| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/28/2011 | US20110180002 Vaporizer and deposition system using the same |
| 07/28/2011 | US20110180001 Vapor phase epitaxy apparatus of group iii nitride semiconductor |
| 07/28/2011 | US20110179999 Systems and methods for sealing in site-isolated reactors |
| 07/28/2011 | DE102010060297A1 Verfahren zum Entfernen von Kontamination von einem Reaktor A method of removing contamination from a reactor |
| 07/28/2011 | DE102010001218A1 Substratteller und Beschichtungsanlage zum Beschichten von Substraten Substrate plate and coating plant for coating substrates |
| 07/28/2011 | CA2788448A1 Cleaning method for coating systems |
| 07/27/2011 | EP2348139A1 Substrate plate and coating assembly for coating substrates |
| 07/27/2011 | EP2347031A2 Atomic layer deposition powder coating |
| 07/27/2011 | EP2347030A1 Vapor phase deposition system |
| 07/27/2011 | EP2347029A1 Method for producing photocatalytically active titanium dioxide layers |
| 07/27/2011 | EP2347028A1 Method and apparatus for chemical vapor deposition |
| 07/27/2011 | EP1807372B1 Glass ceramic article having a diffusion barrier and method for producing a glass ceramic article having a diffusion barrier |
| 07/27/2011 | EP1557479B1 Substrate having multilayer film and method for manufacturing the same |
| 07/27/2011 | EP1546434B1 Device for carrying out a plasma-assisted process |
| 07/27/2011 | EP1275139B1 Uv pretreatment process of ultra-thin oxynitride for formation of silicon nitride films |
| 07/27/2011 | CN201908132U Cantilever type push-and-pull boat system used for plasma enhanced chemical vapor deposition (PECVD) device |
| 07/27/2011 | CN201908131U Substrate preloading system for MOCVD treatment system |
| 07/27/2011 | CN201908130U PECVD equipment with super-high productivity |
| 07/27/2011 | CN201908129U Dust collection device of flat type plasma coating equipment |
| 07/27/2011 | CN102138205A Insulating film material, method for forming film by using the insulating film material, and insulating film |
| 07/27/2011 | CN102138204A Gas supply member and plasma processing device |
| 07/27/2011 | CN102137961A Group III nitride crystal and production method thereof |
| 07/27/2011 | CN102137952A High-k dielectric films and methods of producing using cerium-based ss-diketonate precursors |
| 07/27/2011 | CN102136411A UV curing system |
| 07/27/2011 | CN102136407A Guide rack of dry etcher |
| 07/27/2011 | CN102134710A Film deposition apparatus |
| 07/27/2011 | CN102134709A Film deposition apparatus |
| 07/27/2011 | CN102134708A Filter for filtering fluid in a substrate treatment chamber |
| 07/27/2011 | CN102134707A Deposition source, deposition apparatus having the same, and method of forming thin film |
| 07/27/2011 | CN102134697A Mask plate and positioning method thereof |
| 07/27/2011 | CN101643932B Low texture pyrolysis born nitride (PBN) thin-wall container and preparation method thereof |
| 07/27/2011 | CN101573469B Deposition of amorphous silicon films by electron cyclotron resonance |
| 07/27/2011 | CN101510566B Wide bandgap N type nanometer silicon material for silicon film solar battery and preparation method |
| 07/27/2011 | CN101476113B Method for preparing boron doped conductive diamond thin film by chemical vapor deposition |
| 07/27/2011 | CN101373703B Cap-opening mechanism and semiconductor processing device and cap-opening control method thereof |
| 07/27/2011 | CN101233792B Plasma generator and film deposit method employing same |
| 07/27/2011 | CN101228292B Method for silicon nitride chemical vapor deposition |
| 07/27/2011 | CN101071755B Decoupled chamber body |
| 07/26/2011 | US7985696 Method of manufacturing semiconductor device |
| 07/26/2011 | US7985664 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device |
| 07/26/2011 | US7985635 Laser process |
| 07/26/2011 | US7985450 Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound |
| 07/26/2011 | US7985449 Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes |
| 07/26/2011 | US7985350 Additives to prevent degradation of cyclic alkene derivatives |
| 07/26/2011 | US7985295 RF heater arrangement for substrate heating apparatus |
| 07/26/2011 | CA2496122C Method of coating a surface with an organic film |
| 07/21/2011 | WO2011088024A1 Methods and apparatus for atomic layer deposition on large area substrates |
| 07/21/2011 | WO2011087186A1 Polysilicon deposition apparatus |
| 07/21/2011 | WO2011087094A1 Electromagnetic-radiation power-supply mechanism and microwave introduction mechanism |
| 07/21/2011 | WO2011087061A1 Single-crystal substrate, group iii element nitride crystal obtained using same, and process for produicng group iii element nitride crystal |
| 07/21/2011 | WO2011087049A1 Substrate processing apparatus |
| 07/21/2011 | WO2011086971A1 Method for manufacturing semiconductor device, and film forming apparatus |
| 07/21/2011 | WO2011086186A1 Plasma- or ion-based system for producing coatings on fluoropolymers, said coatings having good adhesion |
| 07/21/2011 | WO2011086164A1 Cvd single crystal diamond material |
| 07/21/2011 | WO2011086096A1 Mounting for fixing a reactor in a vacuum chamber |
| 07/21/2011 | WO2011085796A1 Coated tool |
