Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2011
08/17/2011CN102154629A Device and method for adjusting mixed gas inflow and outflow of polycrystalline silicon CVD (Chemical Vapor Deposition) furnace
08/17/2011CN102154628A Multi-gas distribution injector for chemical vapor deposition reactors
08/17/2011CN102154627A Method for preparing independent self-supporting transparent aluminium nitride nanocrystalline film
08/17/2011CN102154626A Surface treatment method for measuring diffusion length of silicon wafer
08/17/2011CN102154625A Preparation method for anti-carbon deposition layer on the surface of steel material part of engine
08/17/2011CN102154624A Reactor, chemical vapor deposition reactor and metal organic chemical vapor deposition reactor
08/17/2011CN102154623A An active viewport detection assembly for substrate detection in a vapor deposition system
08/17/2011CN102153569A Method of preparing organometallic compounds
08/17/2011CN101805894B Preparation method for hydrogenated crystalline state nanometer carborundum films under low temperature
08/17/2011CN101781755B Method for preparing aluminum-based alloy with Al-Si-O-N wearproof anticorrosive layer
08/17/2011CN101770933B Plasma process equipment and gas distribution device thereof
08/17/2011CN101688306B Apparatus and method for depositing multiple coating materials in a common plasma coating zone
08/17/2011CN101681870B Dynamic temperature backside gas control for improved within-substrate processing uniformity
08/17/2011CN101665918B Film forming method and film forming apparatus
08/17/2011CN101660143B Flat heater and plasma processing equipment
08/17/2011CN101553900B Plasma confinement rings including RF absorbing material for reducing polymer deposition
08/17/2011CN101452706B Protection film forming method
08/17/2011CN101371958B Exhaust gas collection device
08/17/2011CN101370962B Methods and arrangement for a highly efficient gas distribution arrangement
08/17/2011CN101310040B Manufacturing method of ti system film
08/17/2011CN101256935B Method and apparatus for controlling gas flow to a processing chamber
08/17/2011CN101175868B Bonding an adherent to a substrate via a primer
08/16/2011US7998883 Process for producing zirconium oxide thin films
08/16/2011US7998600 Dry composition, its use, layer system and coating process
08/16/2011US7998538 Electromagnetic control of chemical catalysis
08/16/2011US7998537 High density thin films; ion bombardment surfaces; crosslinking
08/16/2011US7998536 Silicon precursors to make ultra low-K films of K<2.2 with high mechanical properties by plasma enhanced chemical vapor deposition
08/16/2011US7998527 Composite material and process for preparing a composite material
08/16/2011US7998526 Method and system for dynamic in-situ phosphor mixing and jetting
08/16/2011US7998426 Plasma-based gas treatment system integrated in a vacuum pump
08/16/2011US7998307 Electron beam enhanced surface wave plasma source
08/16/2011US7998263 Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film
08/16/2011US7997227 Vacuum coater device and mechanism for supporting and manipulating workpieces in same
08/11/2011WO2011097012A1 An isolation chamber and method of using the isolation chamber to make solar cell material
08/11/2011WO2011095849A1 Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film deposition
08/11/2011WO2011095846A1 Parallel plate reactor for uniform thin film deposition with reduced tool foot-print
08/11/2011WO2011095681A1 Strengthened structural module and method of fabrication
08/11/2011WO2011064392A3 Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure
08/11/2011WO2011045186A4 Method and device for separating argon from a gaseous mixture
08/11/2011WO2011020028A3 Silane blend for thin film vapor deposition
08/11/2011US20110195580 Method for forming laminated structure including amorphous carbon film
08/11/2011US20110195207 Graphene roll-to-roll coating apparatus and graphene roll-to-roll coating method using the same
08/11/2011US20110195202 Oxygen pump purge to prevent reactive powder explosion
08/11/2011US20110195199 Process and device for soldering in the vapor phase
08/11/2011US20110195196 Method for manufacturing transparent oxide electrode using electron beam post-treatment
08/11/2011US20110195188 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
08/11/2011US20110195187 Direct liquid vaporization for oleophobic coatings
08/11/2011US20110195186 Plane-type film continuous evaporation source and the manufacturing method and system using the same
