Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2011
07/12/2011US7977243 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
07/12/2011US7976909 Method for deposition of titanium oxide by a plasma source
07/12/2011US7976908 High throughput processes and systems for barrier film deposition and/or encapsulation of optoelectronic devices
07/12/2011US7976898 reactor has a shaped ceiling of the reaction space to provide a nonuniform gap over the substrate; rapid depositing a thin film on substrate having a larger actual area; gas flow space above the substrate is not uniform in height across a direction perpendicular to the gas flow direction
07/12/2011US7976897 Thermal chemical vapor deposition methods, and thermal chemical vapor deposition systems
07/12/2011US7976893 Superconductivity in boron-doped diamond thin film
07/12/2011US7976716 Semiconductor device manufacturing method
07/12/2011US7976674 Embedded multi-inductive large area plasma source
07/12/2011US7976672 Plasma generation apparatus and work processing apparatus
07/12/2011US7976671 Mask etch plasma reactor with variable process gas distribution
07/12/2011US7976636 Multiple nozzle evaporator for vacuum thermal evaporation
07/12/2011US7976635 Dual substrate loadlock process equipment
07/12/2011US7976634 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
07/12/2011US7976633 Device and method of forming film
07/12/2011US7976632 Vacuum processing apparatus
07/12/2011US7976631 Multi-gas straight channel showerhead
07/12/2011US7975646 Device for depositing a coating on an internal surface of a container
07/12/2011US7975558 Method and apparatus for gas flow measurement
07/12/2011CA2544625C One piece shim
07/08/2011CA2726386A1 Process and apparatus for continuous coating of fibrous materials
07/07/2011WO2011081210A1 Tantalum carbide-coated carbon material and manufacturing method for same
07/07/2011WO2011080978A1 Ruthenium complex mixture, method for producing same, composition for forming film, ruthenium-containing film and method for producing same
07/07/2011WO2011080661A1 Method for depositing multi-layered layers and/or gradient layers
07/07/2011WO2011080659A1 Inline coating installation
07/07/2011WO2011079699A1 Method and plasma enhanced chemical vapor deposition system for removing film contamination produced during working process
07/07/2011WO2011047210A3 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
07/07/2011WO2011034751A3 Hot wire chemical vapor deposition (cvd) inline coating tool
07/07/2011US20110165435 Sanitary object
07/07/2011US20110165394 Weather-resistant article, weather-resistant film and optical member
07/07/2011US20110165346 Precursors for CVD Silicon Carbo-Nitride Films
07/07/2011US20110165333 Plasma arc coating system and method
07/07/2011US20110165328 Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition
07/07/2011US20110165327 Thin film deposition apparatus
07/07/2011US20110165326 Automatic feed system and related process for introducing source material to a thin film vapor deposition system
07/07/2011US20110165325 Cool-down system and method for a vapor deposition system
07/07/2011US20110165320 Deposition source, thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus
07/07/2011US20110165317 Coating device and coating method
07/07/2011US20110165315 Flux Monitor
07/07/2011US20110165057 Plasma cvd device, dlc film, and method for depositing thin film
07/07/2011US20110164842 Wear and corrosion resistant layered composite
07/07/2011US20110164253 Method of modifying a substrate for deposition of charged particles thereon
07/07/2011US20110163452 Semiconductor device, method of manufacturing semiconductor device, and substrate processing apparatus
07/07/2011US20110163181 Film formation method, film formation device, piezoelectric film, piezoelectric device and liquid discharge device
07/07/2011US20110163065 System for batch processing of magnetic media
07/07/2011US20110162971 Sputtering Target and Process for Producing Same
07/07/2011US20110162802 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
07/07/2011US20110162582 Deposition of active films
07/07/2011US20110162581 Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same
07/07/2011US20110162580 High temperature ald inlet manifold
07/07/2011DE112009002204T5 Neuartiges Hartmetall für eine Verwendung bei Erdöl- und Gasbohrungen New type of carbide for use in oil and gas wells