| 07/21/2011 | WO2011026067A3 Method for making a film cassette for gaseous vapor deposition |
| 07/21/2011 | US20110177644 Plasma cvd apparatus, method for manufacturing semiconductor film, method for manufacturing thin-film solar cell, and method for cleaning plasma cvd apparatus |
| 07/21/2011 | US20110177460 process for producing an image on a substrate |
| 07/21/2011 | US20110177349 Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures |
| 07/21/2011 | US20110177342 Cured Organopolysiloxane Resin Film Having Gas Barrier Properties and Method Of Producing The Same |
| 07/21/2011 | US20110177260 Plasma cvd device, method for depositing thin film, and method for producing magnetic recording medium |
| 07/21/2011 | US20110177233 Apparatus for providing material on a deposition surface |
| 07/21/2011 | US20110176967 Vertical type semiconductor device producing apparatus |
| 07/21/2011 | US20110175487 Method for producing a dielectric layer in an electroacoustic component, and electroacoustic component |
| 07/21/2011 | US20110175345 Security film and process for preparation thereof |
| 07/21/2011 | US20110175140 Methods for forming nmos epi layers |
| 07/21/2011 | US20110174778 Plasma processing apparatus and method |
| 07/21/2011 | US20110174776 Plasma processing apparatus, plasma processing method and end point detection method |
| 07/21/2011 | US20110174775 Surface processing apparatus |
| 07/21/2011 | US20110174664 Colored device casing and surface-treating method for fabricating same |
| 07/21/2011 | US20110174608 Method for forming a diamond-like carbon layer on air bearing surface of a slider |
| 07/21/2011 | US20110174441 Plasma processing apparatus |
| 07/21/2011 | US20110174221 Surface processing apparatus |
| 07/21/2011 | US20110174220 Device for Plasma-Assisted Coating of the Inner Side of Tubular Components |
| 07/21/2011 | US20110174219 Control for and method of pulsed gas delivery |
| 07/21/2011 | US20110174213 Vapor Phase Epitaxy System |
| 07/21/2011 | US20110174212 Epitaxial chamber with cross flow |
| 07/21/2011 | DE112009002396T5 Vorrichtung zum Herstellen eines Verbindungshalbleiters, Verfahren zum Herstellen eines Verbindungshalbleiters und Einspannvorrichtung zum Herstellen eines Verbindungshalbleiters Apparatus for producing a compound semiconductor process for producing a compound semiconductor and jig for manufacturing a compound semiconductor |
| 07/21/2011 | DE102010018981B3 Verfahren zur plasmagestützten Behandlung von Innenflächen eines Hohlkörpers, Fluid-Separator sowie dessen Verwendung A method for plasma-assisted treatment of internal surfaces of a hollow body, the fluid separator and the use thereof |
| 07/21/2011 | DE102010004991A1 Verfahren zum Vakuumbeschichten eines Substrates mit einem transparenten leitfähigen Metalllegierungsoxid sowie eine transparente leitfähige Schicht aus einem Metalllegierungsoxid Method for vacuum coating a substrate with a transparent conductive Metalllegierungsoxid and a transparent conductive layer made of a Metalllegierungsoxid |
| 07/21/2011 | DE102010000983A1 Plasma- bzw. ionengestützes System zur Herstellung haftfester Beschichtungen auf Fluorpolymeren Plasma or ionengestützes system for producing adherent coatings on fluoropolymers |
| 07/21/2011 | DE102010000940A1 Device for plasma-treating a container for inner coating of the container, comprises an evacuatable treatment chamber, an electrode to generate plasma in the container, and a transport unit to move the container into the treatment chamber |
| 07/21/2011 | DE102008012931B4 Verfahren und Vorrichtung zum Kühlen von Substraten Method and apparatus for cooling of substrates |
| 07/20/2011 | EP2345751A1 Plasma film forming apparatus |
| 07/20/2011 | EP2345473A2 Method for constant concentration evaporation and a device using the same |
| 07/20/2011 | EP2344697A1 Fibrous product having a barrier layer and method of producing the same |
| 07/20/2011 | CN201902735U Pipeline connector and chemical vapor deposition equipment applying same |
| 07/20/2011 | CN201901702U Cylindrical part CVI (Chemical Vapor Immersion) slit oriented flow device |
| 07/20/2011 | CN201901701U Vacuum processing system for metal-organic chemical vapor deposition |
| 07/20/2011 | CN201901700U MOCVD (metal-organic chemical vapor deposition) processing system realizing automatic substrate conveying |
| 07/20/2011 | CN201901699U MOCVD (metal-organic chemical vapor deposition) processing system for automatic substrate conveying and in-situ substrate test |
| 07/20/2011 | CN1958170B Gas supplying unit and substrate processing apparatus |
| 07/20/2011 | CN1717791B Method for cleaning substrate processing chamber |
| 07/20/2011 | CN102132387A Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus |
| 07/20/2011 | CN102132380A Polysilicon deposition apparatus |
| 07/20/2011 | CN102131957A UV absorption based monitor and control of chloride gas stream |
| 07/20/2011 | CN102131955A Coating chamber with a moveable shield |
| 07/20/2011 | CN102130212A Manufacturing method of solar cell |
| 07/20/2011 | CN102130185A Dual-layer silicon nitride film for crystalline silicon solar cell and preparation method thereof |