Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2011
06/23/2011WO2011073514A1 Method of surfacing metallic nanoparticles with carbon
06/23/2011WO2011072932A1 Hot-trap assembly
06/23/2011WO2011072664A1 Structure containing a solid lubricant (solid lubricant structure), solid lubricant structure designed in particular for a vacuum-tribological use, and method for the production thereof
06/23/2011US20110151615 Bicyclic guanidines, metal complexes thereof and their use in vapor deposition
06/23/2011US20110151590 Apparatus and method for low-k dielectric repair
06/23/2011US20110151263 Multilayer growth by gas phase deposition
06/23/2011US20110151246 Stone agglomerate slab or flag with tio2 or zno coating
06/23/2011US20110151209 Shell for electronic device, method of forming the shell and electronic device having the same
06/23/2011US20110151141 Chemical vapor deposition for an interior of a hollow article with high aspect ratio
06/23/2011US20110151140 Methods Of Forming Nickel Aluminde Coatings
06/23/2011US20110151137 Method of gas distribution and nozzle design in the improved chemical vapor deposition of polysilicon reactor
06/23/2011US20110151132 Methods for Coating Articles Exposed to Hot and Harsh Environments
06/23/2011US20110151122 Film deposition apparatus, film deposition method, and computer readable storage medium
06/23/2011US20110151121 Chemical vapor deposition apparatus and method for forming parylene film
06/23/2011US20110151120 Surface treating method for making the same
06/23/2011US20110151119 Methods and Systems of Transferring, Docking and Processing Substrates
06/23/2011US20110151118 Treatment system using a fluid capable of phase change
06/23/2011US20110151111 Apparatus And Method For Vapor Deposition Of Dielectric Wire Coating
06/23/2011US20110151107 Coating apparatus and method for real-timely monitoring thickness change of coating film
06/23/2011US20110151106 Source for Inorganic Layer and Method for Controlling Heating Source Thereof
06/23/2011US20110151105 High-Throughput Combinatorial Dip-Coating Apparatus and Methodologies
06/23/2011US20110150608 Apparatus for transferring a substrate
06/23/2011US20110148050 Sealing article
06/23/2011US20110147935 Method and system for binding halide-based contaminants
06/23/2011US20110147345 Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
06/23/2011US20110147339 Method for manufacturing wiring structure of wiring board
06/23/2011US20110146910 Plasma processing apparatus
06/23/2011US20110146909 Methods for wet cleaning quartz surfaces of components for plasma processing chambers
06/23/2011US20110146848 Oxide-forming protective coatigns for niobium-based materials
06/23/2011US20110146764 Molecular precursor methods and articles for optoelectronics
06/23/2011US20110146579 Linear evaporation source and deposition apparatus having the same
06/23/2011US20110146578 Substrate processing apparatus
06/23/2011US20110146577 Showerhead with insulated corner regions
06/23/2011US20110146575 Evaporation source and deposition apparatus having the same
06/23/2011US20110146571 Temperature controlled showerhead for high temperature operations
06/23/2011US20110146568 Modification of nanoimprint lithography templates by atomic layer deposition
06/23/2011CA2781441A1 Chemical vapor deposition for an interior of a hollow article with high aspect ratio
06/22/2011EP2336397A2 Non-polar (Al,B,In,Ga)N-based device with a reduced dislocation density and method for its manufacture
06/22/2011EP2336389A1 A showerhead assembly for vacuum processing apparatus
06/22/2011EP2336388A1 Method for deposition of a layer of a tin oxide onto a substrate
06/22/2011EP2336387A1 Workpiece mount device
06/22/2011EP2334842A1 Apparatus and method for atomic layer deposition
06/22/2011EP2334841A1 Films containing an infused oxygenated gas and methods for their preparation
06/22/2011EP2334840A1 Shadow mask held magnetically on a substrate support
06/22/2011EP2334839A2 Method for the controlled growth of a graphene film
06/22/2011EP2334443A1 Method for using a super-slippery thin layer characterised by the method for making same
06/22/2011EP2126154B1 Coating for gas turbine components and method for providing a coating
06/22/2011EP1186025B1 Tungsten-filled deep trenches
06/22/2011DE102009059800A1 Method of using a volatile metal compound to form metal-containing layer on a substrate within a reaction zone under the use of an agent for the formation or storage and for supplying two process gases and agent for tempering the substrate
06/22/2011DE102009059799A1 New vaporizable copper carboxylate-amine complex comprising a copper carboxylate and a polyamine, useful as copper precursor for atomic layer- and chemical vapor-deposition coating process, and to produce electronic or optical component
