C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2011
06/14/2011	US7959972 Monomolecular carbon-based film for forming lubricious surface on aircraft parts
06/14/2011	US7959971 Film formation method with deposition source position control
06/14/2011	US7959970 System and method of removing chamber residues from a plasma processing system in a dry cleaning process
06/14/2011	US7959735 Susceptor with insulative inserts
06/14/2011	US7959734 Substrate mounting structure and substrate processing apparatus
06/14/2011	US7959733 Film formation apparatus and method for semiconductor process
06/14/2011	US7959695 Fixed abrasive articles utilizing coated abrasive particles
06/14/2011	US7958842 Substrate processing apparatus
06/09/2011	WO2011069011A1 Small plasma chamber systems and methods
06/09/2011	WO2011068480A1 Method and system for forming a metal electrode for a solar cell
06/09/2011	WO2011068283A1 Chemical vapor deposition reactor having a radiant heat barrier layer for improving energy efficiency
06/09/2011	WO2011068065A1 Semiconductor device and production method thereof
06/09/2011	WO2011068038A1 Cleaning gas
06/09/2011	WO2011067872A1 Light emitting element and method for manufacturing same
06/09/2011	WO2011066769A1 Plasma-enhanced chemical vapor deposition system
06/09/2011	WO2011066697A1 Gas supply system and method thereof
06/09/2011	WO2011066696A1 Gas feeding device and gas feeding method
06/09/2011	WO2011066632A1 Cylindrical electrochemical cell with doped coaxial diamond anode produced by deposition of diamond-bearing films on mechanically resistant cylindrical substrates, for use in aqueous solution purification processes
06/09/2011	WO2011020042A3 Hafnium- and zirconium-containing precursors and methods of using the same
06/09/2011	US20110136347 Point-of-use silylamine generation
06/09/2011	US20110136343 Composition and method for low temperature deposition of silicon-containing films
06/09/2011	US20110136328 Method for depositing ultra fine grain polysilicon thin film
06/09/2011	US20110136162 Compositions and Methods for Functionalized Patterning of Tissue Engineering Substrates Including Bioprinting Cell-Laden Constructs for Multicompartment Tissue Chambers
06/09/2011	US20110135948 Composition for making metal matrix composites
06/09/2011	US20110135915 Methods of Coating Substrate With Plasma Resistant Coatings and Related Coated Substrates
06/09/2011	US20110135898 Multilayered coated cutting tool
06/09/2011	US20110135897 Coated Article and Method for Making a Coated Article
06/09/2011	US20110135844 Large area plasma processing chamber with at-electrode rf matching
06/09/2011	US20110135843 Deposited Film Forming Device and Deposited Film Forming Method
06/09/2011	US20110135842 Method and system for performing different deposition processes within a single chamber
06/09/2011	US20110135840 Method for producing a component through selective laser melting and process chamber suitable therefor
06/09/2011	US20110135839 Lithographic apparatus and a method of forming a lyophobic coating on a surface
06/09/2011	US20110135838 Liquid Precursor for Depositing Group 4 Metal Containing Films
06/09/2011	US20110135822 Coated cutting tool and method for producing the same
06/09/2011	US20110135821 Methods of and apparatus for controlling pressure in multiple zones of a process tool
06/09/2011	US20110132873 Substrate processing apparatus, method for measuring distance between electrodes, and storage medium storing program
06/09/2011	US20110132263 System and Method for Depositing a Material on a Substrate
06/09/2011	US20110132262 System and Method for Depositing a Material on a Substrate
06/09/2011	US20110132261 System and Method for Depositing a Material on a Substrate
06/09/2011	US20110132260 Manufacturing apparatus
06/09/2011	US20110131804 Substrate treating apparatus and method for manufacturing semiconductor device
06/09/2011	DE102009050283A1 Agent useful for removing metallic, semimetallic or ceramic deposit, preferably of silicon nitride, from surface on which it is disposed, comprises composition comprising nitric acid, ammonium fluoride, acetic acid, and/or propane-1,2-diol
06/08/2011	EP2330633A1 Photoelectric conversion device manufacturing method, photoelectric conversion device, and photoelectric conversion device manufacturing system
06/08/2011	EP2330232A1 CVD reactor with energy efficient thermal-radiation shield
06/08/2011	EP2330230A1 Masking material, masking device, method for masking a substrate and method for coating a substrate
06/08/2011	EP2330109A1 Liquid precursor for depositing group 4 metal containing films
06/08/2011	EP2329888A2 Organic glass for automobile and process for producing the same
06/08/2011	EP2329056A1 Uv absorption based monitor and control of chloride gas stream
