Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2011
06/16/2011WO2011070667A1 Vacuum processing apparatus and processing method using vacuum processing apparatus
06/16/2011WO2011069687A1 Substrate support
06/16/2011WO2011026078A3 Apparatus for gaseous vapor deposition
06/16/2011WO2011026073A3 Apparatus and method for unloading a film cassette for gaseous vapor deposition
06/16/2011WO2011026072A3 Apparatus and method for loading a film cassette for gaseous vapor deposition
06/16/2011WO2011026066A3 Film cassette for gaseous vapor deposition
06/16/2011US20110143930 Tunable size of nano-active material on nano-support
06/16/2011US20110143910 Inorganic phosphate compositions and methods
06/16/2011US20110143551 Device and process for chemical vapor phase treatment
06/16/2011US20110143525 Nitride semiconductor substrate and manufacturing method thereof
06/16/2011US20110143491 Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate
06/16/2011US20110143481 Modular system and process for continuous deposition of a thin film layer on a substrate
06/16/2011US20110143463 Vapor deposition method and vapor deposition apparatus
06/16/2011US20110143163 Method for the production of an optimized bonding agent layer by means of partial evaporation of the bonding agent layer, and a layer system
06/16/2011US20110143127 Methods for coating implants
06/16/2011US20110143053 Method of forming zinc oxide film (zno) or magnesium zinc oxide film (znmgo) and apparatus for forming zinc oxide film or magnesium zinc oxide film
06/16/2011US20110143050 Method for producing a three-dimensionally controlled surface coating in a cavity
06/16/2011US20110143035 Thin Film Deposition System and Method for Depositing Thin Film
06/16/2011US20110143034 Method for depositing graphene film
06/16/2011US20110143033 Vacuum processing apparatus and vacuum processing method
06/16/2011US20110143032 Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants
06/16/2011US20110143019 Apparatus for Deposition on Two Sides of the Web
06/16/2011US20110143017 Method for generating and applying instrument profiles
06/16/2011US20110143016 Temperature control method for chemical vapor deposition apparatus
06/16/2011US20110142746 SYSTEM AND PROCESS FOR CADMIUM TELLURIDE (CdTe) RECLAMATION IN A VAPOR DEPOSITION CONVEYOR ASSEMBLY
06/16/2011US20110142384 Sliding element having a multiple layer
06/16/2011US20110141556 Systems having optical absorption layer for mid and long wave infrared and methods for making the same
06/16/2011US20110140309 Method for making carbon nanotube structure
06/16/2011US20110140246 Delta-doping at wafer level for high throughput, high yield fabrication of silicon imaging arrays
06/16/2011US20110139958 Wear resistant coatings for tool dies
06/16/2011US20110139751 Plasma-based chemical source device and method of use thereof
06/16/2011US20110139749 Substrate processing apparatus, substrate processing method, and program for implementing the method
06/16/2011US20110139611 Apparatus for Fabricating Thin Film Transistor
06/16/2011US20110139372 Showerhead assembly for vacuum processing apparatus
06/16/2011US20110139370 Plasma processing apparatus
06/16/2011US20110139361 Method for making carbon nanotube film
06/16/2011US20110139209 Method of growing a thin film, a method of forming a structure and a device
06/16/2011US20110139074 Film deposition apparatus
06/16/2011US20110139072 Continuous deposition apparatus
06/16/2011US20110139070 Substrate processing apparatus and method of manufacturing semiconductor device
06/16/2011DE102009058038A1 Anordnung zum Temperieren von bandförmigen Substraten Arrangement for controlling the temperature of the band-shaped substrates
06/16/2011DE102009057903A1 Evaporation device for coating systems for high-temperature gas evaporation of a material, comprises a section for the gas flow and a heat source, which heats in the section of the gas-material mixture
06/16/2011DE102009052873A1 Device for continuously movable infiltration of a flexible band substrate in high vacuum without touching the front side of the band substrate, comprises a sequence of prechambers to which the band substrate passes through
06/15/2011EP2333819A1 Method for fabricating p-type gallium nitride-based semiconductor, method for fabricating nitride-based semiconductor element, and method for fabricating epitaxial wafer
06/15/2011EP2333136A1 Diamond electrode and method for manufacturing diamond electrode
