04/20/2011 | EP2310554A1 Process and installation for depositing films onto a substrate |
| 04/20/2011 | EP2310553A1 Atomic layer deposition apparatus and loading methods |
| 04/20/2011 | EP2310552A2 Gas delivery device |
| 04/20/2011 | EP2310551A1 Method of forming a tantalum-containing layer on a substrate |
| 04/20/2011 | EP1957689B1 High crystalline quality synthetic diamond |
| 04/20/2011 | EP1508525B1 Device for coating a plastic container with a diamond-like carbon layer |
| 04/20/2011 | EP1422747B1 Apparatus and method for producing a semiconductor device and method for cleaning a semiconductor producing apparatus |
| 04/20/2011 | CN201804896U Device for continuous production by plasma chemical vapour deposition |
| 04/20/2011 | CN201801592U Thin-film solar-cell panel deposition fixture |
| 04/20/2011 | CN201801591U Air-cooling heat dissipation device at charging end of PECVD coating machine for solar batteries |
| 04/20/2011 | CN201801590U Internal connection structure of PECVD chamber |
| 04/20/2011 | CN201801589U Amorphous-silicon film plasma enhanced chemical vapor deposition equipment |
| 04/20/2011 | CN201801588U Graphite boat used in silicon chip production |
| 04/20/2011 | CN1940129B Reactor and method for high density plasma chemical vapor deposition |
| 04/20/2011 | CN1780934B Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
| 04/20/2011 | CN1777696B Methods and apparatus for atomic layer deposition |
| 04/20/2011 | CN1759203B Hybrid ball-lock attachment apparatus |
| 04/20/2011 | CN102027811A Plasma generating apparatus and plasma processing apparatus |
| 04/20/2011 | CN102027603A Process for depositing organic materials |
| 04/20/2011 | CN102027156A Systems and methods for distributing gas in a chemical vapor deposition reactor |
| 04/20/2011 | CN102027155A A coating and a method for producing a coating |
| 04/20/2011 | CN102027152A Water-reactive Al composite material, water-reactive Al film, process for production of the Al film, and constituent member for film deposition chamber |
| 04/20/2011 | CN102027151A Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber |
| 04/20/2011 | CN102024741A Method for forming shallow trench isolation structure |
| 04/20/2011 | CN102024659A Cleaning method of PVD (Physical Vapor Deposition) equipment |
| 04/20/2011 | CN102021574A Metal wire structure with high-melting-point protective layer and production method thereof |
| 04/20/2011 | CN102021539A Film deposition method |
| 04/20/2011 | CN102021538A Film deposition method |
| 04/20/2011 | CN102021537A 薄膜沉积设备 Thin film deposition apparatus |
| 04/20/2011 | CN102021536A Vapor deposition shadow mask system and method thereof for arbitrarily-sized base board and display screen |
| 04/20/2011 | CN102021535A Method for preparing aluminum-doped zinc oxide transparent conducting films at low temperature |
| 04/20/2011 | CN102021534A Method for preparing substrate glass slide with effect of surface enhanced Raman scattering |
| 04/20/2011 | CN102021533A Chemical vapor deposition technology and vapor deposition furnace for preparing pyrolytic boron nitride (PBN) products |
| 04/20/2011 | CN102021532A Gas barrier coating and gas barrier film |
| 04/20/2011 | CN102021531A Device and method for generating silicon nitride film |
| 04/20/2011 | CN102021530A Reaction chamber of multiple-gas coupling metal metallorganic chemical vapor deposition equipment |