06/08/2011	EP2329055A1 Sige matrix nanocomposite materials with an improved thermoelectric figure of merit
06/08/2011	EP2328692A2 Metal and electronic device coating process for marine use and other environments
06/08/2011	EP2000562B1 Electrode and vacuum processing apparatus
06/08/2011	CN201857426U Supporting structure
06/08/2011	CN1990492B Ti, ta, hf, zr and related metal silicon amides for ald/cvd of metal-silicon nitrides, oxides or oxynitrides
06/08/2011	CN1956777B Tailored and uniform coatings in microchannel apparatus
06/08/2011	CN1870863B Casing of portable electronic device and its manufacturing method
06/08/2011	CN1788106B Treating device using raw material gas and reactive gas
06/08/2011	CN102090153A Microwave plasma processing device
06/08/2011	CN102089872A Film production method and storage medium
06/08/2011	CN102089871A Method for Sr-Ti-O-base film formation and recording medium
06/08/2011	CN102089456A Coating process and corrosion protection coating for turbine components
06/08/2011	CN102086515A Substrate processing apparatus
06/08/2011	CN102086514A PECVD (plasma enhanced chemical vapor deposition) system
06/08/2011	CN102086513A Liquid precursor for depositing group 4 metal containing films
06/08/2011	CN102086503A Masking material, masking layer, method for masking a substrate and method for coating a substrate
06/08/2011	CN101671814B Surface coating method of transmission mechanism
06/08/2011	CN101641459B Vaporizer, vaporization module, and film forming device
06/08/2011	CN101533846B Photoluminescent dosimeter element used for radiant metering and method for preparing same
06/08/2011	CN101512040B Confinement ring drive
06/08/2011	CN101495268B Methods of making gas distribution members for plasma processing apparatuses
06/08/2011	CN101490307B Film formation method, cleaning method, and film formation device
06/08/2011	CN101423933B Metal heat absorption tube and preparation method thereof
06/08/2011	CN101399176B Substrate processing system, control method for substrate processing apparatus and program
06/08/2011	CN101208458B Method of forming metallic
06/08/2011	CN101072894B Method for deposition of metal layers from metal carbonyl precursors
06/08/2011	CN101018884B Plasma processing apparatus including gas distribution member supplying process gas and radio frequency (RF) power
06/07/2011	US7956519 Piezoelectric device having a ferroelectric film including a solid solution
06/07/2011	US7956207 Heteroleptic organometallic compounds
06/07/2011	US7955991 Producing method of a semiconductor device using CVD processing
06/07/2011	US7955986 Capacitively coupled plasma reactor with magnetic plasma control
06/07/2011	US7955880 Method of producing semiconductor optical device
06/07/2011	US7955687 Antifouling material and production method thereof
06/07/2011	US7955651 Enhanced alumina layer with texture
06/07/2011	US7955650 Method for forming dielectric film using porogen gas
06/07/2011	US7955649 vapor depositing on lenses using a more reliable, versatile and safer dispensing system carrier; pre-opening the screw cap of vial prior placing within the chamber, vacuum depositing silica layer, covering with a thin polysilsesquioxane film; uniform layer, no defect, no splashing
06/07/2011	US7955648 Thin alignment layers for liquid crystal displays
06/07/2011	US7955647 Method for manufacturing film or piezoelectric film
06/07/2011	US7955646 Elimination of flow and pressure gradients in low utilization processes
06/07/2011	US7955581 Method of producing silicon oxide, negative electrode active material for lithium ion secondary battery and lithium ion secondary battery using the same
06/07/2011	US7955513 Apparatus and method for reactive atom plasma processing for material deposition
06/07/2011	US7955437 Apparatus for fabricating a III-V nitride film
06/07/2011	US7955436 Systems and methods for sealing in site-isolated reactors
06/07/2011	US7954452 Film formation apparatus for semiconductor process and method for using the same
06/07/2011	CA2519944C Method of making coated articles and coated articles made thereby
06/03/2011	WO2011065965A2 An electrostatic chuck with an angled sidewall
06/03/2011	WO2011065776A2 Tray and substrate processing apparatus using same and method for manufacturing tray
06/03/2011	WO2011065506A1 Plasma processor
06/03/2011	WO2011065343A1 Photoelectric converter and method for producing same
06/03/2011	WO2011065221A1 Ruthenium-film forming material and ruthenium-film forming method
06/03/2011	WO2011064446A1 Method for forming a decorative coating on a gemstone, a decorative coating on a gemstone, and uses of the same
06/03/2011	WO2011064392A2 Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure

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