06/15/2011EP2332167A2 Vapor phase epitaxy system
06/15/2011EP2331729A1 Sanitary object
06/15/2011EP2331726A1 Method for electron beam induced deposition of conductive material
06/15/2011EP2331725A1 Epitaxial reactor for silicon deposition
06/15/2011CN201868459U Semiconductor solar coating process chamber
06/15/2011CN201864776U Hanging hook of flat plate PECVD (plasma-enhanced chemical vapor deposition) device
06/15/2011CN201864775U Instrument for preparing nano materials with gas phase method
06/15/2011CN201864774U Swing bin for vacuum continuous coating film production line
06/15/2011CN201864773U Slewing mechanism for vacuum continuous film-coating production line
06/15/2011CN201864772U Work rest for vacuum coating
06/15/2011CN201864771U Workpiece bracket for vacuum coater
06/15/2011CN1721569B Coat base with curved surface and method for manufacturing such coat base
06/15/2011CN102099506A Metal/cnt and/or fullerene composite coating on strip materials
06/15/2011CN102099505A Deposition film forming apparatus and deposition film forming method
06/15/2011CN102098863A Electrode board for plasma processing equipment and method for removing process sediments
06/15/2011CN102097595A Organic lighting device and producing method thereof
06/15/2011CN102097548A Method for preparing self-supported GaN-based light emitting diode
06/15/2011CN102097541A Method for enhancing efficiency of industrial single-chamber deposited amorphous silicon-based solar cell
06/15/2011CN102097534A Method for simultaneously forming crystal silicon solar cell PN junction and silicon nitride antireflection film
06/15/2011CN102097528A Solar cell and method for manufacturing the same
06/15/2011CN102097302A Film formation method and apparatus
06/15/2011CN102097297A Method for depositing high k gate dielectrics on atomic layer on graphene surface by adopting electric field induction
06/15/2011CN102097295A Cleaning method of process chamber
06/15/2011CN102094190A Preparation method of lanthanum-based high-dielectric constant film
06/15/2011CN102094189A Chemical vapor deposition reaction equipment
06/15/2011CN102094188A A showerhead assembly for vacuum processing apparatus
06/15/2011CN102094187A Film deposition apparatus
06/15/2011CN102094186A Gas supply equipment
06/15/2011CN102094185A Barrel-shaped metal organic chemical vapor deposition reaction tube
06/15/2011CN102094184A PECVD up-and-down simultaneous coating method
06/15/2011CN102094183A Cold-wall batch reactor
06/15/2011CN102094168A 掩膜组件 Mask assembly
06/15/2011CN102094158A Dumping machine prepared from new composite
06/15/2011CN102093430A Organic phosphine-stabilized alkyl silver disulfonate complex, and synthetic method and application thereof
06/15/2011CN101724827B Method for reducing ethylene cracking furnace tube coking and improving ethylene selectivity
06/15/2011CN101582468B Method of high-mobility textured structure IMO/ZnO composite film of solar battery
06/15/2011CN101565821B Method for coating film on surface of drill point and drill point coated with film
06/15/2011CN101525743B Method for depositing semi-conductor film on substrate by using close-space sublimation technology and device thereof
06/15/2011CN101525740B Method for growing high-quality indium nitride single crystal epitaxial film
06/15/2011CN101378031B Substrate carrier plateform and substrate processing device
06/15/2011CN101356298B Film-forming apparatus, exhaust system structure thereof, and method for processing exhaust gas
06/15/2011CN101336470B Plasma etching method
06/15/2011CN101333654B Plasma discharge processing unit
06/15/2011CN101325174B Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program
06/15/2011CN101171367B High efficiency UV cleaning of a process chamber
06/15/2011CN101111502B Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same
06/15/2011CN101040059B Heat transfer system for improved semiconductor processing uniformity
06/14/2011US7962016 Heating crucible for organic thin film forming apparatus
06/14/2011US7960901 Piezoelectric device having a ferroelectric film including a ferroelectric material
06/14/2011US7960294 Method of modifying interlayer adhesion
06/14/2011US7960254 Manufacturing method for epitaxial wafer
06/14/2011US7960043 Photo-induced hydrophilic article and method of making same
06/14/2011US7959987 Fuel cell conditioning layer
06/14/2011US7959985 Method of integrating PEALD Ta-containing films into Cu metallization
06/14/2011US7959973 Pressure swing CVI/CVD