Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2011
07/20/2011CN102127807A Method for preparing ternary-component AlxGaI-xN nanocone
07/20/2011CN102127757A Metal organic chemical vapor deposition (MOCVD) reaction system
07/20/2011CN102127756A Device and method for enhancing atomic layer deposition by pulse-modulation radio frequency plasma
07/20/2011CN102127755A Direct current glow plasma device and preparation method of diamond chip
07/20/2011CN102127754A Plasma film forming apparatus
07/20/2011CN102127753A Device for preparing silicon carbide fiber by direct current heating CVD method and preparation method of silicon carbide fiber
07/20/2011CN102127752A Gas treatment systems
07/20/2011CN102127751A Boron-doped diamond micro-nano material with columnar array structure and preparation method thereof
07/20/2011CN102127750A Method for preparing graphene material based on chemical deposition
07/20/2011CN102127749A MOCVD (metal-organic chemical vapour deposition) reactor
07/20/2011CN102127748A Thin film deposition apparatus
07/20/2011CN101770923B Method for loading plasma enhanced chemical vapor deposition equipment and glass panel
07/20/2011CN101704110B Method for preparing flaky metal carbonyl powder
07/20/2011CN101693991B Plasma-enhanced chemical vapor deposition PECVD equipment
07/20/2011CN101580932B Device for realizing temperature equalization of matrix in preparation process of diamond film spherical crown
07/20/2011CN101577211B Reaction chamber component resisting plasma corrosion, preparation method thereof and plasma reaction chamber comprising same
07/20/2011CN101555593B Method and system for preparing functional films in asynchronous pulse mode
07/20/2011CN101389785B Methods for preparation of high-purity polysilicon rods using a metallic core means
07/20/2011CN101353786B Foundation and manufacture method and chemical vapor deposition device having the foundation
07/20/2011CN101294276B Process for producing mix laminated shield membrane with high-selection ratio
07/20/2011CN101220463B Process for chemical vapor deposition and semiconductor structure
07/20/2011CN101078110B Semiconductor manufacturing device
07/20/2011CN101042992B Vertical plasma processing apparatus for semiconductor process
07/19/2011US7982208 Non-polar (Al,B,In,Ga)N quantum well and heterostructure materials and devices
07/19/2011US7981791 Thin films
07/19/2011US7981776 Method for depositing silicon
07/19/2011US7981473 Uniform film deposition; exposing wafer alternately to two different chemically reactive precursors under starved saturation conditions; rapid deposition rate, high throughput
07/19/2011US7981472 Methods of providing uniform gas delivery to a reactor
07/19/2011US7981471 Forming a plastic lens, with no discoloration and a good antistatic property and water repellency; perfluoroalkyl water repellent, mixture of a modified silicone oil, a silane coupling agent, and a perfluoroether compound, and as conductive substance fullerenes, carbon nanotubes or graphite
07/19/2011US7981462 Method for applying paints and varnishes
07/19/2011US7981262 Process kit for substrate processing chamber
07/19/2011US7981219 System for plasma treating a plastic component
07/19/2011US7981218 Substrate supporting mechanism and substrate processing apparatus
07/19/2011US7981217 Vertical heat treatment apparatus and method of transferring substrates to be processed
07/19/2011US7981216 Vacuum processing apparatus
07/19/2011US7980198 Doping apparatus, doping method, and method for fabricating thin film transistor
07/19/2011CA2442575C Process and device for the deposition of an at least partially crystalline silicium layer on a substrate
07/14/2011WO2011085109A1 Method for the co-evaporation and deposition of materials with differing vapor pressures
07/14/2011WO2011084427A2 Methods and systems for producing silicon, e.g., polysilicon, including recycling byproducts
07/14/2011WO2011084171A1 Molecular precursors for optoelectronics
07/14/2011WO2011083869A1 Cubic boron nitride coating method and material produced by the method
07/14/2011WO2011083820A1 Metal alkoxide compound and process for production of metal-containing thih film using the compound
07/14/2011WO2011083552A1 Epitaxial wafer and semiconductor element
07/14/2011WO2011049811A3 Point-of-use silylamine generation
07/14/2011WO2010130437A3 Method for producing a photovoltaic module
07/14/2011WO2010094376A3 A method and arrangement for vapour phase coating of an internal surface of at least one hollow article
07/14/2011US20110171835 Method and apparatus for forming silicon oxide film
07/14/2011US20110171489 Multi-layer high moisture barrier polylactic acid film
07/14/2011US20110171469 Cnt-infused aramid fiber materials and process therefor
07/14/2011US20110171462 Nitride Semiconductor Crystal Manufacturing Apparatus, Nitride Semiconductor Crystal Manufacturing Method, and Nitride Semiconductor Crystal
07/14/2011US20110171444 Coated Cutting Tool
07/14/2011US20110171426 Hard water-repellent structure and method for making the same