06/22/2011DE102009059097A1 Verfahren und Vorrichtung zur Auswertung des von einem Plasma emittierten Lichtes zur Regelung von plasmagestützten Vakuumprozessen Method and apparatus for evaluation of light emitted from a plasma light to the regulation of plasma-assisted vacuum processes
06/22/2011CN201873753U Support hook for graphite frame
06/22/2011CN201873752U Vacuum treating device
06/22/2011CN201873751U Atom layer deposition device for preparing thin film at inner wall of porous material
06/22/2011CN201873750U Novel switch furnace door of PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment
06/22/2011CN201873749U Vacuum plating roller way overturning device
06/22/2011CN201873748U Vacuum plating roller transmission device
06/22/2011CN201873747U Vacuum plating sealing device
06/22/2011CN1777697B Transient enhanced atomic layer deposition
06/22/2011CN1638014B Ion beam monitoring arrangement
06/22/2011CN102105990A Apparatus and method for manufacturing thin film solar cell, and thin film solar cell
06/22/2011CN102105620A Susceptor with support bosses
06/22/2011CN102104111A Method of forming variable resistance memory device
06/22/2011CN102104110A Resistance change memory with optimized resistance change characteristic and preparation method thereof
06/22/2011CN102104088A Method for depositing amorphous silicon film in solar battery production
06/22/2011CN102104054A Method for manufacturing a solid-state image capturing element
06/22/2011CN102102196A Temperature control method for chemical vapor deposition apparatus
06/22/2011CN102102195A Thin film deposition system and method for depositing thin film
06/22/2011CN102102194A Temperature controlled showerhead for high temperature operations
06/22/2011CN102102193A Method for preparing ZnO transparent conductive film through metal organic chemical vapor deposition
06/22/2011CN102102192A Method for promoting crystallization of silicon film on glass substrate by using light with specific wavelength
06/22/2011CN102102191A Silicon film processing method and flash lamp irradiation device
06/22/2011CN102102174A Coating method and equipment
06/22/2011CN102101371A Method for bonding objects
06/22/2011CN101838808B Method for preparing graphite carbon-coated metal nanoparticles in air atmosphere
06/22/2011CN101655641B Method for forming mesh-like film
06/22/2011CN101319311B Method and apparatus for silicon oxide deposition on large area substrates
06/22/2011CN101304089B Phosphorizing nickel cathode material for lithium ion battery and preparation method thereof
06/22/2011CN101126155B Chemical vapor deposition apparatus
06/21/2011US7964516 Film formation apparatus for semiconductor process and method for using same
06/21/2011US7964515 Method of forming high-dielectric constant films for semiconductor devices
06/21/2011US7964513 Method to form ultra high quality silicon-containing compound layers
06/21/2011US7964479 Low-temperature formation of layers of polycrystalline semiconductor material
06/21/2011US7964280 High colour diamond layer
06/21/2011US7964241 Chemical vapor deposition of a silane gas, a nitriding gas or oxynitriding gas, a boron-containing gas, and a carbon hydride gas; low process temperature film formation, causing etching by a low amount during a cleaning process, so that the cleaning process can be performed with high controllability
06/21/2011US7964238 Method of making coated article including ion beam treatment of metal oxide protective film
06/21/2011US7964058 Processing system and method for chemically treating a substrate
06/21/2011US7964038 Apparatus for improved azimuthal thermal uniformity of a substrate
06/21/2011US7964037 Deposition apparatus
06/21/2011US7963248 Plasma generator, substrate treating apparatus including the same and substrate treating method
06/21/2011US7963247 Diffusion tube, dopant source for a diffusion process and diffusion method using the diffusion tube and the dopant source
06/21/2011CA2480590C Self-sharpening cutting tool with hard coating
06/16/2011WO2011071706A1 Methods of and apparatus for controlling pressure in multiple zones of a process tool
06/16/2011WO2011071191A1 P-type algan layer, method for producing same and group iii nitride semiconductor light-emitting element
06/16/2011WO2011071069A1 Method for cleaning film forming apparatus, film forming method, and film forming apparatus
06/16/2011WO2011070945A1 Thin film manufacturing apparatus, thin film manufacturing method, and method for manufacturing semiconductor device
06/16/2011WO2011070805A1 Process for production of photoelectric conversion device
06/16/2011WO2011070760A1 Method for producing semiconductor element
06/16/2011WO2011070741A1 Tray for cvd and film-forming method using same
06/16/2011WO2011070694A1 Semiconductor device and method for manufacturing same