Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2011
06/03/2011WO2011064268A1 Method for surface treating a substrate and device for carrying out the method
06/03/2011WO2011026127A3 A local plasma confinement and pressure control arrangement and methods thereof
06/03/2011WO2011026126A3 A multi-peripheral ring arrangement for performing plasma confinement
06/03/2011WO2011017338A3 Method for making graphene
06/03/2011WO2006091291A3 Apparatus and process for carbon nanotube growth
06/02/2011US20110130584 Insulating film material, method of film formation using insulating film material, and insulating film
06/02/2011US20110130011 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
06/02/2011US20110130001 Substrate Processing Apparatus
06/02/2011US20110129686 Deposition method, deposition apparatus, and laminated film
06/02/2011US20110129681 Sealable packaging structures and applications related thereto
06/02/2011US20110129621 Systems and methods for distributing gas in a chemical vapor deposition reactor
06/02/2011US20110129620 Gas heating methods
06/02/2011US20110129619 Film formation method and apparatus
06/02/2011US20110129618 Vertical film formation apparatus and method for using same
06/02/2011US20110129617 Plasma system and method of producing a functional coating
06/02/2011US20110129604 Direct oxidation method for semiconductor process
06/02/2011US20110129603 Air-permeable filtration media, methods of manufacture and methods of use
06/02/2011US20110129602 Diruthenium complex, and material and method for chemical vapor deposition
06/02/2011US20110129595 Deposition source, deposition apparatus having the same, and method of forming thin film
06/02/2011US20110129594 Thin-film battery methods for complexity reduction
06/02/2011US20110128667 Semiconductor device including carbon-containing electrode and method for fabricating the same
06/02/2011US20110127581 Heterostructure for electronic power components, optoelectronic or photovoltaic components
06/02/2011US20110127571 Mixed source growth apparatus and method of fabricating iii-nitride ultraviolet emitters
06/02/2011US20110126985 Substrate processing apparatus
06/02/2011US20110126766 Coating apparatus
06/02/2011US20110126765 Plasma processing apparatus
06/02/2011US20110126764 Gas supply apparatus
06/02/2011US20110126763 Vapor deposition device
06/02/2011US20110126762 Vapor deposition system
06/02/2011US20110126761 Cvd reactor with energy efficient thermal-radiation shield
06/02/2011US20110126515 Sensor-integrated device
06/02/2011US20110126402 Methods of and factories for thin-film battery manufacturing
06/01/2011EP2327811A1 Film forming apparatus
06/01/2011EP2326743A1 Plastic product having good barrier action after sterilization treatment
06/01/2011EP1852438B1 Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same
06/01/2011EP1664374B1 Atomic layer deposition methods of forming silicon dioxide comprising layers
06/01/2011EP1177112B1 Remote plasma generator
06/01/2011DE112009001422T5 Plasma-Processing-Vorrichtung und Plasma-Vorrichtung-Verfahren Plasma processing apparatus and plasma process apparatus
06/01/2011DE102009055946B3 Method for measuring thickness of deposited layers in continuous process by means of vacuum evaporation, comprises measuring a first temperature change of a discrete substrate or substrate portion
06/01/2011DE102009049811B4 Verfahren zum Herstellen einer Elektrode A method for manufacturing an electrode
06/01/2011CN102084469A 等离子体处理装置 The plasma processing apparatus
06/01/2011CN102084030A Process and installation for despositing films simultaneously onto both sides of a substrate
06/01/2011CN102084029A Deposition method for passivation of silicon wafers
06/01/2011CN102084028A Chuck and bridge connection points for tube filaments in a chemical vapor deposition reactor
06/01/2011CN102084027A Surface treatment method for treating surface of substrate to be highly hydrophobic
06/01/2011CN102084026A Methods of forming ruthenium-containing films by atomic layer deposition
06/01/2011CN102083550A Metal and electronic device coating process for marine use and other environments
06/01/2011CN102080220A Low-pressure chemical vapor deposition reaction equipment