07/14/2011US20110171399 Process and apparatus for continuous coating of fibrous materials
07/14/2011US20110171390 Fixture for coating application
07/14/2011US20110171384 Polymerized film forming method and polymerized film forming apparatus
07/14/2011US20110171383 Method for constant concentration evaporation and a device using the same
07/14/2011US20110171382 Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
07/14/2011US20110171381 Silicon precursors and method for low temperature cvd of silicon-containing films
07/14/2011US20110171380 Susceptor, coating apparatus and coating method using the susceptor
07/14/2011US20110171028 Boron-based Refractory Coating for a Wind Turbine Component
07/14/2011US20110168954 Carbon nanotube based composite surface enhanced raman scattering (sers) probe
07/14/2011US20110168673 Plasma processing apparatus, plasma processing method, and mechanism for regulating temperature of dielectric window
07/14/2011US20110168669 Method of preparing low resistance metal line, patterned metal line structure, and display device using the same
07/14/2011US20110168440 Broadband electromagnetic wave-absorber and process for producing same
07/14/2011US20110168330 Support structure, load lock apparatus, processing apparatus and transfer mechanism
07/14/2011US20110168094 Plasma film forming apparatus
07/14/2011US20110168093 Methods and apparatus for incorporating nitrogen in oxide films
07/14/2011US20110168051 Chromium (iii) carbonate and process for producing the same
07/14/2011DE112008004011T5 Verfahren zur Bildung von Zinkoxidfilm (ZnO) oder Magnesiumzinkoxidfilm (ZnMgO) und Anlage zur Bildung von Zinkoxidfilm oder Magnesiumzinkoxidfilm A method for forming zinc oxide (ZnO) or Magnesiumzinkoxidfilm (ZnMgO) and investment in the formation of zinc oxide or Magnesiumzinkoxidfilm
07/14/2011DE112008003635T5 Beschichtungsvorrichtung und Beschichtungsverfahren A coating apparatus and coating process
07/14/2011DE102010062937A1 Lineare Verdampfungsquelle und Beschichtungsvorrichtung mit linearer Verdampfungsquelle Linear evaporation source and coating apparatus with linear evaporation source
07/14/2011DE102009030876B4 Verfahren zum Beschichten eines Substrats A method for coating a substrate
07/14/2011DE102007040655B4 Funktionsschichtübertragungsanordnung, Verfahren zu deren Herstellung, Übertragungsverfahren für eine Funktionsschicht und Verwendung einer plasmapolymeren Schicht oder einer Funktionsschichtübertragungsanordnung zum Übertragen einer Funktionsschicht auf ein Substrat Functional layer transfer assembly, to processes for their preparation, transmission method for a functional layer and use of a plasma polymer layer or a functional layer transfer assembly for transferring a functional layer onto a substrate
07/13/2011EP2343398A1 Process and apparatus for continuous coating of fibrous materials
07/13/2011EP2342367A1 A coated tool and a method of making thereof
07/13/2011EP2342366A2 Metal/cnt and/or fullerene composite coating on strip materials
07/13/2011EP2250298B1 Method and system for depositing a metal or metalloid on carbon nanotubes
07/13/2011EP1994197B1 Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components
07/13/2011EP1831425B1 Method of disposing metal bearing gases
07/13/2011EP1698614B1 Metal compound, material for forming thin film and method for preparing thin film
07/13/2011EP1630859B1 Vaporizer and semiconductor processing apparatus
07/13/2011EP1618227B1 Method and device for depositing semiconductor layers using two process gases, of which one is preconditioned
07/13/2011CN201896195U Novel glass coating equipment
07/13/2011CN201896194U Novel solar battery coating equipment
07/13/2011CN201896193U Delivering-taking device for glass coating equipment
07/13/2011CN1711369B Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
07/13/2011CN102124291A Process device for processing in particular stacked processed goods
07/13/2011CN102124140A Trap
07/13/2011CN102124139A Improvement of electrical and optical properties of silicon solar cells
07/13/2011CN102121099A Method for depositing film by using LPCVD process
07/13/2011CN102121098A Reaction chamber with external heating mode for metal organic chemical vapor deposition system
07/13/2011CN102121097A Multi-gas spiral channel showerhead
07/13/2011CN102121096A Chemical vapor deposition method and equipment integrated with atomic layer deposition process
07/13/2011CN102121091A Cool-down system and method for a vapor deposition system
07/13/2011CN101460656B Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
07/13/2011CN101256936B Method and apparatus for controlling gas flow to a processing chamber
07/13/2011CN101191198B Method for forming alignment layers for liquid crystal displays
07/12/2011US7978963 Thermal processing apparatus
07/12/2011US7977673 Semiconductor layer with a Ga2O3 system
07/12/2011US7977611 Systems and methods for providing localized heat treatment of metal components