08/11/2011US20110195185 SiGe Matrix Nanocomposite Materials with an Improved Thermoelectric Figure of Merit
08/11/2011US20110195184 Substrate protection device and method
08/11/2011US20110195182 Cvi followed by coal tar pitch densification by vpi
08/11/2011US20110192779 Thin layer chromatography plates and related methods
08/11/2011US20110192546 WATER-COLLAPSIBLE Al COMPOSITE MATERIAL, Al FILM AND Al POWDER CONSISTING OF THIS MATERIAL, AND METHODS FOR PREPARATION THEREOF, AS WELL AS COMPONENT MEMBERS FOR CONSTITUTING FILM-FORMING CHAMBERS AND METHOD FOR THE RECOVERY OF FILM-FORMING MATERIALS
08/11/2011US20110192540 Table for plasma processing apparatus and plasma processing apparatus
08/11/2011US20110192349 Phase-Modulated RF Power for Plasma Chamber Electrode
08/11/2011US20110192348 RF Hollow Cathode Plasma Generator
08/11/2011US20110192347 Substrate processing apparatus and semiconductor devices manufacturing method
08/11/2011US20110192344 Film forming apparatus
08/11/2011US20110192320 Black metallic effect pigments
08/11/2011DE102010007516A1 Large-scale cathode for magnetron sputtering within vacuum chamber, comprises target, and device for producing a magnetic field, which is enclosed itself on the surface of the target in circular manner and is formed in tunnel-shaped manner
08/11/2011DE102010000388A1 Gaseinlassorgan mit Prallplattenanordnung Gas inlet element with baffle arrangement
08/10/2011EP2354272A1 Graphene roll-to-roll coating apparatus and graphene roll-to-roll coating method using the same
08/10/2011EP2354271A1 Substrate protection device and method
08/10/2011EP2353176A2 Reaction chamber
08/10/2011EP2160759B1 Device for coating a plurality of closest-packed substrates arranged on a susceptor
08/10/2011EP1893786B1 A method of producing metal cutting tools
08/10/2011EP1828430B1 Method for deposition of metal layers from metal carbonyl precursors
08/10/2011EP1770187B1 Thin film-forming material and method for producing thin film
08/10/2011EP1631986B1 A method of preparation of an epitaxial substrate
08/10/2011EP1618225B1 Porous materials functionalized by vacuum deposition
08/10/2011EP1547131B1 Large-diameter sic wafer and manufacturing method thereof
08/10/2011EP1411031B1 Ceramic and semiconductor
08/10/2011CN201924077U 化学气相沉积设备及其气体扩散器 Chemical vapor deposition apparatus and the gas diffuser
08/10/2011CN201924070U 一种真空镀膜靶条气体供气分布装置 A vacuum coating target strip gas supply distribution unit
08/10/2011CN1944714B Process for the metallic coating of fibres by liquid means
08/10/2011CN1749430B Pecvd susceptor support construction
08/10/2011CN1598048B Holder for multiple substrates and chamber with the same
08/10/2011CN102150245A Film forming apparatus
08/10/2011CN102149850A Sanitary object
08/10/2011CN102149845A SiGe matrix nanocomposite materials with an improved thermoelectric figure of merit
08/10/2011CN102148153A Substrate cleaning method and substrate cleaning apparatus
08/10/2011CN102148134A Method for isolated and discretized process sequence integration
08/10/2011CN102146553A Method of depositing a metal film on a substrate with patterned features
08/10/2011CN101775590B Graphite base with protective coating layer and preparation method thereof
08/10/2011CN101736326B Capacitively coupled plasma processing reactor
08/10/2011CN101724826B Surface treatment method for C-C heating element
08/10/2011CN101238095B Metal-containing compound, method for producing the compound, metal-containing thin film and method for forming the thin film
08/09/2011US7993705 Film formation apparatus and method for using the same
08/09/2011US7993704 Protective coating systems for gas turbine engine applications and methods for fabricating the same
08/09/2011US7993703 Method for making nanostructures
08/09/2011US7993698 Techniques for temperature controlled ion implantation
08/09/2011US7993497 Magnetic disk and magnetic disk manufacturing method
08/09/2011US7993489 Capacitive coupling plasma processing apparatus and method for using the same
08/09/2011US7993488 Microwave plasma processing device and gate valve for microwave plasma processing device
08/09/2011US7993487 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
08/09/2011US7993486 Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces
08/09/2011US7993462 Substrate-supporting device having continuous concavity
08/09/2011US7993460 Substrate support having dynamic temperature control
08/09/2011US7993459 Delivering particulate material to a vaporization zone
08/09/2011US7993458 Vacuum processing apparatus and method