| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/04/2011 | CN102041487A Temperature control system and temperature control method for substrate mounting table |
| 05/04/2011 | CN102041486A Substrate processing equipment |
| 05/04/2011 | CN102041485A Metal organic chemical vapor deposition apparatus and method |
| 05/04/2011 | CN102041484A Gas distribution plate and device |
| 05/04/2011 | CN102041483A Low pressure chemical vapor deposition equipment and low pressure chemical vapor deposition controlling method |
| 05/04/2011 | CN102041482A Methods for deposition of group 4 metal containing films |
| 05/04/2011 | CN102040620A Group 4 metal precursors for metal-containing films |
| 05/04/2011 | CN102039413A Diamond composite sheet and preparation method thereof |
| 05/04/2011 | CN101696491B In-situ method for preparing graphene/carbon nanotube composite film |
| 05/04/2011 | CN101550544B Method for improving non-crystal hatching layer in high-speed deposition microcrystal silicon material |
| 05/04/2011 | CN101463471B Continuous thin film vacuum deposition method and apparatus |
| 05/04/2011 | CN101381862B Device for controlling treatment of gas flow in treatment chamber |
| 05/04/2011 | CN101310038B Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film |
| 05/04/2011 | CN101094732B Deposition of silicon-containing films from hexachlorodisilane |
| 05/04/2011 | CN101039544B Plasma processor with electrode simultaneously responsive to plural frequencies |
| 05/03/2011 | US7935913 Apparatus and method for thermal processing of substrate |
| 05/03/2011 | US7935653 Metal oxide nanoporous material, coating composition to obtain the same, and methods of manufacturing them |
| 05/03/2011 | US7935425 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device |
| 05/03/2011 | US7935384 Depositing metal-nitride film onto suface of container designed to be used in vaccum; semiconductor wafers |
| 05/03/2011 | US7935382 Method for making crystalline composition |
| 05/03/2011 | US7935188 Rapid heat up and cool down; productivity; semiconductor wafers |
| 05/03/2011 | US7935187 Film forming apparatus |
| 05/03/2011 | US7935186 Plasma processing apparatus |
| 05/03/2011 | US7935185 Film forming system and film forming method |
| 05/03/2011 | US7934468 Plasma processing apparatus and plasma processing method |
| 05/03/2011 | CA2662212C Synthetic resin bottle |
| 04/28/2011 | WO2011049816A2 Processes for passivating dielectric films |
| 04/28/2011 | WO2011049811A2 Point-of-use silylamine generation |
| 04/28/2011 | WO2011049017A1 Film formation and vacuum processing method for performing cleaning |
| 04/28/2011 | WO2011048866A1 Oligomethyl germane compound for amorphous semiconductor film, and film formation gas using same |
| 04/28/2011 | WO2011048809A1 Solar cell and method for manufacturing the same |
| 04/28/2011 | WO2011048790A1 Cvd film forming device |
| 04/28/2011 | WO2011002920A3 LITHIUM PRECURSORS FOR LixMyOz MATERIALS FOR BATTERIES |
| 04/28/2011 | WO2010096212A3 Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon |
| 04/28/2011 | US20110098841 Gas supply device, processing apparatus, processing method, and storage medium |
| 04/28/2011 | US20110097878 Chamber for pecvd |
| 04/28/2011 | US20110097877 Method for manufacturing microcrystalline semiconductor and thin film transistor |
| 04/28/2011 | US20110097876 Chemical vapor deposition reactor having multiple inlets |
| 04/28/2011 | US20110097823 Apparatus for forming thin film and method of manufacturing semiconductor film |
| 04/28/2011 | US20110097609 Method and apparatus for integrated-circuit battery devices |
| 04/28/2011 | US20110097571 Oleophobic, air permeable, and breathable composite membrane |
| 04/28/2011 | US20110097551 Coating and a method for producing a coating |
| 04/28/2011 | US20110097533 Thin film encapsulation method |
| 04/28/2011 | US20110097518 Vertically integrated processing chamber |
| 04/28/2011 | US20110097517 Dynamic vertical microwave deposition of dielectric layers |
| 04/28/2011 | US20110097516 Plasma processing apparatus and plasma processing method |
| 04/28/2011 | US20110097495 Organic vapor jet printing with chiller plate |
| 04/28/2011 | US20110097494 Fluid conveyance system including flexible retaining mechanism |
| 04/28/2011 | US20110097493 Fluid distribution manifold including non-parallel non-perpendicular slots |
| 04/28/2011 | US20110097492 Fluid distribution manifold operating state management system |
| 04/28/2011 | US20110097491 Conveyance system including opposed fluid distribution manifolds |
| 04/28/2011 | US20110097490 Fluid distribution manifold including compliant plates |
| 04/28/2011 | US20110097489 Distribution manifold including multiple fluid communication ports |
