C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2011
05/11/2011	CN102054910A LED chip process integration system and treating method thereof
05/11/2011	CN102054663A Substrate process apparatus, substrate process method
05/11/2011	CN102051615A Preparation method of anti-creeping and anti-corrosive titanium or titanium alloy material
05/11/2011	CN102051603A Plasm-aided selenium sulfuration treatment device and process
05/11/2011	CN102051602A Thin film deposition method and device
05/11/2011	CN102051601A Thin film deposition method
05/11/2011	CN102051600A Showerhead assembly for plasma processing chamber
05/11/2011	CN102051599A Method and system for depositing multiple materials on a substrate
05/11/2011	CN102051598A Method for preparing titanium/titanium nitride nano composite hard film
05/11/2011	CN102051597A Film deposition apparatus, film deposition method, and storage medium
05/11/2011	CN102051596A Heating unit and substrate processing apparatus having the same
05/11/2011	CN102051595A Chemical vapor deposition device and spray nozzle thereof
05/11/2011	CN102051594A Method for preparing Al-doped ZnO transparent conductive film by atomic layer deposition
05/11/2011	CN102051593A Method and device for epitaxially growing metal oxide transparent conductive film
05/11/2011	CN102051592A Method for preparing graphene film with single atomic layer
05/11/2011	CN102051591A Vapor phase deposition method of organosilan on surface of polydimethylsiloxane
05/11/2011	CN101697363B Method for improving properties of window layer material for single-chamber sedimentary silicon-based solar cells
05/11/2011	CN101678920B Biodegradable resin bottle and process for producing the same
05/11/2011	CN101568667B Vaporization apparatus, film forming apparatus, film forming method
05/11/2011	CN101560647B Preparation method of GaN-based material featuring epitaxial layer growth
05/11/2011	CN101469418B Control method for plasma reinforced chemical meteorology deposition apparatus
05/11/2011	CN101443477B Ti film forming method
05/11/2011	CN101265570B High-temperature metal organic chemical gas-phase deposition reactor
05/11/2011	CN101237027B Method for depositing air light-sensitive material on substrate
05/10/2011	US7941039 Pedestal heat transfer and temperature control
05/10/2011	US7940009 Plasma processing apparatus
05/10/2011	US7939173 Polycrystalline silicon rod for zone reflecting and a process for the production thereof
05/10/2011	US7939129 Architectural glazing; chemical vapor deposition by reacting ferrocene and an oxidant on a heated glass substrate; control over the valence of the iron deposited to give pleasing color
05/10/2011	US7939125 Viscous material noncontact jetting system
05/10/2011	US7938907 Device for fabricating a mask by plasma etching a semiconductor substrate
05/10/2011	US7938906 Method and apparatus for dynamic thin-layer chemical processing of semiconductor wafers
05/10/2011	US7938081 Radial line slot antenna having a conductive layer
05/10/2011	US7938080 Method for using film formation apparatus
05/10/2011	CA2402040C Chemical vapor deposition apparatus and method
05/05/2011	WO2011053505A1 Evaporator
05/05/2011	WO2011053477A1 Fluid distribution manifold including non-parallel non-perpendicular slots
05/05/2011	WO2011053446A1 Fluid conveyance system including flexible retaining mechanism
05/05/2011	WO2011053445A1 Distribution manifold
05/05/2011	WO2011052767A1 Surface coated cutting tool with excellent chip resistance
05/05/2011	WO2011052764A1 Process for producing multilayer film
05/05/2011	WO2011052640A1 Water-reactive al composite material, water-reactive al film, process for producing the al film, and constituent member for film-deposition chamber
05/05/2011	WO2011052463A1 Plasma cvd device and method of manufacturing silicon thin film
05/05/2011	WO2011052453A1 Material for forming ruthenium film and method for forming ruthenium film
05/05/2011	WO2011051410A1 Method for removing deposits
05/05/2011	WO2011051409A1 Method of plasma etching and plasma chamber cleaning using f2 and cof2
05/05/2011	WO2011051052A1 Method for producing semiconductor layers
05/05/2011	WO2011051008A1 Sliding element, in particular piston ring, and combination of a sliding element with a mating running element
05/05/2011	WO2011029096A3 Plasma enhanced chemical vapor deposition apparatus
05/05/2011	WO2011020740A3 Metal, hard metal, cermet or ceramic coated bodies and method for coating said type of bodies
05/05/2011	WO2010151057A3 Plasma deposition of a thin film
05/05/2011	WO2010132591A3 Pecvd coating using an organosilicon precursor