07/07/2011DE10351467B4 Gegenstand mit leicht reinigbarer Oberfläche und Verfahren zu seiner Herstellung Subject to easily cleanable surface and method for its manufacture
07/07/2011DE102010061585A1 Transportvorrichtungsbaugruppe mit entnehmbaren Rollen für ein Dampfabscheidungssystem Transport device assembly with removable wheels for a vapor deposition system
07/07/2011DE102010000002A1 Verfahren zur Abscheidung von Mehrlagenschichten und/oder Gradientenschichten A process for the deposition of multilayer coatings and / or gradient
07/07/2011DE102010000001A1 Inline-Beschichtungsanlage Inline coating machine
07/07/2011DE102005045081B4 Suszeptor Susceptor
07/06/2011EP2341163A1 Method of forming a film
07/06/2011EP2013378B1 Exhaust system
07/06/2011EP1917674B1 Optical emission interferometry for pecvd using a gas injection hole
07/06/2011EP1564794B1 Method and device for generating uniform high- frequency plasma over large surface area
07/06/2011CN201890929U Carrying disc structure for vapor phase deposition equipment
07/06/2011CN201890928U Vapor phase deposition furnace
07/06/2011CN1989587B Blocker plate bypass to distribute gases in a chemical vapor deposition system
07/06/2011CN1989080B Nanostructured coatings and related methods
07/06/2011CN1782119B Method of coating a component inside an apparatus
07/06/2011CN1673410B Showerhead mounting to accommodate thermal expansion
07/06/2011CN102119238A Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
07/06/2011CN102115879A Substrate processing apparatus
07/06/2011CN102115878A Preparation method of single crystal cubic carbon nitride thin film
07/06/2011CN102115877A Equipment for preparing boron-doped isotropic pyrolytic carbon materials
07/06/2011CN102115876A Chemical vapor deposition device and method for forming poly-p-xylylene film
07/06/2011CN102115875A Conveyor assembly with removable rollers for a vapor deposition system
07/06/2011CN101736313B Method for preparing diamond-like film on germanium substrate
07/06/2011CN101443478B Gas supply pipe for plasma treatment
07/06/2011CN101388359B Adhesion improvement for low k dielectrics to conductive materials
07/06/2011CN101329982B Apparatus for heat treatment of wafer
07/06/2011CN101304630B Internal balanced coil for inductively coupled high density plasma processing chamber
07/06/2011CN101040061B An elongated gas ditribution system
07/06/2011CN101010782B Method of vapor-phase growing and vapor-phase growing apparatus for AlGaN
07/05/2011US7974524 Heat treatment apparatus and heat treatment method
07/05/2011US7973189 Nucleation, adhesion to copper wires; chemical vapor deposition of cobalt amidate ; diffusion barrier for copper; microelectronics
07/05/2011US7973188 Processes for the production of organometallic compounds
07/05/2011US7972974 Gallium lanthanide oxide films
07/05/2011US7972961 Purge step-controlled sequence of processing semiconductor wafers
07/05/2011US7972663 Method and apparatus for forming a high quality low temperature silicon nitride layer
07/05/2011US7972649 Thin film forming method and thin film forming apparatus
07/05/2011US7972471 Inductively coupled dual zone processing chamber with single planar antenna
07/05/2011US7972470 Asymmetric grounding of rectangular susceptor
07/05/2011US7972468 Semiconductor device fabricating system
07/05/2011US7972467 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
07/05/2011US7972444 Workpiece support with fluid zones for temperature control
07/05/2011US7972443 Metering of particulate material and vaporization thereof
07/05/2011US7972442 Photoplate for OLED deposition screen
07/05/2011US7972441 Thermal oxidation of silicon using ozone
07/05/2011US7971861 Safe liquid source containers
06/2011
06/30/2011WO2011078626A2 Strip passing apparatus, apparatus for treating surface of strip with the same, and method for treating surface of strip
06/30/2011WO2011078270A1 Method for operating vacuum processing apparatus
06/30/2011WO2011077892A1 Method for manufacturing optical component, and optical component
06/30/2011WO2011077746A1 Amorphous carbon orientation film and formation method therefor
06/30/2011WO2011077641A1 Epitaxial growing apparatus and method for manufacturing epitaxial growing apparatus
06/30/2011WO2011077157A1 Coated substrate