Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2011
08/09/2011US7993457 Deposition sub-chamber with variable flow
08/09/2011US7993456 Device for carrying out a surface treatment of substrates under vacuum
08/09/2011US7992518 Silicon carbide gas distribution plate and RF electrode for plasma etch chamber
08/09/2011CA2538897C Metallization of substrate(s) by a liquid/vapor deposition process
08/05/2011CA2727509A1 Method of preparing organometallic compounds
08/04/2011WO2011094311A2 Balancing rf bridge assembly
08/04/2011WO2011094142A2 Apparatus for controlling temperature uniformity of a substrate
08/04/2011WO2011093709A1 Dynamic fluid valve and method for establishing the same
08/04/2011WO2011093481A1 Method for producing nitride compound semiconductor substrate, and nitride compound semiconductor free-standing substrate
08/04/2011WO2011093235A1 Method for producing an optical component
08/04/2011WO2011092778A1 Plasma film-forming apparatus
08/04/2011WO2011057105A3 Materials and methods for thermal and electrical conductivity
08/04/2011WO2011030305A3 An insulated conductive element having a substantially continuous barrier layer formed through multiple coatings
08/04/2011WO2010144730A8 Method for manufacturing multi-component oxide heterostructures
08/04/2011US20110189862 Silicon oxynitride film and process for production thereof, computer-readable storage medium, and plasma cvd device
08/04/2011US20110189861 Deposition Method for Passivation of Silicon Wafers
08/04/2011US20110189841 Fabrication of large grain polycrystalline silicon film by nano aluminum-induced crystallization of amorphous silicon
08/04/2011US20110189815 Formation of cigs absorber layer materials using atomic layer deposition and high throughput surface treatment on coiled flexible substrates
08/04/2011US20110189593 Defect repair apparatus and method for EUV mask
08/04/2011US20110189407 Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure
08/04/2011US20110189394 Method for forming carbon nanotube
08/04/2011US20110189380 Device and method for fabricating display device
08/04/2011US20110188206 Thermal interface
08/04/2011US20110186984 Substrate processing apparatus and method of manufacturing semiconductor device
08/04/2011US20110186545 Feedforward temperature control for plasma processing apparatus
08/04/2011US20110186537 Systems, Apparatus and Methods for Coating the Interior of a Container Using a Photolysis and/or Thermal Chemical Vapor Deposition Process
08/04/2011US20110186229 Gas shower structure and substrate processing apparatus
08/04/2011US20110185973 Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces
08/04/2011US20110185972 Balancing rf bridge assembly
08/04/2011US20110185971 Laser doping
08/04/2011US20110185970 Semiconductor processing
08/04/2011DE102010006735A1 Method for producing an object coated in a path of a plasma coating process, comprises cleaning the object in a frame preparing process steps and temporally coating the following plasma coating process into the frame
08/04/2011DE102010000270A1 Elektrode für einen Reaktor zur Herstellung von polykristallinem Silizium An electrode for a reactor for preparing polycrystalline silicon
08/03/2011EP2351071A2 Methods for forming a conductive material, methods for selectively forming a conductive material, methods for forming platinum, and methods for forming conductive structures
08/03/2011EP2351070A2 Method and apparatus for controlling ion energy distribution
08/03/2011EP2351069A2 Continuous feed chemical vapor deposition
08/03/2011EP2350342A1 Reagent dispensing apparatuses and delivery methods
08/03/2011EP2350341A1 Device for the synthesis of nanoparticles by fluidized-bed chemical vapour deposition
08/03/2011EP2350340A1 Systems, apparatus and methods for coating the interior of a container using a photolysis and/or thermal chemical vapor deposition process
08/03/2011EP1948842B1 Titanium carbonitride layer and method for the production of a titanium carbonitride layer
08/03/2011CN201915144U 化学气相沉积装置 Chemical vapor deposition apparatus
08/03/2011CN201915143U 用于化学气相沉积设备的喷头 Nozzles for the chemical vapor deposition apparatus
08/03/2011CN201915142U 用于高温炉的排气管道和高温炉 Exhaust pipes and high-temperature furnace for high temperature furnace
08/03/2011CN1930099B Method for depositing gallium oxide coatings on flat glass
08/03/2011CN1906026B Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components
08/03/2011CN102142475A Graded alloy telluride layer in cadmium telluride thin film photovoltaic devices and methods of manufacturing the same
08/03/2011CN102142469A P type microcrystalline silicon carbon film material for PI flexible substrate solar cell and preparation
08/03/2011CN102140630A Coating device
08/03/2011CN102140629A Chemical vapor deposition device and sprayer thereof
08/03/2011CN102140628A Method for removing contamination from reactor