05/05/2011	WO2010119792A9 Substrate, substrate provided with thin film, semiconductor device, and method for manufacturing semiconductor device
05/05/2011	US20110104906 Method of growing oxide thin films
05/05/2011	US20110104902 Plasma processing apparatus and plasma processing method
05/05/2011	US20110104879 Method of manufacturing semiconductor device and substrate processing apparatus
05/05/2011	US20110104848 Hot wire chemical vapor deposition (cvd) inline coating tool
05/05/2011	US20110104509 Polymer surface modification
05/05/2011	US20110104507 Layered structure including graphene and an organic material having a conjugated system, and method of preparing the same
05/05/2011	US20110104399 Method of removing contamination from a reactor
05/05/2011	US20110104398 Method and system for depositing multiple materials on a substrate
05/05/2011	US20110104395 Film deposition apparatus, film deposition method, and storage medium
05/05/2011	US20110104381 Plasma Treatment of Large-Scale Components
05/05/2011	US20110104363 Plasma processing apparatus and method for controlling substrate attraction force in plasma processing apparatus
05/05/2011	US20110101245 Evaporation system
05/05/2011	US20110101244 Target materials for generating protons and treatment apparatuses including the same
05/05/2011	US20110100955 Apparatus and methods for forming energy storage and photovoltaic devices in a linear system
05/05/2011	US20110100556 Plasma System with Injection Device
05/05/2011	US20110100555 Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination
05/05/2011	US20110100458 Multi-layer thin film for encapsulation and method thereof
05/05/2011	US20110100454 Coated and Planarised Polymeric Films
05/05/2011	US20110100298 Fluorinating apparatus
05/05/2011	US20110100297 Thin-film solar cell manufacturing apparatus
05/05/2011	US20110100296 Film formation apparatus
05/05/2011	US20110100295 System and method for forming an integrated barrier layer
05/05/2011	US20110100088 Articles Of Manufacture Containing Increased Stability Low Concentration Gases And Methods Of Making And Using The Same
05/05/2011	US20110099798 Formation of a lithium comprising structure on a substrate by ald
05/05/2011	DE102009044276A1 CVD-Reaktor mit auf einem mehrere Zonen aufweisenden Gaspolster liegenden Substrathalter CVD reactor having a plurality of zones on a gas cushion underlying substrate holder
05/05/2011	DE102007043333B4 Verfahren zur Behandlung und Untersuchung von Bauteilen A method for the treatment and investigation of components
05/04/2011	EP2317543A2 Gas for plasma reaction, process for producing the same and use
05/04/2011	EP2316989A2 Non-polar (Al, B, In, Ga) quantum well and heterostructure materials and devices
05/04/2011	EP2316986A1 Chemical vapor deposition system
05/04/2011	EP2316253A2 A composite showerhead electrode assembly for a plasma processing apparatus
05/04/2011	EP2316123A1 Arrangement and method for generating a plasma having a defined and stable ionization state
05/04/2011	CN201817548U Material processing device for surface modification and plasma polymerization
05/04/2011	CN201817547U C/C panel chemical vapour phase deposition air distribution system
05/04/2011	CN201817546U Substrate supporting base and chemical vapor deposition equipment applying same
05/04/2011	CN201817545U Quartz connecting piece for LPCVD vertical furnace tube
05/04/2011	CN1724704B pecvd films with good deposition repeatability
05/04/2011	CN102047751A Manufacturing apparatus for depositing a material and an electrode for use therein
05/04/2011	CN102047750A Manufacturing apparatus for depositing a material and an electrode for use therein
05/04/2011	CN102047462A Method to control deposition of organic molecules and organic electronic device
05/04/2011	CN102047385A Thin film formation device and semiconductor film manufacturing method
05/04/2011	CN102047066A Manufacturing apparatus for depositing a material and an electrode for use therein
05/04/2011	CN102046856A Methods and apparatus for deposition reactors
05/04/2011	CN102046841A Hybrid layers for use in coatings on electronic devices or other articles
05/04/2011	CN102046840A Processing apparatus and processing method
05/04/2011	CN102046839A Method for making oriented tantalum pentoxide films
05/04/2011	CN102046838A Tellurium precursors for film deposition
05/04/2011	CN102042921A Standard sample prepared for quantitative analysis of SiGe film and preparation method
05/04/2011	CN102041552A Method for preparing polysilicon membrane

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