| 04/28/2011 | US20110097488 Fluid distribution manifold including mirrored finish plate |
| 04/28/2011 | US20110097487 Fluid distribution manifold including bonded plates |
| 04/28/2011 | US20110097478 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material |
| 04/28/2011 | US20110095007 Thermal flux processing by scanning a focused line beam |
| 04/28/2011 | US20110094997 Plasma processing apparatus and plasma processing method |
| 04/28/2011 | US20110094996 Plasma processing apparatus and plasma processing method |
| 04/28/2011 | US20110094995 Plasma processing apparatus and plasma processing method |
| 04/28/2011 | US20110094682 Plasma processing apparatus |
| 04/28/2011 | US20110094446 Thin-film solar cell manufacturing apparatus |
| 04/28/2011 | DE102007049930B4 Oberflächenmodifizierte Hohlraumstrukturen, Verfahren zu deren Herstellung sowie deren Verwendung The surface-modified hollow structures, processes for their preparation and their use |
| 04/27/2011 | EP2313538A1 Device for plasma-assisted coating of the inner side of tubular components |
| 04/27/2011 | EP2000008B1 Atomic layer deposition system and method for coating flexible substrates |
| 04/27/2011 | EP1561239B1 Atomic layer deposition methods |
| 04/27/2011 | CN102037791A Plasma processing apparatus |
| 04/27/2011 | CN102037547A Method of forming a nanocluster-comprising dielectric layer and device comprising such a layer |
| 04/27/2011 | CN102037156A Substrates for silicon solar cells and methods of producing the same |
| 04/27/2011 | CN102036724A Process for the phase transformation of substances |
| 04/27/2011 | CN102036433A Infrared electric heating film heating tube with double-film layer structure as well as preparation method and application thereof |
| 04/27/2011 | CN102034896A Self-cleaning large-scale method for selenylation of a thin film photovoltaic material and furnace system |
| 04/27/2011 | CN102034895A Thermal management and method for large scale processing of cis and/or cigs based thin films overlying glass substrates |
| 04/27/2011 | CN102033361A Manufacture method of liquid crystal orientation layer |
| 04/27/2011 | CN102031504A Film-forming apparatus, matching unit, and impedance control method |
| 04/27/2011 | CN102031503A Deposition method of silicon thin film |
| 04/27/2011 | CN102031502A Temperature control method and temperature control system for substrate mounting table |
| 04/27/2011 | CN102031501A Method for selectively depositing thin film on substrate by utilizing atomic layer deposition |
| 04/27/2011 | CN102031500A Load chamber for chemical vapor deposition |
| 04/27/2011 | CN102031499A Cr-Ti-C-N-O polybasic composite ceramic membrane on surface of steel-based material and preparation method thereof |
| 04/27/2011 | CN102031498A Substrate support seat for III-V group thin film growth reaction chamber, reaction chamber thereof and process treatment method |
| 04/27/2011 | CN102031497A Large scale method and furnace system for selenization of thin film photovoltaic materials |
| 04/27/2011 | CN102031496A Quickly deposited diamond by low pressure chemical vapor deposition (CVD) |
| 04/27/2011 | CN102031495A Organometallic compounds |
| 04/27/2011 | CN102031494A Vacuum plating roller transmission device |
| 04/27/2011 | CN102031484A Method for improving activation efficiency of magnesium-doped nitrides under catalytic dehydrogenation of metals |
| 04/27/2011 | CN101814430B Method for preparing composite trapping layer of floating gate type nonvolatile memory |
| 04/27/2011 | CN101740448B Plasma processing equipment and substrate support plate thereof |
| 04/27/2011 | CN101634016B Modifying device of silicon wafer loading devices for PECVD |
| 04/27/2011 | CN101629283B Roll-to-roll plasma device for enhancing chemical vapor deposition |
| 04/27/2011 | CN101629282B Conversion device of silicon wafer carrier for PECVD |
| 04/27/2011 | CN101613856B Al-doped alpha-phase silicon nitride (alpha-Si3N4)-based material and preparation method thereof |
| 04/27/2011 | CN101570400B Preparation method of crystallized silicon nanorod array |
| 04/27/2011 | CN101560652B Plasma assistant chemical vapor deposition device |
| 04/27/2011 | CN101555592B Method and system for preparing functional films in phase control mode |
| 04/27/2011 | CN101555588B Low-temperature plasma system based on atmosphere pressure glow discharge |
| 04/27/2011 | CN101438429B III nitride compound semiconductor laminated structure |
| 04/27/2011 | CN101403078B Method of manufacturing carbon/carbon-copper composite material |
| 04/27/2011 | CN101373702B Cavity inner lining and reaction cavity |
| 04/27/2011 | CN101297062B Plasma reactor |