08/03/2011CN102140627A Preparation method of planarized coating layer for diamond with ultra-large-aperture inner holes
08/03/2011CN102140626A Tensile spring structure for preparing diamond film
08/03/2011CN102140625A Method for preparing plasma-oriented tungsten coating used in fusion reactor by using tungsten carbonyl as precursor
08/03/2011CN102140619A Deposition mask and mask assembly having the same
08/03/2011CN101770922B Capacitance coupling type radiofrequency plasma source
08/03/2011CN101646802B Deposition source unit, deposition apparatus and temperature control apparatus for deposition source unit
08/03/2011CN101617276B Intermediate transfer member and image formation apparatus
08/03/2011CN101583737B Film deposition of amorphous films by electron cyclotron resonance
08/03/2011CN101573470B Plasma deposited microporous carbon material
08/03/2011CN101553598B Sliding mating part in lubricated regime, coated by a thin film
08/03/2011CN101314846B Substrate carrying mechanism and substrate treating device having the same
08/03/2011CN101253603B Method of film formation
08/02/2011US7989272 Composition of carbon nitride, thin film transistor with the composition of carbon nitride, display device with the thin film transistor, and manufacturing method thereof
08/02/2011US7989034 Method for continuous atmospheric pressure plasma treatment of workpieces
08/02/2011US7989033 Silicon precursors to make ultra low-K films with high mechanical properties by plasma enhanced chemical vapor deposition
08/02/2011US7989024 Atmospheric pressure chemical vapor deposition of gas containing compounds of zinc, oxygen, fluorine and boron, aluminum, gallium and/or indium onto hot substrate; durability; high visible light transmittance, low emissivity and/or solar control properties
08/02/2011US7989023 Method of improving mixing of axial injection in thermal spray guns
08/02/2011US7989022 Methods of processing substrates, electrostatic carriers for retaining substrates for processing, and assemblies comprising electrostatic carriers having substrates electrostatically bonded thereto
08/02/2011US7989021 Vaporizing material at a uniform rate
08/02/2011US7988836 Method of making window unit including diamond-like carbon (DLC) coating
08/02/2011US7988835 Silicon dot forming method and silicon dot forming apparatus
08/02/2011US7988832 Work piece with a hard film of AlCr-containing material, and process for its production
08/02/2011US7988817 Lift pin driving device and a flat panel display manufacturing apparatus having same
08/02/2011US7988816 Plasma processing apparatus and method
08/02/2011US7988815 Plasma reactor with reduced electrical skew using electrical bypass elements
08/02/2011US7988814 Plasma processing apparatus, plasma processing method, focus ring, and focus ring component
08/02/2011US7988812 Substrate treatment apparatus
08/02/2011US7988787 Workpiece support system and method
08/02/2011US7988785 Printing head for nano patterning
08/02/2011US7987814 Lower liner with integrated flow equalizer and improved conductance
08/02/2011CA2583940C Hydrophilic dlc on substrate with flame pyrolysis treatment
07/2011
07/28/2011WO2011090825A1 Control for and method of pulsed gas delivery
07/28/2011WO2011090737A2 Oxygen radical generation for radical-enhanced thin film deposition
07/28/2011WO2011090717A1 Coating methods, systems, and related articles
07/28/2011WO2011090076A1 Plasma processing apparatus and method for processing substrate using the apparatus
07/28/2011WO2011090040A1 Method for manufacturing epitaxial crystal substrate
07/28/2011WO2011088884A1 Cleaning method for coating systems
07/28/2011WO2011057114A3 Methods of making and deposition methods using hafnium- or zirconium-containing compounds
07/28/2011US20110184156 Precursors for deposition of metal oxide layers or films
07/28/2011US20110183528 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
07/28/2011US20110183519 Method of manufacturing semiconductor device and substrate processing apparatus
07/28/2011US20110183461 Process device for processing in particular stacked proessed goods
07/28/2011US20110183074 Ozone applicator and method for polymer oxidation
07/28/2011US20110183069 Deposition apparatus, deposition method, and storage medium having program stored therein
07/28/2011US20110183067 Carbon nano tube coating apparatus and method thereof
07/28/2011US20110182804 Protected Alloy Surfaces In Microchannel Apparatus and Catalysts, Alumina Supported Catalysts, Catalyst Intermediates, and Methods of Forming Catalysts and Microchannel Apparatus
07/28/2011US20110182761 Stator for use in helicoidal motor
07/28/2011US20110180513 Hallow carbon spheres
07/28/2011US20110180402 Vacuum Processing Apparatus
07/28/2011US20110180213 Plasma processing apparatus and plasma processing method