06/01/2011CN102080219A Vertical film formation apparatus and method for using same
06/01/2011CN102080218A Gas distribution plate and treatment chamber equipped therewith
06/01/2011CN102080217A Chemical vapor deposition method assisted by non-plasma
06/01/2011CN102080216A Chemical vapor deposition of chalcogenide materials
06/01/2011CN102080214A Coating device
06/01/2011CN102080209A Vacuum coating device
06/01/2011CN102080206A Mask plate bearing device
06/01/2011CN102080205A Vacuum processing chamber formed by the casting of aluminum
06/01/2011CN102078921A Surface-treated mold and method of producing surface-treated mold
06/01/2011CN102078759A Treatment device for germane-containing waste gas
06/01/2011CN101812672B A1B12 nano/sub-micron spherical material and preparation method thereof
06/01/2011CN101792901B Method for preparing cubic indium oxide single-crystal film on yttrium-doped zirconia substrate
06/01/2011CN101705478B Method for improving strength of free-standing diamond film
06/01/2011CN101635249B Heater interlocking device
06/01/2011CN101409213B Gas supply device, semiconductor manufacturing device and component for gas supply device
06/01/2011CN101375377B Plasma reactor with a dynamically adjustable plasma source power applicator
06/01/2011CN101052744B Apparatus for film formation and method for film formation
05/2011
05/31/2011US7952054 Heating element
05/31/2011US7951463 Water collapsible aluminum film
05/31/2011US7951459 Oxidation resistant coatings, processes for coating articles, and their coated articles
05/31/2011US7951422 Methods for oriented growth of nanowires on patterned substrates
05/31/2011US7951421 Vapor deposition of a layer
05/31/2011US7951280 Gallium electroplating methods and electrolytes employing mixed solvents
05/31/2011US7951261 Plasma etching apparatus
05/31/2011US7951242 Apparatus for forming structured material for energy storage device and method
05/31/2011US7950348 Substrate processing apparatus and semiconductor device producing method
05/26/2011WO2011063424A1 Cnt-tailored composite space-based structures
05/26/2011WO2011063216A2 Encoded consumable materials and sensor assemblies for use in additive manufacturing systems
05/26/2011WO2011063065A1 Deposition inhibitor composition method of use
05/26/2011WO2011063007A2 Fluid bed reactor
05/26/2011WO2011062779A1 Method for selective deposition and devices
05/26/2011WO2011062450A2 Sputtering target of multi-component single body and method for preparation thereof, and method for producing multi-component alloy-based nanostructured thin films using same
05/26/2011WO2011062286A1 Deposited film forming device
05/26/2011WO2011062254A1 Apparatus and process for producing nanocarbon material
05/26/2011WO2011062134A1 In-line type film forming apparatus and method for manufacturing magnetic recording medium
05/26/2011WO2011062069A1 Cobalt film forming material and cobalt film forming method
05/26/2011WO2011062058A1 Semiconductor device
05/26/2011WO2011060830A1 Chemical vapour deposition process and device
05/26/2011WO2011060519A1 System for depositing tubular or conical diamantiferous films
05/26/2011WO2011011129A4 Coated tooling
05/26/2011WO2011008778A3 Metal and metal oxide structures and preparation thereof
05/26/2011WO2010142847A3 Method and apparatus for coating glass substrate
05/26/2011US20110124483 Ceramic composite materials containing carbon nanotube-infused fiber materials and methods for production thereof
05/26/2011US20110124204 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
05/26/2011US20110124201 Chemical vaporizer for material deposition systems and associated methods
05/26/2011US20110124200 Method and apparatus of plasma treatment
05/26/2011US20110124199 Apparatus and method for high-throughput atomic layer deposition
05/26/2011US20110124182 System for the delivery of germanium-based precursor
05/26/2011US20110124144 Substrate processing system and substrate processing method
05/26/2011US20110123776 Graphene laminate and method of preparing the same
05/26/2011US20110123707 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
05/26/2011US20110123409 Chemical reactor with nanometric superstructure